• 제목/요약/키워드: plasma chemistry

검색결과 764건 처리시간 0.031초

저출력 마이크로파 유도 플라스마 방출스펙트럼의 특성과 $CO_2$ 분석 (Characteristics of Low-power Microwave Induced Plasma Emission Spectrum and Detection of $CO_2$)

  • 노승만;박창준;김영상
    • 대한화학회지
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    • 제40권4호
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    • pp.235-242
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    • 1996
  • 기체 크로마토그래피와 쉽게 연결할 수 있는 Surfatron형의 MIP(Microwave Induced Plasma)용 cavity를 제작하고 헬륨, 아르곤, 질소 등을 플라스마 가스로 사용하여 플라스마를 생성시키고 스펙트럼을 비교하였다. 또한 헬륨과 아르곤, 질소에 미량의 CO2를 혼합하여 각 기체의 스펙트럼을 비교 분석하였으며, 제작한 MIP cavity가 질량분석기와 연결되었을 때 분자이온을 생성시킬 수 있는 이온원으로서의 가능성을 연구하였다. 헬륨과 아르곤 MIP는 높은 준안정 준위의 에너지를 가지기 때문에 분자들이 거의 다 깨어지므로 분자상태로 시료기체의 검출은 거의 불가능하였다. 그러나 질소는 다른 비활성기체에 비하여 낮은 준안정 준위의 어네지를 가지므로 검출하려는 기체성분이 상당부분 분자상태로 존재함을 알 수 있었다.

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Oxidative Etching of Imprinted Nanopatterns by Combination of Vacuum Annealing and Plasma Treatment

  • Park, Dae Keun;Kang, Aeyeon;Jeong, Mira;Lee, Jae-Jong;Yun, Wan Soo
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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    • pp.251.1-251.1
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    • 2013
  • Combination of oxidative vacuum annealing and oxygen plasma treatment can serve as a simple and efficient method of line-width modification of imprinted nanopatterns. Since the vacuum annealing and oxygen plasma could lead mass loss of polymeric materials, either one of the process can yield a narrowed patterns. However, the vacuum annealing process usually demands quite high temperatures (${\geq}300^{\circ}C$) and extended annealing time to get appreciable line-width reduction. Although the plasma treatment may be considered as an effective low temperature rapid process for the line-width reduction, it is also suffering for the lowered controllability on application to very fine patterns. We have found that the vacuum annealing temperature can be lowered by introducing the oxygen in the vacuum process and that the combination of oxygen plasma treatment with the vacuum annealing could yield the best result in the line-with reduction of the imprinted polymeric nanopatterns. Well-defined line width reduction by more than 50% was successfully demonstrated at relatively low temperatures. Furthermore, it was verified that this process was applicable to the nanopatterns of different shapes and materials.

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Surface modification of polypropylene membrane to improve antifouling characteristics in a submerged membrane-bioreactor: Ar plasma treatment

  • Zhou, Jin;Li, Wei;Gu, Jia-Shan;Yu, Hai-Yin
    • Membrane and Water Treatment
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    • 제1권1호
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    • pp.83-92
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    • 2010
  • To improve the antifouling characteristics of polypropylene hollow fiber microporous membranes in a submerged membrane-bioreactor for wastewater treatment, the surface-modification was conducted by Ar plasma treatment. Surface hydrophilicity was assessed by water contact angle measurements. The advancing and receding water contact angles reduced after the surface modification, and hysteresis between the advancing and receding water contact angles was enlarged after Ar plasma treatment due to the increased surface roughness after surface plasma treatment. After continuous operation in a submerged membrane-bioreactor for about 55 h, the flux recovery after water cleaning and the flux ratio after fouling were improved by 20.0 and 143.0%, while the reduction of flux was reduced by 28.6% for the surface modified membrane after 1 min Ar plasma treatment, compared to those of the unmodified membrane. Morphological observations showed that the mean membrane pore size after Ar plasma treatment reduced as a result of the deposition of the etched species; after it was used in the submerged membrane-bioreactor, the further decline of the mean membrane pore size was caused by the deposition of foulants. X-ray photoelectron spectroscopy and infrared spectroscopy confirmed that proteins and polysaccharide-like substances were the main foulants in the precipitate.

A Study of Atmospheric Plasma Treatment on Surface Energetics of Carbon Fibers

  • Park, Soo-Jin;Chang, Yong-Hwan;Moon, Cheol-Whan;Suh, Dong-Hack;Im, Seung-Soon;Kim, Yeong-Cheol
    • Bulletin of the Korean Chemical Society
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    • 제31권2호
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    • pp.335-338
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    • 2010
  • In this study, the atmospheric plasma treatment with $He/O_2$ was conducted to modify the surface chemistry of carbon fibers. The effects of plasma treatment parameters on the surface energetics of carbon fibers were experimentally investigated with respect to gas flow ratio, power intensity, and treatment time. Surface characteristics of the carbon fibers were determined by X-ray photoelectron spectroscopy (XPS), scanning electron microscope (SEM), Fourier transform infrared (FT-IR), Zeta-potential, and contact angle measurements. The results indicated that oxygen plasma treatment led to a large amount of reactive functional groups onto the fiber surface, and these groups can form together as physical intermolecular bonding to improve the surface wettability with a hydrophilic polymer matrix.

Polymerization of Tetraethoxysilane by Using Remote Argon/dinitrogen oxide Microwave Plasma

  • Chun, Tae-Il;Rossbach, Volker
    • 한국염색가공학회지
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    • 제21권3호
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    • pp.19-25
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    • 2009
  • Polymerization of tetraethoxysilane on a glass substrate was investigated by remote microwave plasma using argon with portions of nitrous oxide as carrier gas. Transparent layer like a thickness of 0.5 ${\mu}m$ 3 ${\mu}m$ were obtained, differing in chemical composition, depending on plasma power and treatment time as well as on ageing time. In general the milder the treatment and the shorter the ageing was, the higher was the content of organic structural elements in the layer. We have identified that the chemical structure of our samples composed of mainly Si O and Si C groups containing aliphatics, carbonyl groups. These results were obtained by X ray photon spectroscopy, Fourier transformed infrared spectroscopy, and scanning electron microscope combined with Energy dispersive X ray spectroscopy.

The Effect of Etching on Low-stress Mechanical Properties of Polypropylene Fabrics under Helium/Oxygen Atmospheric Pressure Plasma

  • Hwang, Yoon J.;An, Jae Sang;McCord, Marian G.;Park, Shin Woong;Kang, Bok Choon
    • Fibers and Polymers
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    • 제4권4호
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    • pp.145-150
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    • 2003
  • Polypropylene nonwoven fabrics were exposed to He/$O_2$ atmospheric pressure glow discharge plasma. Surface chemical analysis and contact angle measurement revealed the surface oxidation by formation of new functional groups after plasma treatment. Weight loss (%) measurement and scanning electron microscopy analysis showed a significant plasma etching effect. It was investigated in low-stress mechanical properties of the fabrics using Kawabata Evaluation System (KES-FB). The surface morphology change by plasma treatment increased surface friction due to an enhancement of fiber-to-fiber friction, resulting in change of other low-stress mechanical properties of fabric.

Effect of NH3 plasma on thin-film composite membrane: Relationship of membrane and plasma properties

  • Kim, Eun-Sik;Deng, Baolin
    • Membrane and Water Treatment
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    • 제4권2호
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    • pp.109-126
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    • 2013
  • Surface modification by low-pressure ammonia ($NH_3$) plasma on commercial thin-film composite (TFC) membranes was investigated in this study. Surface hydrophilicity, total surface free energy, ion exchange capacity (IEC) and zeta (${\zeta}$)-potentials were determined for the TFC membranes. Qualitative and quantitative analyses of the membrane surface chemistry were conducted by attenuated total reflectance Fourier transform infrared (ATR FT-IR) spectroscopy. Results showed that the $NH_3$ plasma treatment increased the surface hydrophilicity, in particular at a plasma treatment time longer than 5 min at 50 W of plasma power. Total surface free energy was influenced by the basic polar components introduced by the $NH_3$ plasma, and isoelectric point (IEP) was shifted to higher pH region after the modification. A ten (10) min $NH_3$ plasma treatment at 90 W was found to be adequate for the TFC membrane modification, resulting in a membrane with better characteristics than the TFC membranes without the modification for water treatment. The thin-film chemistry (i.e., fully-aromatic and semi-aromatic nature in the interfacial polymerization) influenced the initial stage of plasma modification.

Enhancement of Size Gradient of Imprinted Nanopattern by Plasma Etching under a Nonuniform Magnetic Field

  • Lim, Jonghwan;Kim, Soohyun;Kim, Da Sol;Jeong, Mira;Lee, Jae-Jong;Yun, Wan Soo
    • Applied Science and Convergence Technology
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    • 제24권5호
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    • pp.184-189
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    • 2015
  • We report a simple way to enhance the size gradient of an imprinted nanopattern through oxygen plasma etching under a nonuniform magnetic field. A sample substrate was placed next to a magnet, and then a nonuniform magnetic field condition was formed around the sample. Using oxygen plasma etching, a line pattern having an initial width of 273 nm was gradually modified from 248 nm at one end to 182 nm at the other end. Controlling the arrangement of the magnet and sample, we could induce a triangular shape size gradient. We verified that the gradually modified nanopatterns we produced are applicable to continual optical property control, showing a possibility to be utilized for optical components such as gratings and polarizers.

PACVD of Plasma Polymerized Organic Thin Films and Comparison of their Electrochemical Properties

  • I.S. Bae;S.H. Cho;Kim, M.C.;Y.H. Roh;J.H. Boo
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2003년도 춘계학술발표회 초록집
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    • pp.53-53
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    • 2003
  • Plasma polymerized organic thin films were deposited on Si(100) glass and metal substrates using thiophene and ethylcyclohexane precursors by PECVD method. In order to compare electrochemical properties of the as-grown thin films, the effects of the RF plasma power in the range of 30~100 W. AFM showed that the polymer films with smooth surface and sharp interface could be grown under various deposition conditions. Impedance analyzer was utilized for the determination of I-V curve for leakage current density and C-V for dielectric constants, respectively. To obtain C-V curve, we used a MIM structure of metal(Al)-insulator(plasma polymerized thin film)-metal(Pt) structure. Al as the electrode was evaporated on the thiophene films that grew on Pt coated silicon substrates, and the dielectric constants of the as-grown films were then calculated from C- V data measured at 1MHz. From the electrical property measurements such as I-V and C-V characteristics, the minimum dielectric constant and the best leakage current of thiophene thin films were obtained to be about 3.22 and $1{\;}{\times}10^{-11}{\;}A/cm^2$. However, in case of ethylcyclohexane thin films, the minimum dielectric constant and the best leakage current were obtained to be about 3.11 and $5{\;}{\times}10^{-12}{\;}A/cm^2$.

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질소 플라즈마 표면처리가 쌀겨 기반 활성탄소의 전기 이중층 커패시터 성능에 미치는 영향 (Effect of Nitrogen Plasma Surface Treatment of Rice Husk-Based Activated Carbon on Electric Double-Layer Capacitor Performance)

  • 이란은;곽철환;이혜련;김석진;이영석
    • 공업화학
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    • 제33권1호
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    • pp.71-77
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    • 2022
  • 바이오매스 활용을 높이기 위하여, 쌀겨 기반 활성탄소(RHAC)를 제조한 뒤 질소 플라즈마 표면처리를 수행하여 전기이중층 커패시터(EDLC) 성능을 고찰하였다. 질소 플라즈마 표면처리를 통하여, RHAC 표면에 최대 2.17%의 질소가 도입되었으며 특히, 5 min 동안 반응한 샘플의 경우 pyrrolic/pyridine계 N 작용기의 형성이 우세하였다. 또한, 실리카 제거에 의해 쌀겨 기반 탄소재에 메조기공이 형성되었고 질소 플라즈마 표면처리에 의해 탄소재 표면 거칠기가 증가하여 미세기공이 많이 형성되는 것을 확인할 수 있었다. 순환전압전류법 측정 실험으로부터, 5 mV/s의 전압 주사 속도에서 질소 플라즈마 처리된 RHAC의 비정전용량은 최대 200 F/g로, 미처리 RHAC (111 F/g)에 비교하여 80.2% 향상된 값을 나타내었다. 이러한 결과는 질소 플라즈마 표면처리로 인해 탄소재 표면에 도입된 pyrrolic/pyridine계 질소 작용기 도입과 탄소재 표면 미세기공 부피 향상으로 인한 시너지 효과인 것으로 판단된다. 본 연구는 폐기 자원을 재활용하고, 플라즈마 표면처리법을 통해 이종원소 도입을 한다는 점에서 환경적으로 긍정적인 영향을 미칠 것으로 사료된다.