• 제목/요약/키워드: nano-scale

검색결과 1,058건 처리시간 0.034초

나노 인장시험을 위한 압축 시험기용 인장시편 제작에 관한 연구 (Fabrication of Nano-Size Specimens for Tensile Test Employing Nano-Indentation Device)

  • 임태우;양동열
    • 한국정밀공학회지
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    • 제32권10호
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    • pp.911-916
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    • 2015
  • In the nano/micro scale, material properties are dependent on the size-scale of a structure. However, conventional micro-scale tensile tests have limitations to obtain reliable values of nano-scale material properties owing to residual stress and elastic slippage in the gripping/aligning process. The indenter-driven nano-scale tensile test provides prominent advantages simple testing device, high-quality nano-scale metallic specimen with negligible residual stress. In this paper, two-types of specimens (a specimen with multi-testing parts and a specimen with a single-testing part) are discussed. Focused ion beam (FIB) is employed to fabricate a nano-scale specimen from a thin nickel film. Using the specimen with a single-testing part, we obtained a nano-scale stress-strain curve of electroplated nickel film.

패턴 롤 스템퍼를 이용한 연속 UV 나노 임프린팅 공정기술 개발 (Development of Continuous UV Nano Imprinting Process Using Pattern Roll Stamper)

  • 차주원;안수호;한정원;배형대;명호;강신일
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 2006년도 춘계학술대회 논문집
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    • pp.105-108
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    • 2006
  • It has been issued to fabricate nano-scale patterns with large-scale in the field of digital display. Also, large-scale fabrication technology of nano pattern is very important not only for the field of digital display but also for the most of applications of the nano-scale patterns in the view of the productivity. Among the fabrication technologies, UV nano imprinting process is suitable for replicating polymeric nano-scale patterns. However, in case of conventional UV nano imprinting process using flat mold, it is not easy to replicate large areal nano patterns. Because there are several problems such as releasing, uniformity of the replica, mold fabrication and so on. In this study, to overcome the limitation of the conventional UV nano imprinting process, we proposed a continuous UV nano imprinting process using a pattern roll stamper. A pattern roll stamper that has nano-scale patterns was fabricated by attaching thin metal stamper to a roll base. A continuous UV nano imprinting system was designed and constructed. As practical examples of the process, various nano patterns with pattern size of 500, 150 and 50nm were fabricated. Finally, geometrical properties of imprinted nano patterns were measured and analyzed.

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접촉 면적에 따른 나노/마이크로 마찰 특성 (Nano/Micro Friction with the Contact Area)

  • 윤의성;;공호성
    • Tribology and Lubricants
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    • 제21권5호
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    • pp.209-215
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    • 2005
  • Nano/micro friction with the contact area was studied on Si-wafer (100) and diamond-like carbon (DLC) film. Borosilicate balls of radii $0.32{\mu}m,\;0.5{\mu}m,\;1.25{\mu}m\;and\;2.5{\mu}m$ mounted on the top of AFM tip (NPS) were used for nano-scale contact and Soda Lime glass balls of radii 0.25mm, 0.5mm, 1mm were used for micro-scale contact. At nano-scale, the friction between ball and surface was measured with the applied normal load using an atomic force microscope (AFM), and at micro scale it was measured using ball-on flat type micro-tribotester. All the experiments were conducted at controlled conditions of temperature $(24\pm1^{\circ}C)$ and humidity $(45\pm5\%)$. Friction was measured as a function of applied normal load in the range of 0-160nN at nano scale and in the range of $1000{\mu}N,\; 1500{\mu}N,\;3000{\mu}N\;and\;4800{\mu}N$ at micro scale. Results showed that the friction at nano scale increased with the applied normal load and ball size for both kinds of samples. Similar behavior of friction with the applied normal load and ball size was observed for Si-wafer at micro scale. However, for DLC friction decreased with the ball size. This difference of in behavior of friction in DLC nano- and microscale was attribute to the difference in the operating mechanisms. The evidence of the operating mechanisms at micro-scale were observed using scanning electron microscope (SEM). At micro-scale, solid-solid adhesion was dominant in Silicon-wafer, while plowing in DLC. Contrary to the nano scale that shows almost a wear-less situation, wear was prominent at micro-scale. At nano- and micro-scale, effect of contact area on the friction was discussed with the different applied normal load and ball size.

Nano-Scale Observation of Nanomaterials by In-Situ TEM and Ultrathin SiN Membrane Platform

  • 안치원
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.657-657
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    • 2013
  • In-situ observations of nano-scale behavior of nanomaterials are very important to understand onthe nano-scale phenomena associated with phase change, atomic movement, electrical or optical properties, and even reactions which take place in gas or liquid phases. We have developed on the in-situ experimental technologies of nano-materials (nano-cluster, nanowire, carbon nanotube, and graphene, et al.) and their interactions (percolation of metal nanoclusters, inter-diffusion, metal contacts and phase changes in nanowire devices, formation of solid nano-pores, melting behavior of isolated nano-metal in a nano-cup, et al.) by nano-discovery membrane platform [1-4]. Between two microelectrodes on a silicon nitride membrane platform, electrical percolations of metal nano-clusters are observed with nano-structures of deposited clusters. Their in-situ monitoring can make percolation devices of different conductance, nanoclusters based memory devices, and surface plasmonic enhancement devices, et al. As basic evidence on the phase change memory, phase change behaviors of nanowire devices are observed at a nano-scale.

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Mechanism-based Strain Gradient Plasticity 를 이용한 나노 인덴테이션의 해석 (Analysis of the nano indentation using MSG plasticity)

  • 이헌기;고성현;한준수;박현철
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2004년도 추계학술대회 논문집
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    • pp.413-417
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    • 2004
  • Recent experiments have shown the 'size effects' in micro/nano scale. But the classical plasticity theories can not predict these size dependent deformation behaviors because their constitutive models have no characteristic material length scale. The Mechanism - based Strain Gradient(MSG) plasticity is proposed to analyze the non-uniform deformation behavior in micro/nano scale. The MSG plasticity is a multi-scale analysis connecting macro-scale deformation of the Statistically Stored Dislocation(SSD) and Geometrically Necessary Dislocation(GND) to the meso-scale deformation using the strain gradient. In this research we present a study of nano-indentation by the MSG plasticity. Using W. D. Nix and H. Gao s model, the analytic solution(including depth dependence of hardness) is obtained for the nano indentation , and furthermore it validated by the experiments.

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Nano-Scale Cu Direct Bonding Technology Using Ultra-High Density, Fine Size Cu Nano-Pillar (CNP) for Exascale 2.5D/3D Integrated System

  • Lee, Kang-Wook
    • 마이크로전자및패키징학회지
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    • 제23권4호
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    • pp.69-77
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    • 2016
  • We propose nano-scale Cu direct bonding technology using ultra-high density Cu nano-pillar (CNP) with for high stacking yield exascale 2.5D/3D integration. We clarified the joining mechanism of nano-scale Cu direct bonding using CNP. Nano-scale Cu pillar easily bond with Cu electrode by re-crystallization of CNP due to the solid phase diffusion and by morphology change of CNP to minimize interfacial energy at relatively lower temperature and pressure compared to conventional micro-scale Cu direct bonding. We confirmed for the first time that 4.3 million electrodes per die are successfully connected in series with the joining yield of 100%. The joining resistance of CNP bundle with $80{\mu}m$ height is around 30 m for each pair of $10{\mu}m$ dia. electrode. Capacitance value of CNP bundle with $3{\mu}m$ length and $80{\mu}m$ height is around 0.6fF. Eye-diagram pattern shows no degradation even at 10Gbps data rate after the lamination of anisotropic conductive film.

Innovative Remediation of Arsenic in Groundwater by Nano Scale Zero-Valent Iron

  • Kanel, Sushil-Raj;Kim, Ju-Yong;Park, Heechul
    • 한국지하수토양환경학회:학술대회논문집
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    • 한국지하수토양환경학회 2003년도 추계학술발표회
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    • pp.87-90
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    • 2003
  • This research examines the feasibility of using laboratory-synthesized nano scale zero-valent iron particles to remove arsenic from aqueous phase. Batch experiments were performed to determine arsenic sorption rates as a function of the nano scale zero-valent iron solution concentration. Rapid adsorption of arsenic was achieved with the nano scale zero-valent iron. Typically 1 mg $L^{-1}$ arsenic (III) was adsorbed by 5 g $L^{-1}$ nano scale zero-valent iron below the 0.01 g $L^{-1}$ concentration within 7min. The kinetics of the arsenic sorption followed pseudo-first-order reaction kinetics. Observed reaction rate constants ( $K_{obs}$) varied between 11.4 to 129.0 $h^{-1}$ with respect to different concentrations of nano scale zero-valent iron. A variety of analytical techniques were used to study the reaction products including HGAAS (hydride generator atomic adsorption spectrophotometer), SEM (scanning electron microscopy) and TEM (transmission electron microscopy). Our experimental results suggest novel method for efficient removal of arsenic Iron groundwater.r.

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PMOSFET에서 Hot Carrier Lifetime은 Hole injection에 의해 지배적이며, Nano-Scale CMOSFET에서의 NMOSFET에 비해 강화된 PMOSFET 열화 관찰 (PMOSFET Hot Carrier Lifetime Dominated by Hot Hole Injection and Enhanced PMOSFET Degradation than NMOSFET in Nano-Scale CMOSFET Technology)

  • 나준희;최서윤;김용구;이희덕
    • 대한전자공학회논문지SD
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    • 제41권7호
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    • pp.21-29
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    • 2004
  • 본 논문에서는 Dual oxide를 갖는 Nano-scale CMOSFET에서 각 소자의 Hot carrier 특성을 분석하여 두 가지 중요한 결과를 나타내었다. 하나는 NMOSFET Thin/Thick인 경우 CHC stress 보다는 DAHC stress에 의한 소자 열화가 지배적이고, Hot electron이 중요하게 영향을 미치고 있는 반면에, PMOSFET에서는 특히 Hot hole에 의한 영향이 주로 나타나고 있다는 것이다. 다른 하나는, Thick MOSFET인 경우 여전히 NMOSFET의 수명이 PMOSFET의 수명에 비해 작지만, Thin MOSFET에서는 오히려 PMOSFET의 수명이 NMOSFET보다 작다는 것이다. 이러한 분석결과는 Charge pumping current 측정을 통해 간접적으로 확인하였다. 따라서 Nano-scale CMOSFET에서의 NMOSFET보다는 PMOSFET에 대한 Hot camel lifetime 감소에 관심을 기울여야 하며, Hot hole에 대한 연구가 진행되어야 한다고 할 수 있다.

나노 구조물을 이용한 전자선 차폐 가능성과 한계 조사 (Possibility & Limitation of 1D Nano Scale Electron Shielder)

  • 안성준;이범수;김종일
    • 방사성폐기물학회지
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    • 제5권2호
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    • pp.109-112
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    • 2007
  • 나노 규모의 1차원 양자 구조물을 이용한 전자선 차폐 가능성에 관한 이론적 배경과 한계를 정리한다. 나노 구조물을 이용한 전자선 차폐는 차폐재의 경량화와 소형화에 크게 기여할 것으로 예상되나, 실용화를 위해서는 아직 연구되어야 할 분야가 많다. 임의의 1차원 포텐셜 장벽을 대상으로 양자투과계수 계산을 실행하여, 나노 구조물의 전자선 차폐와 관련된 문제점들을 살펴본다.

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