• Proceedings of the KSME Conference
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• 2004.04a
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• pp.956-960
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• 2004

Effects of ion implantation and deposition on the tribological properties of DLC film as a function of implanted energies and process times were investigated. TiC ions were implanted and deposited on the Si-wafer substrates followed by DLC coating using ion beam deposition method. In order to study tribological properties such as friction coefficient and behavior of DLC film on the modified surface as a function of implanted energies and process times, we used a ball-on-disc type apparatus in the atmospheric environment. From results of wear test, as the implanted energy was increased, the friction coefficient was more stable below 0.1.

• Proceedings of the KAIS Fall Conference
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• 2006.11a
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• pp.133-134
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• 2006

본 논문에서는 ITO/Glass 기판에 스핀 코팅법(Spin Coating)과 열 증착법(Thermal Evaporation)을 이용하여 ITO/PEDOT:PSS/PVK/PFO-poss/Li/Al 구조를 갖는 청색 고분자 유기전계발광소자를 제작하였다. 청색 고분자 유기발광다이오드 제작시 ITO 전극을 $O_2$ gas를 이용한 Plasma Treatment와 Heat Treatment를 실시하여 기판처리가 제작된 소자의 전기, 광학적 특성에 미치는 영향에 대하여 조사하였다. Plasma와 Heat Treatment를 동시에 처리한 소자에서 가장 우수한 전기, 광학적 특성을 나타냈으며, 기판처리를 하지 않은 경우는 전기, 광학적 특성은 크게 감소하였다.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2011.05a
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• pp.171-171
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• 2011

Atmospheric pressure- plasma enhanced chemical vapor deposition(AP-PECVD)Processes are recognized as promising and cost effective methods for wide-area coating on sheets of steel, glass, polymeric web, etc. In this study, $SiO_xC_y$ thin films were deposited by using AP-PECVD with a dielectric barrier discharge(DBD). The characteristic of $SiO_xC_y$ thin films were investigated as afunction of the HMDSO/O2/He flow rate. And the moisture permeability of $SiO_xC_y$ thin films was studied. The $SiO_xC_y$ thin films were characterized by the Fourier-transformed Infrared(FT-IR) spectroscopy and also investigated by X-ray photo electron spectroscopy(XPS), Auger Electron Spectroscopy(AES). The moisture permeability of $SiO_xC_y$ thin films was investigated by $H_2O$ permeability tester Detailed experimental results will be demonstrated through th present work.

• Journal of Surface Science and Engineering
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• v.27 no.1
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• pp.12-18
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• 1994

The plasma spray process was used to deposit coatings of $ZrO_2$-8wt%Y2O3 powders on mild steel sub-strate, and the characteristics of as-deposited and heat treated coatings have been investigated. Particulary, the variations of porosity, wear resistance, thermal barrier and thermal shock resistance in $ZrO_2$-8wt% $Y_2O_3$coatings after heat treatment under vacuum circumstance have been investigated. The porosity of the coating layer was increased with increased spray distance. In the case of the arc current of 450A and at the spray distance of 50mm, it was obtained the lowest amount of porosity. After heat treatment, the amount of porosity was found to be decreased, and the wear resistance, microhardness and thermal shock resistance were im-proved. However, the thermal barrier was decreased.

• Journal of Surface Science and Engineering
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• v.57 no.4
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• pp.348-354
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• 2024

Nanocrystalline zirconium nitride (ZrN) coatings were deposited by mid-frequency direct current sputtering (mfMS) with varying pulsed plasma parameters such as pulse frequency and duty cycle to understand the effect of pulsed plasma on the microstructure, residual stress and mechanical properties. The results show that, with the increasing pulse frequency and decreasing duty cycle, the coating morphology changed from a porous columnar to a dense structure, with finer grains. Mid-frequency magnetron sputtered ZrN coatings with pulse frequency of 30 kHz showed the highest both nanoindentation hardness of 16.3 GPa, and elastic modulus of 214.4 GPa. In addition, Effect of pulse frequency on a residual stress and average crystal grain sizes was also investigated.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.96-97
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• 2012

In nitride and oxide film deposition, sputtered metals react with nitrogen or oxygen gas in a vacuum chamber to form metal nitride or oxide films on a substrate. The physical properties of sputtered films (metals, oxides, and nitrides) are strongly influenced by magnetron plasma density during the deposition process. Typical target power densities on the magnetron during the deposition process are ~ (5-30) W/cm2, which gives a relatively low plasma density. The main challenge in reactive sputtering is the ability to generate a stable, arc free discharge at high plasma densities. Arcs occur due to formation of an insulating layer on the target surface caused by the re-deposition effect. One current method of generating an arc free discharge is to use the commercially available Pinnacle Plus+ Pulsed DC plasma generator manufactured by Advanced Energy Inc. This plasma generator uses a positive voltage pulse between negative pulses to attract electrons and discharge the target surface, thus preventing arc formation. However, this method can only generate low density plasma and therefore cannot allow full control of film properties. Also, after long runs ~ (1-3) hours, depends on duty cycle the stability of the reactive process is reduced due to increased probability of arc formation. Between 1995 and 1999, a new way of magnetron sputtering called HIPIMS (highly ionized pulse impulse magnetron sputtering) was developed. The main idea of this approach is to apply short ${\sim}(50-100){\mu}s$ high power pulses with a target power densities during the pulse between ~ (1-3) kW/cm2. These high power pulses generate high-density magnetron plasma that can significantly improve and control film properties. From the beginning, HIPIMS method has been applied to reactive sputtering processes for deposition of conductive and nonconductive films. However, commercially available HIPIMS plasma generators have not been able to create a stable, arc-free discharge in most reactive magnetron sputtering processes. HIPIMS plasma generators have been successfully used in reactive sputtering of nitrides for hard coating applications and for Al2O3 films. But until now there has been no HIPIMS data presented on reactive sputtering in cluster tools for semiconductors and MEMs applications. In this presentation, a new method of generating an arc free discharge for reactive HIPIMS using the new Cyprium plasma generator from Zpulser LLC will be introduced. Data (or evidence) will be presented showing that arc formation in reactive HIPIMS can be controlled without applying a positive voltage pulse between high power pulses. Arc-free reactive HIPIMS processes for sputtering AlN, TiO2, TiN and Si3N4 on the Applied Materials ENDURA 200 mm cluster tool will be presented. A direct comparison of the properties of films sputtered with the Advanced Energy Pinnacle Plus + plasma generator and the Zpulser Cyprium plasma generator will be presented.

• Journal of the Korean Institute of Telematics and Electronics A
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• v.32A no.11
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• pp.44-51
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• 1995

Homogeneous, compositionally graded, and superlattice-like silicon oxynitride(SiON) dielectric layers, with the refractive index varying from 1.46 to 2.05 as a function of film thickness, were grown by computer-controlled plasma-enhanced chemical vapor deposition (PECVD) using silane, nitrogen, and nitrous oxide reactant gases. An antireflection(AR) coating and thin-film electroluminescent(TFEL) devices with multiple dielectrics were designed and fabricated using real time control of reactant gases of the PECVD system.

• Proceedings of the Korean Society of Dyers and Finishers Conference
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• 2006.11a
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• pp.219-221
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• 2006

• Journal of Information Display
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• v.7 no.2
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• pp.1-5
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• 2006

The characteristics of MgO layer deposited under hydrogen atmosphere were investigated. Hydrogen gas was introduced during e-beam evaporation coating process of MgO layer and its effects on microstructure, cathode luminescence spectra, discharge voltages and effective yield of secondary electron emission were examined. The results indicated that the hydrogen influences the concentration and energy levels of defects in MgO layer, which in turn affects the luminance efficiency and discharge delays of the panels significantly.

• Proceedings of the KIEE Conference
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• 1989.07a
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• pp.335-337
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• 1989

The Charcteristics of the HCD ion plating system for TiN coating was Investigated. 1-V curvet of the HCD ( hollow cathode discharge ), radiation temperatures of the Ta tube and the Ti pool and the electron density and the temperature of the generated plasma are shown. The preferred orientation and the micro-hardness of coatings performed by HCD process are studied.