• 제목/요약/키워드: poly(methyl methacrylate)

검색결과 338건 처리시간 0.027초

Observation of Residual PMMA on Graphene Surface by Using IR-Absorption Mapping

  • Oh, Hye Min;Kim, Yong Hwan;Kim, Hyojung;Park, Doo Jae;Lee, Young Hee;Jeong, Mun Seok
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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    • pp.292.2-292.2
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    • 2013
  • Graphene, a two-dimensional graphite material consisting of sp2-hybridized carbons. The properties of graphene such as extremely high carrier mobility, high thermal conductivity, low resistivity, large specific make it a promising materail of divices and material. Typically, poly (methyl methacrylate) (PMMA) is used when graphene transfer to other substrates. To remove PMMA on graphene, people used to dip the graphene into the acetone. However, it is known that the remove of PMMA on the graphene is difficult to completely using the acetone. Therefore, to remove the PMMA on the graphene surface, many research groups have employed various methods such as the thermal treatment, photothermal method, and other solvent. Nevertheless, a part of PMMA still remain on graphene surface. Usually, to observe the residual PMMA on graphene surface, topography of graphene surface scanned by atomic force microscopy is used. However, in that case, we can not distinguish PMMA and other particles. In this study, to confirm the residual PMMA on graphene surface, we employed novel measurement technique which is available to distinguish PMMA and other particles by means of photothermal effect.

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Rheological Properties of the Solutions of Incompatible Polymer Blends

  • Sohn, Jeong-In;Ree, Taik-Yue
    • Bulletin of the Korean Chemical Society
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    • 제2권4호
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    • pp.142-147
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    • 1981
  • A blend polymeric system composed of poly(methyl methacrylate) (PMMA or PM) and polystyrene (PS) dissolved in chloroform was rheologically studied. The viscosities ${\eta}_{bl}$ of the blend system with various blending ratios ${\chi}$ changing from zero (pure PS solution) to unity (pure PMMA solution) were measured at $25{\circ}C$ as a function of shear rates ${\dot{s}}$ by using a Couette type viscometer. ${\eta}_{bl}$ at a given ${\dot{s}}$ decreased exponentially with ${\chi}$ reaching asymptotic constant value of ${\eta}_{bl}$ ; ${\eta}_{bl}$ at a given ${\chi}$ is greater at a smaller ${\dot{s}}$. These results are explained by using Ree-Erying's theory of viscosity, ${\eta}_{bl}=(x_1{\beta}_1/{\alpha}_1)_{b}_1+ (x_2{\beta}_2/{\alpha}_2)_{bl}[sinh^{-1}{\beta}_2(bl) {\dot{s}}]/{\beta}_2(bl){\dot{s}}$. The Gibbs activation energy ${\Delta}G_i^\neq$(i = 2 for non-Newtonian units) entering into the intrinsic relaxation time ${\beta}$ is represented by a linear combination ${\Delta}G_i^\neq(bl) ={\chi}{\Delta}G_i^{\neq}_{iPM}+(1-{\chi}){\Delta}G_i^{\neq}_{iPS}$;the intrinsic shear modulus$[[\alpha}_i]^{-1}$ is also represented by $[{\alpha}_i(bl)]^{-1}={\chi}[{\alpha}_{iPM}]^{-1}+(1-{\chi})[{\alpha}_{iPS}]^{-1}$ and the fraction of area on a shear surface occupied by the ith flow units $x_i(bl)$ is similarly represented, i.e., $x_i(bl) = {\chi}x_{iPM}+(1-{\chi})x_{iPS}$. By using these ideas the Ree-Eyring equation was rewritten which explained the experimental results satisfactorily.

다중 배열 니들 코팅을 이용한 LED 스크린용 Anti-Moiré 필터 제작 (Fabrication of Anti-Moiré Filter Using Multi-Array Needle Coating for LED Screens)

  • 전경준;이진영;박종운
    • 반도체디스플레이기술학회지
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    • 제20권1호
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    • pp.77-82
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    • 2021
  • Using a multi-array needle module developed for coating of high-density cylindrical microlens array (C-MLA), we have fabricated an anti-Moiré filter for LED screens. The Moiré phenomenon appears due to the interference between the array pattern of image sensors in a camera and the non-emission area (grid pattern) of a LED screen. To suppress it, we have employed poly(methyl methacrylate) (PMMA) and coated it on a glass substrate in the form of a grid and non-grid (parallel lines). We have rotated the needle module in order to increase the number of C-MLAs. With this scheme, we have fabricated the 150 mm × 150 mm anti-Moiré filters where 836 microlens lines are formed. They show the average width of 255.4 ㎛, the average distance between CMLs of 94.6 ㎛, and C-MLA width non-uniformity of 4.7%. We have shown that the Moiré patterns still appear in the presence of the parallel (non-grid)-type filter, whereas they disappeared completely by the grid-type filter. It is due to the fact that the Moiré patterns are diffused more effectively by the grid-type C-MLA.

고종횡비를 갖는 용액기반 원통형 마이크로렌즈 제조 (Fabrication of Solution-Based Cylindrical Microlens with High Aspect Ratio)

  • 전경준;이진영;박종운
    • 반도체디스플레이기술학회지
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    • 제20권1호
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    • pp.70-76
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    • 2021
  • A cylindrical microlens (CML) has been widely used as an optical element for organic light-emitting diodes (OLEDs), light diffusers, image sensors, 3D imaging, etc. To fabricate high-performance optoelectronic devices, the CML with high aspect ratio is demanded. In this work, we report on facile solution-based processes (i.e., slot-die and needle coatings) to fabricate the CML using poly(methyl methacrylate) (PMMA). It is found that compared with needle coating, slot-die coating provides the CML with lower aspect ratio due to the wide spread of solution along the hydrophilic head lip. Although needle coating provides the CML with high aspect ratio, it requires a high precision needle array module. To demonstrate that the aspect ratio of CML can be enhanced using slot-die coating, we have varied the molecular weight of PMMA. We can achieve the CML with higher aspect ratio using PMMA with lower molecular weight at a fixed viscosity because of the higher concentration of PMMA solute in the solution. We have also shown that the aspect ratio of CML can be further boosted by coating it repeatedly. With this scheme, we have fabricated the CML with the width of 252 ㎛ and the thickness of 5.95 ㎛ (aspect ratio=0.024). To visualize its light diffusion property, we have irradiated a laser beam to the CML and observed that the laser beam spreads widely in the vertical direction of the CML.

Origin of Tearing Paths in Transferred Graphene by H2 Bubbling Process and Improved Transfer of Tear-Free Graphene Films U sing a Heat Press

  • Jinsung Kwak
    • 한국재료학회지
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    • 제32권12호
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    • pp.522-527
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    • 2022
  • Among efforts to improve techniques for the chemical vapor deposition of large-area and high-quality graphene films on transition metal substrates, being able to reliably transfer these atomistic membranes onto the desired substrate is a critical step for various practical uses, such as graphene-based electronic and photonic devices. However, the most used approach, the wet etching transfer process based on the complete etching of metal substrates, remains a great challenge. This is mainly due to the inevitable damage to the graphene, unintentional contamination of the graphene layer, and increased production cost and time. Here, we report the systematic study of an H2 bubbling-assisted transfer technique for graphene films grown on Cu foils, which is nondestructive not only to the graphene film but also to the Cu substrate. Also, we demonstrate the origin of the graphene film tearing phenomenon induced by this H2 bubbling-assisted transfer process. This study reveals that inherent features are produced by rolling Cu foil, which cause a saw-like corrugation in the poly(methyl methacrylate) (PMMA)/graphene stack when it is transferred onto the target substrate after the Cu foil is dissolved. During the PMMA removal stage, the graphene tearing mainly appears at the apexes of the corrugated PMMA/graphene stack, due to weak adhesion to the target substrate. To address this, we have developed a modified heat-press-assisted transfer technique that has much better control of both tearing and the formation of residues in the transferred graphene films.

Azimuthal Angle Scan Distribution, Third Order Response, and Optical Limiting Threshold of the Bismarck Brown Y:PMMA Film

  • Fadhil Abass Tuma;Hussain Ali Badran;Harith Abdulrazzaq Hasan;Riyadh Chassib Abul-Hail
    • Current Optics and Photonics
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    • 제7권6호
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    • pp.721-731
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    • 2023
  • This paper studies various roughness parameters, besides waviness, texture, and nonlinear parameters of Bismarck brown Y (BBY)-doped Poly(methyl methacrylate) (PMMA) films based on the computed values of optical limiting (OL) threshold power and nonlinear refractive index. The films' morphology, grain size, and absorption spectra were investigated using atomic force microscopy in conjunction with ultraviolet-visible (UV-Vis) spectrophotometer. The particle size of the films ranged between 4.11-4.51 mm and polymer films showed good homogeneity and medium roughness, ranging from 1.11-4.58 mm. A polymer film's third-order nonlinear optical features were carried out using the Z-scan methodology. The measurements were obtained by a continuous wave produced from a solid-state laser with a 532 nm wavelength. According to the results, BBY has a nonlinear refractive index of 10-6 cm2/W that is significantly negative and nonlinear. The optical limiting thresholds are roughly 10.29, 13.52, and 18.71 mW, respectively. The shift of nonlinear optical features with the film's concentration was found throughout the experiment Additionally, we found that the polymer samples have outstanding capabilities for restricting the amount of optical power that may be transmitted through them. We propose that these films have the potential to be used in a wide variety of optoelectronic applications, including optical photodetectors and optical switching.

O2/SF6/CH4 플라즈마를 이용한 플렉시블 Polycarbonate와 PMMA의 건식 식각 (Dry Etching of Flexible Polycarbonate and PMMA in O2/SF6/CH4 Discharges)

  • 주영우;박연현;노호섭;김재권;이제원
    • 한국진공학회지
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    • 제18권2호
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    • pp.85-91
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    • 2009
  • 현재 플렉시블 폴리머를 이용한 MEMS (Microelectromechanical Systems) 기술이 빠르게 발전하고 있다. 그 중에서 Polycarbonate (PC), Poly Methyl Methacrylate (PMMA)와 같은 플렉시블 폴리머 재료는 광학적 특성이 우수하고 인체 친화적이며 미세 패턴 제조 공정이 용이하다는 등의 많은 장점을 가지고 있다. 본 연구는 반응성 이온 식각 기술을 이용하여 $O_2$, $SF_6$ 그리고 $CH_4$의 삼성분계 가스의 혼합 비율에 따른 PC와 PMMA의 건식 식각 결과 및 특성 평가에 관한 것이다. 준비한 각각의 기판에 포토리소그래피 방법으로 마스크를 형성하여 샘플을 만들었다. RF 척 파워를 100 W, 총 가스 유량을 10 sccm으로 고정시켜 플라즈마 식각 실험을 실시하였다. 그 결과에 의하면 전체적으로 PMMA의 식각율이 PC보다는 약 2배 정도 높았다. 그 결과는 PC는 PMMA 보다 상대적으로 높은 녹는점을 가지고 있다는 사실과 관계가 있다고 생각한다. 또한 $O_2/SF_6/CH_4$의 삼성분계 가스와 $SF_6/CH_4$, $O_2/SF_6$, $O_3/CH_4$로 나누었을 때 $O_2/SF_6$의 혼합 가스에서 PMMA와 PC의 식각 속도가 가장 높았다 (PC: 5 sccm $O_2$/5 sccm $SF_6$에서 약 350 nm/min, PMMA: 2.5 sccm $O_2$/7.5 sccm $SF_6$에서 약 570 nm/min). SEM을 활용하여 식각된 표면을 분석한 결과 PC는 PMMA보다 상대적으로 식각 표면이 더 매끈하였다. 또한 표면 거칠기 분석결과 PC의 표면 거칠기는 1.9$\sim$3.88 nm이었지만 PMMA의 표면 거칠기는 17.3$\sim$26.1 nm로 현저하게 높았음을 확인할 수 있었다.

Nanotribology를 이용한 PMMA 박막의 Hardness와 Elastic Modulus 특성 연구 (Characteristics of Hardness and Elastic Modulus of PMMA Film using Nano-Tribology)

  • 김수인;김현우;노성철;윤덕진;장홍준;이종림;이창우
    • 한국진공학회지
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    • 제18권5호
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    • pp.372-376
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    • 2009
  • 현대 반도체 공정에서 일정한 패턴을 생성하기 위하여 리소그래피(Lithography) 공정을 이용하고 있으나 선폭의 감소로 인하여 기존 UV를 이용한 PR(Photoresist) 이외에 e-beam을 이용한 PMMA(Polymethyl methacrylate) 리소그래피에 대한 관심이 높아지고 있다. 또한 리소그래피에 의하여 생성된 패턴은 이후 세정 공정에서 잔류물을 제거하는 과정에서 패턴 붕괴를 일으키게 되는데 이러한 패턴 붕괴에 대한 방어력은 패턴 형성 물질의 탄성력(Elastic modulus)과 비례하는 것으로 알려져 있다. 이 논문에서 우리는 PMMA의 soft-baking 이후 Hardness(H)와 Elastic modulus(Er)의 변화를 압입력을 25 uN에서 8,500 uN으로 134.52 uN 간격으로 증가시키며 측정하였다. 또한 이 실험에서 Hardness(H)와 Elastic modulus(Er)는 Hysitron사의 Triboindenter를 이용하여 측정하였고 압입팁은 Berkovich 팁을 사용하였다.

프로필렌/질소 분리를 위한 가교 구조의 PGMA-co-PMMA/DAAB 분리막 (Cross-Linked PGMA-co-PMMA/DAAB Membranes for Propylene/Nitrogen Separation)

  • 김나운;박병주;김종학
    • 멤브레인
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    • 제30권4호
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    • pp.252-259
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    • 2020
  • 올레핀 가스는 다양한 석유화학물질의 합성에 사용되는 산업적으로 매우 중요한 물질로, 합성 과정에서 미반응된 올레핀은 다량의 질소와 함께 배출된다. 이러한 화학 공정의 경제성을 향상시키기 위해서는 미반응한 올레핀을 질소로부터 효율적으로 회수해야 한다. 본 연구에서는 올레핀 중 프로필렌을 질소로부터 효과적으로 분리하기 위해 PGMA-co-PMMA (PGM) 가지형 공중합체를 합성하고, 4,4'-diaminoazobenzene (DAAB)를 도입하여 가교된 멤브레인을 제조하였다. PGM과 DAAB는 상온에서 에폭사이드-아민 반응을 통해 쉽게 반응하여 별도의 열처리 없이도 가교 구조의 멤브레인을 형성하였다. 유리상 고분자인 PGM 기반의 멤브레인은 C3H6에 비해 N2를 더 빠르게 투과시키는 결과를 나타내었는데, 순수 PGM 멤브레인의 경우, 0.12 barrer의 N2 투과도와, 32.4의 높은 N2/C3H6 선택도를 보고하였다. DAAB가 가교제로 도입됨에 따라 멤브레인의 열적 안정성이 크게 향상된 것을 TGA 결과로부터 확인하였다. 1 wt%의 DAAB 함량에서 N2/C3H6 선택도는 감소하였으나, N2 투과도가 약 4.7배 증가하는 결과를 나타내었다. 본 연구에서는 많이 연구되지 않은 유리상 고분자 기반의 멤브레인에서의 N2/C3H6 기체 분리 특성을 분석하였으며, 가교를 통해 멤브레인의 열적 안정성을 크게 향상시킬 수 있음을 확인하였다.

Growth of Graphene Films from Solid-state Carbon Sources

  • Kwak, Jinsung;Kwon, Tae-Yang;Chu, Jae Hwan;Choi, Jae-Kyung;Lee, Mi-Sun;Kim, Sung Youb;Shin, Hyung-Joon;Park, Kibog;Park, Jang-Ung;Kwon, Soon-Yong
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.181.2-181.2
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    • 2014
  • A single-layer graphene has been uniformly grown on a Cu surface at elevated temperatures by thermally processing a poly (methyl methacrylate) (PMMA) film in a rapid thermal annealing (RTA) system under vacuum. The detailed chemistry of the transition from solid-state carbon to graphene on the catalytic Cu surface was investigated by performing in-situ residual gas analysis while PMMA/Cu-foil samples being heated, in conjunction with interrupted growth studies to reconstruct ex-situ the heating process. We found that the gas species of mass/charge (m/e) ratio of 15 ($CH_3{^+}$) was mainly originated from the thermal decomposition of PMMA, indicating that the formation of graphene occurs with hydrocarbon molecules vaporized from PMMA, such as methane and/or methyl radicals, as precursors rather than by the direct graphitization of solid-state carbon. We also found that the temperature for dominantly vaporizing hydrocarbon molecules from PMMA and the length of time, the gaseous hydrocarbon atmosphere is maintained, are dependent on both the heating temperature profile and the amount of a solid carbon feedstock. From those results, we strongly suggest that the heating rate and the amount of solid carbon are the dominant factors to determine the crystalline quality of the resulting graphene film. Under optimal growth conditions, the PMMA-derived graphene was found to have a carrier (hole) mobility as high as ${\sim}2,700cm^2V^{-1}s^{-1}$ at room temperature, which is superior to common graphene converted from solid carbon.

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