• 제목/요약/키워드: pulsed Nd:YAG laser

검색결과 276건 처리시간 0.022초

펄스 레이저 증착법을 이용한 실리콘 박막의 어닐링 온도 변화에 따른 발광 특성연구 (Effect of Annealing Temperature on the Luminescence of Si Nanocrystallites Thin Flms Fabricated by Pulsed Laser Deposilion)

  • 김종훈;전경아;이상렬
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 하계학술대회 논문집
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    • pp.127-130
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    • 2001
  • Si thin films on p-type (100) Si substrate have been fabricated by pulsed laser deposition technique using a Nd:YAG laser. The pressure of the environmental gas during deposition was 1 Torr. After deposition, Si thin film has been annealed again at 400-840$^{\circ}C$ in nitrogen ambient. Strong blue photoluminescence (PL) have been observed at room temperature. We report the PL properties of Si thin films depending on the variation of the annealing temperature.

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PLD를 이용한 ZnO 박막의 후열처리에 관한 연구 (Effects of Post-Annealing Treatment of ZnO Thin Films by Pulsed Laser)

  • 이천;김재홍
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제54권3호
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    • pp.103-108
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    • 2005
  • ZnO thin films on (001) sapphire substrates have been deposited by pulsed laser deposition(PLD) technique using an Nd:YAG laser with a wavelength of 266nm. Before post-annealing treatment in the oxygen ambient, the experiment of the deposition of ZnO thin films has been performed for substrate temperatures in the range of $300\~450^{\circ}C$ and oxygen gas flow rate of $100\~700\;sccm$. In order to investigate the effect of post-annealing treatment of ZnO thin films, films have been annealed at various temperatures after deposition. After post-annealing treatment in the oxygen ambient, the structural properties of ZnO thin films were characterized by X-ray diffraction(XRD), scanning electron microscopy(SEM) and the optical properties of the ZnO were characterized by photoluminescence(PL).

펄스 레이저 증착법으로 성장된 실리콘 박막의 어닐링 온도 변화에 따른 발광 특성연구 (Effect of Annealing Temperature on the Luminescence of Si Nanocrystallites Thin Films Prepared by Pulsed Laser Deposition)

  • 김종훈;전경아;이상렬
    • 한국전기전자재료학회논문지
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    • 제15권1호
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    • pp.75-78
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    • 2002
  • Si thin films on p-type (100) Si substrate have been prepared by a pulsed laser deposition technique using a Nd:YAG laser. The pressure of the environmental gas during deposition was 1 Torr. After deposition, Si thin film has been annealed again at 400-840$^{\circ}C$ in nitrogen ambient. Strong blue photoluminescence (PL) have been observed at room temperature. We report the PL properties of Si thin films with the variation of the annealing temperature.

PLT buffer층의 삽입에 따른 강유전 PZT박막의 특성 향상 (Enhancement of the ferroelectric properties of $Pb(Zr,Ti)O_3$ thin films with $Pb(La,Ti)O_3$ buffers fabricated by pulsed laser deposition)

  • 임성훈;이은선;정현우;이상렬
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.1
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    • pp.67-69
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    • 2004
  • The $Pb(Zr,Ti)O_3$ thin films were fabricated with $Pb(La,Ti)O_3$ buffers in-situ onto $Pt/Ti/SiO_2/Si$ substrates by pulsed laser deposition technique using a Nd:YAG laser with energy density of $2.5J/cm^2$, and deposited for 10 minutes at $550^{\circ}C$ of substrate temperature. And then, the films have been annealed at $550^{\circ}C$ in oxygen ambient pressure. The remanent polarization value is increased by using buffer layers but coercive field of films is slightly increased.

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압밀 금속 마이크로 입자의 펄스 레이저 ABLATION에 의한 나노입자 합성 (Nanoparticle Synthesis by Pulsed Laser Ablation of Consolidated Microparticles)

  • 장덕석;오부국;김동식
    • 한국레이저가공학회지
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    • 제5권2호
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    • pp.31-38
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    • 2002
  • This paper describes the process of nanoparticle synthesis by laser ablation of consolidated microparticles. We have generated nanoparticles by high-power pulsed laser ablation of Al, Cu and Ag microparticles using a Q-switched Nd:YAG laser (wavelength 355 nm, FWHM 5 ㎱, fluence 0.8∼2.0 J/㎠). Microparticles of mean diameter 18∼80 ㎛ are ablated in the ambient air The generated nanoparticles are collected on a glass substrate and the size distribution and morphology are examined using a scanning electron microscope and a transmission electron microscope. The effect of laser fluence and collector position on the distribution of particle size is investigated. The dynamics of ablation plume and shock wave is analyzed by monitoring the photoacoustic probe-beam deflection signal. Nanosecond time-resolved images of the ablation process are also obtained by laser flash shadowgraphy. Based on the experimental results, discussions are made on the dynamics of ablation plume.

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ITO Thin Film Ablation Using KrF Excimer Laser and its Characteristics

  • Lee, Kyoung-Chel;Lee, Cheon;Le, Yong-Feng
    • Transactions on Electrical and Electronic Materials
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    • 제1권4호
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    • pp.20-24
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    • 2000
  • This study aimed to develop ITO(Indium Tim Oxide) tin films ablation with a pulsed type KrF excimer laser required for the electrode patterning application in flat panel display into small geometry on a large substrate are. The threshold fluence for ablating ITO on glass substrate is about 0.1 J/㎠. And its value is much smaller than that using 3 .sup rd/ harmonic Nd:YAG laser. Through the optical microscope measurement the surface color of the ablated ITO is changed into dark brown due to increase of surface roughness and transformation of chemical composition by the laser light. The laser-irradiated regions were all found to be electrically isolating from the original surroundings. The XPS analysis showed that the relative surface concentration of Sn and In was essentially unchanged (In:Sn=5:1)after irradiating the KrF excimer laser. Using Al foil made by 2$\^$nd/ harmonic Na:YAG laser, the various ITO patterning is carried out.

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Nd:YAG 레이저의 제 2조화파로 종여기하는 펄스형 Ti:sapphire 레이저 발진기와 이를 이용한 단일경로 형태의 Ti:sapphire 증폭기의 출력특성 (Output Characteristics of a Pulsed Ti:sapphire Laser Oscillator Pumped Longitudinally by Second Harmonic Wave of Nd:YAG Laser and a Ti:sapphire Laser Amplifier Operated along the Single Path of the Oscillator Beam)

  • 김경남;조재흥;임권;차병헌
    • 한국광학회지
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    • 제18권1호
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    • pp.66-73
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    • 2007
  • 레이저 분광용 고출력 파장가변 레이저로 이용할 Nd:YAG 레이저의 제 2조화파로 종여기한 평행평면형 공진기 구조의 펄스형 Ti:sapphire 레이저 발진기와 이를 이용한 단일경로 형태의 Ti:sapphire 레이저 증폭기의 출력특성을 조사하였다. 발진기의 경우에는 여기광의 에너지, 공진기 길이, 출력거울의 반사율을 변화시키면서 출력스펙트럼, 펄스 발생시간, 펄스폭, 출력에너지를 측정하였다. 그리고 증폭기의 경우, 발진기의 레이저 광과 증폭기 여기광이 증폭매질에 들어오는 시간차이, 그리고 발진기의 여기에너지와 증폭기의 여기에너지를 각각 변화시키면서 증폭기의 출력에너지를 측정하고 이를 분석하였다. 이 결과 발진기와 증폭기의 여기에너지가 18 mJ/pulse일 때 두 여기광의 시간차가 35 ns까지는 지속적으로 증폭기의 에너지가 증가했으며, 발진기의 여기광에 대한 증폭기의 기울기 효율은 23.5 %이고, 증폭기의 여기광에 대한 증폭기의 기울기 효율은 11.6 %였다.

원형 Cavity를 이용한 펄스형 Nd:YAG레이저의 출력특성 및 병렬메쉬 회로의 최적화 (The Output Characteristics and the Optimization of Parallel-mesh Circuit of a Pulsed Nd:YAG Laser by Using a Circular Cavity)

  • 홍정환;양동민;김병균;박구렬;강욱;김휘영;김희제
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1999년도 하계학술대회 논문집 E
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    • pp.2201-2203
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    • 1999
  • In this study, we have designed and manufactured not a present elliptic cavity but a circular cavity and we have experimented the operational characteristics. As a result, we obtained the maximum efficiency of 2.1 %. It didn't have any difference compared with elliptic cavity. A circular cavity is much more compact, so far easier to be manufactured than a elliptic cavity. And it can be made at a low cost. At the input energy, parameter $\alpha$, input voltage, and pulse width were in the same condition, we have decided to the optimization of the mesh number of a parallel-mesh circuit which was connected with main power supply.

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