• 제목/요약/키워드: pattern source

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Analysis of Multi Level Current Source GTO Inverter for Induction Motor Drives

  • Arase, Takayuki;Matususe, Kouki
    • Proceedings of the KIPE Conference
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    • 1998.10a
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    • pp.535-540
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    • 1998
  • This paper discusses a triple stage current source GTO inverter system for high power motor drives. The energy rebound circuit of the triple stage inverter not only controls the spike voltage of the GTO inverter but also facilitates PWM control of the thyristor rectifier operated at unity fundamental input power factor. Based on Pspice simulation and experiments, the principles and PWM pulse pattern for removing specific lower harmonics in the inverter's output current are discussed in detail.

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On the Numerical Evaluation of the Wave Patten of a Havelock Source

  • Dong-Kee,Lee
    • Bulletin of the Society of Naval Architects of Korea
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    • v.16 no.4
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    • pp.13-21
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    • 1979
  • A method of evaluating Kelvin wave pattern is presented in this paper. The mathematical manipulation of x-derivative of the Green function of the Havelock source by the use of contour integration on the complex plane has resulted in the expression that can be readily incorporated with computer program. The efficiency and accuracy that can be secured by the use of the present mathematical expressions seem to be excellent when suitable numerical quadratures are employed. The wave patterns for particular submergences of the singularity are presented.

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Development of High-Quality Poly(3,4-ethylenedioxythiophene) Electrode Pattern Array Using SC1 Cleaning Process (SC1 세척공정을 이용한 고품질 Poly(3,4-ethylenedioxythiophene) 전극 패턴 어레이의 개발)

  • Choi, Sangil;Kim, Wondae;Kim, Sungsoo
    • Journal of Integrative Natural Science
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    • v.4 no.4
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    • pp.311-314
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    • 2011
  • Application of self-assembled monolayers (SAMs) to the fabrication of organic thin film transistor has been recently reported very often since it can help to provide ohmic contact between films as well as to form simple and effective electrode pattern. Accordingly, quality of these ultra-thin films is becoming more imperative. In this study, in order to manufacture a high quality SAM pattern, a hydrophobic alkylsilane monolayer and a hydrophilic aminosilane monolayer were selectively coated on $SiO_2$ surface through the consecutive procedures of a micro-contact printing (${\mu}CP$) and dip-coating methods under extremely dry condition. On a SAM pattern cleaned with SC1 solution immediately after ${\mu}CP$, poly(3,4-ethylenedioxythiophene) (PEDOT) source and drain electrode array were very selectively and nicely vapour phase polymerized. On the other side, on a SC1-untreated SAM pattern, PEDOT array was very poorly polymerized. It strongly suggests that the SC1 cleaning process effectively removes unwanted contaminants on SAM pattern, thereby resulting in very selective growth of PEDOT electrode pattern.

Joint Aspect Inspecting System Using Image Processing (영상처리를 통한 접합면 검사 시스템)

  • Kang, Won-Chan;Kim, Young-Dong
    • The Transactions of the Korean Institute of Electrical Engineers P
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    • v.53 no.1
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    • pp.1-6
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    • 2004
  • In this paper, we present the new method for joint aspect inspecting system. We use the image processing and laser maker for light source. We can find the matrial joint status through processing the line pattern which is made by laser maker. To get the line pattern, in first, we did the preprocess of threshold. If the shape of line had over two segments, then the joint status is abnormal. We show our system efficency by experiment on tire facility.

A Study on Design Pattern Applied Message Monitoring System for Open Source Software based ESB (Enterprise Service Bus) (오픈 소스 기반 ESB의 패턴 적용 메시지 모니터링 시스템 구축 사례)

  • Lee, Sung-Jae
    • Proceedings of the Korea Information Processing Society Conference
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    • 2012.04a
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    • pp.1290-1293
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    • 2012
  • 오픈 소스 기반 ESB 모니터링 시스템 설계에 EIP(Enterprise Integration Pattern)을 적용하여 비즈니스 요구사항을 처리하는 통합 로직과 메시지 추적 관리를 위한 관리 로직을 분리하여, 메시지 관리 로직 처리에 따른 성능 저하 및 오류에 의한 영향도를 최소화하며 메시지 데이터를 중앙 저장 장치에 저장하여 메시지 추적 관리를 용이한 모니터링 시스템 구축 사례.

The Development of Air Quality Model Considering Shipping Source in Pusan Region (선박배출 오염물질의 영향을 고려한 부산지역 대기질 모델의 개발)

  • 이화운;김유근;원경미
    • Journal of Environmental Science International
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    • v.8 no.1
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    • pp.135-144
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    • 1999
  • Air quality modeling about coastal urban region such as Pusan shoud be consider shipping source emmited from ships anchoraging and running. It has been proved at our previous studies that the ratios of air pollutants emission amount in coastal area to inland are 12.2% for NO$_2$ and 11.7% for $SO_2$ and the air qualify of coastal urban area consierably counts on ships. Also the dispersion pattern of the all pollutants followed local circulation system in this region. Therefore this study has been developed air quality model which can describe the formation, transport, transformation and deposition processes of air pollutants considering shipping source. Currently, restriction for emission amount of ships does not exist, so our study will be useful to set the omission standard and for devising air quality policy in coastal urban region.

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Diffractive Optical Element for Noise-reduced Beam Shaping of Multi-array Point Light Source

  • Lee, Jonghyun;Hahn, Joonku;Kim, Hwi
    • Current Optics and Photonics
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    • v.5 no.5
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    • pp.506-513
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    • 2021
  • An arrayed diffractive optical element design for the beam-shaping of a multi-array light source is proposed. This is an essential device for recent optical security and face recognition applications. In practice, we devise a DC noise reduction technique featuring high fabrication error tolerance regarding the multi-array light source diffractive optical elements, as a necessary part of the proposed design method. The spherical diverging illumination leads to DC-conjugate noise spreading. The main idea is tested experimentally, and the multi-array light source diffraction pattern is investigated numerically.

Verb Pattern Based Korean-Chinese Machine Translation System

  • Kim, Changhyun;Kim, Young-Kil;Hong, Munpyo;Seo, Young-Ae;Yang, Sung-Il;Park, Sung-Kwon
    • Proceedings of the Korean Society for Language and Information Conference
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    • 2002.02a
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    • pp.157-165
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    • 2002
  • This paper describes our ongoing Korean-Chinese machine translation system, which is based on verb patterns. A verb pattern consists of a source language pattern part for analysis and a target language pattern part for generation. Knowledge description on lexical level makes it easy to achieve accurate analyses and natural, correct generation. These features are very important and effective in machine translation between languages with quite different linguistic structures including Korean and Chinese. We performed a preliminary evaluation of our current system and reported the result in the paper.

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Laser Processing for Manufacturing Styrofoam Pattern (주물용 스티로폼 목형 제작을 위한 레이저 가공 공정 개발)

  • 강경호;김재도
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2001.04a
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    • pp.1085-1088
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    • 2001
  • The process of styrofoam pattern that has been used for material of press die pattern depends chiefly on handwork. Laser manufacturing system developed to increase precision and efficiency of process that is also able to convert the design easily. Applying the RP(rapid prototyping) concept reversely, the unnecessary part of section is vapored away by heat source of laser beam after converting 3-D CAD model into cross-sectional shape information. Laser beam is line-scanned in plane specimens to measure the depth and width of cut, surface roughness, cross-sectional shape as converting laser power, scanning speed, cutting gas pressure. With these basic data, plane surface, inclined surface, hole, outer contour trimming process is experimented and optimum condition are obtained. In plane and inclined surface experiments, 15W laser power and 50mm/s scanning speed make superior processing property and 30W, 10mm/s make processing efficiency increase in trimming process. With these results, simple patterns were manufactured and the possibility of applying laser manufacturing system to styrofoam pattern was convinced.

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Reverse design of photomask for optimum fiedelity in optical lithography (광리소그래피에서 최적 모양의 패턴 구현을 위한 포토마스크 역설계)

  • 이재철;오명호;임성우
    • Journal of the Korean Institute of Telematics and Electronics D
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    • v.34D no.12
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    • pp.62-67
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    • 1997
  • The optical lithography wit an ArF excimer laser as a light source is expected to be used in the mass production of giga-bit DRAMs which require less than 0.2.mu.m minimum feature size. In this case, the distortion of a patterned image becomes very severe, since the lithography porcess is performed at the resolution limit. Traditionally, the photomask pattern was designed and revised with trial-and-error methods, such as repeated execution of process simulators or actual process experiments which require time and effort. Ths paper describes a program which automatically finds an optimal mask pattern. The program divides the mask plane into cells with same sizes, chooses a cell randomly, changes the transparent/opaque property of the cell, and eventually genrates a mask pattern which produces required image pattern. The program was applied to real DRAM cell patterns to produce mask patterns which genertes image patterns closer to object images than original mask patterns.

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