• Title/Summary/Keyword: plasma flow

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Growth of Carbon Nanotubes using Plasma-Enhanced Chemical Vapor Deposition (플라즈마 CVD 를 이용한 탄소나노튜브의 성장)

  • Bang Y.Y.;Chang W.S.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2005.06a
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    • pp.1236-1239
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    • 2005
  • Aligned carbon nanotubes(CNTs) array were synthesized using DC plasma-enhanced chemical vapor deposition. Silicon substrate Ni-coated of 5nm thickness were pretreated by $NH_3$ gas with a flow rate of 180sccm, for 10min. CNTs were grown on the pretreated substrates at $30%\;C_2H_2:NH_3$ flow ratios for 10min. Carbon nanotubes with diameters from 60 to 80 nanometers and lengths about 2.7 micrometers were obtained. Vertical alignment of carbon nanotubes were observed by FESEM.

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A study on platinum dry etching using a cryogenic magnetized inductively coupled plasma (극저온 자화 유도 결합 플라즈마를 이용한 Platinum 식각에 관한 연구)

  • 김진성;김정훈;김윤택;황기웅;주정훈;김진웅
    • Journal of the Korean Vacuum Society
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    • v.8 no.4A
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    • pp.476-481
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    • 1999
  • Characteristics of platinum dry etching were investigated in a cryogenic magnetized inductively coupled plasma (MICP). The problem with platinum etching is the redeposition of sputtered platinum on the sidewall. Because of the redeposits on the sidewall, the etching of patterned platinum structure produces feature sizes that exceed the original dimension of the PR size and the etch profile has needle-like shape [1]. The main object of this study was to investigate a new process technology for fence-free Pt etching As bias voltage increased, the height of fence was reduced. In cryogenic etching, the height of fence was reduced to 20% at-$190^{\circ}C$ compared with that of room temperature, however the etch profile was not still fence-free. In Ar/$SF_6$ Plasma, fence-free Pt etching was possible. As the ratio of $SF_6$ gas flow is more than 14% of total gas flow, the etch profile had no fence. Chemical reaction seemed to take place in the etch process.

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A Study on the Flow Characteristic of Non-Thermal Plasma Reactor for Demonstration (실증실험용 저온 플라즈마 반응기의 유동특성에 관한 연구)

  • Kim, Y.S.;Choi, S.H.;Kim, J.I.;Kim, T.H.;Yoo, J.S.;Paek, M.S.;Jang, G.H.
    • Proceedings of the KSME Conference
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    • 2000.11b
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    • pp.508-513
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    • 2000
  • HANJUNG has developed demonstration plant treating combustion flue gas such as dioxide($SO_2$) and nitrogen oxides(NOx). Before operating this system, we tested the inner airflow characteristic of demonstration plant in the front of plasma reactor field 1 and field 2. The experimental results of $25,000Nm^3/hr$ airflow are compared with the computational results using FLUENT code. It is found that the velocity distribution trends are matched the experimental results with the calculation results. To improve the eccentric airflow in the inlet hood, it is necessary to install the vertical guide vane as well as the horizontal guide vane.

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A Study on the Development of the Industrial Torch (산업용 토치 개발에 관한 연구)

  • Kim, Oe-Dong;Shim, Jae-Hak;Chang, Yong-Moo;Kang, Hyung-Boo
    • Proceedings of the KIEE Conference
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    • 1994.07b
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    • pp.1606-1608
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    • 1994
  • A performance of the torch greatly depends on the plasma gas and the cooling gas. The plasma gas constricted by the nozzle concentrates electric power and momentum, so it can eject molten metal from a cut. As an electric arc constricted in a nozzle is more constricted through thermal pinch by the cooling gas, it is possible to transfer larger thermal concentration to the workpiece. The optimized parameter value in this study was given below. Plasma gas pressure is $4[kgf/cm^2]$ and gas mass flow is $30[{\ell}/min]$. Cooling gas pressure is $6[kgf/cm^2]$ and gas mass flow is $120[{\ell}/min]$.

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Analysis of Energy Flow and Barrier Rib Height Effect using Ray-Optics Incorporated Three-dimensional PDP Cell Simulation

  • Chung, Woo-Joon;Jeong, Dong-Cheol;Whang, Ki-Woon;Park, Jae-Hyeung;Lee, Byoung-Ho
    • Journal of Information Display
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    • v.2 no.4
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    • pp.46-51
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    • 2001
  • Using ray-optics code incorporated with three-dimensional PDP cell simulation, we have analysed the energy flow in the PDP cell from the electric power input to the visible light output. Also, the visible light output profile and viewing angle distribution were obtained. We applied our code to the analysis of the barrier rib height effect on the visible light luminance and efficiency of the sustaining discharge. Although cells with higher barrier rib generate more VUV photons, less ratio of visible photons are emitted toward front panel due to the shadow effect. Thus, there exists optimal barrier rib height giving the highest visible luminance and efficiency. This kind of code can be a powerful tool in designing cell geometry.

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Numerical Simulation: Effects of Gas Flow and Rf Current Direction on Plasma Uniformity in an ICP Dry Etcher

  • Joo, Junghoon
    • Applied Science and Convergence Technology
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    • v.26 no.6
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    • pp.189-194
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    • 2017
  • Effects of gas injection scheme and rf driving current configuration in a dual turn inductively coupled plasma (ICP) system were analyzed by 3D numerical simulation using CFD-ACE+. Injected gases from a tunable gas nozzle system (TGN) having 12 horizontal and 12 vertical nozzles showed different paths to the pumping surface. The maximum velocity from the nozzle reached Mach 2.2 with 2.2 Pa of Ar. More than half of the injected gases from the right side of the TGN were found to go to the pump without touching the wafer surface by massless particle tracing method. Gases from the vertical nozzle with 45 degree slanted angle soared up to the hottest region beneath the ceramic lid between the inner and the outer rf turn of the antenna. Under reversed driving current configuration, the highest rf power absorption region were separated into the two inner islands and the four peaked donut region.

Low temperature preparation of $SnO_2$ films by ICP-CVD (ICP-CVD를 이용한 $SnO_2$ 박막 저온 증착)

  • Lee, H.Y.;Lee, J.J.
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2007.04a
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    • pp.157-158
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    • 2007
  • Tin oxide films were successfully crystallized without additional heating by inductively coupled plasma assisted chemical vapor deposition (ICP-CVD). The degree of crystallization was affected by the ICP power, hydrogen flow and ion bombardment induced by negative substrate bias. The substrate temperature was increased only up to $150^{\sim}180^{\circ}C$ by plasma heating, which suggests that the formation of $SnO_2$ crystalswas caused by enhanced reactivity of precursors in high density plasma. The hardness of deposited tin oxide films ranged from 5.5 to 11GPa at different hydrogen flow rates.

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Fundamental Experiments for Attitude Control of a Low Earth Orbit Satellite Using Ion Drag

  • Ohue, Miho;Koizumi, Hiroyuki;Kuninaka, Hitoshi;Nishida, Michio
    • Proceedings of the Korean Society of Propulsion Engineers Conference
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    • 2008.03a
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    • pp.561-565
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    • 2008
  • Generally, reaction wheels or thrusters are used for attitude control of a satellite. There is a potential method for the attitude control utilizing the plasma flow on the Low Earth Orbit. In the present study, experiments which simulate attitude control of a Low Earth Orbit Satellite using the ionosphere were conducted. In this experiment, a plasma flow was generated by a steady-state Hall type accelerator. However it is known that the Hall type accelerator, which is used as plasma source, produces a torque around its axis called "swirl torque". This torque would affect the attitude control in the above-mentioned experiments. First of all, we conducted the measurement of the swirl torque. Secondly, experiments using a satellite model with negative electrodes were conducted. The negative electrodes generated torque around the axis, and controlled the attitude of the satellite model by changing the applied voltage.

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Optimization of Design of Plasma Process for Water Treatment using Response Surface Method (반응표면분석법을 이용한 수처리용 플라즈마 공정 설계의 최적화)

  • Kim, Dong-Seog;Park, Young-Seek
    • Journal of Korean Society on Water Environment
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    • v.27 no.5
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    • pp.617-624
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    • 2011
  • In order to confirm the creation of the OH radical which influences to RNO bleaching processes, it experimented using laboratory reactor of dielectric barrier discharge plasma (DBDP). The experiments performed in about 4 kind process variables (diameter of ground electrode, diameter of discharge electrode, diameter of quartz tube and effect of air flow rate) which influence to process. In order to examine optimum conditions of design factors as shown in Box-Behnken experiment design, ANOVA analysis was conducted against four factors. The actual RNO removal at optimized conditions under real design constraints were obtained, confirming Box-Behnken results. Optimized conditions under real design constraints were obtained for the highest desirability at 1, 1 mm diameter of ground and discharge electrode, 6 mm diameter of quartz tube and 5.05 L/min air flow rate, respectively.

Plasma Density Measurement of Linear Atmospheric Pressure DBD Source Using Impedance Variation Method (임피던스 변화를 이용한 선형 대기압 DBD 플라즈마 밀도 측정)

  • Shin, Gi Won;Lee, Hwan Hee;Kwon, Hee Tae;Kim, Woo Jae;Seo, Young Chul;Kwon, Gi-Chung
    • Journal of the Semiconductor & Display Technology
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    • v.17 no.2
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    • pp.16-19
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    • 2018
  • The development speed of semiconductor and display device manufacturing technology is growing faster than the development speed of process equipment. So, there is a growing need for process diagnostic technology that can measure process conditions in real time and directly. In this study, a plasma diagnosis was carried out using impedance variation due to the plasma discharge. Variation of the measurement impedance appears as a voltage change at the reference impedance, and the plasma density is calculated using this. The above experiment was conducted by integrating the plasma diagnosis system and the linear atmospheric pressure DBD plasma source. It was confirmed that plasma density varies depending on various parameters (gas flow rate, $Ar/O_2$ mixture ratio, Input power).