• 한국정보디스플레이학회:학술대회논문집
• /
• 2004.08a
• /
• pp.988-991
• /
• 2004

In the present investigation, we tried AR coating simulation by using the "Essential Macleod optical coating design and analysis" program. After various run of the program we selected appropriate materials which have specific refractive indices and for that thickness was optimized to get the low reflectance. By comparing the simulated results for the different materials,we found that $SiO_2$ and TiN are the appropriate materials for this Flat panel device (FPD) application. Thin films of these materials were deposited using RF magnetron sputtering and Inductively Coupled Plasma Chemical Vapour Deposition (ICPCVD) methods on Polyethyleneterephthalate (PET) substrates. Spectroscopic ellipsometer (SE MF-1000) and UV-Vis spectrophotometer (SCINCO) were used for the optical characterization. The obtained experimental results are in good agreement with the simulation results.

• 한국정보디스플레이학회:학술대회논문집
• /
• 2004.08a
• /
• pp.223-226
• /
• 2004

MgO thin films were deposited bye-beam evaporation on $SiO_2$/Si wafers for the application of a protective layer in alternating current plasma display panels (AC-PDPs). Three different MgO sources, single crystal, melted polycrystal and sintered polycrystal, were used to find out the change of the properties of MgO protective layer depending on the source type. The properties of MgO thin films such as density, orientation and surface morphology were influenced by the source type. MgO thin films deposited with the melted polycrystal source had the highest density with the highest (100) preferred orientation, whereas the films deposited with the sintered polycrystal source had the lowest density with less preferred orientation. Such a result seems to be originated from the different mobility of adatoms on the surface of the deposited MgO thin films. Different microstructures of MgO thin films deposited even in the same deposition condition were observed depending on the MgO source type, resulting in different discharge characteristics.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2009.06a
• /
• pp.118-119
• /
• 2009

This paper presents the feature profile evolution silicon deep trench etching, which is very crucial for the commercial wafer process application. The silicon deep trenches were etched with the SF6 gas & Hbr gas based process recipe. The optimized silicon deep trench process resulted in vertical profiles (87o~90o) with loading effect of < 1%. The process recipes were developed for the silicon deep trench etching applications. This scheme provides vertically profiles without notching of top corner was observed. In this study, the production of SF6 gas based silicon deep trench etch process much more strongly than expected on the basis of Hbr gas trench process that have been investigated by scanning electron microscope (SEM). Based on the test results, it is concluded that the silicon deep trench etching shows the sufficient profile for practical MOS FET silicon deep trench technology process.

• Asian-Australasian Journal of Animal Sciences
• /
• v.26 no.1
• /
• pp.108-115
• /
• 2013

The effects of dietary Coptis chinensis herb extract (CHE) on growth performance, blood characteristics, nutrient digestibility and meat quality of growing-finishing pigs were investigated in an 18-wk feeding trial. A total of 36 Landrace${\times}$Yorkshire-Duroc pigs with an initial body weight of $20{\pm}1.0$ kg were randomly assigned to 3 dietary treatments with 6 replications per treatment and 2 pigs per pen. A maize-soybean meal-based diet was formulated as a control diet and other treatment diets were supplemented with 0.5, or 1 g CHE/kg, respectively. After the feeding period, meat samples were collected from those pigs that had reached the market BW. During the experimental periods, growth performance and apparent total tract digestibility of dry matter and nitrogen were unaffected (p>0.05) by the dietary supplementation of CHE. Plasma erythrocytes counts were increased (Linearly, p<0.05) in response to application of CHE at the end of the experiment. Moreover, pigs fed the CHE diets had better (p<0.05) meat color, pH and water holding capacity (WHC) than pigs fed the control diet. In conclusion, dietary supplementation with CHE could increase blood erythrocytes counts and improve meat quality in growing-finishing pigs but not improve growth performance.

• BMB Reports
• /
• v.40 no.4
• /
• pp.532-538
• /
• 2007

Mouse ficolin A is a plasma protein with lectin activity, and plays a role in host defense by binding carbohydrates, especially GlcNAc, on microorganisms. The ficolin A subunit consists of an N-terminal signal peptide, a collagen-like domain, and a C-terminal fibrinogen-like domain. In this study, we show that ficolin A can be synthesized and oligomerized in a cell and secreted into culture medium. We also identify a functionally relevant signal peptide of ficolin A by using MS/MS analysis to determine the N-terminal sequence of secreted ficolin A. When the signal peptide of mouse ficolin A was fused with enhanced green fluorescent protein (EGFP), EGFP was released into HEK 293 cell medium, suggesting that the signal peptide can efficiently direct ficolin A secretion. Moreover, our results suggest that the signal peptide of ficolin A has potential application for the production of useful secretory proteins.

• Journal of the Korean Society for Heat Treatment
• /
• v.14 no.3
• /
• pp.151-154
• /
• 2001

$TiO_2$ thin film has wide application because of its high capacitanca, reflection, and good transmissivity in visible range. $TiO_2$ thin film can be made by thermal deposition method, reactive evaporation method, activated reactive evaporation(ARE) method. In the case of thermal deposition, the oxygen deficiency can occur because the melting point of Ti is very high. While in the case of reactive evaporation, high density $TiO_2$ can not be made, because reactive gas($O_2$) and evaporated material(Ti) are not fully combined, activated reactive evaporation, $TiO_2$ is easily deposited at lower gas pressure compared with reactive evaporation because the ionized reactive gas is made by plasma. Therefore, activated reactive evaporation is very useful to deposit the material having the high melting point. In this work, we formed $TiO_2$ thin film by activated reactive evaporation method. The surface of $TiO_2$ thin film was analyzed by X-ray photoelectron spectroscopy. The surface morphology which was analyzed by atomic force microscopy(AFM) shows that feature of the film surface is uniform. The dielectric capacitance, withstanding voltage were $600{\mu}F/cm^2$, 0.4V respectively. In further work, we can increase the withstanding voltage by improving the deposition parameter of substrates.

• Korean Journal of Materials Research
• /
• v.28 no.4
• /
• pp.247-253
• /
• 2018

We examined the characteristics of indium tin zinc oxide (ITZO) thin film transistors (TFTs) on polyimide (PI) substrates for next-generation flexible display application. In this study, the ITZO TFT was fabricated and analyzed with a SiOx/SiNx gate insulator deposited using plasma enhanced chemical vapor deposition (PECVD) below $350^{\circ}C$. X-ray photoelectron spectroscopy (XPS) and secondary ion mass spectroscopy (SIMS) results revealed that the oxygen vacancies and impurities such as H, OH and $H_2O$ increased at ITZO/gate insulator interface. Our study suggests that the hydrogen related impurities existing in the PI and gate insulator were diffused into the channel during the fabrication process. We demonstrate that these impurities and oxygen vacancies in the ITZO channel/gate insulator may cause degradation of the electrical characteristics and bias stability. Therefore, in order to realize high performance oxide TFTs for flexible displays, it is necessary to develop a buffer layer (e.g., $Al_2O_3$) that can sufficiently prevent the diffusion of impurities into the channel.

• Proceedings of the Materials Research Society of Korea Conference
• /
• 2003.03a
• /
• pp.213-213
• /
• 2003

저온소성 가능하며 저 융점유리인 고 투과율의 Pb-free 조성으로서 PDP(Plasma Display panel)의 투명유전체에 응용하고자 P$_2$O$_{5}$-ZnO-RO 계인 인산염 유리의 열적, 광학적성질을 연구하였다. 이 삼원계인 인산염유리계를 PDP의 투명 유전체에 응용하기에는 열적특성에서 문제점이 제기되어, (30-50)P$_2$O$_{5}$ - (20-50)ZnO - (15-45) RO (mol%)계에 유리망목형성제인 A1$_2$O$_3$, SiO$_2$, B$_2$O$_3$등을 첨가하여 열적성질 및 소성후 투광성 등을 조사하였다. 열적특성은 DTA와 TGA를 이용하여 유리전이점(Tg) 및 선팽 창계수(CTE)와 연하점(Ts) 을 측정하였으며, 투광성은 500-58$0^{\circ}C$에서 1시간동안 소성하여 UV-visible spectrometer을 이용하였다 그 결과로, 380-46$0^{\circ}C$의 Tg와 8-$10^{-6}$K의 CTE 및 70-80%의 광투과율을 나타내었다. 이러한 결과는 P$_2$O$_{5}$-ZnO-RO계는 PDP의 투명유전체에 적용하기에는 상당히 높거나 낮은 Tg를 형성하였지만 유리형성제를 수 mol%을 첨가함으로써 적절한 Tg점과 높은 투과율을 얻을 수 있었다.수 있었다.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2013.02a
• /
• pp.93-93
• /
• 2013

In recent years, multifunctional ternary nitride thin films have received extenstive attention due to its versatility in many applications. In particular, noble metal based ternary nitride thin films showed a promising properties in the application of Multifunctional heating resistor films because its good electrical properties and excellent resistance against oxidation and corrosion. In this study, we prepared multifunctional noble metal based ternary nitride thin films by atomic layer deposition (ALD) and plasma-enhanced ALD (PEALD) method. ALD and PEALD techniques were used due to their inherent merits such as a precise composition control and large area uniformity, which is very attractive for preparing multicomponent thin films on large area substrate. Here, we will demonstrate the design concept of multifunctional noble metal based ternary thin films. And, the relationship between microstructural evolution and electrical resistivity in noble metal based ternary thin films will be systemically presented. The useful properties of noble metal based ternary thin films including anti-corrosion and anti-oxidation will be discussed in terms of hybrid functionality.

• Proceedings of the Korean Radioactive Waste Society Conference
• /
• 2004.02a
• /
• pp.130-139
• /
• 2004

The cladding materials remaining after reprocessing process of the nuclear fuel, generally called as hulls, are classified as a high-level radioactive waste. They are usually packaged in the container for disposal after being compacted, melted, or solidified into the matrix. The efforts to fabricate a better ingot for a more favorable disposal to the environment have failed due to the technical difficulties encountered in the chemical decontamination method. In the early 1990s, the accumulation of radio-chemical data on hulls and the advent of new technology such as a laser or plasma have made the pre-treatment of the hulls more efficient. This paper summarizes the information regarding the radio-chemical analysis of the hull through a literature survey and determines the characteristics of the hull and depth profile of the radio-nuclides within the hull thickness. The feasibility study was carried out to evaluate the reduction of the radioactivity by peeling off the surface of the hull with the application of laser technology.