• Journal of the Korean Vacuum Society
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• v.19 no.5
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• pp.331-340
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• 2010

3D fluid based numerical modelling is done for a VHF multi hollow cathode array plasma enhanced chemical vapor deposition system. In order to understand the fundamental characteristics of it, Ar plasma is analyzed with a condition of 40 MHz, 100 Vrf and 1 Torr. For hole array of 6 mm diameter and 20 mm inter-hole distance, plasma is well confined within the hole at an electrode gap of 10 mm. The peak plasma density was $5{\times}10^{11}#/cm^3$ at the center of the hole. When the substrate was assumed at ground potential, electron temperature showed a peak at the vicinity of the grounded walls including the substrate and chamber walls. The reaction rate of metastable based two step ionization was 10 times higher than the direct electron impact ionization at this condition. For $H_2$, the spatial localization of discharge is harder to get than Ar due to various pathways of electron impact reactions other than ionization.

• Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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• v.13 no.4
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• pp.82-86
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• 1999

Electron Energy Distribution Function(EEDF) were treasured In Radio-Frequency Inductively Coupled Plasma(RFlCP) using a probe rrethocl Measurerrents were conducted in argon discharge for pressure from 10[mTorr] to 4O[mTorr] and input rf power from 100[W] to 600[W] and flow rate from 3[sccm] to 12[sccm]. Spatial distribution of electron energy distribution function were measured for discharge with same aspoct ratio (R/L=2). Electron energy distribution function strongly depended on both pressure and power. Electron energy distribution function increased with increasing flow rate. Radial distribution of the electron energy distribution function were peaked in the plasma center. Normal distribution of the electron energy distribution function were peaked in the center between quartz plate and substrate. From the results, we can find out the generation mechanism of Radio Frequency Inductively Coupled Plasma. And these results contribute the application of a simple Inductively Coupled Plasma(ICP).a(ICP).

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2007.04a
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• pp.71-72
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• 2007

In this study, we investigated the fabrication of MLR (multi-layer resist) with a very thin diamond-like carbon (DLC) layer. ArF PR/$SiO_2$/DLC MLR structure was investigated and etching characteristics of the DLC layer was patterned using $SiO_2$ hard-mask by varying the process parameters such as different high-frequency/low-frequency combination ($f_{LF}/f_{HF}$), HF/LF power ratio ($P_{HF}/P_{LF}$), $O_2$ flow and $N_2$ flow rate in $O_2/N_2$/Ar plasmas. The results indicated an increased etch rate of DLC for the higher $f_{LF}/f_{HF}$ combination and for the increased low-frequency power ($P_{LF}$). And the etch rate of DLC was decreased with increasing the $N_2$ flow rate in $O_2/N_2$/Ar plasmas. In order to confirm the application of DLC MLR for the etching process of silicon oxide, the stack of ArF PR/BARC/$SiO_2$/DLC/TEOS/Si was investigated.

• Journal of Korean Society for Atmospheric Environment
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• v.17 no.E3
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• pp.91-99
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• 2001

Plasma reactor was used to generate a high potential difference between two surfaces of concentric pyrex tubes by electrical current. The annular gap of the reactor was calculated by trial and error from the breakdown voltage equation and set at 0.45 cm. The overall objective of this research was to know the effects of the frequency, humidity, and residence time on the formation of nitrogen oxides in a plasma reactor. The primary voltage varied from 50 to 90 volts and the frequency was varied in increments of 10 Hz from 60 to 650 Hz at the primary voltage of 90. The increase in the secondary voltage was not linear but exponential at high frequencies. At a maximum concentration of about 745 ppm, the frequency and secondary voltage was 600 Hz and 4,200 volts, respectively. All tests for the effects of humidity on NO$_{x}$ production were performed at the optimal setting of 90 colts and 600 Hz frequency. Since the NO$_{x}$ production was not an one dimensional phenomenon, competing reactions were assumed to occur in the discharge chamber. The sharp peak concentration of 1,810 ppm was observed at 38% of relative humidity, The enhanced production was choked off, and the production rate rapidly dropped to 3 ppm at above 40% of relative humidity. It is assumed that the corona attacks the most vulnerable molecules in the reaction chamber before attacking other more lightly bonded molecules, possibly at humidities above 38% and the optimized 90 volt setting. Thus, there was not enough energy left after attacking all water molecules to decompose an appreciable amount of $N_2$. If nitrogen breakdown does not occur, then oxides of nitrogen are not likely to be produced.ced.

• Applied Science and Convergence Technology
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• v.26 no.4
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• pp.74-78
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• 2017

The discharge characteristics of the radio frequency (RF) surface dielectric barrier discharge have been simulated for the investigation of the ratio of the ion transit time to the RF period. From one-dimensional particle-in-cell (PIC) simulation for a planar dielectric barrier discharge (DBD), it was observed that the high-frequency driving voltage confines the ions in the plasma because of a shorter RF period than the ion transit time. For two-dimensional surface dielectric barrier discharges, a fluid simulation is performed to investigate the characteristics of RF discharges from 1 MHz to 40 MHz. The ratio of the peak density to the average density decreases with the increasing frequency, and the spatiotemporal discharge patterns change abruptly with the change in the ratio of ion transit time to the RF period.

• Proceedings of the IEEK Conference
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• 1998.10a
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• pp.589-592
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• 1998

The performance of inductively coupled plasma (ICP) is enhanced by axial magnetic field driven by alternating current Helmholtz coils in this work. Langmuir pobe is used to characterize the plasma, and the etching performance is demonstrated with phororesist stripping process. It is shown that its density and uniformity depends on the frequency of driving current to the magnetic field.

• 제어로봇시스템학회:학술대회논문집
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• 2002.10a
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• pp.32.5-32
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• 2002

Processing plasmas are playing a crucial role in either depositing thin films or etching fine patterns. Any variability in process factors (such as radio frequency power or pressure) can cause a significant shift in plasma state. When this shift becomes large enough to change operating condition beyond an acceptable level, overall product quality can greatly be jeopardized. Thus, timely and accurate diagnosis of plasma malfunction is crucial to maintaining device yield and throughput. Many diagnostic systems have been developed, including HIPOCRATES [1] and PIES [2]. Plasma equipment was also diagnosed by combining neural network and expert system called Dempster-Schafer Theory [3]. A fact c...

• 전기의세계
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• v.42 no.1
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• pp.5-11
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• 1993

금속이나 세라믹 입자를 용사하여 보호피막을 형성하는 기술은 화염을 사용하는 방법에서 시작했으며 용사재료는 분말, 선, 봉의 형태로 공급되었다. 1960년대에 상업적인 plasma 용사장비가 개발되었으며 여기서 사용된 D.C.plasma jet를 이용하여 분말형태의 용사재료를 용융하고 고속으로 피용사테에 용융입자를 분사하여 피용사체면에 충돌시켜 다층의 얇은 피막을 형성한다. 최근(1985년)에는 R.F.(Radio Frequency) Plasma를 이용하여 열전도도가 작은 재료나 산소와 반응성이 큰 재료를 용사하는 방법도 개발되고 있다. 용사피복법은 현재 여러가지 방법이 실용되고 있으며 재료를 용융하는 열원에 따라 분류하면 표1과 같다. 즉 산소와 연료 가스의 혼합에 의한 연소나 폭발에너지를 이용하는 가스식 용사법과 Arc, Plasma등의 전기 에너지를 이용하는 전기식 용사법으로 크게 나눌 수 있다.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2000.07a
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• pp.616-619
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• 2000

It is important to control the plasma characteristics for high quality plasma process. Recently, a novel method proposed by us, named as Enhanced-ICP, using periodic weak time-varying axial magnetic field added to a normal ICP source, has improved etch characteristics much. Variation of plasma characteristics according to the frequency of time-varying axial magnetic field have been measured and analyzed.

• The Journal of Korean Physical Therapy
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• v.15 no.4
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• pp.442-454
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• 2003

The aim of this study was to demonstrate the effects of silver spike point (SSP) low frequency electrical stimulation on plasma vasoactive intestinal polypeptide (VIP) activities measured by radioimmunoassay from volunteer and the effects of VIP on pain substance-induced contraction investigated by isometric tension methode in animal. The current of 3 Hz continue type, but not 100 Hz continue type, of SSP low frequency electrical stimulation significantly increased in plasma VIP from normal volunteer. The pain substance, such as norepinephrine, serotonin, and prostaglandin $F2{\alpha}$, increased vascular smooth muscle contraction, respectively. These responses were inhibited by VIP applied cumulatively (1 nM - $1\;{\mu}M$), but not serotonin-induced contraction. In addition, serotonin, and prostaglandin $F2{\alpha}$ induced uterine smooth muscle contraction from rat. However, these responses were inhibited by VIP ($1\;{\mu}M$), only serotonin-induced contraction. These results suggest that the VIP regulates pain substance in part and that the SSP low frequency electrical stimulation, specifically current of 3 Hz continue type, significantly increases plasma VIP from volunteer.