• Title/Summary/Keyword: plasma frequency

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High Performance AC-PDP Sustain Driver with Low switching Loss (낮은 스위칭 손실을 가지는 고성능 AC-PDP 구동 회로에 관한 연구)

  • Kang, Feel-Soon;Park, Sung-Jun;Park, Han-Woong;Kim, Cheul-U
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.05a
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    • pp.50-56
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    • 2002
  • When the plasma panel is used as a display, frequent discharging are made to occur by alternatively charging each side of the panel to a critical voltage, which causes repeated gas discharges to occur. In this paper, an efficient sustain driver is proposed to achieve a faster rise-time in order to be suitable to widely used ADS driving method. The proposed circuit increases an operational margin up to 20 % compared with conventional approaches improving the recovery efficiency regardless of the variation of panel capacitance. Thanks to the increased operational margin, the brightness decrease problem can be solved without a limitation to sustain pulse width. The principle of operation, and features are illustrated, and verified on a 7.5 inch diagonal panel at 200 kHz operating frequency - based on experimental prototype.

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Neural Network Modeling of Ion Energy Impact on Surface Roughness of SiN Thin Films (신경망을 이용한 SiN 박막 표면거칠기에의 이온에너지 영향 모델링)

  • Kim, Byung-Whan;Lee, Joo-Kong
    • Journal of the Korean institute of surface engineering
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    • v.43 no.3
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    • pp.159-164
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    • 2010
  • Surface roughness of deposited or etched film strongly depends on ion bombardment. Relationships between ion bombardment variables and surface roughness are too complicated to model analytically. To overcome this, an empirical neural network model was constructed and applied to a deposition process of silicon nitride (SiN) films. The films were deposited by using a pulsed plasma enhanced chemical vapor deposition system in $SiH_4$-$NH_4$ plasma. Radio frequency source power and duty ratio were varied in the range of 200-800 W and 40-100%. A total of 20 experiments were conducted. A non-invasive ion energy analyzer was used to collect ion energy distribution. The diagnostic variables examined include high (or) low ion energy and high (or low) ion energy flux. Mean surface roughness was measured by using atomic force microscopy. A neural network model relating the diagnostic variables to the surface roughness was constructed and its prediction performance was optimized by using a genetic algorithm. The optimized model yielded an improved performance of about 58% over statistical regression model. The model revealed very interesting features useful for optimization of surface roughness. This includes a reduction in surface roughness either by an increase in ion energy flux at lower ion energy or by an increase in higher ion energy at lower ion energy flux.

Effect of Growth Conditions on Crystal Quality of InGaN Epitaxial Layers Grown by RF-MBE (RF-MBE 성장조건에 따른 InGaN 단결정 박막의 결정성 관찰)

  • Na, Hyunseok
    • Journal of the Korean Society for Heat Treatment
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    • v.31 no.5
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    • pp.237-243
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    • 2018
  • In-rich InGaN epilayers were grown on (0001) sapphire substrates by radio-frequency plasma-assisted molecular beam epitaxy (RF-MBE). InGaN epilayers grown at various growth condition were observed by SEM, XRD, and RHEED. When plasma power of nitrogen increased from 290 to 350 W, surface morphology and crystal quality became worse according to more active nitrogen on the surface of InGaN at N-rich growth condition. As In composition was reduced from 89 to 71% by changing the incoming flux of In and Ga, surface morphology and crystal quality became worse. In addition, weak peaks of cubic InGaN phase was observed from InGaN layer with 71% In composition by XRD ${\Phi}$ scan measurement. When growth temperature decreased from 500 to $400^{\circ}C$, RHEED diffraction pattern was changed to be from streaky to spotty which means atomically rough surface, and spotty pattern showed cubic symmetry of InGaN clearly. XRD ${\Phi}$ scan measurement gave clear evidence that more cubic InGaN phase was formed at low growth temperature. All these results indicates that extremely low surface mobility of Ga adatom caused inferior crystal quality and cubic InGaN phase.

Simulation of Capacitively Coupled RF Plasma; Effect of Secondary Electron Emission - Formation of Electron Shock Wave

  • Park, Seung-Kyu;Kim, Heon-Chang
    • Journal of the Semiconductor & Display Technology
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    • v.8 no.3
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    • pp.31-37
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    • 2009
  • This paper presents one and two dimensional simulation results with discontinuous features (shocks) of capacitively coupled rf plasmas. The model consists of the first two and three moments of the Boltzmann equation for the ion and electron fluids respectively, coupled to Poisson's equation for the self-consistent electric field. The local field and drift-diffusion approximations are not employed, and as a result the charged species conservation equations are hyperbolic in nature. Hyperbolic equations may develop discontinuous solutions even if their initial conditions are smooth. Indeed, in this work, secondary electron emission is shown to produce transient electron shock waves. These shocks form at the boundary between the cathodic sheath (CS) and the quasi-neutral (QN) bulk region. In the CS, the electrons emitted from the electrode are accelerated to supersonic velocities due to the large electric field. On the other hand, in the QN the electric field is not significant and electrons have small directed velocities. Therefore, at the transition between these regions, the electron fluid decelerates from a supersonic to a subsonic velocity in the direction of flow and a jump in the electron velocity develops. The presented numerical results are consistent with both experimental observations and kinetic simulations.

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Performance assessment of HEPA filter to reduce internal dose against radioactive aerosol in nuclear decommissioning

  • Hee Kwon Ku;Min-Ho Lee;Hyunjin Boo;Geun-Dong Song;Deokhee Lee;Kaphyun Yoo;Byung Gi Park
    • Nuclear Engineering and Technology
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    • v.55 no.5
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    • pp.1830-1837
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    • 2023
  • The thermal cutting of contaminated or activated metals during decommissioning nuclear power plants inevitably results in the release of radioactive aerosol. Since radioactive aerosols are pernicious particles that contribute to the internal dose of workers, air conditioning units with a HEPA filter are used to remove radioactive aerosols. However, a HEPA filter cannot be used permanently. This study evaluates the efficiency and lifetime of filters in actual metal cutting condition using a plasma arc cutter and a high-resolution aerosol detector. The number concentration and size distribution of aerosols from 6 nm to 10 ㎛ were measured on both the upstream and downstream sides of the filter. The total aerosol removal efficiency of HEPA filter satisfies the standard of removing at least 99.97% of 0.3 ㎛ airborne particles, even if the pressure drop increases due to dust feeding load. The pressure drop and particle size removal efficiency at 0.3 ㎛ of the HEPA filter were found to increase with repeated cutting experiments. By contrast, the efficiency of used HEPA filter reduced in removing nano-sized aerosols by up to 79.26%. Altogether, these results can be used to determine the performance guidance and replacement frequency of HEPA filters used in nuclear power plants.

Research of Heavily Selective Emitter Doping for Making Solar Cell by Using the New Atmospheric Plasma Jet (새로운 대기압 플라즈마 제트를 이용한 태양전지용 고농도 선택적 도핑에 관한 연구)

  • Cho, I Hyun;Yun, Myung Soo;Son, Chan Hee;Jo, Tae Hoon;Kim, Dong Hea;Seo, Il Won;Rho, Jun Hyoung;Jeon, Bu Il;Kim, In Tae;Choi, Eun Ha;Cho, Guangsup;Kwon, Gi Chung
    • Journal of the Korean Vacuum Society
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    • v.22 no.5
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    • pp.238-244
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    • 2013
  • Doping process using laser is an important process in fabrication of solar cell for heat treatment. However, the process of using the furnace is difficult to form a selective emitter doping region. The case of using a selective emitter laser doping is required an expensive laser equipment and induce the wafer's structure damage due to high temperature. This study, we fabricated a new costly plasma source. Through this, we research the selective emitter doping. We fabricated that the atmospheric pressure plasma jet injected Ar gas is inputted a low frequency (a few tens kHz). We used shallow doping wafers existing PSG (Phosphorus Silicate Glass) on the shallow doping CZ P-type wafer. Atmospheric plasma treatment time was 15 s and 30 s, and current for making the plasma is 40 mA and 70 mA. We investigated a doping profile by using SIMS (Secondary Ion Mass Spectroscopy) and we grasp the sheet resistance of electrical character by using doping profile. As result of experiment, prolonged doping process time and highly plasma current occur a deeper doping depth, moreover improve sheet resistance. We grasped the wafer's surface damage after atmospheric pressure plasma doping by using SEM (Scanning Electron Microscopy). We check that wafer's surface is not changed after plasma doping and atmospheric pressure doping width is broaden by increase of plasma treatment time and current.

Comparative Analysis of Flicker Noise and Reliability of NMOSFETs with Plasma Nitrided Oxide and Thermally Nitrided Oxide (Plasma Nitrided Oxide와 Thermally Nitrided Oxide를 적용한 NMOSFET의 Flicker Noise와 신뢰성에 대한 비교 분석)

  • Lee, Hwan-Hee;Kwon, Hyuk-Min;Kwon, Sung-Kyu;Jang, Jae-Hyung;Kwak, Ho-Young;Lee, Song-Jae;Go, Sung-Yong;Lee, Weon-Mook;Lee, Hi-Deok
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.24 no.12
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    • pp.944-948
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    • 2011
  • In this paper, flicker noise characteristic and channel hot carrier degradation of NMOSFETs with plasma nitrided oixde (PNO) and thermally nitrided oxide (TNO) are analyzed in depth. Compared with NMOSFET with TNO, flicker noise characteristic of NMOSFET with PNO is improved significantly because nitrogen density in PNO near the Si/$SiO_2$ interface is less than that in TNO. However, device degradation of NMOSFET with PNO by channel hot carrier stress is greater than that with TNO although PMOSFET with PNO showed greater immunity to NBTI degradation than that with TNO in previous study. Therefore, concurrent investigation of the reliability as well as low frequency noise characteristics of NMOSFET and PMOSFET is required for the development of high performance analog MOSFET technology.

Development of Inductively Coupled Plasma Gas Ion Source for Focused Ion Beam (유도결합형 플라즈마 소스를 이용한 집속 이온빔용 가스 이온원 개발)

  • Lee, Seung-Hun;Kim, Do-Geun;Kang, Jae-Wook;Kim, Tae-Gon;Min, Byung-Kwon;Kim, Jong-Kuk
    • Journal of the Korean Society for Precision Engineering
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    • v.28 no.1
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    • pp.19-23
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    • 2011
  • Recently, focused ion beam (FIB) applications have been investigated for the modification of VLSI circuit, the MEMS processing, and the localized ion doping, A multi aperture FIB system has been introduced as the demands of FIB applications for high speed and large area processing increase. A liquid metal ion source has problems, a large angular divergence and a metal contamination into a substrate. In this study, a gas ion source was introduced to replace a liquid metal ion source. The gas ion source generated inductively coupled plasma (ICP) in a quartz tube (diameter: 45 mm). Ar gas fed into the quartz was ionized by a 2 turned radio frequency antenna. The Ar ions were extracted by 2 extraction grids. The maximum extraction voltage was 10 kV. A numerical simulation was used to optimize the design of extraction grids and to predict an ion trajectory. As a result, the maximum ion current density was 38 $mA/cm^2$ and the spread of ion energy was 1.6 % for the extraction voltage.

Optical Properties of Diamond Like Carbon Films Deposited by Plasma Enhanced CVD (rf PECVD법으로 증착된 DLC film의 광학적 성질)

  • Kim, Moon-Hyup;Song, Jae-Jin;Kim, Seong-Jin
    • Korean Journal of Materials Research
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    • v.11 no.7
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    • pp.550-555
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    • 2001
  • A diamond-like carbon(DLC) films were deposited on the borosilicate glass substrate by radio frequency plasma enhanced chemical deposition(rf-PECVD). The $methane(CH_4)-hydrogen(H_2)$ gas mixture was used as precursor gas. The morphologies, the structure and the optical properties of the DLC films were investigated by SEM, Raman and UV spectrometer. The deposition rate was slightly increased with the hydrogen concentration in the gas mixture and it maintained constant at over 25 sccm of the gas flow rate. The optical band gap calculated by UV spectra decreased with increase of deposition time and DC self bias, but that were not effected by hydrogen content. Most effective parameter on the transmittance of film was bias voltage, especially in the range of ultra violet and visible light.

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A Novel Multi-Level Type Energy Recovery Sustaining Driver for AC Plasma Display Panel (새로운 AC PDP용 멀티레벨 에너지 회수회로)

  • Hong, Soon-Chang;Jung, Woo-Chong;Kang, Kyoung-Woo;Yoo, Jong-Gul
    • Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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    • v.19 no.4
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    • pp.71-78
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    • 2005
  • This paper proposes a novel multi-level energy recovery sustaining driver for AC PDP(Plasma Display Panel), which solves the problems of the conventional multi-level sustaining driver. While the conventional circuit improves the voltage md current stress of the switching elements in Weber circuit not only there are parasitic resonant currents between resonant inductors and parasitic capacitance and hard switching, but also the changing period between 0 and sustain voltage is too long. Comparing the proposed circuit with the conventional circuit, the number of components are reduced and the parasitic resonant currents in resonant inductors are eliminated Moreover the hard switching problem is solved by using CIM(Current Injection Method) and the operating frequency will be high as much as possible by removing Vs/2 sustain period. And the circuit operations of the proposed circuit are analyzed for each mode and the validity is verified by the simulations using PSpice program.