• Title/Summary/Keyword: raman spectroscopy

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Low Temperature Deposition of ${\mu}c$-Si:H Thin-films for Solar Cell Application (태양전지용 ${\mu}c$-Si:H 박막의 저온증착 및 특성분석)

  • Chung, Y.S.;Lee, J.C.;Kim, S.K.;Yoon, K.H.;Song, J.;Park, I.J.;Kwon, S.W.;Lim, K.S.
    • Proceedings of the KIEE Conference
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    • 2003.07c
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    • pp.1592-1594
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    • 2003
  • This paper presents the deposition and characterization of microcrystalline silicon(${\mu}c$-Si:H) films by HWCVD(Hot-wire Chemical Vapor Deposition) method at low substrate($300^{\circ}C$). The filament temperature, pressure and $SiH_4$ concentration were determined to be a critical parameter for the deposition of poly-Si films. Series A was deposited under the conditions of $1380^{\circ}C$(Tf), 100 mTorr and $2{\sim}10%\{SC:SiH_4/(SiH_4+H_2)\}$ for 60 min. Series B was deposited under the conditions of $1400{\sim}1450^{\circ}(T_f)$, 30 mTorr and $2{\sim}12%$(SC) for 60 min. The physical characteristics were measured by Raman and FTIR spectroscopy, dark and photoconductivity measurements under AM1.5 illumination.

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Microcrystalline Silicon Thin-film(${\mu}c$-Si:H) and Solar Cells prepared at Low Temperature by 60MHz PECVD (60MHz PECVD법에 의한 ${\mu}c$-Si:H 박막의 저온증착 및 태양전지 응용)

  • Lee, J.C.;Chung, Y.S.;Kim, S.K.;Yoon, K.H.;Song, J.;Park, I.J.;Kwon, S.W.;Lim, K.S.
    • Proceedings of the KIEE Conference
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    • 2003.07c
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    • pp.1595-1597
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    • 2003
  • This paper presents the deposition of ${\mu}c$-Si:H thin-film and fabrication of a solar cell by VHF-PECVD method. The ${\mu}c$-Si:H thin films and pin-type solar cells are fabricated using multi-chamber cluster tool system. A 7.4% conversion efficiency was achieved from ${\mu}c$-Si:H thin film solar cells with total thickness less than $5{\mu}m$. The physical characteristic was measured by Raman spectroscopy, Solar cell characteristic was measured under AM1.5 illumination.

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Synthesis and Characterization of CNTs/Metal/Al2O3 Nanocomposite Powders by Thermal CVD (열 CVD법에 의한 CNTs/Metal/Al2O3 나노복합분말의 합성 및 특성)

  • Choa Yong-Ho;Yoo Seung-Hwa;Yang Jae-Kyo;Oh Sung-Tag;Kang Sung-Goon
    • Journal of Powder Materials
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    • v.12 no.2 s.49
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    • pp.146-150
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    • 2005
  • An optimum route to synthesize $Al_2O_3$-based composite powders with homogeneous dispersion of carbon nanotubes (CNTs) was investigated. CNTs/Metal/$Al_2O_3$ nanocomposite powders were fabricated by thermal chemical vapor deposition of $C_2H_2$ gas over metal/$Al_2O_3$ nanocomposite catalyst prepared by selective reduction of metal oxide/$Al_2O_3$ powders. The FT-Raman spectroscopy analysis revealed that the CNTs have single- and multi-walled structure. The CNTs with the diameter of 25-43 nm were homogeneously distributed in the metal/$Al_2O_3$ powders, and their characteristics were strongly affected by a kind of metal catalyst and catalyst size. The experimental results show that the composite powder with required size and dispersion of CNTs can be realized by control of synthesis condition.

Study on the wettability of precuesor solution for MoS2 film by spin coating (스핀코팅에 의한 MoS2 박막 합성을 위한 전구체 용액의 젖음성에 관한 연구)

  • Kim, Min-Gyeong;Park, Yeong-Bae;Lee, Gyu-Hwan
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2015.05a
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    • pp.160-161
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    • 2015
  • 탄소 원자들이 육각형의 벌집 모양으로 배열된 그래핀은 강철보다 200배 이상 강하며, 다이아몬드보다 2배 이상 열전도율이 높으며, 구리보다 100배 이상 전기가 잘 통하며, 실리콘보다 100배 이상 전자가 빠르게 움직일 수 있는 장점이 있다. 그래핀의 이러한 기계적, 열적, 전기적 특성은 에너지 밴드 갭이 없는 그래핀의 전자구조에서 근거하고 있다. 그러나 이러한 에너지 밴드 갭이 없는 그래핀은 반도체가 아닌 준금속의 특성을 보이며, 전자산업의 핵심소자인 트랜지스터로의 상용화에 큰 장벽이 되고 있다. 이러한 그래핀의 단점을 보완하고자 그래핀 이외의 2D 물질에 주목하기 시작하였으며, 그 가운데 최근 $MoS_2$과 같은 Transiton-Metal dichalcogenide(TMD)에 대한 관심이 급증하고 있다. TMD 중 대표적인 물질인 MoS2는 단일 층이 직접 전이 밴드 갭을 가진 반도체로서 전자회로와 발광 다이오드에 이용될 잠재적 가능성을 가진 재료이다. 본 연구에서는 이러한 MoS2 박막 형성을 하기 위해서 대면적이고 저비용으로 만들 수 있는 spin coating을 이용하려고 한다. spin coating을 이용하여 박막을 얻기 위해서는 좋은 wettability가 필수적이므로 이를 개선하기 위하여 용액, 전처리에 따른 wettability를 비교한 후, 열처리를 하여 그 표면을 관찰하고 Raman spectroscopy를 이용하여 분석하여 최적의 조건을 찾기 위한 실험을 하였다.

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Effects of TiN bufer on field emission properties of conical-type tungsten tips with carbon nanotubes coated (원뿔형 CNT-W 팁의 TiN 완충막 유무에 따른 전계방출 특성)

  • Kim, Young-Kwang;Yun, Sung-Jun;Kim, Won;Kim, Jong-Pil;Park, Chang-Kyun;Park, Jin-Seok
    • Proceedings of the KIEE Conference
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    • 2007.07a
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    • pp.1271-1272
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    • 2007
  • Experimental results regarding to the structural properties of carbon nanotubes (CNTs) and the field-emission characteristics of CNT-coated tungsten (W) tips are presented. CNTs are successfully grown on conical-type W-tips by inductively coupled plasma-chemical vapor deposition (ICP-CVD) with or without inserting a TiN-buffer layer prior to the formation of Ni catalysts. For all the CNTs grown, their nanostructures, morphologies, and crystalline structures are analyzed by FESEM, HRTEM, and Raman spectroscopy. Furthermore, the emission properties of CNT-based field-emitters are characterized to estimate the maximum current density and the threshold voltage. The results obtained in this study indicate that the emission current level of the CNT-emitter without using a TiN buffer is desirable for the application of micro-focused x-ray systems.

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Effect of Methane Gases on the Properties of Diamond Thin Films Synthesized by MPCVD (MPCVD법으로 증착된 다이아몬드 박막 특성에 미치는 메탄가스의 영향)

  • Song, Jin-Soo;Nam, Tae-Woon
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.24 no.3
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    • pp.229-233
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    • 2011
  • Diamond thin films were deposited on pretreated Co cemented tungsten carbide (WC-6%Co) inserts as substrate by microwave plasma chemical vapor deposition (MPCVD) system, equipped with a 915MHz, 30kW generator for generating a large-size plasma. The substrates were pretreated with two solutions Murakami solution $[KOH:K_3Fe(CN)_6:H_2O]$ and nitric solution $[HNO_3:H_2O]$ to etch, WC and Co at cemented carbide substrates, respectively. The deposition experiments were performed at an input power of 10 kW and in a total pressure of 100 torr. The influence of various $CH_4$ contents on the crystallinity and morphology of the diamond films deposited in MPCVD was investigated using scanning electron microscopy (SEM) and Raman spectroscopy. The diamond film synthesized by the $CH_4$ plasma shows a triangle-faceted (111) diamond. As $CH_4$ contents was increased, the thickness of diamond films increased and the faceted planes disappeared. Finally, Faceted diamond changed into nano-crystalline diamond with random crystallinity.

Growth and Characterization of Vertically well Aligned Crbon Nanotubes on Glass Substrate by Plasma Enhanced Hot Filament Chemical Vapor deposition

  • Park, Chong-Yun;Yoo, Ji-Beom
    • Proceedings of the Korean Vacuum Society Conference
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    • 2000.02a
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    • pp.210-210
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    • 2000
  • Vertically well aligned multi-wall carbon nanotubes (CNT) were grown on nickel coated glass substrates by plasma enhanced hot filament chemical vapor deposition at low temperatures below 600$^{\circ}C$. Acetylene and ammonia gas were used as the carbon source and a catalyst. Effects of growth parameters such as pre-treatment of substrate, plasma intensity, filament current, imput gas flow rate, gas composition, substrate temperature and different substrates on the growth characteristics of CNT were systematically investigated. Figure 1 shows SEM image of CNT grown on Ni coated glass substrate. Diameter of nanotube was 30 to 100nm depending on the growth condition. The diameter of CNT decreased and density of CNT increased as NH3 etching time etching time increased. Plasma intensity was found to be the most critical parameter to determine the growth of CNT. CNT was not grown at the plasma intensity lower than 500V. Growth of CNT without filament current was observed. Raman spectroscopy showed the C-C tangential stretching mode at 1592 cm1 as well as D line at 1366 cm-1. From the microanalysis using HRTEM, nickel cap was observed on the top of the grown CNT and very thin carbon amorphous layer of 5nm was found on the nickel cap. Current-voltage characteristics using STM showed about 34nA of current at the applied voltage of 1 volt. Electron emission from the vertically well aligned CNT was obtained using phosphor anode with onset electric field of 1.5C/um.

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Dependence of $Cl_2$ Gas Reaction Time on Tribological Properties of TiC Derived Carbon Layer (염소가스 반응시간에 따른 TiC표면 탄소막의 Tribology 특성)

  • Lim, Dae-Soon;Bae, Heung-Taek;Jeong, Ji-Hoon;Na, Byung-Chul
    • Tribology and Lubricants
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    • v.25 no.1
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    • pp.20-24
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    • 2009
  • TiC-derived carbon coatings have been synthesized at $600^{\circ}C$ temperature treatment with $H_2/Cl_2$ mixture gases. From Raman spectroscopy measurements, the modified layer was covered with carbon and the thick-ness of the layer was increased with increasing reaction time. And $I_D/I_G$ ratio was decreased with increasing reaction time. The superior tribological property was obtained from TiC reacted with $Cl_2$ gas for 2 hrs. And the tribological property measurements indicate that TiC-derived carbon layer has $0.9{\times}10_{-6}mm^3/Nm$ in wear coefficient and 0.13 in friction coefficient.

Growth of graphene:Fundamentals and its application

  • Hwang, Chan-Yong;Yu, Gwon-Jae;Seo, Eun-Gyeong;Kim, Yong-Seong;Kim, Cheol-Gi
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.38-38
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    • 2010
  • Ever since the experimental discovery of graphene exfoiliated from the graphite flakes by Geim et at., this area has drawn a lot of attention for its possible application in IT industry. For the growth of graphene, chemical vapor deposition (CVD) has been widely used to fabricate the large area graphene. The lateral size of this graphene can be easily controlled by the size of the metal substrate though the chemical etching to remove this substrate is somewhat troublesome. Another problem which is hard to avoid is the folding at the grain boundary. We will discuss the origin of the folding first and introduce the way to avoid this folding. To solve this problem, we have used the various types of micro-thin metal foils. The precise control of hydro-carbon and the carrier gas results in the formation of the graphene on top of substrate. The thickness of graphene layers can be controlled with the control of gas flow on top of Cu substrate in contrast to the previously reported self-limiting growth $behavior^1$. Uniformity of this graphene layer has been checked by micro-raman spectroscopy and SEM. The size of grain can be enhanced by thermal treatment or use of other metal substrate. The dependence of grain size on the lattice size of the substrate will be discussed. By selecting the shape of substrate, we can grow various types of graphene. We will introduce the micron size graphene tube and its application.

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DLC박막 증착시 전처리 가스 종류와 유량 변화에 따른 효과

  • Baek, Il-Ho;Lee, Won-Baek;Hong, Byeong-Yu;Lee, Jun-Sin
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.247-247
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    • 2010
  • DLC(diamond-like carbon)는 비정질 고상 탄소의 하나로 다이아몬드의 유사한 높은 경도, 내마모성, 윤활성, 전기절연성, 화학적 안정성을 가지고 있는 재료이다. 이러한 우수한 특성 때문에 DLC는 박막의 형태로 여러 종류의 보호코팅에 많이 응용되고 있다. DLC의 광범위한 응용에 있어 가장 큰 문제점은 박막이 갖는 높은 잔류응력과 이에 따른 기판과의 낮은 접착성으로 알려져 있다. 최근 연구에 의하면, plasma pre-treatment를 통해 PTFE기판에 DLC박막의 adhesion strength를 증진 시킬 수 있다고 보고하였다. 또한 ion beam technique를 이용하여 잔류응력을 줄이고 기판과의 접착력을 높일 수 있다는 것도 보고 되었다. 이에 기인하여 pre-treatment가 DLC합성에 잔류응력을 낮추고 기판과의 접착성을 높이는 효과를 보일 것이라고 가정하고 연구하였다. 본 연구에서 pre-treatment가 Diamond-like Carbon의 stainless steel 합성시 stress와 adhesion에 어떤 효과가 있는지 알아보기 위해, pre-treatment시와 synthesis of DLC film시에 13.56MHz 150W RF플라즈마 화학기상 증착 (RF-PECVD) 법을 통해 합성되었다. pre-treatment시에 H2(80 sccm), O2(10 sccm), N2(20 sccm)의 가스 종류를 다르게 하였고, synthesis of DLC film시에는 CH4 (20 sccm), H2 (80 sccm)가스의 유량을 고정하였다. 합성된 DLC 박막은 Contact Angle Analyze, Raman spectroscopy, Scratch tester를 이용하여 접촉각, D peak Position, G peak Position, ID/IG ratio, 접착력을 측정하였다.

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