• Macromolecular Research
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• v.14 no.3
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• pp.300-305
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• 2006

The chemical structure of a semi-aromatic polyimide-I, which was prepared by the chemical imidization of cyclopentanetetracarboxylic dianhydride and 2,2-bis(4-aminophenyl)hexafluoropropane, was characterized by $^{13}C-NMR$ spectroscopy. The chemically imidized polyimide-I was used for the preparation of a photosensitive polyimide (PSPI) through the addition of benzophenone and benzophenone oxime hexamethylene diurethane (BOHD), a photobase generator containing oxime-urethane groups. The polyimide-I film containing benzophenone and BOHD was not soluble in 2.38 wt% tetrabutylammonium hydroxide solution in $H_2O$. However, it became soluble following irradiation with 310 nm UV light. A positive tone image with a resolution of $5{\mu}m$ was obtained with this PSPI, having sensitivity($D_c$) of $1.2J/cm^2$ and contrast(${\gamma}_p$) of 1.08. Thus, a polyimide, which is not intrinsically photosensitive, can become photosensitive through the addition of a photobase generator containing oxime-urethane groups as a photosensitive compound.

• Textile Coloration and Finishing
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• v.18 no.2 s.87
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• pp.24-30
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• 2006

The photosensitive spiroxazine compound and the electrosensitive viologen compound were prepared to examine their practical application feasibilities and behaviors. These dyes represent corresponding chromism effects related to their own characteristics of the dye molecules. Thus, the prepared dyes were characterized and their absorption spectra were also investigated. Besides, an interest on direct spiroxazine exhaustion to the polyamide substrates and its photochromic effects within the fiber molecules were determined. The photochromic reaction on the substrates was clearly observed and its reversible decoloration behaviors responded.

• Journal of the Korean Applied Science and Technology
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• v.14 no.2
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• pp.27-34
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• 1997

Naphthoquinone-1,2-diazide-5-sulfonyl [NDS]derivatives members of Quinone diazide compound that are utilizable as photoresist for printing plate were synthesized, and photoresist were prepared by mixing these derivatives with a matrix resin(PF, CF) at various weight ratios. Photosensitive characteristics of photoresist were studied by Gray scale method, and SEM to analyze if they can be used as photosensitive material in a printing plate. Experimental results showed using IR, UV, NDS derivatives were photoconverted and developer-soluble photoresist were produced. Photoresist in the mixing ratio of 1:4 of NDS[II] and CF resin gave rise to the highest dissolution rate. In addition, photoresist obtained at this condition resulted in the most superior sensitivity.

• Journal of the Korean Applied Science and Technology
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• v.13 no.3
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• pp.145-153
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• 1996

Naphthoquinone-1,2-diazide-5-sulfonyl[NDAS] derivatives members of quinone diazide compound that are utilizable as photosensitive polymer material were synthesized, and photoresist were prepared by mixing these derivatives with m-cresol novolak(a matrix resin) at various weight ratios. Photosensitive characteristics of photoresist were studied by examining UV and IR, relative sensitivity using a Gray scale method, and SEM to analyze if they can be used as photosensitive material in printing process. Experimental results showed that, by UV, NDAS derivatives were photoconverted and developer-soluble photoresist were produced. The mixing ratio of 1:4(by mass) of NDAS+p-ydroxybenzophenone+sensitizer and m-cresol novolak gave rise to the highest dissolution rate. In addition, photoresist obtained at this condition resulted in the most superior sensitivity and contrast.

• Applied Chemistry for Engineering
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• v.7 no.2
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• pp.379-386
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• 1996

Photosensitive compound, 1-methyl-4-[2-(4-diethylacetylphenyl)ethenyl] pridinium methosulfate(SbQ-A salt), was synthesized from dimethyl sulfate, terephthalaldehyde mono-(diethylacetal) and 4-picoline. SbQ-A salts were reacted with poly(vinyl alcohol)s, (PVA) in aqueous solution with phosphoric acid as catalyst to give photosensitive PVA-SbQ with different SbQ content and molecular weight. Relative photosensitivity of PVA-SbQ was determined by gray scale(GS) method. The rotative sensitivity of PVA-SbQ increased with increasing amount of bound SbQ in the case of high molecular weight(MW=77,000-79,000g/mol) as substrate and decreased with decreasing molecular weight of PVA with about constant(1.3mol%) amount of bound SbQ. The most sensitive polymer was obtained when SbQ group content in PVA-SbQ reached about 2.63mol% in the case of high molecular weight(77,000-79,000g/mol) PVA. This sample showed 90 times greater sensitivity than dichromated PVA as reference photosensitive system. PVA-SbQ photosensitive polymer synthesized was applied to the photolithographic screening process of phosphor on the panel of cathode ray tube(CRT). Phosphor slurry was made with PVA-SbQ, phosphor, a small amount of surfactant and other additives using water as medium. The slurry was coated onto panel, dried by heater, exposed to UV light and then developed by distilled water. When a small amount of cationic surfactant such as cetyltrimethylammonium chloride was used in the slurry formulation, the sharpness of phosphor pattern was equal to or better than that of dichromated PVA photosensitive polymer system used currently.

• Macromolecular Research
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• v.8 no.1
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• pp.19-25
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• 2000

Aromatic diamine monomers containing allylic ester linkage, 1,5-bis(4-aminobenzoate)-1,2,3,4-tetrahydronaphthalene (4-DABTN) and 1,5-bis(3-amin obenzoate)-1,2,3,4-tetrahydronaphthalene (3-DABTN) were synthesized through the reaction of 1,5-dihydroxy-1,2,3,4-tetrahydronaphthalene and 4- or 3-nitrobenzoly chloride. By the reaction of these diamines with pyromellitic dianhydride (PMDA) or 4,4-(hexafluoroisopropylidene)diphthalic anhydride (6FDA), poly(amic acid)s were obtained. The inherent viscosities of the poly(amic acid)s were between 0.55 and 1.31 dL/g. The poly(amic acid)s were converted to polyimides by chemical imidization. The thermogravimetric analysis (TGA) thermograms of these polyimides showed temperatures of 5% weight loss between 323 and 389$^{\circ}C$ in nitrogen atmosphere. The model compound ,1,5-bis (4-nitrobenzoate)-1,2,3,4-tetrahydronaphthalene (4-DNBTN), was decomposed to 4-nitrobenzoic acid and 5-(4-nitrobenzoate)-3,4-dihydronaphthalene upon addition of CF$_3$COOH.