• Textile Coloration and Finishing
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• v.10 no.2
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• pp.29-36
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• 1998

Poly(L-lactide) microcapsules containing hydrophilic penetrate were prepared by interfacial precipitation method through solvent evaporation from w/o/w emulsion. Effect of four determinative process parameters on the particle size distributions, morphologies, and release properties of microcapsules coated with poly(L-lactide) was investigated. Moreover, susceptible functional cotton fabrics treated with the mentioned microcapsules were prepared and laundry test up to 15 times were done to determine fastness properties. As a result, the prepared poly(L-lactide) microcapsules with a more sharp-distributive, rounder, and more permeable membranes could be prepared by means of protective colloid concentration, solution volume and stirring rate.

• Proceedings of the Membrane Society of Korea Conference
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• 2004.05b
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• pp.69-72
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• 2004

So far the most practical polymer electrolytes are gel systems, which contain a polymeric matrix, a lithium salt, and aprotic organic solvents. This has met with success but has had disadvantages that the addition of solvents promotes deterioration of the electrolyte's mechanical properties and increases its reactivity towards the lithium metal anode.[1](omitted)

• Journal of the Korean Institute of Telematics and Electronics A
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• v.33A no.7
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• pp.127-133
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• 1996

In this paper, we propose a new fabrication method for poly-Si TFTs with a self-aligned offset gated structure by employing a photoresist reflow process. Compared with the conventional poly-Si TFTs, the device is consist of two gate electrodes, of which one is the entitled main gate where the gate bias is employed and the other is the entitled subgate which is separate form both sides of the main gate. The poly-Si channel layer below the offset oxide is protected form the injected ion impurities for the source/drain implantation and acts as an offset region of the proposed device. The key feature of oru new device is the offset region due to the offset oxide. our experimental reuslts show that the offset region, due to the photoresist reflow process, has been sucessfully obtained in order to fabricate the offset gated poly-Si TFTs. The maximum ON/OFF ratio occurs at the L$_{off}$ of 1.1${\mu}$m and exceeds 1X10$^{6}$.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.07a
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• pp.202-205
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• 2002

Polycrystalline silicon thin film transistors (poly-Si TFTs) are used in a wide variety of applications, and will figure prominently future high-resolution, high-performance flat panel display technology However, it was very difficult to fabricate high performance poly-Si TFTs at a temperature lower than 300$^{\circ}C$ for glass substrate. Conventional process on a glass substrate were limited temperature less than 600$^{\circ}C$ This paper proposes a high temperature process above 750$^{\circ}C$ using a flexible molybdenum substrate deposited hydrogenated amorphous silicon (a-Si:H) and than crystallized a rapid thermal processor (RTP) at the various temperatures from 750$^{\circ}C$ to 1050$^{\circ}C$. The high temperature annealed poly-Si film illustrated field effect mobility higher than 30 $\textrm{cm}^2$/Vs, achieved I$\sub$on//I$\sub$off/ current ratio of 10$^4$ and crystall volume fraction of 92%. In this paper, we introduce the new TFTs Process as flexible substrate very promising roll-to-roll process, and exhibit the properties of high temperature crystallized poly-Si Tn on molybdenum substrate.

• Journal of the Korean Vacuum Society
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• v.15 no.4
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• pp.387-394
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• 2006

In this study, the effect of using a neutral beam formed by low-angle forward reflection of a reactive ion beam on aspect-ratio-dependent etching (ARDE) has been investigated. When a SF6 Inductively Coupled Plasma and $SF_6$ ion beam etching are used to etch poly-Si, ARDE is observed and the etching of poly-Si on $SiO_2$ shows a higher ARDE effect than the etching of poly-Si on Si. However, by using neutral beam etching with neutral beam directionality higher than 70 %, ARDE during poly-Si etching by $SF_6$ can be effectively removed, regardless of the sample conditions. The mechanism for the removal of ARDE via a directional neutral beam has been demonstrated through a computer simulation of different nanoscale features by using the two-dimensional XOOPIC code and the TRIM code.

• Applied Chemistry for Engineering
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• v.9 no.5
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• pp.710-714
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• 1998

Organic electroluminescence devices (ELD) with hetero-junction structure were fabricated utilizing poly(p-phenylne vinylene) (PPV) as emitting layer and electron transport layer (ETL). 2-(4-biphenyl)-5-(4-tert-butylphenyl)-1,3,4-oxadiazole (PBD) was used as an electron transport agent. Copolymers with stilbene type comonomers, such as poly(styrene-co-PVTS), poly(styrene-co-MeO-PVTS) and poly(styrene-co-MeO-ST) were synthesized to be used as a matrix polymer to disperse electron transport agent (PBD). Among the hetero-junction EL devices fabricated with the above materials, the device with poly(styrene-co-PVTS) as matrix polymer for ETL gave the highest luminance ($120.7cd/m^2$, 13 V). EL devices made with poly(styrene-co-MeO-PVTS) or poly(styrene-co-MeO-ST) matrix exhibited lower luminance than the one with polystyrene matrix and the single layer EL (ITO/PPV/Mg) device.

• Textile Coloration and Finishing
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• v.5 no.3
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• pp.182-187
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• 1993

The binding isotherms of Methylene Blue with Poly(vinyl pyrrolidone) (PVP) were determined in a Mcllvaine buffer of pH 8.0 at 3$0^{\circ}C$ by a dynamic dialysis methods. The isotherms showed a partition binding which was increase linearly with the increase of free dye concentration in solution. The Scatchard plots for Poly(vinyl pyrrolidone)-Methylene Blue gave a constant value. The results were interpreted by the McGhee and von Hippel theory considering non-cooperative binding. The intrinsic binding constant k, for Poly(vinyl pyrrolidone)-Methylene Blue was 6.02$\ell$/base mol.

• Journal of Biomedical Engineering Research
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• v.8 no.2
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• pp.199-204
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• 1987

ABA type block copolymers composed of r benzyle L-glutamate as the A component and poly(ethylene glycol) as the B components were obtained. Platelet adhesion on their sunfaces was investigated by a column elusion method to examine the effects of microdomain and secondary structure. The number of platelets adhered from whole blood and plasma rich platelet was smaller for the block copolymer systems than for the homopolymers. In the block copolymer system, the number of platelets adrered on their surfaces increased with increasing the content of PEG, that is, with decreasing of a-helix of block copolymers. A thick thrombus formation on the PBLG homopolymer was observed than block copolymer by scanning electron micrographs. The platelets adhesion increased with increasing the critical surface tension of the block copolymer.

• Textile Coloration and Finishing
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• v.7 no.4
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• pp.39-44
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• 1995

A study has been made about some correlations in the chemical cyclization of precursors, poly(ether-amide-amic acid)s by treating in solution a mixture of acetic anhydride and pyridine in the presence of 4,4-dimethyl formamide, with the poly(ether-amic acid)s being respectively reacted between trimellitic anhydride chloride and 3 kinds of diamines, i.e., 4,4'-bis(m-aminophenoxy) benzophenone, 2,2'-bis[4-(m-aminophenoxy) phenyl] propane and 4,4'-bis(m-aminophenoxy) diphenyl sulfone. The cyclization of imide ring in the poly(ether-amide-amic acid)s may be regarded as an intramolecular acylation of amide group by o-carboxyl group. As a result of this reseach, the effects on the conversion to poly(ether-amide-imide)s have been found by changing the ratio of cosolvents in the cyclization mixture.

• Korean Journal of Microbiology
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• v.32 no.3
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• pp.182-185
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• 1994

Effects of nitrogen and carbon sources on the decolorization rate of poly R-478 dye by a white rot basidiomycete Coriorus versicolor IFO 30388 were examined. The fungus exhibited 87.2% of decolorization rate when it was cultured in the state of stationary in a nitrogen-limited medium (pH 4.5) which contained 2.0% glucose, 0.04% ammonium tartrate, 0.02% poly R-478 dye, 2% $KH_2PO_4$, 0.5% $MgSO_4{\cdot}7H_2O$, 0.1% $CaCl_2{\cdot}2H_2O$, 0.002% thiamine-HCl and 10 mM 2,2 dimethylsuccinate (sodium) at $28^{\circ}C$ for 10 days. Decolorization of the dye occurred in the presence of nitrogen source in the medium and decolorization rate increased rapidly after depletion of $NH_4^+$ from the medium.