• Title/Summary/Keyword: plasma application

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Design of Snubber Capacitor for Equalization of Voltage Sharing in Series Connected SiC MOSFETs

  • Min, Juhwa;Suh, Yongsug
    • Proceedings of the KIPE Conference
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    • 2017.07a
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    • pp.188-189
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    • 2017
  • There has been a growing demand for power semiconductor switches equipped with high-voltage blocking capability of kV range and fast-switching characteristics of ns range in various plasma application. This paper investigates the application of SiC MOSFETs in the particular plasma application which requires the blocking voltage of 4.5kV and the switching transient time of less than 100ns. In order to meet the required blocking voltage, the series connection of multiple SiC MOSFETs is adopted in this paper. Also, snubber capacitors are employed to equalize the voltage sharing among the series connected SiC MOSFETs. The simulation and experimental result successfully verifies the application of SiC MOSFETs and snubber capacitors in the plasma application requiring high-voltage and fast-switching load dynamics.

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Alteration of Hydroxyapatite Surface after Tooth Bleaching with Nonthermal Atmospheric Pressure Plasma

  • Nam, Seoul Hee;Lee, Hae June;Hong, Jin Woo;Kim, Gyoo Cheon
    • International Journal of Oral Biology
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    • v.39 no.4
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    • pp.187-192
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    • 2014
  • Nonthermal atmospheric pressure plasma has attracted great interest for biomedical applications. The plasma consists of charged particles, radicals, and a strong electric field as the fourth state of matter. This study evaluated the change in the surface roughness after tooth bleaching by plasma in combination with a low concentration (15%) of carbamide peroxide, specifically whether the application of plasma produced detriments, such as demineralization and structural change, with the goal of efficient and safe tooth bleaching. After being combined with plasma and 15% carbamide peroxide, the hydroxyapatite surface was significantly smoother with a low roughness average value. Tooth bleaching with 15% carbamide peroxide alone produced an irregular surface and increased the surface roughness with high roughness average value. Tooth bleaching with plasma resulted in no significant variations in hydroxyapatite in terms of change in surface roughness and surface topography. The application of tooth bleaching with plasma is not deleterious to dental hard tissue, implicating it as a safe tooth bleaching technique.

A Study on the Plasma Nitriding Application for the Durability Improvement of the Exhaust Decoupler (배기계 디커플러의 내구 향상을 위한 플라즈마 질화에 관한 연구)

  • Hur, Deog-Jae;Kim, Sang-Sik;Chung, Tae-Jin;Kim, Do-Hoon
    • Transactions of the Korean Society of Automotive Engineers
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    • v.14 no.3
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    • pp.157-163
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    • 2006
  • This paper described the process of improving durability performance of the exhaust decoupler by the plasma nitriding. The properties of plasma nitriding treatment of AIS1304 stainless steel were tested using specimens before applying plasma nitriding to a mesh ring. In order to analyses the effect of plasma nitriding treatment on the mechanical properties, SEM(Scanning Electron Microscopes), roughness and hardness tester were used. Based on specimen plasma nitriding, we could find appropriate condition for application to the mesh ring of decoupler. To confirm the improved durability performance, we compared the number of cycles, which reaches to fracture, of the nitrided decoupler and that of the unnitrided decoupler by the bending cyclic test. In this test, the durability and wear resistance of the mesh ring are significantly improved by plasma nitriding treatment.

A study on fast langmuir probe driving circuit for measurement of plasma parameter and its application (플라즈마 파라메타 측정용 고속 langmuir프로브 구동회로 실현 및 적용)

  • 신중흥;고태언;김두환;박정후
    • Electrical & Electronic Materials
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    • v.9 no.5
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    • pp.506-511
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    • 1996
  • This paper deals with an inexpensive, simple and fast Langmuir probe sweeping circuit and its application. This sweeper completes a probe trace in a 1 ms order. Futhermore, the circuit drives a maximum probe voltage of $\pm$30V and has a maximum probe current capability of a few amperes. The plasma parameters are successfully determined using the fast Langmuir probe method.

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Synthesis of Graphene by Plasma Enhanced Chemical Vapor Deposition and Its transfer for Device Application

  • Seo, Dong-Ik;Han, Jeong-Yun;Kim, Eon-Jeong;Park, Wan-Jun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.277-277
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    • 2010
  • In this report, we present a very effective growing method of graphene using plasma enhanced chemical vapor deposition(PECVD). The graphene is successfully grown on copper substrate. Low temperature growing is obtained with methane and hydrogen plasma. The graphene layers are analyzed by Raman spectroscopy and atomic force microscope. We also provide a transfer technique of graphene layer onto silicon substrate to build up various kinds of application devices.

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High Luminance $Zn_2SiO_4:Mn$ Phosphors Prepared by Homogeneous Precipitation Method

  • Sohn, Kee-Sun;Choi, Yoon-Young;Jung, Ha-Kyun;Park, Hee-Dong
    • 한국정보디스플레이학회:학술대회논문집
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    • 2000.01a
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    • pp.31-32
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    • 2000
  • $Zn_2SiO_4:Mn$ phosphors have been recently spotlighted as a green component for plasma TV application. Commercial phosphors such as P1 and P39 have been known to be a very efficient green light emitter for lamp and CRT application. Unfortunately, such commercial phosphors are not suitable for the plasma TV application as both the emission intensity and the decay time do not meet the requirement for plasma TV. The present investigation aims at improving the existing $Zn_2SiO_4:Mn$ phosphors for the purpose of adapting them to PDP application.

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Cellular and Molecular Responses of a Filamentous Fungus Neurospora Crassa to Non-thermal Plasma at Atmospheric Pressure

  • Park, Gyung-Soon;Ryu, Young-Hyo;Hong, Young-June;Uhm, Han-Sup;Choi, Eun-H.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.476-476
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    • 2012
  • Although plasma is an efficient means of microbial sterilization, mechanism of plasma effect on microorganisms still needs to be clarified. In addition, a limited number of studies are available on eukaryotic microorganisms such as yeast and fungi in relation to plasma application. Thus, we investigated cellular and molecular aspects of plasma effects on a filamentous fungus, Neurospora crassa by making use of argon plasma jet at atmospheric pressure. The viability and cell morphology of N. crassa spores exposed to plasma were both significantly reduced depending on the exposure time when treated in water. The intracellular genomic DNA content was dramatically reduced in fungal tissues after a plasma treatment and the transcription factor tah-3 was found to be required for fungal tolerance to a harsh plasma environment.

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E. coli Disinfection Using a Multi Plasma Reactor (멀티 플라즈마 반응기를 이용한 E. coli 소독)

  • Kim, Dong-Seog;Park, Young-Seek
    • Journal of Environmental Health Sciences
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    • v.39 no.2
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    • pp.187-195
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    • 2013
  • Objectives: For the practical application of the dielectric barrier discharge plasma reactor, a plasma reactor able to manage large volumes of water is needed. This study investigated the possibility of the practical application of a multi-plasma reactor which is a scaled-up version of a single plasma reactor. Methods: The multi-plasma reactor consists of several high-voltage transformers and plasma modules (discharge, ground electrodes and quartz dielectric tubes). The effects of water characteristics such as voltage (30-120 V), air flow rate (1-5 l/min), number of high-voltage transformers and plasma modules, and water quality on Escherichia coli (E. coli) disinfection and decrease of COD and $UV_{254}$ absorbance were investigated. Results: The experimental results showed that at a voltage of over 80 V, most of the E. coli were disinfected within 90 seconds. E. coli inactivation was not affected by the air flow rate. E. coli disinfection in the multiplasma process showed the traditional log-linear form of the disinfection curve. E. coli inactivation performance by transformer 3-Reactor 5 and transformer 3-Reactor 3 were similar. The disinfection performance of the UV process was affected by artificial sewage water. However, the plasma process was less affected by the artificial sewage within the standards for effluent water quality. Conclusions: Disinfection performance with several low voltages and plasma modules of three to five in number applied to the plasma process was higher than that concentrating a small amount of high voltage through a single plasma reactor. Removal of COD, $UV_{254}$ absorbance, and E. coli disinfection with the plasma process were better than with the UV process.

The Application of Plasma Nitrocarburizing and Plasma Post Oxidation Technology to the Automobile Engine Parts Shafts (자동차 엔진부품용 Shaft에 플라즈마 산질화기술 적용)

  • Jeon, Eun-Kab;Park, Ik-Min;Lee, In-Sup
    • Korean Journal of Materials Research
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    • v.16 no.11
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    • pp.681-686
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    • 2006
  • Plasma nitrocarburising and plasma post oxidation were performed to improve the wear and corrosion resistance of S45C and SCM440 steel by a plasma ion nitriding system. Plasma nitrocarburizing was conducted for 3h at $570^{\circ}C$ in the nitrogen, hydrogen and methane atmosphere to produce the ${\varepsilon}-Fe_{2-3}$(N, C) phase. Plasma post oxidation was performed on the nitrocarburized samples with various oxygen/hydrogen ratio at constant temperature of $500^{\circ}C$ for 1 hour. The very thin magnetite ($Fe_3O_4$) layer $1-2{\mu}m$ in thickness on top of the $15{\sim}25{\mu}m$ ${\varepsilon}-Fe_{2-3}$(N, C) compound layer was obtained by plasma post oxidation. A salt spray test and electrochemical testing revealed that in the tested 5% NaCl solution, the corrosion characteristics of the nitrocarburized compound layer could be further improved by the application of the superficial magnetite layer. Throttle valve shafts were treated under optimum plasma processing conditions. Accelerated life time test results, using throttle body assembled with shaft treated by plasma nitrocarburising and post oxidation, showed that plasma nitrocarburizing and plasma post oxidation processes could be a viable technology in the very near future which can replace $Cr^{6+}$ plating.

LASER CONSOLIDATION OF THE PLASMA COATED CHROME CARBIDE LAYER (레이저를 이용한 크롬카바이드 플라즈마 용사층의 특성향상)

  • An, Hui-Seok;Lee, Chang-Hui
    • Korean Journal of Materials Research
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    • v.7 no.3
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    • pp.203-212
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    • 1997
  • This paper evaluated the feasibility of laser consolidation for improving the properties of the plasma coated layer, Further, the mechanim of the degradation sequence of the chrome carbide layer applied on the turbine blades was postualted. The laser consolidation could be successfully applied for improcing the surface properties of the plasma coated blade, if a proper condition was carefully chosen. The consolidated layer had erosion & corrosion resistance and vond strength superiro to those of the as-plasma coated layer. The properties of the consolidated layer were strongly dependent upon the degree of dilution, especially on the Fe pickup from the substrate. The degradation of the plasma coating layer was thought to be a reault of the repeating action of the solid particle erosion, corrosion penetration through the pores and oxide films formed along the interlayer surface and impact spalling.

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