• 제목/요약/키워드: r.f magnetron sputtering

검색결과 169건 처리시간 0.029초

스퍼터링으로 퇴적시킨 바나듐 산화막의 구조적, 광학적 특성 (Structural and optical properties of sputtered vanadium pentoxide thin films)

  • 최복길;신규호;정상진;최창규;김성진
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1998년도 추계학술대회 논문집 학회본부 C
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    • pp.746-748
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    • 1998
  • Thin films of vanadium pentoxide ($V_{2}O_{5}$) have been deposited by r.f. magnetron sputtering from $V_{2}O_{5}$ target in gas mixture of argon and oxygen. Crystal structure, surface morphology, surface composition and optical properties of films prepared under different substrates are characterized through XRD, SEM, AES, XPS and optical absorption measurements. The films prepared below $100^{\circ}C$ are amorphous, and those prepared above $200^{\circ}C$ are polycrystalline. Thermally Induced oxidation of films into higher oxide has been observed with increasing substrate temperature. Vanadium oxide films show two optical absorption bands indicating the presence of direct and indirect transitions.

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$(CH_3)_3N$ 가스 감지용 ZnO 박막 가스 센서의 제조 (Fabrication of ZnO thin film gas sensor for detecting $(CH_3)_3N$ gas)

  • 신현우;박현수;윤동현;홍형기;권철한;이규정
    • E2M - 전기 전자와 첨단 소재
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    • 제8권1호
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    • pp.21-26
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    • 1995
  • Highly sensitive and mechanically stable gas sensors have been fabricated using the microfabrication and micromaching techniques. The sensing material used to detect the offensive trimethylarnine ((CH$_{3}$)$_{3}$N) gas is 6 wt% $Al_{2}$O$_{3}$-doped, 1000.angs.-thick ZnO deposited by r. f. magnetron sputtering. The optimum operating temperature of the sensor is 350.deg.C and the corresponding heater power is about 85mW. Excellent thermal insulation is achieved by the use of a double-layer structure of 0.2.mu.m -thick silicon nitride and 1.4.mu.m-thick phosphosilicate glass(PSG) prepared by low pressure chemical vapor deposition(LPCVD) and atmospheric pressure chemical vapor deposition(APCVD), respectively. The sensors are mechanically stable enough to endure at least 43, 200 heat cycles between room temperature and 350.deg. C.

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Effect of the Substrate Temperature on the Copper Oxide Thin Films

  • 박주연;강용철
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2010년도 제39회 하계학술대회 초록집
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    • pp.71-71
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    • 2010
  • Copper oxide thin films were deposited on the p-type Si(100) by r.f. magnetron sputtering as a function of different substrate temperature. The deposited copper oxide thin films were investigated by atomic force microscopy (AFM), scanning electron microscopy (SEM), spectroscopic ellipsometry (SE), X-ray diffraction (XRD), and X-ray photoelectron spectroscopy (XPS). The SEM and SE data show that the thickness of the copper oxide films was about 170 nm. AFM images show that the surface roughness of copper oxide films was increased with increasing substrate temperature. As the substrate temperature increased, monoclinic CuO (111) peak appeared and the crystal size decreased while the monoclinic CuO (-111) peak was independent on the substrate temperature. The oxidation states of Cu 2p and O 1s resulted from XPS were not affected on the substrate temperature. The contact angle measurement was also studied and indicated that the surface of copper oxide thin films deposited high temperature has more hydrophobic surface than that of deposited at low temperature.

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Effects of indium tin oxide top electrode formation conditions on the characteristics of the top emission inverted organic light emitting diodes

  • Kho, Sam-Il;Cho, Dae-Yong;Jung, Dong-Geun
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2002년도 International Meeting on Information Display
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    • pp.714-716
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    • 2002
  • Indium tin oxide (ITO) was used as the top anode of top emission inverted organic light emitting diodes (TEIOLEDs). TEIOLEDs were fabricated by deposition of an aluminum bottom cathode, an N,N'-diphenyl-N,N'-bis(3-methylphenyl)-1, 1'-diphenyl-4, 4 1'-diamine (TPD) hole transport layer, a tris-8-hydroxyquinoline aluminum ($Alq_3$) emission layer, and an ITO top anode sequentially. ITO was deposited by r.f. magnetron sputtering without $O_2$ flow during the deposition. After the deposition, the deposited ITO layer was kept under oxygen atmosphere for the oxidation. The characteristics of the TEOILED were affected significantly by the post-deposition oxidation condition.

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다양한 증착변수에 따른 AlN 박막의 물성 및 SAW 소자의 특성 분석 (Effects of deposition conditions on properties of AlN thin films and characterization of AlN SAW devices)

  • 정준필;이명호;이진복;박진석
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2002년도 하계학술대회 논문집 C
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    • pp.1479-1481
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    • 2002
  • AlN thin films were deposited on Si(100) and $SiO_2$/Si substrates using R.F. magnetron sputtering system. The effect of various deposition conditions on the crystal orientation of AlN films was investigated to obtain a highly (002)-oriented films. SAW filters were fabricated using AlN films with various thicknesses and their frequency response characterizations were measured. Experimental results showed that the (002)-orientation and surface roughness of AlN films played a crucial role of determining the frequency response of AlN SAW devices.

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Investigation on Preparation of Ge Quantum Dots in $SiO_2$ Thin Films

  • Chen, Jing;Wu, Xuemei;Jin, Zongming;Yao, Weiguo
    • 한국진공학회지
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    • 제7권s1호
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    • pp.197-201
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    • 1998
  • Ge quantum dots in $SiO_2$ thin films were prepared by r.f. magnetron co-sputtering using a Ge, $SiO_2$ composite target. The size of quantum dots was modulated by controlling of substrate temperature during depositing and annealing of samples deposited at certain substrate temperature. A series of work was done on the influence of preparing parameters on the growth of quantum dots, and a discussion on the formation and growth of quantum dots under different preparation parameters is given.

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산화마그네슘을 매개층으로 이용한 백금박막 미세발열체의 제작과 그 특성 (The Fabrication of Micro-Heater MgO Medium Layer and It`s Characteristics)

  • 홍석우;노상수;장영석;정쉬상
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1999년도 춘계학술대회 논문집
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    • pp.150-153
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    • 1999
  • The electrical and physical characteristics of MgO and Pt thin-films on Si wafers deposited by r.f magnetron sputtering, were analyzed with annealing condition(100$0^{\circ}C$, 120 min) by four point probe, SEM and XRD. Until annealing temperature of 100$0^{\circ}C$, MgO had the properties of improving Pt adhesion to SiO$_2$ and insulation without chemical reaction to Pt thin-films and the resistivity of Pt thin-films was improved. The thermal characteristics of Pt micro-heater were analyed with Pt-RTD integrated on the same substrate, In the analysis of properties of Pt-RTD, TCR value had 3927 ppm/$^{\circ}C$ and liner in the temperature range of 25~40$0^{\circ}C$ temperature of Pt micro-heater had up to 40$0^{\circ}C$ with 1.5 watts of the heating power.

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Influence of Surface Texturing on the Electrical and Optical Properties of Aluminum Doped Zinc Oxide Thin Films

  • Lee, Jaeh-Yeong;Shim, Joong-Pyo;Jung, Hak-Kee
    • Journal of information and communication convergence engineering
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    • 제9권4호
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    • pp.461-465
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    • 2011
  • An aluminum doped zinc oxide (AZO) film for front contacts of thin film solar cells, in this work, were deposited by r.f. magnetron sputtering, and then etched in diluted hydrochloric acid solution for different times. Effects of surface texturing on the electro-optical properties of AZO films were investigated. Also, to clarify the light trapping of textured AZO film, amorphous silicon thin film solar cells were fabricated on the textured AZO/glass substrate and the performance of solar cells were studied. After texturing, the spectral haze at the visible range of 400 ~750 nm increased substantially with the etching time, without a change in the resistivity. The conversion efficiency of amorphous Si solar cells with textured AZO film as a front electrode was improved by the increase of short-circuit current density ($J_{sc}$), compared to cell with flat AZO films.

Surface Characteristics of Copper Oxide Thin Films with Different Oxygen Ratio

  • 박주연;조준모;강용철
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2009년도 제38회 동계학술대회 초록집
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    • pp.385-385
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    • 2010
  • Copper oxide thin films were deposited on the p-type Si(100) by r.f. magnetron sputtering as a function of different oxygen concentration. The deposited copper oxide thin films were investigated by atomic force microscopy (AFM), scanning electron microscopy (SEM), spectroscopic ellipsometry (SE), X-ray diffraction (XRD), and X-ray photoelectron spectroscopy (XPS). The SEM and SE data show that the thickness of the copper oxide films was in the range of 100-400 nm. AFM images show that the surface morphology was depended on the oxygen ratio. The crystal structure of copper oxide films was changed from metallic copper to copper oxide with increasing oxygen concentration. The oxidation states of Cu 2p and O 1s resulted from XPS were consistent with XRD results.

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Effect of the flow rate of nitrogen sputter gas on the properties of thin zirconium oxynitride films

  • 박주연;조준모;강용철
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2009년도 제38회 동계학술대회 초록집
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    • pp.384-384
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    • 2010
  • Zirconium oxynitride films were obtained by r.f. reactive magnetron sputtering of a zirconium target with nitrogen flow rate ranging from 0 to 60 sccm. The phases present in the films were determined by X-ray diffraction (XRD). Measurements of the oxidation state $ZrON_x$ films were investigated by X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES). Thickness of these samples was estimated by spectroscopic ellipsometry (SE) and scanning electron microscopy (SEM). We found that the surface morphology of $ZrON_x$ films measured by atomic force microscopy (AFM) was also depended on the nitrogen gas flow.

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