• Title/Summary/Keyword: plastic films

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A Study on the ITO Thin Films on Plastic Substrate Using by Powdery Targ (분말 타겟을 이용한 플라스틱 기판 상의 ITO 박막 제조에 관한 연구)

  • Lee, J.H.;Park, Y.K.;Shin, J.H.;Shin, S.H.;Park, K.J.
    • Proceedings of the KIEE Conference
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    • 1999.07d
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    • pp.1683-1685
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    • 1999
  • ITO films on plastic substrate were prepared by DC magnetron sputtering method using powdery target and their properties were investigated as a function of the deposition conditions. As the sputtering power and total pressure were higher, the resistivity of ITO films increased. The optical transmittance deteriorated with increasing sputtering power and thickness. As the total pressure increased, however, the optical transmittance improved at visible region of light. From these results, we could deposited ITO films with $8{\times}10^{-3}{\Omega}-cm$ of resistivity and 80% of transmittance at optimal conditions.

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Effects of Sputter Pressure on the Properties of Sputtered ZnO:Al Films Deposited on Plastic Substrate (플라스틱 기판에 증착한 ZnO:Al 박막의 특성에 미치는 스퍼터 압력 효과)

  • Lee, Jae-Hyeong
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.22 no.3
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    • pp.277-283
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    • 2009
  • In this paper, aluminum doped zinc oxide (ZnO:Al) thin films on plastic substrate such as poly carbonate (PC), polyethylene terephthalate (PET) were prepared by RF magnetron sputtering method for flexible solar cell applications. Effects of the sputter pressure on the structural, electrical and optical properties were investigated. The crystallinity and the degree of the (002) orientation were deteriorated with increasing the sputter pressure. When the sputter pressure was higher, the conductivity of ZnO:Al films was improved because of the high carrier concentration and the Hall mobility. High quality ZnO:Al films with resistivity as low as $1.9{\times}10^{-3}{\Omega}-cm$ and the optical transmittance over 80 % in the visible region have been obtained on PC substrate at 2 mTorr.

Cu-based ink-jet printable inks for highly conductive patterns at lower temperature

  • Woo, Kyoo-Hee;Kim, Dong-Jo;Moon, Joo-Ho
    • 한국정보디스플레이학회:학술대회논문집
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    • 2008.10a
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    • pp.799-802
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    • 2008
  • The metal films ink-jetted using the conductive ink based on a mixture of copper and silver nanoparticles were investigated. The porosity and resistivity of films were minimized by adjusting the mixing ratio of Cu and Ag nanoparticles. We demonstrated that the printed tracks with good conductivity could be obtained at sufficiently lower annealing temperatures where plastic substrates could be used.

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Prevention of thin film failures for 5.0-inch TFT arrays on plastic substrates

  • Seo, Jong-Hyun;Jeon, Hyung-Il;Nikulin, Ivan;Lee, Woo-Jae;Rho, Soo-Guy;Hong, Wang-Su;Kim, Sang-Il;Hong, Munpyo;Chung, Kyuha
    • 한국정보디스플레이학회:학술대회논문집
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    • 2005.07a
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    • pp.700-702
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    • 2005
  • A 5.0-inch transmissive type plastic TFT arrays were successfully fabricated on a plastic substrate at the resolution of $400{\times}3{\times}300$ lines (100ppi). All of the TFT processes were carried out below $150^{\circ}C$ on PES plastic films. After thin film deposition using PECVD, thin film failures such as film delamination and cracking often occurred. For successful growth of thin films (about 1um) without their failures, it is necessary to solve the critical problem related to the internal compressive stress (some GPa) leading to delamination at a threshold thickness value of the films. The Griffith's theory explains the failure process by looking at the excess of elastic energy inside the film, which overcomes the cohesive energy between film and substrate. To increase the above mentioned threshold thickness value there are two possibilities: (i) the improvement of the interface adhesion (for example, through surface micro-roughening and/or surface activation), and (ii) the reduction of the internal stress. In this work, reducing a-Si layer film thickness and optimizing a barrier SiNx layer have produced stable CVD films at 150oC, over PES substrates

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Development of Film Fixing System for Improving Overlap Defects in the Film Insert Injection Molding Process (필름 인서트 사출성형 공정의 오버랩 불량 개선을 위한 필름 고정 시스템 개발)

  • Kim, Jung-Ho;Mun, Ji-Hun;Park, Hong-Seok
    • Journal of the Korean Society of Manufacturing Technology Engineers
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    • v.22 no.3
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    • pp.472-479
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    • 2013
  • We carried out research into an environmentally friendly injection molding process that involves filling the mold with polymer after thin films are fixed into the cavity, without the coating, plating process. Film insert injection molding is a new technique in which molten plastic resin is injected into the cavity after films are precisely attached to the side of the mold wall. In the film insert injection molding process, the insert film is moved by the flow of the molten plastic resin. Overlap defects cause a decline in the productivity and the quality of the manufactured goods. To reduce overlap defects, new injection mold parts are proposed to produce automotive exterior parts using thin films. It is suggested that the best possible method would be to fix the thin films to one side of the mold wall, and develop interior pins to fix the films in the mold. Based on this new pin fixing system, the problem of the film being moved by the flow of the molten resin was improved.

Low Temperature Processes of Poly-Si TFT Backplane for Flexible AM-OLEDs

  • Hong, Wan-Shick;Lee, Sung-Hyun;Cho, Chul-Lae;Lee, Kyung-Eun;Kim, Sae-Bum;Kim, Jong-Man;Kwon, Jang-Yeon;Noguchi, Takashi
    • 한국정보디스플레이학회:학술대회논문집
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    • 2005.07a
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    • pp.785-789
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    • 2005
  • Low temperature deposition of silicon and silicon nitride films by catalytic CVD technique was studied for application to thin film transistors on plastic substrates for flexible AMOLEDs. The substrate temperature initially held at room temperature, and was controlled successfully below $150^{\circ}C$ during the entire deposition process. Amorphous silicon films having good adhesion, good surface morphology and sufficiently low content of atomic hydrogen were obtained and could be successfully crystallized using excimer laser without a prior dehydrogenation step. $SiN_x$ films showed a good refractive index, a high deposition rate, a moderate breakdown field and a dielectric constant. The Cat-CVD silicon and silicon nitride films can be good candidates for fabricating thin films transistors on plastic substrates to drive active-matrix organic light emitting display.

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Transmissive 7' VGA a-Si TFT Plastic LCD Using Low Temperature Process and Holding Spacer

  • Lee, U-Jae
    • Electrical & Electronic Materials
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    • v.19 no.9
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    • pp.28-32
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    • 2006
  • A 7.0-inch transmissive type plastic TFT-LCD was developed at the resolution of 640 $\times$ 3 $\times$ 480 lines (114ppi). All of the processed of TFT, color filter and LC were carried out below $130^{\circ}C$ on PES plastic films. The process conditions of TFT, color filter and LC were optimized for large area TFT-LCD on plastic substrate. The backplane and the color filter was strongly adhered while the panel was bending by using holding spacers.

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Testing Methods for Permeability of Plastic Films (플라스틱 필름류의 투습도 측정방법)

  • Park, Hyung-Woo;Koh, Ha-Young;Kang, Tong-Sam;Shin, Dong-Hwa
    • Korean Journal of Food Science and Technology
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    • v.21 no.2
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    • pp.235-237
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    • 1989
  • Water vapor permeability of plastic films was measured by Electric tester and Cup tester and the data of the two were compared. Regardless of the testing method, water vapor permeability measured by two methods showed consistent results. By these methods, water vapor permeability of polyethylene film was $21.25g/m^2$. 24h and $5.4g/m^2$. 24h for 0.045mm and 0.08mm thickness, respectively. The water vapor permeability of casted polypropylene film was 14.93 and $14.90g/m^2$. 24h for Electric tester and Cup tester, respectively. In conclusion, the data obtained by Cup tester was consistent with those of the Electric tester. The Cup tester was certified to perform the water vapor pormeability testing method.

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THIN FILM ADHESION IN Cu/Cr/POLYIMIDE AND Cu/Cu-Cr/POLYIMIDE SYSTEMS

  • Joh, Cheol-Ho;Kim, Young-Ho;Oh, Tae-Sung;Park, Ik-Sung;Yu, Jin
    • Journal of Surface Science and Engineering
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    • v.29 no.5
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    • pp.379-385
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    • 1996
  • Adhesion of Cu/Cr and Cu/$Cu_xCr_{1-x}$ thin films onto polyimide substrates has been studied. For an adhesion layer, Cr or Cu-Cr alloy films were deposited onto polyimide using DC magnetron sputtering machine. Then Cu was sputter-deposited and finally, Cu was electroplated. Adhesion was evaluated using $90^{\circ}C$ peel test or T-peel test. Plastic deformation of the peeled metal layer was qualitatively measured using XRD technique. It is confirmed that high interfacial fracture energy and large plastic deformation are important to enhance the peel adhesion strength. High peel strength is obtained when the interface is strongly bonded. More ductile film has higher peel strength. In Cu-Cr alloy films, opposite effects of the Cr addition in the alloy film on the peel strength are operative: a beneficial effect of strong interfacial bonding and a negative effect of smaller plastic deformation.

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