• Polymer(Korea)
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• v.31 no.2
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• pp.148-152
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• 2007

The prototype of color fitters for the liquid crystal displays (LCD) using cholesteric liquid crystal monomers was produced. Cholesteric liquid crystal is characterized by the unique optical features of selective reflection, which is due to the helical twisting structures of LCs comparable to the wavelength of the incident light under certain conditions of substrate treatment. In the results of the experiment, cholesteric films for red, green, and blue light reflections respectively were produced and the viewing angle dependence of these films were investigated. Reflective light of red and green films shifted to shorter wavelength regions as viewing angle becomes greater, but blue one shifted very little. Periodic micrometer-sized half-spherical photoresist formed by thermal reflow method after photo-lithography was patterned on glass substrates. The viewing angle dependence of reflective light colors of red, green, and blue films on the patterned substrates compared with those on no patterned substrates was investigated. We could confirm the dependences were much smaller on the patterned substrates by bare eyes and Lab-color coordination methods qualitatively.

• Journal of the Microelectronics and Packaging Society
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• v.29 no.2
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• pp.99-105
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• 2022

As the chip size gets smaller, the width of the electrode line is also fine, and the density of interconnections is increasing. As a result, RC delay is becoming a problem due to the difference in resistance between the capacitor layer and the electrical conductivity layer. To solve this problem, the development of electrodes with high electrical conductivity and dielectric materials with low dielectric constant is required. In this study, we developed low dielectric ink by mixing commercial PSR which protect PCB's circuits from external factors and PI with excellent thermal property and low-k characteristics. As a result, the ink mixture of PSR and PI 10:3 showed the best results, with a dielectric constant of about 2.6 and 2.37 at 20 GHz and 28 GHz, respectively, and dielectric dissipation was measured at about 0.022 and 0.016. In order to verify the applicability of future applications, various line-width transmission lines produced on Teflon were evaluated, and as a result, the loss of transmission lines using low dielectric ink mixed with PI was 0.12 dB less on average in S21 than when only PSR was used.

• Journal of the Korea Concrete Institute
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• v.26 no.4
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• pp.491-497
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• 2014

The corrosion of steel reinforcement in reinforced concrete bridge decks significantly affects the degradation of the capacity. Due to the advantageous characteristics such as high tensile strength and non-corrosive property, fiber reinforced polymer (FRP) has been gathering much interest from designers and engineers for possible usage as a alternative reinforcement for a steel reinforcing bar. However, its application has not been widespread, because there data for short- and long-term performance data of FRP reinforced concrete members are insufficient. In this paper, seven full-scale decks with dimensions of $4000{\times}3000{\times}240mm$ were prepared and tested to failure in the laboratory. The test parameter was the bottom reinforcement ratio in transverse direction. The decks were subjected to various levels of concentrated cyclic load with a contact area of $577{\times}231mm$ to simulate the vehicle loading of DB-24 truck wheel loads acting on the center span of the deck. It was observed that the glass FRP (GFRP) reinforced deck on a restraint girder is strongly effected to the level of the applied load rather than the bottom reinforcement ratio. The study results showed that the maximum load less than 58% of the maximum static load can be applied to the deck to resist a fatigue load of 2 million cycles. The fatigue life of the GFRP decks from this study showed the lower and higher fatigue performance than that of ordinary steel and CFRP rebar reinforced concrete deck. respectively.

• Journal of the Microelectronics and Packaging Society
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• v.12 no.4 s.37
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• pp.275-280
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• 2005

We propose a new approach to greatly simplify the fabrication of conventional nanoimprint lithography (NIL) by combined nanoimprint and photolithography (CNP). We introduce a hybrid mask mold (HMM) made from UV transparent material with a UV-blocking Cr metal layer placed on top of the mold protrusions. We used a negative tone photo resist (PR) with higher selectivity to substrate the CNP process instead of the UV curable monomer and thermal plastic polymer that has been commonly used in NIL. Self-assembled monolayer (SAM) on HMM plays a reliable role for pattern transfer when the HMM is separated from the transfer layer. Hydrophilic $SiO_2$ thin film was deposited on all parts of the HMM, which improved the formation of SAM. This $SiO_2$ film made a sub-10nm formation without any pattern damage. In the CNP technique with HMM, the 'residual layer' of the PR was chemically removed by the conventional developing process. Thus, it was possible to simplify the process by eliminating the dry etching process, which was essential in the conventional NIL method.