• 한국표면공학회지
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• 제19권2호
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• pp.59-64
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• 1986

SRHS(Self-Regulating High Speed) 크롬도금욕을 사용하여 도금욕온도 10-80$^{\circ}C$, 전류밀도 0-400A/$dm^2$의 직류전해도금에서의 전류효율 및 표면광택을 조사하였으며, 동이도금욕 조건에서 펄스 주파수 10-100,000Hz의 펄스전해도금 경우와 비교검토하여 다음과 같은 결론을 얻었다. (1) 20$^{\circ}C$의 욕온도의 경우 5-100Hz의 주파수의 펄스전해도금에서 직류전해도금보다 40%의 높은 전류효율 값을 나타내었다. (2) 75$^{\circ}C$의 욕온도에서는 10-100,000Hz의 전주파수 범위와 25$^{\circ}C$에서는 500Hz이상의 주파수 범위에서 펄스 전해도금의 전류효율은 직류전해 도금보다 낮은 값을 보였다. (3) 직류 전해도금조건에서 광택 및 반광택 표면은 펄스 전해도금으로 무광택으로 변하며, 펄스 주파수가 10,000Hz이상되면 직류전해 도금의 동일 표면광택을 다시 나타났다.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2009년도 추계학술대회 초록집
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• pp.155-155
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• 2009

The copper plating was deposited by pulse reverse current (PRC) method with additives. The all specimens were first immersted in 10% H2SO4 for 10 minutes, and then were rinsed with deionized water. The current densities of forward pulse were 400mA/$cm^2$, and those of reverse pulse were 1900mA/$cm^2$ and 100mA/$cm^2$. Results are compared for different additives for pulse plating conditions. When it added in Only CH4N2S (TU) or only C10H13NO3S (SVH), the effect of surface side growth of Cu was not different. But when it added in TU and SVH, surface side growth of Cu decreased. Polarization curves were measured from OCP to -0.7 V at a rate of 1mV/sec. Each specimen was observed under the PHENOM to see surface morphology.

• 반도체디스플레이기술학회지
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• 제14권1호
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• pp.67-71
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• 2015

Pulse electroplating was studied to form nanocrystal structure effectively by changing plating current density and duty cycle. When both of plating current density and duty cycle were decreased from $100mA/cm^2$ and 70% to $50mA/cm^2$ and 30%, the P content in the Ni matrix was increased almost up to the composition of $Ni_3P$ compound and the grain growth after annealing was retarded as well. The as-plated hardness values ranging from 660 to 753 HV are mainly based on the formation of nanocrystal structure. On the other hand, the post-anneal hardness values ranging from 898 to 1045 HV, which are comparable to the hardness of hard Cr, are coming from how competition worked between the precipitation of $Ni_3P$ and the grain coarsening. According to the ANOVA and regression analysis, the plating current density showed more strong effect on nanocrystal size and film hardness than the duty cycle.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2015년도 추계학술대회 논문집
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• pp.232-233
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• 2015

The effects of various bath conditions such as surfactant concentration, bath pH, bath temperature, agitation of bath; as well as pulse parameters such as cathodic current density, pulse duty cycle and frequency, on the grain size, surface finish, and appearance of the tin plated coatings have been investigated. The plating bath under investigation is an aqueous acidic solution composed of a mixture of $SnSO_4$, $H_2SO_4$, and a surfactant. The bath conductivity and pH are measured by a glass pH electrode. The microstructure of the coatings produced is characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), and surface profilometry. XRD analysis shows that the deposits consist of tetragonal ${\beta}$-Sn crystal structure irrespective of plating conditions. The mechanism involved in the morphology evolution in response to various parameters and conditions has also been discussed.

• 한국표면공학회지
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• 제35권1호
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• pp.53-63
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• 2002

Ni coating was carried out by pulse plating at room temperature. So, experimental conditions for Ni-coating were based on Watt's bath, and new additives(propionic acid) were introduced in the Watt's bath electrolyte as $H_3$$BO_3$ alternatives. By adding propionic acid, coating layer demonstrated a good adhesion and uniformity without special pre-treatment of the 316L stainless steel at room temperature. With a decrease of amount of propionic acid and applied average current density, cathode current efficiency increased. Also, edge effect was decreased with decreasing a peak current and increasing a pulse frequency in the same bath condition. It was found that the optimum condition for Ni coating was a current density of 10~20mA/$\textrm{cm}^2$ at below 500 mA peak current in the $5m\ell/\ell$ propionic acid solution.

• 한국표면공학회지
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• 제26권5호
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• pp.245-254
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• 1993

The effects of pulse current electrolysis conditions on the composition and the microstructure of Ag-Sn alloy were studied by using a pyrophosphate bath. Both cathode current efficiency and throwing power of alloy deposits formed under pulse plating conditions, decreased with increasing mean current density, and lower than those under D.C. electrolysis condition. Tin content of Ag-Sn alloy decreased noticebly with in-creasing the mean current density, while it increased with the increase of On-time from 1 to 10 ms. The pre-ferred orientation of Ag-Sn alloy changed with increasing cathode overpotential in the sequence of (100)longrightarrow(100)+(111)longrightarrow(111) at $20^{\circ}C$ and (110)longrightarrow(111)longrightarrow(111)+(100) at $30^{\circ}C$. The effective crystal grain size of the alloy was decreased by decreasing temperature from $30^{\circ}C$ to $20^{\circ}C$ and the surface structure of them was related to the preferred orientation.

• 한국표면공학회지
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• 제36권3호
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• pp.242-250
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• 2003

Electrodeposition of Ni was carried out on copper substrate from Ni Sulfamate bath by DC and high frequency pulse current. During the electroplating, bath temperature was steady $60^{\circ}C$ , agitation was applied. Morphology and surface roughness of electrodeposits was investigated with the AFM. Crystalline structure of electrodeposits was investigated with XRD. Also, surface electric resistivity was investigated with 4-point probe. The result of crystalline structure by X-ray diffractometer, in the case of DC, <200> direction was dominant growing direction. But in the case of PC, the ratio of <200> direction vs. other direction decreased. As the pulse frequency increased, the enhanced properties of deposits were shown. With increasing frequency, the degree of surface properties increased DC more than that of PC, eg surface morphology, roughness and the degree of compactness of grains. With increasing duty cycle, the surface properties such as the degree of the morphology, roughness and electroconductivity was deteriorated.

• 한국표면공학회지
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• 제24권2호
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• pp.88-95
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• 1991

The tin-lead alloy was electrodeposited in the low range of peak current density in order to investigate the change of composition and microstructure of them. The Pb content of alloy deposits, which was decreased with increasing average current density, was relatively lower than that of D.C. plated alloy deposit. The preferred orientation of alloy deposit was changed with increasing peak current density and the surface morphology of alloy deposits was closely related to the preferred orientation of them.

• 한국표면공학회지
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• 제34권6호
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• pp.553-567
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• 2001

Electrodeposition technology is widely used in industry for various kinds of coatings. Modifications in this technology led to several processes to meet various requirements. Electrolysis in ionic liquids has many advantages such as low energy consumption of energy, low pollutant emission and low operating costs. Although ionic liquids have already been used in liquid/liquid extraction processes, only recently their use in electrodeposition was exploited. Electrochemical deposition of composites is an expanding area. Coupled with the progress in the synthesis of nanometric powder, this research will open a large number of innovative materials. Pulse current plating is another electrodeposition technique which yields improved coatings. Although electrodeposition is now regarded as an environmental non-friendly process, it is economically viable and has many inherent advantages. For certain applications, alternatives to electrodeposition have not yet been fully implemented. Hence, continued research in this technology is warranted. This article reviews some recent advances in electrodeposition technology. Aspects of electrodeposition such as electrolysis in ionic liquids, electrodeposition of composites, pulse current plating techniques, metal and alloy deposition, compound deposition and effects of additives are discussed in this review.

• 한국세라믹학회지
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• 제45권12호
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• pp.807-814
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• 2008

The Cu-Ni-YSZ cermet anodes for direct use of methane in solid oxide fuel cells have been fabricated by electroplating Cu into the porous Ni-YSZ cermet anode. The uniform distribution of Cu in the Ni-YSZ anode could be obtained via pulse electroplating in the aqueous solution mixture of $CuSO_4{\cdot}5H_{2}O$ and ${H_2}{SO_4}$ for 30 min with 0.05 A of average applied current. The power density ($0.17\;Wcm^{-2}$) of a single cell with a Cu-Ni-YSZ anode was shown to be slightly lower in methane at $700^{\circ}C$, compared with the power density ($0.28\;Wcm^{-2}$) of a single cell with a Ni-YSZ anode. However, the performance of the Ni-YSZ anode-supported single cell was abruptly degraded over 21 h because of carbon deposition, whereas the Cu-Ni-YSZ anode-supported single cell showed the enhanced durability upto 52 h.