• Applied Science and Convergence Technology
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• 제24권5호
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• pp.184-189
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• 2015

We report a simple way to enhance the size gradient of an imprinted nanopattern through oxygen plasma etching under a nonuniform magnetic field. A sample substrate was placed next to a magnet, and then a nonuniform magnetic field condition was formed around the sample. Using oxygen plasma etching, a line pattern having an initial width of 273 nm was gradually modified from 248 nm at one end to 182 nm at the other end. Controlling the arrangement of the magnet and sample, we could induce a triangular shape size gradient. We verified that the gradually modified nanopatterns we produced are applicable to continual optical property control, showing a possibility to be utilized for optical components such as gratings and polarizers.

• 전자공학회논문지D
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• 제35D권9호
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• pp.42-47
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• 1998

현재의 전자빔 묘화의 한계를 극복할 수 있는 마이크로 전자빔 시스템의 전자 광학 렌즈를 제작하였고 전자빔 묘화실험을 통하여 이를 검증하였다. 마이크로머시닝기술을 이용하여 실리콘 전극을 제작하고 이를 양극 접합을 통해 조립하여 다층 전극의 전자 광학 렌즈를 제작하였다. 완성된 전자 광학 소자를 초고진공 챔버에 장착하여, STM(Scanning Tunneling Microscope) 팁에서 방출된 전자빔의 focusing 특성을 관찰하였으며 전자를 집속하여 리소그라피를 수행하였다. E-beam 감광막은 PMMA(Poly-methylmethacrylate)를 사용하였고 0.13㎛의 패턴을 형성시킬 수 있었다.

• 마이크로전자및패키징학회지
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• 제23권1호
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• pp.23-28
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• 2016

본 연구에서는 소수성 구현을 위한 표면 거칠기가 접촉각과 접촉각 이력에 미치는 영향을 평가하였다. 초발수 특성을 극대화하기 위해, 액적이 이동하기 위해 필요한 구름저항력을 제안하였으며, 이에 대한 평가를 통하여 표면에 형성한 패턴이 접촉각 이력 및 구름저항력에 큰 영향을 주는 것을 확인하였다. 초발수 특성이 요구되는 실제 응용을 위해서는 액적의 이동에 필요한 에너지를 최소화하기 위하여 접촉각을 극대화하고 동시에 접촉각 이력을 최소화하기 위한 표면 패턴 형상의 최적화가 요구됨을 확인하였다.

• 한국분무공학회지
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• 제16권1호
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• pp.7-14
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• 2011

High pressure LPG fuel spray with a conventional swirl injector was visualized and the impact of the injection pressure was also investigated using a DISI (direct injection spark ignition) LPG single cylinder engine. Engine performance and emission characteristics were evaluated over three different injection pressure and engine loads at an engine speed of 1500 rpm. The fuel spray pattern appeared to notably have longer penetration length and narrower spray angle than those of gasoline due to its lower angular momentum and rapid vaporization. Fuel injection pressure did not affect combustion behaviors but for high injection pressure and low load condition ($P_{inj}$=120 bar and 2 bar IMEP), which was expected weak flow field configuration and low pressure inside the cylinder. In terms of nano particle formation the positions of peak values in particle size distributions were not also changed regardless of the injection pressure, and its number densities were dramatically reduced compared to those of gasoline.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2010년도 제39회 하계학술대회 초록집
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• pp.291-291
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• 2010

Electron-beam lithography (EBL) process is a versatile tool for a fabrication of nanostructures, nano-gap electrodes or molecular arrays and its application to nano-device. However, it is not appropriate for the fabrication of sub-5 nm features and high-aspect-ratio nanostructures due to the limitation of EBL resolution. In this study, the precision assembly and alignment of DNA molecule was demonstrated using sub-5 nm nanostructures formed by a combination of conventional electron-beam lithography (EBL) and plasma ashing processes. The ma-N2401 (EBL-negative tone resist) nanostructures were patterned by EBL process at a dose of $200\;{\mu}C/cm2$ with 25 kV and then were ashed by a chemical dry etcher at microwave (${\mu}W$) power of 50 W. We confirmed that this method was useful for sub-5 nm patterning of high-aspect-ratio nanostructures. In addition, we also utilized the surface-patterning technique to create the molecular pattern comprised 3-(aminopropyl) triethoxysilane (APS) as adhesion layer and octadecyltrichlorosilane (OTS) as passivation layer. DNA-templated gold nanoparticle chain was attached only on the sub-5 nm APS region defined by the amine groups, but not on surface of the OTS region. We were able to obtain DNA molecules aligned selectively on a SiO2/Si substrate using atomic force microscopy (AFM).

• 한국정밀공학회지
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• 제24권4호
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• pp.153-158
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• 2007

Recently nano imprint lithography to fabricate photonic crystal on polymer is preferred because of its simplicity and short process time and ease of precise manufacturing. But, the technique requires the precise mold as an imprinting tool for good replication. These molds are made of the silicon, nickel and quartz. But this is not desirable due to complex fabrication process, high cost. So, we describe a simple, precise and low cost method of fabricating PDMS stamp to make the photonic crystals. In order to fabricate the PDMS mold, we make the original pattern with designed hole array by finding the optimal electron beam writing condition. And then, we have tried to fabricate PDMS mold by the replica molding with ultrasonic vibration and pressure system. We have used the cleaning process to solve the detaching problem on the interface. Using these methods, we acquired the PDMS mold for photonic crystals with characteristics of a good replication. And the accuracy of replication shows below 1% in 440nm at diameter and in 610nm at lattice constant by dimensional analysis by SEM and AFM.

• Journal of the Optical Society of Korea
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• 제9권1호
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• pp.26-31
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• 2005

We describe the design and the implementation of video-rate reflection confocal scanning microscopy (CSM) using an acousto-optical deflector (AOD) for the fast horizontal scan and a galvanometer mirror (GM) for the slow vertical scan. Design parameters of the optical system are determined for optimal resolution and contrast. The OSLO simulations show that the performances of CSM are not changed with deflection angle and the wavefront errors of the system are less than 0.012λ. To evaluate the performances of designed CSM, we do a series of tests, measuring lateral and axial resolution, real time image acquisition. Due to a higher axial resolution compared with conventional microscopy, CSM can detect the surface of sub-micrometer features. We detect 138㎚ line shape pattern with a video-rate (30 frm/sec). And 10㎚ axial resolution is archived. The lateral resolution of the topographic images will be further enhanced by differential confocal microscopy (DCM) method and computational algorithms.

• 한국표면공학회지
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• 제43권4호
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• pp.176-179
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• 2010

The InAs thin films were grown on GaAs(100) substrate with $2^{\circ}C$ tilted toward [$0\bar{1}\bar{1}$] with different As beam equivalent pressure (BEP) by using molecular beam epitaxy. Growth temperature and thickness of the InAs thin films were $480^{\circ}C$ and 0.5 ${\mu}m$, respectively. We studied the relation between the As BEP and the properties of InAs thin films. The properties of InAs thin films were observed by reflection high-energy electron diffraction (RHEED), optical microscope, and Hall effect. The growth, monitored by RHEED, was produced through an initial 2D (2-dimensional) nucleation mode which was followed by a period of 3D (3-dimensional) island growth mode. Then, the 2D growth recovered after a few minutes and the streak RHEED pattern remained clear till the end of growth. The crystal quality of InAs thin films is dependent strongly on the As BEP. When the As BEP is $3.6{\times}10^{-6}$ Torr, the InAs thin film has a high electron mobility of 10,952 $cm^2/Vs$ at room temperature.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2004년도 춘계학술대회
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• pp.240-245
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• 2004

Tensile properties of hard coating material, TiN, were evaluated using micro-tensile testing system. TiN has been known as a hard coating material commonly used today. Micro-tensile testing system consisted of a micro tensile loading system and a micro-ESPI(Electronic Speckle Pattern Interferometry) system. Micro-tensile loading system had a maximum load capacity of 500mN and a resolution of 4.5 nm in stroke. TiN thin film $1{\mu}m$ thick was deposited on the Si wafer pre-deposited of $Si_3N_4$ film substrate by the closed field unbalanced magnetron sputtering (CFUBMS) process. Three kinds of micro-tensile specimen with the respective width of $50{\mu}m$, $100{\mu}m$ and $500{\mu}m$ were fabricated by MEMS process. The mechanical properties including tensile strength and elastic modulus were determined using the micro-tensile testing system and compared by those obtained by nano-indentation

• 한국정밀공학회지
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• 제31권3호
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• pp.189-197
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• 2014

Diffractive optical elements (DOEs) - in general a complex pattern of micro- and nano-scale structures - can modulate and transform light in a predetermined way. Their importance is being increased nowadays because they can be designed to handle a number of simultaneous tasks. In view point of machining DOEs, it is a big challenge to fabricate micro- and nano-scale structures on a free-form surfaces. In this paper, the state-of-the-art of the ultra-precision machine tools is reviewed. Also some technical issues which determine the machine tool accuracy are discussed.