• 제목/요약/키워드: plasma ion

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고밀도 플라즈마 내에서의 plasma species의 변화 (The generation of nitrogen ion species in high-density plasma with HCD)

  • 김상권;김성완
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2009년도 춘계학술대회 논문집
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    • pp.234-234
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    • 2009
  • 고밀도 플라즈마 질화를 위해 장비 내에 보조 HCD (Hollow Cathode Discharge) 전극을 설치하여 고밀도의 플라즈마가 발휘되도록 장비를 구축하였다. 기존 bias 플라즈마 질화는 1-10Torr의 공정압력인데 반하여 $10^{-1}-10^{-2}$Torr의 비교적 고 진동에서 고밀도의 플라즈마를 발생시켰다. HCD 질화는 bias plasma 질화 공정의 플라즈마를 비교하면 가스 비의 영향이 매우 큰 것드로 관찰되었으며 기존에 발표된 플라즈마 질화 관련 모델과 비교하여 관찰된 플라즈마 내에서는 ion species가 실제 공정에서도 영향을 미치는 것을 알 수 있었다.

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신경망을 이용한 SiN 박막 표면거칠기에의 이온에너지 영향 모델링 (Neural Network Modeling of Ion Energy Impact on Surface Roughness of SiN Thin Films)

  • 김병환;이주공
    • 한국표면공학회지
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    • 제43권3호
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    • pp.159-164
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    • 2010
  • Surface roughness of deposited or etched film strongly depends on ion bombardment. Relationships between ion bombardment variables and surface roughness are too complicated to model analytically. To overcome this, an empirical neural network model was constructed and applied to a deposition process of silicon nitride (SiN) films. The films were deposited by using a pulsed plasma enhanced chemical vapor deposition system in $SiH_4$-$NH_4$ plasma. Radio frequency source power and duty ratio were varied in the range of 200-800 W and 40-100%. A total of 20 experiments were conducted. A non-invasive ion energy analyzer was used to collect ion energy distribution. The diagnostic variables examined include high (or) low ion energy and high (or low) ion energy flux. Mean surface roughness was measured by using atomic force microscopy. A neural network model relating the diagnostic variables to the surface roughness was constructed and its prediction performance was optimized by using a genetic algorithm. The optimized model yielded an improved performance of about 58% over statistical regression model. The model revealed very interesting features useful for optimization of surface roughness. This includes a reduction in surface roughness either by an increase in ion energy flux at lower ion energy or by an increase in higher ion energy at lower ion energy flux.

Biologic stability of plasma ion-implanted miniscrews

  • Cho, Young-Chae;Cha, Jung-Yul;Hwang, Chung-Ju;Park, Young-Chel;Jung, Han-Sung;Yu, Hyung-Seog
    • 대한치과교정학회지
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    • 제43권3호
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    • pp.120-126
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    • 2013
  • Objective: To gain basic information regarding the biologic stability of plasma ion-implanted miniscrews and their potential clinical applications. Methods: Sixteen plasma ion-implanted and 16 sandblasted and acid-etched (SLA) miniscrews were bilaterally inserted in the mandibles of 4 beagles (2 miniscrews of each type per quadrant). Then, 250 - 300 gm of force from Ni-Ti coil springs was applied for 2 different periods: 12 weeks on one side and 3 weeks contralaterally. Thereafter, the animals were sacrificed and mandibular specimens including the miniscrews were collected. The insertion torque and mobility were compared between the groups. The bone-implant contact and bone volume ratio were calculated within 800 mm of the miniscrews and compared between the loading periods. The number of osteoblasts was also quantified. The measurements were expressed as percentages and analyzed by independent t-tests (p < 0.05). Results: No significant differences in any of the analyzed parameters were noted between the groups. Conclusions: The preliminary findings indicate that plasma ion-implanted miniscrews have similar biologic characteristics to SLA miniscrews in terms of insertion torque, mobility, bone-implant contact rate, and bone volume rate.

Role of Magnetic Field Configuration in a Performance of Extended Magnetron Sputtering System with a Cylindrical Cathode

  • Chun, Hui-Gon;Sochugov, Nikolay S.;You, Yong-Zoo;Soloviv, Andrew A.;Zakharov, Alexander N,
    • 반도체디스플레이기술학회지
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    • 제2권3호
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    • pp.19-23
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    • 2003
  • Extended unbalanced magnetron sputtering system based on the cylindrical magnetron with a rotating cathode was developed. The unbalanced configuration of magnetic field was realized by means of additional lines of permanent magnets, placed along both sides of a 89 mm outer diameter and 600 mm long cylindrical cathode. The performance of the unbalanced magnetron was assessed in terms of the ion current density and the ion-to-atom ratio incident at the substrate. Furthermore, the paper presents the comparison of the internal plasma parameters, such as the electron temperature, electron density, plasma and floating potentials, measured by a Langmuir probe in various positions from the cathode, for conventional and unbalanced constructions of the cylindrical magnetron. The plasma density and ion current density are about 3-5 times higher than those of conventional one, in the unbalanced magnetron in a 0.24 Pa Ar atmosphere with a DC cathode power of 3 kW.

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반도체 제조용 사일렌 플라즈마 반응기 내에서의 입자 오염에 관한 이론적 연구 (Theoretical study on the particle contamination in silane plasma reactor for semiconductor processing)

  • 김동주;김교선
    • 한국진공학회지
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    • 제9권2호
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    • pp.172-178
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    • 2000
  • 반도체 제조공정 중 플라즈마 반응기 내에서 입자오염을 유발하는 입자들의 거동과 성장을 모델식을 사용하여 이론적으로 고찰하였다. 플라즈마 반응기 내에서 입자 거동에 영향을 미치는 힘들로 유체 대류, 입자 확산 및 외부힘 (ion drag force, electrostatic force, 중력) 등을 고려하였다. 플라즈마 벌크 영역에서 전하를 가진 입자들간의 충돌에 의한 입자 성장을 고려하기 위해 모델식에 입자 전하 분포를 고려하였다. 대부분의 입자들은 ion drag force와 electrostatic force가 균형을 이루고 있는 두 sheath 경계 영역에 존재하였으며 두 sheath 영역과 벌크 플라즈마에서의 입자 농도는 0에 접근하였다. 시간이 지남에 따라 입자 충돌로 인한 입자들의 크기는 증가하였으며 입자가 성장함에 따라 입자 표면적의 증가와 더불어 입자가 가지는 평균 전하량도 증가하였다.

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플라즈마 이온질화에 의한 Fe 나노분말소결체의 표면경화 가능성 연구 (A Feasibility Study on the Surface Hardening of Sintered Iron Nanopowder by Plasma Ion Nitriding)

  • 윤준철;이재성
    • 한국분말재료학회지
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    • 제19권1호
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    • pp.13-18
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    • 2012
  • This study has been performed on the full density sintering of Fe nanopowder and the surface hardening by plasma ion nitriding. The Fe sintered part was fabricated by pressureless sintering of the Fe nanopowder at $700^{\circ}C$ in which the nanopowder agglomerates were controlled to have 0.5-5 ${\mu}m$ sized agglomerates with 150 nm Fe nanopowders. The green compact with 46% theoretical density(T.D.) showed a homogeneous microstructure with fine pores below 1 ${\mu}m$. After sintering, the powder compact underwent full densification process with above 98%T.D. and uniform nanoscale microstructure. This enhanced sintering is thought to be basically due to the homogeneous microstructure in the green compact in which the large pores are removed by wet-milling. Plasma ion nitriding of the sintered part resulted in the formation of ${\gamma}$'-$Fe_4N$ equilibrium phase with about 12 ${\mu}m$ thickness, leading to the surface hardening of the sintered Fe part. The surface hardness was remarkably increased from 176 $H_v$ for the matrix to 365 $H_v$.

알루미늄 합금의 수소취화 방지를 위한 경질양극산화 및 플라즈마이온질화의 영향 (Effects of Hard Anodizing and Plasma Ion-Nitriding on Al Alloy for Hydrogen Embrittlement Portection)

  • 신동호;김성종
    • Corrosion Science and Technology
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    • 제22권4호
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    • pp.221-231
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    • 2023
  • Interest in aluminum alloys for the hydrogen valves of fuel cell electric vehicles (FCEVs) is growing due to the reduction in fuel efficiency by the high weight. However, when an aluminum alloy is used, deterioration in mechanical characteristics caused by hydrogen embrittlement and wear is regarded as a problem. In this investigation, the aluminum alloy used to prevent hydrogen embrittlement was subjected to surface treatments by performing hard anodizing and plasma ion nitriding processes. The hard anodized Al alloy exhibited brittleness in which the mechanical characteristics rapidly deteriorated due to porosity and defects of surface, resulting in a decrease in the ultimate tensile strength and modulus of toughness by 15.58 and 42.51%, respectively, as the hydrogen charging time increased from 0 to 96 hours. In contrast, no distinct nitriding layer in the plasma ion-nitrided Al alloy was observed due to oxide film formation and processing conditions. However, compared to 0 and 96 hours of hydrogen charging time, the ultimate tensile strength and modulus of toughness decreased by 7.54 and 13.32%, respectively, presenting excellent resistance to hydrogen embrittlement.

Arc Ion Plating으로 증착된 CrAlN 코팅막의 표면 특성에 미치는 Al 원소의 영향 (The Effect of Aluminum Element on the Surface Properties of CrAlN Coating Film Deposited via Arc Ion Plating )

  • 김재운;임병석;윤영신;안병우;최한철
    • 한국표면공학회지
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    • 제57권1호
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    • pp.14-21
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    • 2024
  • For this study, CrAlN multilayer coatings were deposited on SKD61 substrates using a multi-arc ion plating technique. The structural characteristics of the CrAlN multilayer coatings were evaluated using X-ray diffraction (XRD) and Scanning Electron Microscopy (SEM). Additionally, the adhesion of the coatings was assessed through scratch testing, and the mechanical strength was evaluated using nanoindentation and tribometric tests for frictional properties. The results show that the CrAlN multilayer coatings possess a uniform and dense structure with excellent mechanical strength. Hardness measurements indicated that the CrAlN coatings have high hardness values, and both the coating adhesion and wear resistance were found to be improved compared to CrN. The addition of aluminum is anticipated to contribute to enhanced durability and wear resistance.

The characteristics of AC-PDPs According to binary and ternary gas mixtures of He-Ne-Xe_

  • Lee, H.J.;Son, C.G.;Lee, S.B.;Han, Y.K.;Jeoung, S.H.;You, N.L.;Lim, J.E.;Lee, J.H.;Moon, M.W.;Oh, P.Y.;Jeoung, J.M.;Choi, E.H.
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.II
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    • pp.1195-1198
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    • 2005
  • The improvement of efficiency is the one of the most important part in AC PDPs . To achieve high efficiency, high VUV emission efficiency and High ion induces secondary electron emission coefficient are needed. We have measured the emission spectra of vacuum ultraviolet rays and ion induced secondary electron emission coefficient of MgO protective layer in surface discharge AC-PDP with binary and ternary gas mixtures. We have investigated electro-optical characteristics of AC-PDPs to optimum gas mixture for high efficient.

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새로운 이온빔을 이용한 $SiO_x$ 박막 표면의 액정 배향 효과 (Homeotropic Alignment Effect for Nematic Liquid Crystal on the $SiO_x$ Thin Film Layer by New Ion beam Exposure)

  • 최성호;김병용;한진우;오용철;서대식
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 추계학술대회 논문집 Vol.19
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    • pp.311-312
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    • 2006
  • We studied homeotropic alignment effect for a nematic liquid crystal (NLC) on the $SiO_x$, thin film irradiated by the new ion beam method $SiO_x$ thin films were deposited by plasma enhanced chemical vapor deposition (PECVD) and were treated by the DuoPIGatron ion source. A uniform liquid crystal alignment effect was achieved over 2100 eV ion beam energy. Tilt angle were about $90^{\circ}$ and were not affected by various ion beam energy.

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