Journal of the Korean Society of Manufacturing Technology Engineers (한국생산제조학회지)

The Korean Society of Manufacturing Technology Engineers (한국생산제조학회)
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Effects of Grooved Surface with Nano-ridges on Silicon Substrate on Anisotropic Wettability

실리콘 기판 위에 제작된 나노 크기의 구조물을 가진 그루브 표면이 이방성 젖음에 미치는 영향

  • Lee, Dong-Ki (Graduate School of NID Fusion Technology, Seoul National University of Science & Technology) ;
  • Cho, Younghak (Department of Mechanical System Design Engineering, Seoul National University of Science & Technology)
  • Received : 2013.03.29
  • Accepted : 2013.05.14
  • Published : 2013.06.15
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Abstract

A grooved surface with anisotropic wettability was fabricated on a silicon substrate using photolithography, reactive ion etching, and a KOH etching process. The contact angles (CAs) of water droplets were measured and compared with the theoretical values in the Cassie state and Wenzel state. The experimental results showed that the contact area between a water droplet and a solid surface was important to determine the wettability of the water. The specimens with native oxide layers presented CAs ranging from $71.6^{\circ}$ to $86.4^{\circ}$. The droplets on the specimens with a native oxide layer could be in the Cassie state because they had relatively smooth surfaces. However, the CAs of the specimens with thick oxide layers ranged from $33.4^{\circ}$ to $59.1^{\circ}$. This indicated that the surface roughness for a specimen with a relatively thick oxide layer was higher, and the water droplet was in the Wenzel state. From the CA measurement results, it was observed that the wetting on the grooved surface was anisotropic for all of the specimens.

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References

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