• Title/Summary/Keyword: plating time

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A Study on Reusing of Electroless Ni-Cu-P Waste Solution (無電解 Ni-Cu-P 廢 도금액의 재사용에 관한 연구)

  • 오이식
    • Resources Recycling
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    • v.10 no.2
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    • pp.27-33
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    • 2001
  • Reusing of electroless Ni-Cu-P waste solution was investigated in the plating time, plating rate, solution composion and deposit. Plating time of nickel-catalytic surface took longer than that of zincated-catalytic surface. Initial solution with 50f) waste solution additive at batch type was possible to reusing of waste solution. Plating time of initial solution at continuous type took longer 10 times over than that of batch type. Plating time of 50% waste solution additive at continuous type took longer 3.7 times over than that of batch type. Component change of nickel-copper for electroless deposition was greatly affected by depolited inferiority and larger decreased plating rate.

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A Study on Reusing of Electroless Ni-Cu-B Waste Solution (무전해 Ni-Cu-B 폐 도금액의 재사용에 관한 연구)

  • Oh Iee-Sik;Bai Young-Han
    • Resources Recycling
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    • v.12 no.1
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    • pp.18-24
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    • 2003
  • Reusing of electroless Ni-Cu-B waste solution was investigated in the plating time, plating rate, solution composition and deposit. Plating time of nickel-catalytic surface took longer than that of zincated-catalytic surface. Initial solution with 40% waste solution additive at batch type was possible to reusing of waste solution. Plating time of initial solution at continuous type took longer 6 times over than that of batch type. Plating time of 40% waste solution additive at continuous type took longer 2 times over than that of batch type. Component change of nickel-copper for electroless deposition was greatly affected by deposited inferiority and larger decreased plating rate.

Preparation and Characterization of Highly Conductive Nickel-coated Glass Fibers

  • Kim, Byung-Joo;Choi, Woong-Ki;Song, Heung-Sub;Park, Jong-Kyoo;Lee, Jae-Yeol;Park, Soo-Jin
    • Carbon letters
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    • v.9 no.2
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    • pp.105-107
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    • 2008
  • In this work, we employed an electroless nickel plating on glass fibers in order to enhance the electric conductivity of fibers. And the effects of metal content and plating time on the conductivity of fibers were investigated. From the results, island-like metal clusters were found on the fiber surfaces in initial plating state, and perfect metallic layers were observed after 10 min of plating time. The thickness of metallic layers on fiber surfaces was proportion to plating time, and the electric conductivity showed similar trends. The nickel cluster sizes on fibers decreased with increasing plating time, indicating that surface energetics of the fibers could become more homogeneous and make well-packed metallic layers, resulting in the high conductivity of Ni/glass fibers.

Effect of Plating Conditions on Electroless Copper Plating on SiC Fabric (직조된 SiC 섬유에 무전해 구리도금 시 도금 조건의 영향)

  • Lee, Kee Hwan;Sohn, Youhan;Han, Taeyang;Lee, Kyung Jin;Kim, Hye Hung;Han, Jun Hyun
    • Journal of Surface Science and Engineering
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    • v.50 no.4
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    • pp.244-250
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    • 2017
  • Effects of plating conditions (dispersant concentration, plating time, and ultrasonication) on electroless Cu plating on SiC fabric woven by crossing of SiC continuous fibers vertically were studied. The ultrasonic dispersion treatment not only did not improve the dispersion of the SiC fibers, but also did not change the plating thickness. The ultrasonication in the pretreatment step of electroless plating did not improve the dispersion of the fibers, while the ultrasonication in the plating step enhanced the dispersion of the fibers and decreased the thickness of the Cu films. It was possible to control the thickness of the Cu coating layer as well as the dispersion of the fibers in the fabric by changing the plating conditions such as dispersant concentration, plating time, and ultrasonication, but it was very difficult to coat copper on the intersection of vertical fibers in the fabric.

Preparation of Porous Cobalt Thin Films by Using an Electrochemical Method (전기화학적 방법을 통한 다공성 코발트 박막 합성)

  • Ha, Seong-Hyeok;Shin, Heon-Cheol
    • Journal of Surface Science and Engineering
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    • v.53 no.6
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    • pp.312-321
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    • 2020
  • Morphology of porous cobalt electro-deposits was systematically investigated as functions of cobalt precursors in the plating bath and applied cathodic current density with a special focus on cobalt nano-rod formation. It was proved that the concentration of cobalt precursor plays little effect on the morphology of cobalt electro-deposits at relatively low plating current density while it significantly affects the morphology with increasing plating current density. Such a dependence was discussed in terms of the kinetics of two competitive reactions of cobalt reduction and hydrogen evolution. Cobalt nano-rod structure was created at specific ranges of cobalt precursor content and applied cathodic current density, and its diameter and length varied with plating time without notable formation of side branches which is usually found during dendrite formation. Specifically, the nano-rod length was preferentially increased in relative short plating time (<15 s), resulting in higher aspect ratio of nano-rod with plating time. Whereas, both the nano-rod length and diameter were increased nearly at the same level in a prolonged plating time, making the aspect ratio unchanged. From the analysis of crystal structure, it was confirmed that the cobalt nano-rod preferentially grew in the form of single crystal on a dense poly-crystalline cobalt thin film initially formed on the substrate.

A Study on Reusing of Electroless Co-Cu-P Waste Solution (무전해 Co-Cu-P 폐 도금액의 재사용에 관한 연구)

  • Bai Young-Han;Oh Lee-Sik
    • Resources Recycling
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    • v.14 no.4 s.66
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    • pp.34-40
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    • 2005
  • Reusing of electroless Co-Cu-P waste solution was investigated in the respect of plating time, plating rate, solution composition and deposit. Plating time of cobalt-catalytic surface took longer than that of zincated-catalytic surface. It was possible to reuse the waste solution by mixing $50\%$ fresh solution at batch type. Plating time of initial solution at continuous type took longer 7.5 times over than that of batch type. Plating time of $50\%$ waste solution additive at continuous type took longer 2.5 times over than that of batch type. Component change of cobalt-topper for electroless deposition was greatly affected by deposit inferiority and rapid decrease in plating rate.

Preparation of Pt Films on GaAs by 2-step Electroless Plating

  • Im, Hung-Su;Seo, Yong-Jun;Kim, Young-Joo;Wang, Kai;Byeon, Sang-Sik;Koo, Bon-Heun;Chang, Ji-Ho
    • Journal of Surface Science and Engineering
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    • v.42 no.4
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    • pp.152-156
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    • 2009
  • Electroless plating is influenced by kinds of parameters including concentrations of electrolyte, plating time, temperature and so on. In this study, the Pt thin films were prepared on GaAs substrate by a 2-step electroless plating depending method. The small Pt catalytic particles by using Pt I bath exhibited islands-morphology dispersed throughout the substrate surface at $65^{\circ}C$, as function as a sensitized thin film, and then a thicker Pt film grew upon the sensitized layer by the second Pt II bath. As the growth of Pt film is strongly influenced by the plating time and temperature, the plating time of Pt II bath varied from 5 min to 40 min at $60{\sim}80^{\circ}C$ after Pt I bath at $60{\sim}80^{\circ}C$ for 5 min. It is found that the film grows with the increasing plating time and temperature. The resistivity value of Pt deposited layer was characterized to study the growth mechanism of 2-step plating.

Effect of Pulse Plating on the Hardness and Ductility of Electroplated Fe-C (펄스전류에 의해 제조된 Fe-C 도금층의 경도 및 인성에 대한 연구)

  • 오영주;하헌필;변정수
    • Journal of Surface Science and Engineering
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    • v.35 no.3
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    • pp.141-148
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    • 2002
  • Fe-C alloy layers were produced by pulse plating and the properties were compared with those produced by D.C. plating. When the pulse on time ($T_{on}$ ) was the same, both the duty cycle and peak current density($I_{p}$ ) had little influence on the carbon content and the hardness of the layer. The structure and hardness of the direct current plating were similar to those of the pulse current plating. However, the ductility was enhanced when the pulse current was applied due to the release of residual stress during the pulse off time($T_{off}$).).

A Real Time Temperature Monitoring System for Plating Process (도금공정 실시간 원격 온도 모니터링 시스템)

  • Jung, Sun-Wung;Choi, Tae-Lin;Yoo, Woosik;Kim, Byung Soo
    • Journal of Korean Society of Industrial and Systems Engineering
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    • v.38 no.4
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    • pp.72-79
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    • 2015
  • A number of plating companies have been exposed to the risk of fire due to unexpected temperature increasing of water in a plating bath. Since the companies are not able to forecast the unexpected temperature increasing of water and most of raw materials in the plating process have low ignition temperature, it is easy to be exposed to the risk of fire. Thus, the companies have to notice the changes immediately to prevent the risk of fire from plating process. Due to this reason, an agile and systematic temperature monitoring system is required for the plating companies. Unfortunately, in case of small size companies, it is hard to purchase a systematic solution and be offered consulting from one of the risk management consulting companies due to an expensive cost. In addition, most of the companies have insufficient research and development (R&D) experts to autonomously develop the risk management solution. In this article, we developed a real time remote temperature monitoring system which is easy to operate with a lower cost. The system is constructed by using Raspberry Pi single board computer and Android application to release an economic issue for the small sized plating manufacturing companies. The derived system is able to monitor the temperature continuously with tracking the temperature in the batch in a short time and transmit a push-alarm to a target-device located in a remoted area when the temperature exceeds a certain hazardous-temperature level. Therefore, the target small plating company achieves a risk management system with a small cost.

Effect of Plating Condition and Surface on Electroless Co-Cu-P Alloy Plating Rate (무전해 Co-Cu-P 도금속도에 미치는 도금 조건과 표면상태의 영향)

  • Oh, L.S.
    • Journal of Power System Engineering
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    • v.4 no.2
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    • pp.31-39
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    • 2000
  • Relationships between the plating condition and the plating rate of the deposition film for the electroless plating of Co-Cu-P alloy were discussed in this report. The result obtained from this experiment were summarized as follow ; The optimum bath composition was consisted of 0.8 ppm thiourea as a stabilizing agent. Composition of the deposit was found to be uniform after two hours of electroless plating. Plating rates of nickel-catalytic surface and zincate-catalytic surface were found to be very closely equal, but the plating time of nickel-catalytic surface took longer than that of the zincated-catalytic surface.

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