• Current Photovoltaic Research
• /
• 제11권4호
• /
• pp.103-107
• /
• 2023

A Nickel oxide (NiO_x) thin films were prepared via sol-gel process on a transparent conductive oxide glass substrate. The NiO_x thin films were spin-coated in ambient air and subsequently annealed for 30 minutes at temperatures ranging from 150℃ to 450℃. The structural and optical characteristics of the NiO_x thin films annealed at various temperatures were measured using X-ray diffraction, field emission scanning electron microscopy, and ultraviolet-visible spectroscopy. After optimizing the NiO_x coating conditions, perovskite solar cells were fabricated with p-i-n inverted structure, and its photovoltaic performance was evaluated. NiO_x thin films annealed at 350℃ exhibited the most favorable characteristics as a hole transport layer, resulting in the highest power conversion efficiency of 17.88 % when fabricating inverted perovskite solar cells using this film.

• Composites Research
• /
• 제28권3호
• /
• pp.94-98
• /
• 2015

탄소섬유 에폭시 복합재료에 다양한 두께의 니켈 박막을 첨가한 복합재료를 제작하여 층간 계면 특성을 평가하고자 한다. 상온에서 스퍼터를 이용하여 니켈 박막을 프리프레그 위에 증착하고 이를 중간층으로 하여 복합재료를 제작하였다. 니켈 박막이 첨가된 탄소섬유 에폭시 복합재료는 니켈 박막 미첨가 탄소섬유 에폭시 복합재료에 비해 층간 전단 특성이 향상되었음을 확인하였다. 층간 파괴거동 분석을 위해 주사전자현미경으로 파단면을 관찰하였으며 니켈 박막이 복합재료 내에 층간 결합력을 높여 계면 특성을 향상시키며 전단시험 시 전단에너지를 흡수하는 역할을 한다는 것을 확인하였다.

• Journal of Electrochemical Science and Technology
• /
• 제2권4호
• /
• pp.204-210
• /
• 2011

Thin film electrodes have been intensively studied for active materials and current collectors to enhance the electrochemical performance. Here, porous structures of nickel-based oxide films, consisting of nickel oxide and copper (II) oxide, which was derived from the copper substrate during the annealing process, were deposited on metallic copper foils. The half-cell tests revealed excellent capacity retention after $80^{th}$ charge/discharge cycles. Some films showed an excess of the theoretical capacity of nickel oxides, which mainly originate from partially oxidized copper substrates during annealing. These results exhibit that both a preparation method of an active materials and partially oxidized current collectors could be important roles to apply thin film electrodes.

• 한국자기학회지
• /
• 제15권3호
• /
• pp.198-201
• /
• 2005

전기도금 방법으로 제작된 니켈과 니켈-구리 합금박막에 미치는 유기첨가제(organic additive)의 영향을 조사하였다. 유기첨가제를 가하여 도금하는 니켈 박막의 경우 순수한 전해액만을 이용하여 도금한 박막과는 다른 결정성을 갖는다 도금조건을 일정하게 한 후 니켈-구리의 합금 박막용 전해액에 유기첨가제를 가하면 구리와 니켈의 조성비율이 변화하는데 유기첨가제의 성분과 농도에 따라 니켈의 함유율이 $65\~95\%$ 영역에서 조절이 가능하다. 유기첨가제에 의한 이러한 물성의 변화는 자성의 변화를 유도하여 도금 박막의 자기저항의 증가와 감소에도 기여하는 것으로 나타났다.

• 한국정밀공학회지
• /
• 제32권10호
• /
• pp.911-916
• /
• 2015

In the nano/micro scale, material properties are dependent on the size-scale of a structure. However, conventional micro-scale tensile tests have limitations to obtain reliable values of nano-scale material properties owing to residual stress and elastic slippage in the gripping/aligning process. The indenter-driven nano-scale tensile test provides prominent advantages simple testing device, high-quality nano-scale metallic specimen with negligible residual stress. In this paper, two-types of specimens (a specimen with multi-testing parts and a specimen with a single-testing part) are discussed. Focused ion beam (FIB) is employed to fabricate a nano-scale specimen from a thin nickel film. Using the specimen with a single-testing part, we obtained a nano-scale stress-strain curve of electroplated nickel film.

• 한국자기학회지
• /
• 제22권2호
• /
• pp.42-44
• /
• 2012

니켈-철 합금 박막의 성분을 연속적으로 변화시키는 방법을 조사하였다. 일정한 전해액에 가해지는 도금 전류와 전압의 변화에 따라 박막 내 니켈과 철의 상대적 함유량의 조절이 가능했는데, 그 결과 도금 박막의 보자력, 각형비 및 포화자기장이 변화하였다. 정전류도금과 정전압 도금 방법으로 박막 내 철의 함유량을 증가시킴에 따라 박막의 입도는 증가하였고 보자력은 감소하는 경향을 나타내었다.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2006년도 하계학술대회 논문집 Vol.7
• /
• pp.10-11
• /
• 2006

In this study, the Ni/Co/TiN (6/2/25 nm) structure was deposited for thermal stability estimation. Vacuum (30 mTorrs) annealing was carried out to compare with furnace annealing in nitrogen ambient. The proposed Ni/Co/TiN structure exhibited low temperature silicidation and wide range of rapid thermal process (RTP) windows. The sheet resistance was too high to measure after furnace annealing at $600^{\circ}C$ due to the thin thickness (15 nm) of the nickel silicide. However, the sheet resistance maintained stable characteristics up to $600^{\circ}C$ for 30 min after vacuum annealing. Therefore, the low resistance of thin film nickel silicide was obtained by vacuum annealing at $600^{\circ}C$.

• 반도체디스플레이기술학회지
• /
• 제7권1호
• /
• pp.29-34
• /
• 2008

In this paper, the DE(double erosion) cathode for the reactive magnetron sputtering system is developed for high deposition rate and high target utilization efficiency. The utilization efficiency of the developed DE cathode is 22% higher than that of normal SE(single erosion) cathode. Sputtering process for the nickel oxide thin films with the DE cathode is performed under the following conditions; power with $1kW{\sim}3kW$, pressure with 4mtorr and 8mtorr, oxygen flow ratio with $0%{\sim}80%$. As a result, the hysteresis phenomenon of discharge voltage in 4mtorr is lower than that in 8mtorr and the hysteresis phenomenon of discharge voltage is getting lower as the applied power is getting higher. The structure of cross section and surface roughness of the thin films are observed by FE-SEM and AFM. The structure of cross section of the thin films is columnar and the average surface roughness under oxygen flow ratio of 0%, 52.5% and 65.0% are $2.08{\AA}$, $2.20{\AA}$ and $0.854{\AA}$, respectively.

• Korean Journal of Chemical Engineering
• /
• 제35권12호
• /
• pp.2474-2479
• /
• 2018

Plasma-enhanced atomic layer deposition (PEALD) is well-known for fabricating conformal and uniform films with a well-controlled thickness at the atomic level over any type of supporting substrate. We prepared nickel oxide (NiO) thin films via PEALD using bis(ethylcyclopentadienyl)-nickel ($Ni(EtCp)_2$) and $O_2$ plasma. To optimize the PEALD process, the effects of parameters such as the precursor pulsing time, purging time, $O_2$ plasma exposure time, and power were examined. The optimal PEALD process has a wide deposition-temperature range of $100-325^{\circ}C$ and a growth rate of $0.037{\pm}0.002nm$ per cycle. The NiO films deposited on a silicon substrate with a high aspect ratio exhibited excellent conformality and high linearity with respect to the number of PEALD cycles, without nucleation delay.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
• /
• pp.407.1-407.1
• /
• 2016

Electrochromism is defined as a phenomenon which involves persistently repeated change of optical properties between bleached state and colored state by simultaneous injection of electrons and ions, sufficient to induce an electrochemical redox process. Due to this feature, considerable progress has been made in the synthesis of electrochromic (EC) materials, improvements of EC properties in EC devices such as light shutter, smart window and variable reflectance mirrors etc. Among the variable EC materials, solid-state inorganics in particular, metal oxide semiconducting materials such as nickel oxide (NiO) have been investigated extensively. The NiO that is an anodic EC material is of special interest because of high color contrast ratio, large dynamic range and low material cost. The high performance EC devices should present the use of standard industrial production techniques to produce films with high coloration efficiency, rapid switching speed and robust reversibility. Generally, the color contrast and the optical switching speed increase drastically if high surface area is used. The structure of porous thin film provides a specific surface area and can facilitate a very short response time of the reaction between the surface and ions. The large variety of methods has been used to prepare the porous NiO thin films such as sol-gel process, chemical bath deposition and sputtering. Few studies have been reported on NiO thin films made by using sol-gel method. However, compared with dry process, wet processes that have the questions of the durability and the vestige of bleached state color limit the thin films practical use, especially when prepared by sol-gel method. In this study, we synthesis the porous NiO thin films on the fluorine doped tin oxide (FTO) glass by using sputtering and anodizing method. Also we compared electrical and optical properties of NiO thin films prepared by sol gel. The porous structure is promised to be helpful to the properties enhancement of the EC devices.