• Title/Summary/Keyword: pixel matrix

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Fabrication of Precise Patterns using a Laser Beam Expanding Technique in Nano-Replication Printing (nRP) Process (레이저 빔 단면확대를 이용한 나노 복화(複畵)공정의 패턴 정밀도 향상에 관한 연구)

  • Park Sang Hu;Lim Tae Woo;Yang Dong-Yol;Yi Shin Wook;Kong Hong Jin
    • Journal of the Korean Society for Precision Engineering
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    • v.22 no.1
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    • pp.175-182
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    • 2005
  • A laser beam expanding technique is employed to fabricate precise nano-patterns in a nano-replication printing (nRP) process. In the nRP process, some patterns can be fabricated in the range of several microns inside on a polymerizable resin by using a volume-pixel (voxel) matrix that is transformed from a two-tone bitmap figure file. The liquid monomers are polymerized by means of a two-photon-absorption (TPA) phenomenon that is induced by a femtosecond (fs)-pulse laser. The yokels are generated consecutively to merge into adjoining yokels in the process of fabricating a pattern. The resolution of a fabricated pattern can be obtained under the diffraction limit of a laser beam by the two-photon absorbed polymerization (TPP). In this work, a beam-expanding technique has been applied to enlarge a working area and to fabricate precise patterns. Through this work, a working area is expanded by the technique as much as 2.5 times compared with a case of without a beam expanding technique, and precision of outside patterns is improved.

Refinements of Multi-sensor based 3D Reconstruction using a Multi-sensor Fusion Disparity Map (다중센서 융합 상이 지도를 통한 다중센서 기반 3차원 복원 결과 개선)

  • Kim, Si-Jong;An, Kwang-Ho;Sung, Chang-Hun;Chung, Myung-Jin
    • The Journal of Korea Robotics Society
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    • v.4 no.4
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    • pp.298-304
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    • 2009
  • This paper describes an algorithm that improves 3D reconstruction result using a multi-sensor fusion disparity map. We can project LRF (Laser Range Finder) 3D points onto image pixel coordinatesusing extrinsic calibration matrixes of a camera-LRF (${\Phi}$, ${\Delta}$) and a camera calibration matrix (K). The LRF disparity map can be generated by interpolating projected LRF points. In the stereo reconstruction, we can compensate invalid points caused by repeated pattern and textureless region using the LRF disparity map. The result disparity map of compensation process is the multi-sensor fusion disparity map. We can refine the multi-sensor 3D reconstruction based on stereo vision and LRF using the multi-sensor fusion disparity map. The refinement algorithm of multi-sensor based 3D reconstruction is specified in four subsections dealing with virtual LRF stereo image generation, LRF disparity map generation, multi-sensor fusion disparity map generation, and 3D reconstruction process. It has been tested by synchronized stereo image pair and LRF 3D scan data.

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Calibration Technique for Freehand 3-D Ultrasound System (3차원 초음파 시스템의 캘리브레이션 방법)

  • Hwang, Myun Joong
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.14 no.12
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    • pp.6066-6071
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    • 2013
  • This paper proposes a calibration method for a freehand 3-D ultrasound system in medical robotic research. The calibration block with six wires was designed to set the fixed target points. The positions of the ultrasound probe and calibration block were measured using an optical tracker. The relationship between the position of the ultrasound probe and the pixel coordinates in the images was derived using a calibration process. The scaling matrix was also calculated. The experimental results showed that the proposed method could find solutions using a simple least square method from one or multiple ultrasound images.

Evaluation of Angle Optimization on Edge Test Device Setting in Modulation Transfer Function (변조전달함수 방법에서 엣지 장치 설정에 대한 각도 최적화 평가)

  • Min, Jung-Whan;Jeong, Hoi-Woun
    • Journal of radiological science and technology
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    • v.43 no.1
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    • pp.15-21
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    • 2020
  • This study was purpose to evaluation of Modulation Transfer Function in Measurements by using the International electrotechnical commission standard(IEC 62220-1) which were edge device each angle by using edge method. In this study was Aero(Konica, Japan) image receptor which is a indirect Flat panel detector(FPD) was used. The size of matrix 1994 × 2430 (14"× 17" inch) which performed 12 bit processing and pixel pitch is 175 ㎛. The results of shown as MTF measurements at IEC standard. The amount of data seemed reasonable and at an MTF value of 0.1 the spatial frequencies were 2.56 cycles/mm at an angle of 2.4°. MTF value of 0.5 the spatial frequencies were 1.32 cycles/mm at an angle of 2.4°. This study were to evaluate MTF by setting each angle 2.0°~2.8° degrees the most effective optimal edge angle and to suggest the quantitative methods of measuring by using IEC.

Novel Development of Electrowetting Display

  • Cheng, W.Y.;Chang, Y.P.;Lo, K.L.;Lee, D.W.;Lee, H.H.;Kuo, S.W.;Hsiao, C.C.;Chen, K.T.;Tsai, Y.H.;Chen, Y.C.;Fuh, S.Y.;Wang, C.W.;Su, P.J.;Chiu, W.W.;Lee, K.C.;Shiu, J.W.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2008.10a
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    • pp.1240-1243
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    • 2008
  • The 6- inch electrowetting display (EWD) can be successfully developed by ink jet printing (IJP) technique. Due to the drop-on-demand characteristic of IJP technology, colored oil can be precisely dosed into the unit pixel. Here, we present the active matrix EWD in this article. By adopting this technique to dose different colored oils, single layer Multi-color EWD without adopting color filter can be achieved in the future.

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New Process Development for Hybrid Silicon Thin Film Transistor

  • Cho, Sung-Haeng;Choi, Yong-Mo;Jeong, Yu-Gwang;Kim, Hyung-Jun;Yang, Sung-Hoon;Song, Jun-Ho;Jeong, Chang-Oh;Kim, Shi-Yul
    • 한국정보디스플레이학회:학술대회논문집
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    • 2008.10a
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    • pp.205-207
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    • 2008
  • The new process for hybrid silicon thin film transistor (TFT) using DPSS laser has been developed for realizing both low-temperature poly-Si (LTPS) TFT and a-Si:H TFT on the same substrate as a backplane of active matrix liquid crystal display. LTPS TFTs are integrated on the peripheral area of the panel for gate driver integrated circuit and a-Si:H TFTs are used as a switching device for pixel in the active area. The technology has been developed based on the current a-Si:H TFT fabrication process without introducing ion-doping and activation process and the field effect mobility of $4{\sim}5\;cm^2/V{\cdot}s$ and $0.5\;cm^2/V{\cdot}s$ for each TFT was obtained. The low power consumption, high reliability, and low photosensitivity are realized compared with amorphous silicon gate driver circuit and are demonstrated on the 14.1 inch WXGA+ ($1440{\times}900$) LCD Panel.

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The Software Development for Diffusion Tensor Imaging

  • Song, In-Chan;Chang, Kee-Hyun;Han, Moon-Hee
    • Proceedings of the KSMRM Conference
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    • 2001.11a
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    • pp.112-112
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    • 2001
  • Purpose: We developed the software for diffusion tensor imaging and evaluated its feasibility in norm brains. Method: Five normal volunteers, aged from 25 to 29 years, were examined on a 1.5 T MR system. the diffusion tensor pulse sequence used a SE-EPI with 6 diffusion gradie directions of (1, 1, 0), (-1, 1,0), (1, 0, 1), (-1, 0, 1), (0, 1, 1), (0, 1, -1) and also with no diffusion gradient. A b-factor of 500 sec/mm2 was used. Measurement parameter were as follows; TR/TE=10000 ms/99 ms, FOV=240 mm, matrix=128$\times$128, slice thickness/gap=6 mm/0 mm, bandwidth=91 kHz and the number of total slices=20. Four repeated axial diffusion images were averaged for diffusion tensor imaging. A total scan 11 of 4 min 30 sec was used. Six full diffusion tensor components of Dxx, Dyy, Dzz, Dxy, Dxz and Dyz were obtained using two-point linear regression model from 7 diffusion-weight images at each pixel and fractional anisotropy and lattice index images was estimated fr their eigenvectors and eigenvalues. Our program was written on a platform of IDL. W evaluated the qualities of fractional anisotropy and lattice index images of normal brains a knew whether our software for diffusion tensor imaging may be feasible.

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Image Coding by Block Based Fractal Approximation (블록단위의 프래탈 근사화를 이용한 영상코딩)

  • 정현민;김영규;윤택현;강현철;이병래;박규태
    • Journal of the Korean Institute of Telematics and Electronics B
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    • v.31B no.2
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    • pp.45-55
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    • 1994
  • In this paper, a block based image approximation technique using the Self Affine System(SAS) from the fractal theory is suggested. Each block of an image is divided into 4 tiles and 4 affine mapping coefficients are found for each tile. To find the affine mapping cefficients that minimize the error between the affine transformed image block and the reconstructed image block, the matrix euation is solved by setting each partial differential coefficients to aero. And to ensure the convergence of coding block. 4 uniformly partitioned affine transformation is applied. Variable block size technique is employed in order to applynatural image reconstruction property of fractal image coding. Large blocks are used for encoding smooth backgrounds to yield high compression efficiency and texture and edge blocks are divided into smaller blocks to preserve the block detail. Affine mapping coefficinets are found for each block having 16$\times$16, 8$\times$8 or 4$\times$4 size. Each block is classified as shade, texture or edge. Average gray level is transmitted for shade bolcks, and coefficients are found for texture and edge blocks. Coefficients are quantized and only 16 bytes per block are transmitted. Using the proposed algorithm, the computational load increases linearly in proportion to image size. PSNR of 31.58dB is obtained as the result using 512$\times$512, 8 bits per pixel Lena image.

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Model-based subpixed motion estimation for image sequence compression (도영상 압축을 위한 모델 기반 부화소 단위 움직임 추정 기법)

  • 서정욱;정제창
    • Journal of the Korean Institute of Telematics and Electronics S
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    • v.35S no.1
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    • pp.130-140
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    • 1998
  • This paper presents a method to estimate subpixel accuracy motion vectors using a mathermatical model withoug interpolation. the proposed method decides the coefficients of mathematical model, which represents the motion vector which is achieved by full search. And then the proposed method estimates subpixel accuracy motion vector from achieved mathematical model. Step by step mathematical models such as type 1, type 2, type 3, modified bype 2, modified type 3, and Partial Interpolation type 3 are presented. In type 1, quadratic polynomial, which has 9 unknown coefficients and models the 3by 3 pixel plane, is used to get the subpixel accuracy motion vectors by inverse matrix solution. In type 2 and 3, each quadratic polynomial which is simplified from type 1 has 5 and 6 unknown coefficients and is used by least square solution. Modified type 2 and modified type 3 are enhanced models by weighting only 5 pixels out of 9. P.I. type 3 is more accurate method by partial interpolation around subpixel which isachieved by type 3. LThese simulation results show that the more delicate model has the better performance and modified models which are simplified have excellent performance with reduced computational complexity.

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Self-Aligned Offset Poly-Si TFT using Photoresist reflow process (Photoresist reflow 공정을 이용한 자기정합 오프셋 poly-Si TFT)

  • Yoo, Juhn-Suk;Park, Cheol-Min;Min, Byung-Hyuk;Han, Min-Koo
    • Proceedings of the KIEE Conference
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    • 1996.07c
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    • pp.1582-1584
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    • 1996
  • The polycrystalline silicon thin film transistors (poly-Si TFT) are the most promising candidate for active matrix liquid crystal displays (AMLCD) for their high mobilities and current driving capabilities. The leakage current of the poly-Si TFT is much higher than that of the amorphous-Si TFT, thus larger storage capacitance is required which reduces the aperture ratio fur the pixel. The offset gated poly-Si TFTs have been widely investigated in order to reduce the leakage current. The conventional method for fabricating an offset device may require additional mask and photolithography process step, which is inapplicable for self-aligned source/drain ion implantation and rather cost inefficient. Due to mis-alignment, offset devices show asymmetric transfer characteristics as the source and drain are switched. We have proposed and fabricated a new offset poly-Si TFT by applying photoresist reflow process. The new method does not require an additional mask step and self-aligned ion implantation is applied, thus precise offset length can be defined and source/drain symmetric transfer characteristics are achieved.

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