Journal of the Korean Applied Science and Technology (한국응용과학기술학회지)
- Volume 13 Issue 3
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- Pages.145-153
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- 1996
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- 1225-9098(pISSN)
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- 2288-1069(eISSN)
DOI QR Code
Synthesis and Photosensitive Characterization of NDAS Derivatives
NDAS 유도체의 합성과 감광특성
- Lee, Ki-Chang (Dept. of Chemical engineering Myong Ji University) ;
- Choi, Sung-Yong (Dept. of Chemical engineering Myong Ji University) ;
- Bae, Nam-Kyoung (Dept. of Chemical engineering Myong Ji University) ;
- Yoon, Cheol-Hun (Dept. of Chemical engineering Myong Ji University) ;
- Hwang, Sung-Kwy (Dept. of Chemical engineering Myong Ji University)
- Published : 1996.11.30
Abstract
Naphthoquinone-1,2-diazide-5-sulfonyl[NDAS] derivatives members of quinone diazide compound that are utilizable as photosensitive polymer material were synthesized, and photoresist were prepared by mixing these derivatives with m-cresol novolak(a matrix resin) at various weight ratios. Photosensitive characteristics of photoresist were studied by examining UV and IR, relative sensitivity using a Gray scale method, and SEM to analyze if they can be used as photosensitive material in printing process. Experimental results showed that, by UV, NDAS derivatives were photoconverted and developer-soluble photoresist were produced. The mixing ratio of 1:4(by mass) of NDAS+p-ydroxybenzophenone+sensitizer and m-cresol novolak gave rise to the highest dissolution rate. In addition, photoresist obtained at this condition resulted in the most superior sensitivity and contrast.
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