• Title/Summary/Keyword: p-type silicon

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A Study on the Nucleation, Growth and Shrinkage of Oxidation Induced Stacking Faults (OSF) -Part2: Role of $SiO_2$ Layer on the Shrinkage of Oxidation Induced Stacking Faults (OSF) in P-type CZ Silicon (산화 적층 결합의 생성, 성장 및 소멸에 관한 연구-제2부 : P형 CZ 실리콘에서 산화 적층 결함의 소멸에 미치는 $SiO_2$층의 역학)

  • 김용태;민석기
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.25 no.7
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    • pp.767-773
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    • 1988
  • We have proposed a new simple and easy method for the observation of OSF growth and shrinkage. This method is to observe the behavior of OSF in thedamaged region during oxidation as well as annealing process after introducing mechanical damage on the silicon surface by pressure-controllable indentor. The effect of SiO2 layer on the shrinkage of pregrown OSF generated by the proposed method has been investigated using the samples with or without SiO2 layer. From the experimental data, we suggest a model for the shrinkage of OSF, which is based on the recombinaiton mechanism between silicon interstitial and vacancy at the Si-SiO2 interface.

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Dependence of Thermal Annealing Conditions on Photoluminescence in $SiO_2$ films

  • Lee, Jae-Hee;Lee, Weon-Sik;Kim, Kwang-Il
    • Proceedings of the Korean Vacuum Society Conference
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    • 1999.07a
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    • pp.102-102
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    • 1999
  • Visible photoluminescence(PL) in si-implanted SiO2 films on crystaline silicon were observed. Thermal oxide films of 1 ${\mu}{\textrm}{m}$ thickness on P-type crystal silicon were made and si+ ions were implanted with 200keV acceleration voltage on ti. Argon laser (wavelength 488nm) and PM tube were used for PL measurements. As annealing time increased at low temperature, the visible PL intensity are increased and the peak positions are changed. On the other hand, with increasing annealing time at high temperature, the visible PL intensity are disappeared. From the PL peaks and intensity changes, XRD results, and TEM observations, we will discuss the origin of PL in Si+-implanted SiO2 films with oxygen righ defects and silicon rich defects.

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Co-existence of Random Telegraph Noise and Single-Hole-Tunneling State in Gate-All-Around PMOS Silicon Nanowire Field-Effect-Transistors

  • Hong, Byoung-Hak;Lee, Seong-Joo;Hwang, Sung-Woo;Cho, Keun-Hwi;Yeo, Kyoung-Hwan;Kim, Dong-Won;Jin, Gyo-Young;Park, Dong-Gun
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.11 no.2
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    • pp.80-87
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    • 2011
  • Low temperature hole transport characteristics of gate-all-around p-channel metal oxide semiconductor (PMOS) type silicon nanowire field-effect-transistors with the radius of 5 nm and lengths of 44-46 nm are presented. They show coexisting two single hole states randomly switching between each other. Analysis of Coulomb diamonds of these two switching states reveals a variety of electrostatic effects which is originated by the potential of a single hole captured in the trap near the nanowire.

Generation of 1/f Noise in Interfacial Structures between Silicon Substrate and Cobalt Thin Film (실리콘과 코발트 박막의 계면구조에서 발생하는 1/f 잡음현상 연구)

  • 조남인;남형진;박종윤
    • Journal of the Korean Vacuum Society
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    • v.5 no.1
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    • pp.48-53
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    • 1996
  • We present a microscopic description for generation of 1/f noise in interfaces between cobalt thin film and silicon substrate. Along with surface resistance measurements and transmission electron diffraction observations. 1/f noise power spectral density has been measured for the interfacial structures at the liquid nitrogen temperature . The cobalt films have been deposited by the electron-beam evaporation technique onto p-type (100) silicon in the high vacuum condition. The measured noise power spectral density shows highest magnitude near the structural transition and metallization transition region. The noise magnitude rapidly decreased after the cobalt silicide nucleation. The noise parameter is concluded to be originated form the structural fluctuations.

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Characteristics of the Avalanche Injection on SiO2Layer in MOS Structures (MOS 구조에서의 Avalanche Injection에 관한 연구)

  • 성영권;김성진;백우현;박찬원
    • The Transactions of the Korean Institute of Electrical Engineers
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    • v.34 no.6
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    • pp.244-252
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    • 1985
  • A model is presented to explain charging phenomena into the oxide layer when a metal-oxide-silicon(MOS) capacitor is driven by a large amplitude and high frequency ac signal sufficient to produce avalanche injection in the silicon. During avalanche, minority carriers are injected. It is assumed that some of these minority carriers attain sufficient energy to surmount the potential barrier at the interface, and then inter the oxide. Measurements of C-V curves are made for the MOS capacitor with p-type silicon substrates before and after avalanche injection. This paper studies how charging in the oxide and the interface depends on oxide properties. It is concluded that this charging effect is related to the presence of water in the oxide.

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Influence of the Thickness and Doping Concentration in p- and n-Type Poly-Si Layers on the Efficiency of a Solar Cell Based on a Carbon Fiber

  • Yoon, Min-Seok;Shim, Young Bo;Han, Young-Geun
    • Journal of the Optical Society of Korea
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    • v.19 no.2
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    • pp.199-205
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    • 2015
  • We investigated the effects of the thickness and doping concentration in p- and n-type poly-Si layers on the performance of a solar cell based on a carbon fiber in order to improve the energy conversion efficiency of the cell. The short-circuit current density and open-circuit voltage of the carbon fiber-based solar cell were significantly influenced by the thickness and doping concentration in the p- and n-type poly-Si layers. The solar cell efficiency was successfully enhanced to ~10.5%.

Improved Carrier Tunneling and Recombination in Tandem Solar Cell with p-type Nanocrystalline Si Intermediate Layer

  • Park, Jinjoo;Kim, Sangho;Phong, Pham duy;Lee, Sunwha;Yi, Junsin
    • Current Photovoltaic Research
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    • v.8 no.1
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    • pp.6-11
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    • 2020
  • The power conversion efficiency (PCE) of a two-terminal tandem solar cell depends upon the tunnel-recombination junction (TRJ) between the top and bottom sub-cells. An optimized TRJ in a tandem cell helps improve its open-circuit voltage (Voc), short-circuit current density (Jsc), fill factor (FF), and efficiency (PCE). One of the parameters that affect the TRJ is the buffer layer thickness. Therefore, we investigated various TRJs by varying the thickness of the buffer or intermediate layer (TRJ-buffer) in between the highly doped p-type and n-type layers of the TRJ. The TRJ-buffer layer was p-type nc-Si:H, with a doping of 0.06%, an activation energy (Ea) of 43 meV, an optical gap (Eg) of 2.04 eV, and its thickness was varied from 0 nm to 125 nm. The tandem solar cells we investigated were a combination of a heterojunction with intrinsic thin layer (HIT) bottom sub-cell and an a-Si:H (amorphous silicon) top sub-cell. The initial cell efficiency without the TRJ buffer was 7.65% while with an optimized buffer layer, its efficiency improved to 11.74%, i.e., an improvement in efficiency by a factor of 1.53.

Development of Rapid Tooling using Investment Casting & R/P Master Model (R/P 마스터 모델을 활용한 정밀주조 부품 및 쾌속금형 제작 공정기술의 개발)

  • Jeong, Hae-Do;Kim, Hwa-Young
    • Journal of Korea Foundry Society
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    • v.20 no.5
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    • pp.330-335
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    • 2000
  • Functional metal prototypes are often required in numerous industrial applications. These components are typically needed in the early stage of a project to determine form, fit and function. Recent R/P(Rapid Prototyping) part are made of soft materials such as plastics, wax, paper, these master models cannot be employed durable test in real harsh working environment. Parts by direct metal rapid tooling method, such as laser sintering, by now are hard to get net shape, pores of the green parts of powder casting method must be infiltrated to get proper strength as tool, and new type of 3D direct tooling system combining fabrication welding arc and cutting process is reported. But a system which can build directly 3D parts of high performance functional material as metal park would get long period of system development, massive investment and other serious obstacles, such as patent. In this paper, through the rapid tooling process as silicon rubber molding using R/P master model, and fabricate wax pattern in that silicon rubber mold using vacuum casting method, then we translated the wax patterns to numerous metal tool prototypes by new investment casting process combined conventional investment casting with rapid prototyping & rapid tooling process. With this wax-injection-mold-free investment casting, we developed new investment casting process of fabricating numerous functional metal prototypes from one master model, combined 3-D CAD, R/P and conventional investment casting and tried to expect net shape measuring total dimension shrinkage from R/P pare to metal part.

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The Effects of Lithium-Incorporated on N-ZTO/P-SiC Heterojunction Diodes by Using a Solution Process (용액공정으로 제작한 리튬 도핑된 N-ZTO/P-SiC 이종접합 구조의 전기적 특성)

  • Lee, Hyun-Soo;Park, Sung-Joon;An, Jae-In;Cho, Seulki;Koo, Sang-Mo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.31 no.4
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    • pp.203-207
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    • 2018
  • In this work, we investigate the effects of lithium doping on the electric performance of solution-processed n-type zinc tin oxide (ZTO)/p-type silicon carbide (SiC) heterojunction diode structures. The proper amount of lithium doping not only affects the carrier concentration and interface quality but also influences the temperature sensitivity of the series resistance and activation energy. We confirmed that the device characteristics vary with lithium doping at concentrations of 0, 10, and 20 wt%. In particular, the highest rectification ratio of $1.89{\times}107$ and the lowest trap density of $4.829{\times}1,022cm^{-2}$ were observed at 20 wt% of lithium doping. Devices at this doping level showed the best characteristics. As the temperature was increased, the series resistance value decreased. Additionally, the activation energy was observed to change with respect to the component acting on the trap. We have demonstrated that lithium doping is an effective way to obtain a higher performance ZTO-based diode.

Silicon Pressure Sensors Using Diffused Resistors (확산저항을 이용한 실리콘 압력 센서)

  • Kwon, Tae Ha;Lee, Wu Il
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.23 no.3
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    • pp.364-369
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    • 1986
  • Silicon diaphragms, 10 and 20 \ulcorner-thick and 1x1 mm\ulcornerarea, have been fabricated by means of the electrochemical P-N junction etch-stop technique. The P-type diffused resistors were formed on the diaphragm, and the piezoresistance effect was examined. It was been found that the fractional variation of the resistance is dependent on the diaphragm thickness, resistor location, and resistor length, etc. The 1.2 k\ulcornerfull-brige pressure sensor with 10\ulcorner-thick diaphragm exhibits a pressure sensitivity of 42 \ulcorner/V\ulcornermHg with a temperature coefficient of 2.3 mmHg/\ulcorner, and shows a good linearity in the pressure range from 0 to 300 mmHg.

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