• Journal of information and communication convergence engineering
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• 제9권5호
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• pp.587-590
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• 2011

The absence of deep traps for electrons in the spectrum of $As_{40}Se_{30}S_30$ localized states films obtained by ion sputtering was determined. Bipolar drift of charge carriers was found in amorphous $As_{40}Se_{30}S_30$ films of chalcogenide glassy semiconductors, obtained by ion-plasma sputtering of high-frequency, unlike the films of these materials obtained by thermal evaporation.

• 제어로봇시스템학회:학술대회논문집
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• 제어로봇시스템학회 2001년도 ICCAS
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• pp.157.1-157
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• 2001

A new methodology is presented to diagnose faults in equipment plasma. This is accomplished by using neural networks as a pattern recognizer of radio frequency(rf) impedance match data. Using a realtime match monitor system, the match data were collected. The monitor system consisted mainly of a multifunction board and a signal flow diagram coded by Visual Designer. Plasma anomaly was effectively represented by electrical match positions. Twenty sets of fault-symptom patterns were experimentally simulated with experimental variations in process factors, which include rf source power, pressure, Ar and O$_2$ flow rates. As the inputs to neural networks, two means and standard deviations of positions were used ...

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2007년도 추계학술대회 논문집
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• pp.480-480
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• 2007

A large diameter plasma filled backward wave oscillator is investigated experimentally. The parameters of slow wave structure are chosen so that the oscillation frequency is high beam energy. Plasma is produced by the beam and it has favorable effects on beam propagation and Cerenkov oscillation.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1992년도 하계학술대회 논문집 B
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• pp.649-652
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• 1992

ECR(Electron Cyclotron Resonance) occure at ${\omega}_c$=${\omega}$, ${\omega}_c$:electron cycltron frequency, ${\omega}$:electromagnetic wave frequency. ECR system have several merit, 1) power transefer efficiency 2) low neutral gas pressure (below 1 mTorr) 3) high plasma density($10^{12}$ $cm^{-3}$). It is applicated variously in the field of semiconductor and new materials as the manufacturing equipment. Magnetic field in ECR system contruct resonance layer (${\omega}$=2.45GHz, $B_z$=875 Gauss) and control plasma. Plasma is almost generated at resonance layer. If the distance between substrate and resonance layer is short, uniformity of plasma is related with profile of resonance layer. Plasma have the property "Cold in Field", so directonality of magnetic field is one of the control factors of anisotropic etching. In this study, we calculate B field and flux line distribution, optimize geometry and submagnet current and improve of magnetic field directionality (99.9%) near substrate. For the purpose of calculation, vector potential A(r,z) and magnetic field B(r,z), green function and numerical integration is used. Object function for submagnet optimization is magnetic field directionality on the substrate and Powell method is used as optimization skim.

• 설비공학논문집
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• 제22권5호
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• pp.282-288
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• 2010

Experiment on the surface characteristics of polymer films treated by atmospheric pressure plasma has been conducted. We chose the process parameters as frequency, gas flow, treatment time, and scrutinized the effects of the process parameters on the surface characteristics of polymer materials by measuring the contact angle and examining SEM. As the result, the surface characteristics highly depends on frequency, reaction gas and treatment time. In the case of PC substrate, the contact angle was changed from $83.5^{\circ}$ (before plasma treatment) to $30^{\circ}$ (after plasma treatment) at 30 kHz, CDA 0.6%, and number of repeat 7. In the case of PET substrate, the contact angle change was found from $59^{\circ}$ to $23.5^{\circ}$ at 20 kHz, CDA 0.6%, and number of repeat 7. In the case of EVA substrate, it shows from $84^{\circ}$ to $44.2^{\circ}$ at 30 kHz, CDA 0.6%, and number of repeat 7.

• Journal of Nutrition and Health
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• 제39권1호
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• pp.28-34
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• 2006

This study was performed to compare nutrients intake and levels of three elements (iron, copper and zinc) in the plasma of breast cancer patients to those in healthy controls. Patients (n = 97) and their age-matched healthy control groups (n = 97) participated in the study. A semi-quantitative food frequency questionnaire specifically formulated to evaluate the consumption of nutrients was used to estimate dietary intake. Only plasma was taken from the 20 patients and their age-matched healthy control group. Plasma concentrations of iron, copper, zinc, ratio of Cu/Zn were measured in both groups. Results showed that patients consumed significantly lower protein, fat, iron. Plasma level of copper and ratio of Cu/Zn were significantly higher in patients compared to those of controls. In conclusion, change of trace elements in plasma might be useful and significant as biomakers involving the initial process. And these results imply that trace elements status is a factor related to breast cancer risk and suggest that proper intake of those nutrients is required for cancer prevention.

• 한국전기전자재료학회논문지
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• 제22권1호
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• pp.81-85
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• 2009

We has been analysed optical properties of OLED(organic light emitting diode) and characteristics of ITO(Indium Tin Oxide) in terms of $O_2$ plasma treatment for manufacturing high efficiency OLED, RF power of $O_2$ plasma was changed 25, 50, 100, 200 W. $O_2$ gas flow, gas pressure and treatment time were fixed. Sheet resistance and surface roughness of ITO were measured by Hall-effect measurement system and AFM, respectively. The ranges of sheet resistance and surface roughness were $5.5{\sim}6,06\;{\Omega}$ and $2.438{\sim}3.506\;nm$ changing of RF power, respectively, PM(Passive Matrix)OLED was fabricated with the structure of ITO(plasm treatment)/TPD($400\;{\AA}$)/$Alq_3(600\;{\AA})$/LiF($5\;{\AA}$)/Al($1200\;{\AA}$). Turn-on voltage of PMOLED was 7 V and luminance was $7,371\;cd/m^2$ at the RF power of 25 W, $O_2$ plasma treatment of ITO surface was result in lowering the operating voltage and improving luminance of PMOLED.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2006년도 하계학술대회 논문집 Vol.7
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• pp.519-520
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• 2006

Research was performed to increase the efficiency of a plasma reactor for $H_2$ yield. In the preceding studies $H_2$ was increased by adding Ni as a transitional metal catalyst and $TiO_2$ as a photocatalyst. In these experiments, it was found that distilled water, discharge frequency, and electrode configuration had a significant impact on $H_2$ generation. A substantial amount of hydrogen yield was observed at 2 kHz of discharge frequency and 12 kV of applied voltage. Within this favorable discharge conditions, the weight rate of $TiO_2$ and Ni powders was investigated. Plasma phenomenon was measured by electrical, optical and acoustical devices. It was found that emitted light, electric current and acoustical signals acquired from the discharge demonstrated systematical correlation. Changing the electrode's configuration allowed discharge distribution along the perimeter of the electrode's tip, which increased the density of streamers and plasma energy loadings, as the value of inception voltage for the discharge propagation decreased.

• 한국분말재료학회지
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• 제26권4호
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• pp.305-310
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• 2019

In the present work, spheroidization of angular vanadium powders using a radio frequency (RF) thermal plasma process is investigated. Initially, angular vanadium powders are spheroidized successfully at an average particle size of $100{\mu}m$ using the RF-plasma process. It is difficult to avoid oxide layer formation on the surface of vanadium powder during the RF-plasma process. Titanium/vanadium/stainless steel functionally graded materials are manufactured with vanadium as the interlayer. Vanadium intermediate layers are deposited using both angular and spheroidized vanadium powders. Then, 17-4PH stainless steel is successfully deposited on the vanadium interlayer made from the angular powder. However, on the surface of the vanadium interlayer made from the spheroidized powder, delamination of 17-4PH occurs during deposition. The main cause of this phenomenon is presumed to be the high thickness of the vanadium interlayer and the relatively high level of surface oxidation of the interlayer.

• 전기학회논문지
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• 제58권6호
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• pp.1174-1179
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• 2009

In this paper we develop the characteristic of density on non-uniform plasma in different layer of the semiconductor with optically controlled microwave pulses. The transient response of the microwave pulses in different plasma layer has been evaluated by calculating the variation of the reflection function of dielectric microstrip lines. The lines has used under open-ended termination containing optically induced plasma region, which has illuminated a laser source. The characteristics impedances resulting from the presence of plasma are evaluated by the transmission line model. The analyzes the variation of transient response in a 0.01cm layer near the surface for frequency range from 1GHz to 128GHz. The diffusion length LD is larger than compared to the absorption depth $l/_{\alpha}l$. The variation of characteristic response in plasma layer with microwave pulses which has in deferentially localized has been evaluated analytically.