• Title/Summary/Keyword: polu-Si

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Design of Poly-Silicon Thin Film Transistor Circuits for Driving Liquid Crystal Display and Analysis of Characteristics of the Devices (액정표시기 구동을 위한 다결정 실리콘 박막 트랜지스터 회로의 설계 및 기초소자 특성분석)

  • 허성회;한철희
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.31A no.3
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    • pp.39-46
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    • 1994
  • CMOS LCD driving circuits using poly-Si TFT have been designed and basic blocks including test patterns have been fabricated. Column driver drives the pixels by block because polu-Si TFT can not operate at the speed of video signal. Row driver has mode selection circuit which can select a mode between interlacing mode and non-interlacing mode. Experimental results show shift register can operate at 1MHz colck frequency with 4pF load.

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Anneal Temperature Effects on Hydrogenated Thin Film Silicon for TFT Applications

  • Ahn, Byeong-Jae;Kim, Do-Young;Yoo, Jin-Su;Junsin Yi
    • Transactions on Electrical and Electronic Materials
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    • v.1 no.2
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    • pp.7-11
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    • 2000
  • a-Si:H and poly-Si TFT(thin film transistor) characteristics were investigated using an inverted staggered type TFT. The TFT an as-grown a-Si:H exhibited a low field effect mobility, transconductance, and high gate threshold voltage. The poly-Si films were achieved by using an isothermal and RTA treatment for glow discharge deposited a-Si:H films. The a-Si:H films were cystallized at the various temperature from 600$^{\circ}C$ to 1000$^{\circ}C$. As anneal temperature was elevated, the TFT exhibited increased g$\sub$m/ and reduced V$\sub$ds/. V$\sub$T/. The poly-Si grain boundary passivation with grain boundary trap types and activation energies as a function of anneal temperature. The poly-si TFT showed an improved I$\sub$nm//I$\sub$off/ ratio of 10$\^$6/, reduced gate threshold voltage, and increased field effect mobility by three orders.

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