• 제목/요약/키워드: plasma flow

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Three Dimensional Computer Modeling of Magnetospheric Substorm

  • Min, Kyoung-W.
    • Journal of Astronomy and Space Sciences
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    • v.6 no.1
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    • pp.1-15
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    • 1989
  • Magnetospheic substorm in the magnetotail region is studied numerically by means of a three dimensional MHD code. The analytic solution for the quiet magnetotail is employed as an initial configuration. The localized solar wind is modeled to enter the simulation domain through the boundaries located in the magnetotail lobe region. As a result of the interaction between the solar wind and the magnetosphere, the magnetic field lines are stretched, and the plasma sheet becomes thinner and thinner. When the current driven resistivity is generated, magnetic reconnection is triggered by this resistivity. The resulting plasma jetting is found to be super-magnetosonic. Although the plasmoid formation and its tailward motion is not quite clear as in the two dimensional simulation, which is mainly because of the numerical model chosen for the present simulation, the rarification of the plasmas near the x-point is observed. Field aligned currents are observed in the late expansive stage of the magnetospheric substorm. These field aligned currents flow from the tail toward the ionosphere on the dawn side from the ionosphere to ward the tail on the dusk side, namely in the same sense of the region 1 current. As the field aligned currents develop, it is found that the cross tail current in the earth side midnight section of the magnetic x-point is reduced.

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Effects of oxygen, hydrogen and nitrogen addition in the synthesis of diamond-like carbon films (DLC 합성시 산소, 수소 및 질소 첨가의 효과)

  • 황민선;이종무
    • Journal of the Korean Vacuum Society
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    • v.8 no.2
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    • pp.165-171
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    • 1999
  • Diamond-like carbon(DLC) films were synthesized using the rf-plasma CVD technique with the addition of small amounts of nitrogen and oxygen to a gas mixture of $CH_4$ and $H_2$. The gas flow ratio of $CH_4$ to $H_2$ was 2.4:1, and 3% , 13.6% of nitrogen were added to the gas mixture of $CH_4$ and $H_2$ for the deposition of DLC films. The film stress tended to decrease as the nitrogen concentration increased from 3% to 13.6%, probably due to the decrease of the number of the interlink between carbon atoms. The residual stress tended to slightly decrease when 3% of oxygen was added. Scratch tests were performed to investigate the adhesion between the DLC films and the Ti intelayer after pretreating the TiN surface with direct hydrogen plasma. The adhesion was enhanced by adding nitrogen and oxygen to the $CH_4$ and $H_2$ gas mixture. The adhesion for the 3% nitrogen addition was better than that for the 13.6% nitrogen addition. The Vicker's hardness of the DLC films was measured to be 1100Hv.

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Surface analysis of a-$Si_{x}C_{1-x}$: H deposited by RF plasma-enhanced CVD

  • Kim, Yong-Tak;Yang, Woo-Seok;Lee, Hyun;Byungyou Hong;Yoon, Dae-Ho
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.10 no.1
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    • pp.1-4
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    • 2000
  • Thin films of hydrogenated amorphous silicon carbide compounds ($a-Si_{x}C_{1-x}:H$) of different compositions were deposited on Si substrate by RF plasma-enhanced chemical vapor deposition (PECVD). Experiments were carried out using silane (SiH$_4$) and methane ($CH_4$) as the gas precursors at 1 Torr and at a low substrate temperature ($250^{\circ}C$). The gas flow rate was changed with the other parameters (pressure, temperature, RF power) fixed. The substrate was Si(100) wafer and all of the films obtained were amorphous. The bonding structure of $a-Si_{x}C_{1-x}:H$films deposited was investigated by X-ray photoelectron spectroscopy (XPS) for the film compositions. In addition, the surface morphology of films was investigated by atomic force microscopy (AFM).

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Etching Characteristics of Ba2Ti9O20(BTO) Thin Films in Inductively Coupled an Ar/Cl2 Plasma (Ar/Cl2 혼합가스를 이용한 Ba2Ti9O20(BTO) 박막의 유도결합 플라즈마 식각)

  • Kim, Young-Keun;Kwon, Kwang-Ho;Lee, Hyun-Woo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.24 no.4
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    • pp.276-279
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    • 2011
  • This work, the etching characteristics of $Ba_2Ti_9O_{20}$(BTO) thin films were investigated using an inductively coupled plasma (ICP) of $Ar/Cl_2$ gas mixture. The etch rate of BTO thin films as well as the $BTO/SiO_2$ and BTO/PR etch selectivity were measured as functions of $Ar/Cl_2$ mixing ratio (0~100% Ar) at a constants gas pressure (6 mTorr), total gas flow rate (50 sccm), input power (700 W) and bias power (200 W). The etch rate of BTO thin films decreased with increasing Ar fraction. To analyze the etching mechanism an optical emission spectroscopy (OES), double Langmuir probe(DLP) and surface analysis using X-ray photoelectron spectroscopy (XPS) were carried out.

Deposition of SiO2 Thin Film for the Core of Planar Light-Wave-Guide by Transformer Coupled Plasma Chemical-Vapor-Deposition (TCP-CVD 장비를 활용한 광도파로용 Core-SiO2 증착)

  • Kim, Chang-Jo;Shin, Paik-Kyun
    • Journal of the Korean Vacuum Society
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    • v.19 no.3
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    • pp.230-235
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    • 2010
  • In this paper, we controlled the deposition rate and reflective index with process conditions that are TCP power, gas flow ratio and bias for optical properties of $SiO_2$ thin film using TCP-CVD equipment. We obtained a excellent $SiO_2$ thin film which has a excellent uniformity (<1 [%]), deposition rate (0.28 [${\mu}m$/ min]) and reflective index (1.4610-1.4621) within 4" wafer with process conditions ($SiH_4:O_2$=50 : 100 [sccm], TCP power 1 [kW], bias 200 [W]) at [$300^{\circ}C$].

A Study of Al2O3 Thin Films Etching Characteristics Using Inductively Coupled BCl3/Ar Plasma (유도결합형 BCl3/Ar 플라즈마를 이용한 Al2O3 박막의 식각 특성)

  • Kim, Young-Keun;Kwon, Kwang-Ho
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.24 no.6
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    • pp.445-448
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    • 2011
  • In this study, the etching characteristics of $Al_2O_3$ thin films were investigated using an ICP (inductively coupled plasma) of $BCl_3$/Ar gas mixture. The etch rate of $Al_2O_3$ thin films as well as the $SiO_2/Al_2O_3$ etch selectivity were measured as functions of $BCl_3$/Ar mixing ratio (0~100% Ar) at a constant gas pressure (10 mTorr), total gas flow rate (40 sccm), input power (800 W) and bias power (100 W). The behavior of the $Al_2O_3$ etch rate was shown to be quite typical for ion-assisted etch processes with a dominant chemical etch pathway. To analyze the etching mechanism using DLP (double langmuir probe), OES (optical emission spectroscopy) and surface analysis using XPS (x-ray photoelectron spectroscopy) were carried out.

Simulation of Capacitively Coupled RF Plasma; Effect of Secondary Electron Emission - Formation of Electron Shock Wave

  • Park, Seung-Kyu;Kim, Heon-Chang
    • Journal of the Semiconductor & Display Technology
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    • v.8 no.3
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    • pp.31-37
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    • 2009
  • This paper presents one and two dimensional simulation results with discontinuous features (shocks) of capacitively coupled rf plasmas. The model consists of the first two and three moments of the Boltzmann equation for the ion and electron fluids respectively, coupled to Poisson's equation for the self-consistent electric field. The local field and drift-diffusion approximations are not employed, and as a result the charged species conservation equations are hyperbolic in nature. Hyperbolic equations may develop discontinuous solutions even if their initial conditions are smooth. Indeed, in this work, secondary electron emission is shown to produce transient electron shock waves. These shocks form at the boundary between the cathodic sheath (CS) and the quasi-neutral (QN) bulk region. In the CS, the electrons emitted from the electrode are accelerated to supersonic velocities due to the large electric field. On the other hand, in the QN the electric field is not significant and electrons have small directed velocities. Therefore, at the transition between these regions, the electron fluid decelerates from a supersonic to a subsonic velocity in the direction of flow and a jump in the electron velocity develops. The presented numerical results are consistent with both experimental observations and kinetic simulations.

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Application of deep neural networks for high-dimensional large BWR core neutronics

  • Abu Saleem, Rabie;Radaideh, Majdi I.;Kozlowski, Tomasz
    • Nuclear Engineering and Technology
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    • v.52 no.12
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    • pp.2709-2716
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    • 2020
  • Compositions of large nuclear cores (e.g. boiling water reactors) are highly heterogeneous in terms of fuel composition, control rod insertions and flow regimes. For this reason, they usually lack high order of symmetry (e.g. 1/4, 1/8) making it difficult to estimate their neutronic parameters for large spaces of possible loading patterns. A detailed hyperparameter optimization technique (a combination of manual and Gaussian process search) is used to train and optimize deep neural networks for the prediction of three neutronic parameters for the Ringhals-1 BWR unit: power peaking factors (PPF), control rod bank level, and cycle length. Simulation data is generated based on half-symmetry using PARCS core simulator by shuffling a total of 196 assemblies. The results demonstrate a promising performance by the deep networks as acceptable mean absolute error values are found for the global maximum PPF (~0.2) and for the radially and axially averaged PPF (~0.05). The mean difference between targets and predictions for the control rod level is about 5% insertion depth. Lastly, cycle length labels are predicted with 82% accuracy. The results also demonstrate that 10,000 samples are adequate to capture about 80% of the high-dimensional space, with minor improvements found for larger number of samples. The promising findings of this work prove the ability of deep neural networks to resolve high dimensionality issues of large cores in the nuclear area.

Determination of osmium using sulfurous acid as reductant by ICP-AES (Sulfurous acid 환원제를 이용한 ICP-AES에 의한 Osmium의 정량 분석)

  • Park, Han-Seok;Kim, Kang-Jin
    • Analytical Science and Technology
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    • v.20 no.3
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    • pp.251-254
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    • 2007
  • In this study, a convenient, fast and accurate inductively coupled plasma atomic emission spectrometry (ICP-AES) method has been optimized for the determination of osmium in aqueous solutions. The method makes use of the reaction of sulfurous acid with osmium to quantitative conversion of volatile Os(VIII) to non-volatile Os(IV) in the pH range 2-10. The response was found to be stabilized immediately after sulfurous acid reacted with osmium. The precision was calculated to be 0.5-4.5 % (RSD) under various ICP-AES conditions. The detection limit was 2.5-57.7 ng/g based on $3{\sigma}$ of the blank response (n=3) using a concentric flow nebulization.

Pharmacokinetics of Propentofylline and the Quantitation of Its Metaolite Hydroxypropentofylline in Human Volunteers

  • Kwon, Oh-Seung;Chung, Youn-Bok;Kim, Min-Hee;Hahn, Hoh-Gyu;Rhee, Hee-Kyung;Ryu, Jae-Chun
    • Archives of Pharmacal Research
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    • v.21 no.6
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    • pp.698-702
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    • 1998
  • Propentofylline (PPF, 3-methyl-1-(5-oxohexyl)-7-propylxanthine) has been reported to be effective for the treatment of both vascular dementia and dementia of the Alzheimer type. The pharmacological effects of PPF may be exerted via the stimulation of nerve growth factor, increased cerebral blood flow, and inhibition of adenosine uptake. The objectives of this experiment are to determine the kinetic behavior of PPF, to identify, and to quantify its metabolite in human. Blood samples were obtained from human volunteers following oral administration of 200mg of PPF tablets. For the identification and quantification of the metabolite, 3-methyl-1-(5-hydroxyhexyl)-7-propylxanthine (PPFOH), PPFOH was synthesized and identified by gas chromatography/mass spectroscopy (GC/MS) and $^1H$-nuclear magnetic resonance spectroscopy. The molecular weight of synthesized metabolite is 308 dalton. The PPF and PPFOH in plasma were extracted with diethyl ether and identified by electron impact GC/MS. The plasma concentrations of PPF and PPFOH were determined by gas chromatography/nitrogen phosphorus detector in plasma and their pharmacokinetic parameters were determined. The mean half-life of PPF was 0.74 hr. The areas under the curve (AUCs) of PPF and PPFOH were 508 and 460ng.hr/ml, respectively. $C_{max}$ of PPF was about 828.4ng/ml and the peak concentration was achieved at about 2.2 hr ($T_{max}$). These results indicate that PPF is rapidly disappeared from blood due to extensive metabolism into PPFOH.

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