• Polymer(Korea)
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• v.37 no.3
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• pp.323-331
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• 2013

Hesperidin (Hes) has known to having some functions like protection of blood circulatory system, anti-tumor effect, antioxidant effect and anti-inflammatory effect. The goal of this study is to demonstrate the relationship between Hes and inflammatory through in vitro and in vivo studies using poly(lactic-co-glycolic acid) (PLGA) film including Hes as a tissue engineered scaffold. To confirm the proliferation of cells on fabricated scaffold, cells (RAW 264.7 and NIH/3T3) were seeded on PLGA/Hes film then analyzed with MTT and SEM at 1 and 3 days after seeding. The results from ELISA, RT-PCR, and FACS for anti-oxident and anti-inflammatory effect showed that inflammatory response of PLGA/Hes film decreased more than that of PLGA film. Also, in vivo result confirmed that inflammatory response by implanted PLGA/Hes film decreased more comparing with PLGA film. This is because of anti-inflammatory effect of Hes reducing induced inflammatory cell and accumulation of fibrous capsule. The results showed that PLGA/Hes film's capacity on reducing inflammatory is better than PLGA film because of Hes.

• Elastomers and Composites
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• v.51 no.4
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• pp.342-349
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• 2016

Characteristics of the swelling-induced wrinkles on the surfaces of natural rubber (NR) film were investigated. The wrinkle structure was generated by swelling of NR film pre-stretched and firmly bonded onto an aluminum substrate in hexane. A novel experimental method was adopted to replicate the swelling-induced wrinkles on the NR film using an epoxy-hardener system. To get insight into the wrinkle parameters; the wrinkle length (L), wrinkle distance (D), wrinkle height (H) and the angle between two consecutive wrinkles (${\theta}$), the cross-sections of the replicas obtained from saturated swollen NR film were examined using an optical microscopy (OM). From the OM images, the wrinkling parameters were measured as a function of the thickness of NR film from 0.42 to 1.76 mm. Also, it was evaluated that the effects of swelling time on the wrinkling parameters. The length (L), distance (D) and height (H) of wrinkles increased as the thickness of the NR film and the swelling time increased. However, the angle between the wrinkles (${\theta}$) showed a sharp decrease up to a swelling time of 200 minutes and slightly decreased afterwards.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.06a
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• pp.379-380
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• 2007

The characteristics of a co-sputtered indium zinc tin oxide (IZTO) films prepared by dual target dc magnetron sputtering from IZO and ITO targets at a room temperature are investigated. Film properties, such as sheet resistance, optical transmittance, surface work function and surface roughness were examined as a function of ITO dc power at constant IZO dc power of 100 W. It was shown that the increase of the ITO dc power during co-sputtering of ITO and IZO target resulted in an increase of sheet resistance of the IZTO films. This can be attributed to high resistivity of ITO film prepared at room temperature. Surface smoothness and roughness were investigated by Scanning Electron Microscopy (SEM) and Atomic Force Microscopy (AFM). The synchrotron x-ray scattering results obtained from IZTO film with different ITO contents showed that introduction of ITO atoms into amorphous IZO film resulted in a crystallization of IZTO film with (222) preferred orientation due to low alc transition temperature of ITO film. However, the transmittance of the IZTO films with thickness of 150 nm is between 80 and 85 % at wavelength of 550 nm regardless of ITO content. Possible mechanism to explain the ITO and IZO co-sputtering effect on properties of IZTO is suggested.

• Journal of the Korean institute of surface engineering
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• v.54 no.1
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• pp.25-29
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• 2021

The fabrication of nanopore membrane by deposition of Al2O3 film using electron-beam evaporation, which is fast, cost-effective, and negligible dependency on substance material, is investigated for potential applications in water purification and sensors. The decreased nanopore diameter owing to increased wall thickness is observed when Al2O3 film is deposited on anodic aluminum oxide membrane at higher deposition rate, although the evaporation process is generally known to induce a directional film deposition leading to the negligible change of pore diameter and wall thickness. This behavior can be attributed to the collision of evaporated Al2O3 particles by the decreased mean free path at higher deposition rate condition, resulting in the accumulation of Al2O3 materials on both the surface and the edge of the wall. The reduction of nanopore diameter by Al2O3 film deposition can be applied to the nanopore membrane fabrication with sub-100 nm pore diameter.

• Korean Journal of Materials Research
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• v.15 no.5
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• pp.285-292
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• 2005

Anti-reflection film was coated by using spherical silica nano colloids. Silica colloid sol was reserved between two inclined slide glasses by capillary force, and particles were convectively stacked to form a film onto the substrate as the water evaporates. As the sliding speed increased, the thickness of the film decreased and the wavelength at the maximum transmittance decreased. The microstructure observed by SEM showed that silica particles were nearly close packed, which enabled the calculation of the effective refractive index of the film. The film thickness was measured by proffer and calculated from the wavelength of maximum transmittance and the effective refractive index. The effective refractive index of the film could be controlled by a subtle controlling of the coating speed and by mixing two different sized silica particles. When the 100 nm and 50 m particles were mixed at 4:1-5:1 volume ratio, the maximum transmittance of $95.2\%$ for one-sided coating was obtained. This is the one that has increased by $3.8\%$ compared to bare glass substrate, and shows that $99.0\%$ of transmittance or $1.0\%$ of reflectance can be achieved by the simple process if both sides of the substrate are coated.

• Proceedings of the KSME Conference
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• 2004.04a
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• pp.252-257
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• 2004

Nanometer-sized structures are being applied to many devices including micro/nano electronics, optoelectronics, quantum devices, MEMS/NEMS, biosensors, etc. Especially, the thin film with submicron thickness is a basic structure for fabricating these devices, but its mechanical behaviors are not well understood. The mechanical properties of the thin film are different from those of the bulk structure and are difficult to measure because of its handling inconvenience. Several techniques have been applied to mechanical characterization of the thin film, such as nanoindentation test, micro/nano tensile test, strip bending test, etc. In this study, we focus on the strip bending test because of its high accuracy and moderate specimen preparation efforts, and measure Au thin film, which is a very popular material in micro/nano electronic devices. Au film is deposited on Si substrate by evaporation process, of which thickness is 100nm. Using the strip bending test, we obtain elastic modulus, yield and ultimate tensile strength, and residual stress of Au thin film.

• Journal of the Korean Vacuum Society
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• v.22 no.5
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• pp.245-249
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• 2013

The $HfO_X$ thin film was deposited what it has been paid attention to the next generation oxide thin layer of MOSFET (metal-Oxide semiconductor field-effect-transistor) by rf magnetron sputter on Si (100) substrate. The $HfO_X$ thin film was deposited using a various oxygen gas flows (5, 10, 15 sccm). After deposition, $HfO_X$ thin films were annealed from 400 to $800^{\circ}C$ for 20 min in nitrogen ambient. The electrical characteristics of the $HfO_X$ thin film was improved by leakage current properties, depending on the increase of oxygen gas flow and annealing temperature. In particular, the properties of nano-mechanics of $HfO_X$ thin films were measured by AFM and Nano-indenter. From the results, the maximum indentation depth at the basis of maximum indentation force was increased from 24.9 to 38.8 nm according to increase the annealing temperature. Especially, the indentation depth was increased rapidly at $800^{\circ}C$. The rapid increasement of indentation depth was expected to be due to the change of residual stress in the $HfO_X$ thin film, and this result was caused by relative flux of oxygen outgasing during the annealing process.

• Transactions on Electrical and Electronic Materials
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• v.11 no.4
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• pp.186-189
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• 2010

Nano-sized MgO single crystal powders have recently been reported to emit ultraviolet by stimulation of electrons in a vacuum. In this study, nanocrystalline MgO powders were applied to a xenon plasma flat fluorescent lamp (FFL) for a liquid crystal display backlight to improve its emission efficiency through the extra ultraviolet from the nano-MgO crystals. For comparison, a MgO nano-thin film was applied directly on the phosphors inside a lamp panel through e-beam evaporation. Adding MgO nano-crystal powders to the phosphors improved the luminance and efficiency of FFLs by around 20% and MgO nano-crystal coverage of 40% of the phosphor provided the best FFL emission characteristics; however, application of MgO thin film to the phosphors degraded the emission characteristics, even compared to FFLs without MgO. This was due to insufficient ultraviolet stimulation of the phosphors and the crystallinity and low secondary electron coefficient of the MgO.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2014.11a
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• pp.155-155
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• 2014

The oxide film was formed in hydrogen induced cracking (HIC) environment by potentio-dynamic method. Corrosion potentials and rates of the X-65 and X-80 line pipe steels were -0.3495 $V_{SHE}$, $2.833{\times}10^{-3}A/cm^2$ and 0.2716 $V_{SHE}$ and $2.533{\times}10^{-3}A/cm^2$, respectively. Surface composition analysis of the oxide film contained sulfur. Thermodynamic analysis of the HIC solution chemistry suggested that the oxide phase consisted of iron sulfate. Dynamic nano-indentation method applied to determine nano-hardnesses of the oxide film and base metal hardness.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.19 no.8
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• pp.712-716
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• 2006

NiCr thin films prepared on $SiO_2/Si$ substrates at room temperature by magnetron co-sputtering technique and then annealed in a vacuum ambient $(3{\times}10^{-6}\;Torr)\;at\;400^{\circ}C$. The grain size and crystallinity of the films increased with film thickness. The resistivity of the films slightly decreases as the film thickness increases, Temperature coefficient resistance (TCR) exhibits positive values irrespective of film thickness and TCR in the range of 50 to 400 nm thickness shows suitable values for the application of 10 dB in ${\pi}-type$ attenuators.