• Title/Summary/Keyword: nano-thick

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Effects of nano silver contents on screen printed-etched gate electrodes and electrical characteristics of OTFTs

  • Lee, Mi-Young;Park, Ji-Eun;Song, Chung-Kun
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.917-919
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    • 2009
  • Effects of nano-silver contents(15~50wt%) on screen printed-etched gate electrodes and electrical characteristics of OTFTs were investigated. As Ag contents increased, the screen-printed film was transferred exactly without spreading and obtained the densely-packed layer with a stable and excellent conductivity but, its thickness was increased and surface became rougher. It was found that the leakage current of MIM devices and off-state currents of OTFTs became larger due to poor step coverage of PVP dielectric layer on the thick and rough gate electrodes for nano-Ag inks with Ag contents more than 30wt%.

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Characteristics of Thick Film Gas Sensors Using Nano ZnO:CNT (나노 ZnO:CNT를 이용한 후막 가스센서의 특성연구)

  • Yoon, So-Jin;Yu, Il
    • Korean Journal of Materials Research
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    • v.24 no.8
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    • pp.413-416
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    • 2014
  • The effects of an addition of CNT on the sensing properties of nano ZnO:CNT-based gas sensors were studied for $H_2S$ gas. The nano ZnO sensing materials were grown by a hydrothermal reaction method. The nano ZnO:CNT was prepared by ball-milling method. The weight range of the CNT addition on the ZnO surface was from 0 to 10%. The nano ZnO:CNT gas sensors were fabricated by a screen-printing method on alumina substrates. The structural and morphological properties of the ZnO:CNT sensing materials were investigated by XRD, EDS, and SEM. The XRD patterns revealed that nano ZnO:CNT powders with a wurtzite structure were grown with (1 0 0), (0 0 2), and (1 0 1) dominant peaks. The size of the ZnO was about 210 nm, as confirmed by SEM images. The sensitivity of the nano ZnO:CNT-based sensors was measured for 5 ppm of $H_2S$ gas at room temperature by comparing the resistance in air with that in target gases.

Thermoelastic static and vibrational behaviors of nanocomposite thick cylinders reinforced with graphene

  • Moradi-Dastjerdi, Rasool;Behdinan, Kamran
    • Steel and Composite Structures
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    • v.31 no.5
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    • pp.529-539
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    • 2019
  • Current paper deals with thermoelastic static and free vibrational behaviors of axisymmetric thick cylinders reinforced with functionally graded (FG) randomly oriented graphene subjected to internal pressure and thermal gradient loads. The heat transfer and mechanical analyses of randomly oriented graphene-reinforced nanocomposite (GRNC) cylinders are facilitated by developing a weak form mesh-free method based on moving least squares (MLS) shape functions. Furthermore, in order to estimate the material properties of GRNC with temperature dependent components, a modified Halpin-Tsai model incorporated with two efficiency parameters is utilized. It is assumed that the distributions of graphene nano-sheets are uniform and FG along the radial direction of nanocomposite cylinders. By comparing with the exact result, the accuracy of the developed method is verified. Also, the convergence of the method is successfully confirmed. Then we investigated the effects of graphene distribution and volume fraction as well as thermo-mechanical boundary conditions on the temperature distribution, static response and natural frequency of the considered FG-GRNC thick cylinders. The results disclosed that graphene distribution has significant effects on the temperature and hoop stress distributions of FG-GRNC cylinders. However, the volume fraction of graphene has stronger effect on the natural frequencies of the considered thick cylinders than its distribution.

Nano-Mechanical and Tribological Characteristics of Ultra-Thin Amorphous Carbon Film Investigated by AFM

  • Chung, Koo-Hyun;Lee, Jae-Won;Kim, Dae-Eun
    • Journal of Mechanical Science and Technology
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    • v.18 no.10
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    • pp.1772-1781
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    • 2004
  • The mechanical as well as tribological characteristics of coating films as thin as a few nm become more crucial as applications in micro-systems grow. Especially, the amorphous carbon film has a potential to be used as a protective layer for micro-systems. In this work, quantitative evaluation of nano-indentation, scratching, and wear tests were performed on the 7nm thick amorphous carbon film using an Atomic Force Microscope (AFM). It was shown that AFM-based nano-indentation using a diamond coated tip can be feasibly utilized for mechanical characterization of ultra-thin films. Also, it was found that the critical load where the failure of the carbon film occurred was about 18${\mu}$N by the ramp load scratch test. Finally, the wear experimental results showed that the quantitative wear rate of the carbon film ranged 10$\^$-9/~10$\^$-8/ ㎣ /N cycle. These experimental methods can be effectively utilized for a better understanding the mechanical and tribological characteristics at the nano-scale.

Fabrication and Properties of Porous Ni Thin Films

  • Choi, Sun-Hee;Kim, Woo-Sik;Kim, Sung-Moon;Lee, Jong-Ho;Son, Ji-Won;Kim, Joo-Sun
    • Journal of the Korean Ceramic Society
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    • v.43 no.5 s.288
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    • pp.265-269
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    • 2006
  • We have deposited NiO films by RF sputtering on $Al_2O_3/SiO_2/Si$ and 100 nm-thick Gd doped $CeO_2$ covered $Al_2O_3/SiO_2/Si$ substrates at various $Ar/O_2$ ratios. The deposited films were reduced to form porous Ni thin fllms in 4% $H_2\;at\;400^{\circ}C$. For the films deposited in pure Ar, the reduction was retarded due to the thickness and the orientation of the NiO films. On the other hand, the films deposited in oxygen mixed ambient were reduced and formed porous Ni films after 20 min of reduction. We also investigated the possibility of using the films for the single chamber operation by studying the electrical property of the films in the fuel/air mixed environment. It is shown that the resistance of the Ni film increases quickly in the mixed gas environment and thus further improvements of Ni-base anodes are required for using them in the single chamber operation.

Preparation of Silicon Carbide Ceramic Thick Films by Liquid Process (액상공정을 이용한 탄화규소 세라믹 후막의 제조)

  • Kim, Haeng-Man;Kim, Jun-Su;Lee, Hong-Rim;Ahn, Young-Cheol;Yun, Jon-Do
    • Journal of the Korean Ceramic Society
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    • v.49 no.1
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    • pp.95-99
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    • 2012
  • Silicon carbide ceramics are used for oxidation resistive coating films due to their excellent properties like high strength, good oxidation resistance, and good abrasion resistance, but they have poor formability and are prepared by vapor process which is complicated, costly, and sometimes hazardous. In this study, preparation of silicon carbide coating film by liquid process using polymer precursor was attempted. Coating film was prepared by dip coating on substrate followed by heat treatment in argon at $1200^{\circ}C$. By changing the dipping speed, the thickness was controlled. The effects of plasticizer, binder, or fiber addition on suppression of crack generation in the polymer and ceramic films were examined. It was found that fiber additives was effective for suppressing crack generation.

Effects of Grooved Surface with Nano-ridges on Silicon Substrate on Anisotropic Wettability (실리콘 기판 위에 제작된 나노 크기의 구조물을 가진 그루브 표면이 이방성 젖음에 미치는 영향)

  • Lee, Dong-Ki;Cho, Younghak
    • Journal of the Korean Society of Manufacturing Technology Engineers
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    • v.22 no.3_1spc
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    • pp.544-550
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    • 2013
  • A grooved surface with anisotropic wettability was fabricated on a silicon substrate using photolithography, reactive ion etching, and a KOH etching process. The contact angles (CAs) of water droplets were measured and compared with the theoretical values in the Cassie state and Wenzel state. The experimental results showed that the contact area between a water droplet and a solid surface was important to determine the wettability of the water. The specimens with native oxide layers presented CAs ranging from $71.6^{\circ}$ to $86.4^{\circ}$. The droplets on the specimens with a native oxide layer could be in the Cassie state because they had relatively smooth surfaces. However, the CAs of the specimens with thick oxide layers ranged from $33.4^{\circ}$ to $59.1^{\circ}$. This indicated that the surface roughness for a specimen with a relatively thick oxide layer was higher, and the water droplet was in the Wenzel state. From the CA measurement results, it was observed that the wetting on the grooved surface was anisotropic for all of the specimens.

Fabrication of Thick Film Capacitors with Printing Technology (인쇄기법을 이용한 후막 캐패시터 제작)

  • Lee, Hye-Mi;Shin, Kwon-Yong;Kang, Hyung-Tae;Kang, Heui-Seok;Hwang, Jun-Young;Park, Moon-Soo;Lee, Sang-Ho
    • Proceedings of the KIEE Conference
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    • 2007.11a
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    • pp.100-101
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    • 2007
  • Polymer thick film capacitors were successfully fabricated by using ink-jet printing and screen printing technology. First, a bottom electrode was patterned by ink-jet printing of a nano-sized silver ink. Next, a dielectric layer was formed by the screen printing, then a top electrode was pattern by ink-jet printing of a nano-sized silver ink. The printed area of the dielectric layers were changed into $2{\times}2m^2$and $4{\times}2m^2$, and also the area of the electrodes were patterned with $1{\times}1mm^2$ and $1{\times}3mm^2$. The thickness of the printed dielectric layer was ranged from 1.1 to $1.4{\mu}m$. The analysis of capacitances verified that the capacitances was proportional to the area of the printed electrode. The capacitances of the fabricated capacitors resulted in one third of the calculated capacitances.

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Nano-thick Nickel Silicide and Polycrystalline Silicon on Glass Substrate with Low Temperature Catalytic CVD (유리 기판에 Catalytic CVD 저온공정으로 제조된 나노급 니켈실리사이드와 결정질 실리콘)

  • Song, Ohsung;Kim, Kunil;Choi, Yongyoon
    • Korean Journal of Metals and Materials
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    • v.48 no.7
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    • pp.660-666
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    • 2010
  • 30 nm thick Ni layers were deposited on a glass substrate by e-beam evaporation. Subsequently, 30 nm or 60 nm ${\alpha}-Si:H$ layers were grown at low temperatures ($<220^{\circ}C$) on the 30 nm Ni/Glass substrate by catalytic CVD (chemical vapor deposition). The sheet resistance, phase, microstructure, depth profile and surface roughness of the $\alpha-Si:H$ layers were examined using a four-point probe, HRXRD (high resolution Xray diffraction), Raman Spectroscopy, FE-SEM (field emission-scanning electron microscopy), TEM (transmission electron microscope) and AES depth profiler. The Ni layers reacted with Si to form NiSi layers with a low sheet resistance of $10{\Omega}/{\Box}$. The crystallinty of the $\alpha-Si:H$ layers on NiSi was up to 60% according to Raman spectroscopy. These results show that both nano-scale NiSi layers and crystalline Si layers can be formed simultaneously on a Ni deposited glass substrate using the proposed low temperature catalytic CVD process.