• 한국정밀공학회지
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• 제29권1호
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• pp.114-120
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• 2012

We present a simple and low-cost method to fabricate poly(methyl-methacrylate) (PMMA) nanochannels with various shapes by combining the standard optical lithography with a PMMA layer transfer and collapse technique. We utilized PMMA membrane reflowing/collapsing phenomena into microchannels to fabricate nanochannels at both corners of arbitrarily-shaped microchannels. This allows nanochannels with various shapes such as curved nanochannels as well as straight nanochannels to be easily fabricated since the shape of the microchannel determines the shape of the nanochannels. This nanochannel fabrication method is simple, flexible, and low-cost since the standard optical lithography with low-resolution optical masks can be used to fabricate nanoscale channels as small as 100 nm wide with various shapes. Also, the sealing of nanochannels can be naturally achieved while the nanochannels are formed through the polymer layer transfer and collapse.

• Journal of the Optical Society of Korea
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• 제19권1호
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• pp.63-68
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• 2015

A one-step fabrication of a photonic crystal (PC) with functional defects is demonstrated. Using multi-beam phase-controlled holographic lithography with a diffracting optical element, large area one dimensional (1D) and two dimensional (2D) PCs with periodic defects were fabricated. The uniform area is up to $2mm^2$, and tens of defect channels have been introduced in the 1D and 2D PC structure. This technique gives rise to substantial reduction in the fabrication complexity and significant improvement in the spatial accuracy of introducing functional defects in photonic crystals. This method can also be used to design and fabricate three dimensional (3D) PCs with periodic defects.

• 한국광학회:학술대회논문집
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• 한국광학회 2009년도 동계학술발표회 논문집
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• pp.225-226
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• 2009

본 연구에서는 마스크리스 노광장치의 두 프로젝션 광학계 사이에 있는 마이크로프리즘 어레이에 관한 연구이다. 마이크로프리즘의 원리와 종류에 대해 알아보고, 마이크로프리즘의 출사부의 모양에 따라 패턴의 모양이 변함을 확인하였다. 그리고 원하는 패턴을 만들 수 있는 마이크로프리즘을 설계하였다.

• 한국광학회:학술대회논문집
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• 한국광학회 2001년도 제12회 정기총회 및 01년도 동계학술발표회
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• pp.76-77
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• 2001

리소그래피 공정은 반도체 공정에 있어서 그 선폭과 집적도를 결정짓는 핵심 공정이다 이러한 리소그래피 공정 중 만들고자 하는 패턴을 사진전사에 의해서 형성해주는 도구인 노광장비는 광학계, 스테이지계, 제어계로 구성되는 데, 여기에서는 이 중에서 광학계를 중심으로 노광장비를 설명한다. 노광장비의 기본적인 형태는 그 사용되는 광학계에 파라서 결정되는데, 크게 나누어서 밀착 노광 방식과 투영 노광 방식이 있다. (중략)

• 한국광학회:학술대회논문집
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• 한국광학회 2008년도 하계학술발표회 논문집
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• pp.387-388
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• 2008

• 진공이야기
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• 제2권1호
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• pp.10-16
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• 2015

With the recognition of nanotechnology as one of the future strategic technologies, the R&D efforts have been performed under exclusive supports of governments and private sectors. At present, nanotechnology is at the focus of research and public attention in almost every advanced country including USA, Japan, and many others in EU. Keeping tracks of such technical trends, center for nanoscale mechatronics and manufacturing (CNMM) was established in 2002 as a part of national nanotechnology promotion policy led by ministry of science and technology (MOST) in Korea. It will hold widespread potential applications in electronics, optical electronics, biotechnology, micro systems, etc, with the promises of commercial visibility and competitiveness. In this paper, wafer scale multilayer nanoimprint lithography technology which is well-known the next generation lithography, roll-typed nanoimprint lithography (R-NIL), roll-typed liquid transfer imprint lithography (R-LTIL), the key technology for nanomanufacturing and nanoscale measurement technology will be introduced. Additionally, its applications and some achievements such as solar cell, biosensor, hard disk drive, and MOSFET, etc by means of the developed multilayer nanoimprint lithography system are introduced.

• 정보저장시스템학회논문집
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• 제10권1호
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• pp.1-6
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• 2014

Plasmonic lithography is the latest technique to overcome diffraction limit of previous optical lithography. In the plasmonic lithography, the nano gap between nano metal wave guide and photoresist should be in sub-wavelength region. SIL-based plasmonic lithography is the one of the solutions to maintain small air gap. However, the nano gap control is so sensitive that a little disturbance is able to have a large effect on the nano gap control. So, we analyzed the characteristics of disturbance, and then modified the previous controller to suppress the disturbance. We applied two peak filters which were fixed one and adaptively changeable one. We experimentally confirmed the improvement of the nano gap control, which reduced nano gap error by 30 %. The proposed control will improve the quality of lithography pattern.

• 한국광학회지
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• 제16권3호
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• pp.235-238
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• 2005

생산성 향상을 위하여 정렬된 마이크로칼럼을 이용하여 멀티-전자빔 리소그라피 장치를 개발하였다. 마이크로칼럼은 매우 작은 크기를 가지고 있어 병렬구조로 정렬하여 작동시킬 수 있다. Single Column Module(SCM) 구조의 멀티 전자빔 리소그라피 시스템과 전자칼럼을 제작하여 250 eV에서 300 eV 에너지 범위에서의 저에너지 마이크로칼럼 리소그라피를 성공적으로 수행하였다. 전자방출원에서 방출되는 전자빔의 총 전류가 $0.5\;{\mu}A$일 때, 샘플에서의 전류는 >1 nA으로 측정되었으며 리소그라피 패텅닝에서 사용된 working distance은 $\~1\;mm$였다.

• 한국전기전자재료학회논문지
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• 제27권12호
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• pp.871-876
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• 2014

Efficiency of crystalline Si solar cell can be maximized as minimizing optical loss through antireflection texturing with inverted pyramids. Even if cost-competitive, soft lithography can be employed instead of photolithography for the purpose, some limitations still remain to apply the soft lithography directly to as-received solar grade wafer with a bunch of micro trenches on surface. Therefore, it is needed to develop a low-cost, effective planarization process and evaluate its output to be applicable to patterning process with PDMS stamp. In this study new surface planarization process is proposed and the change of micro scale trenches on the surface as a function of etching time is observed. Also, the effect of trenches on pattern quality by soft lithography is investigated using FEM structural analysis. In conclusion it is clear that the geometry and shape of trenches would be basic considerations for soft lithography application to low quality wafer.

• 전자공학회논문지D
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• 제35D권10호
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• pp.76-82
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• 1998

반도체 칩 내의 최소 선폭이 작아짐에 따라 광리소그래피에서 필연적으로 발생하는 상(image)의 왜곡 현상이 점점 심각해지고 있다. 이에 따라 광리소그래피의 해상 한계에서 발생하는 패턴의 왜곡 현상에 대한 보정(Optical Proximity Correction)은 이제 불가피한 기술이 되고 있다. 본 논문에서는 몬테-칼로 기법을 사용하여 왜곡 현상을 고려한 최적의 마스크의 패턴을 찾는 프로그램을 개발하였다. 이 프로그램을 기본적인 실제 메모리 셀 패턴에 적용시켜 수행해 본 결과 원래의 마스크 패턴보다 목표 상에 근접한 마스크 패턴을 효과적으로 구현할 수 있었을 뿐 아니라 공정 여유도의 향상도 기대할 수 있게 되었다.