• Title/Summary/Keyword: nano film

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Clinical In Vivo Bio Assay of Glucose in Human Skin by a Tattoo Film Carbon Nano Tube Sensor

  • Ly, Suw Young;Lee, Chang Hyun
    • Journal of the Korean Applied Science and Technology
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    • v.34 no.3
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    • pp.595-601
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    • 2017
  • In vivo assay of glucose detection was described using a skin tattoo film electrode (STF), and the probe was made from carbon nano tube paste modification film paper. Here in the square-wave stripping anodic working range obtained of $20-100mgL^{-1}$ within an accumulation time of 0 seconds only in sea water electrolyte solutions of pH 7.0. The relative standard deviations of 50 mg glucose that were observed of 0.14 % (n=12), respectively, using optimum stripping accumulation of 30 sec, the low detection limit (S/N) was pegged at 15.8 mg/L. The developed results can be applied to the detect of in vivo skin sensing in real time. Which confirms the results are usable for in vitro or vivo diagnostic clinical analysis.

Effects of Ru Co-Sputtering on the Properties of Porous Ni Thin Films

  • Kim, Woo-Sik;Choi, Sun-Hee;Lee, Hae-Weon;Kim, Joo-Sun
    • Journal of the Korean Ceramic Society
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    • v.43 no.11 s.294
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    • pp.746-750
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    • 2006
  • NiO films and Ru co-sputtered NiO films were deposited by reactive magnetron sputtering for micro-solid oxide fuel cell anode applications. The deposited films were reduced to form porous films. The reduction kinetics of the Ru doped NiO film was more sluggish than that of the NiO film, and the resulting microstructure of the former exhibited finer pore networks. The possibility of using the films for the anodes of single chamber micro-SOFCs was investigated using an air/fuel mixed environment. It was found that the abrupt increase in the resistance is suppressed in the Ru co-sputtered film, as compared to undoped film.

Technology and Application of Hybrid Insulation Film for Electric Magnet Wire (하이브리드 절연필름의 전동기권선 적용 특성 연구)

  • Han, Se-Won;Han, Dong-Hee;Kang, Dong-Phil
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.06a
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    • pp.210-211
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    • 2006
  • This study presents the technology and application of hybrid insulation film for electric magnet wire. In order to make the high efficient motor with high space factor, it is necessary to develop a self-lubrication heat-resistant insulation film that can be used when the space factor 70% or more. A key to achieving high windability is to increase the lubricity and bonding strength of vanish, which for a magnet wire generally determines the mechanical scratches characteristics. Effective ways to reduce scratches include improving insulation film prepared by organic and inorganic hybrid synthesis methods.

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Single Wall Carbon Nanotube Films Produced by Arc Discharge (아크 방전법으로 성장된 대면적 단일벽 탄소나노튜브 필름)

  • Kang, Young-Jin;Oh, Dong-Hoon;Song, Hye-Jin;Jung, Jin-Yeun;Jung, Hyuk;Cho, You-Suk;Kim, Do-Jin
    • Korean Journal of Materials Research
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    • v.18 no.5
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    • pp.253-258
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    • 2008
  • A simple method to deposit carbon nanotube films uniformly on large area substrates using an arc discharge method is reported in this paper. The arc discharge method was modified to deposit carbon nanotube films in situ on the substrates. The substrates were scanned several times over the arcing point for a uniform film thickness. Deposition was carried out under variable dc bias conditions at 600 torr of $H_2$ gas. The thickness uniformity of the single-wall carbon nanotube films as characterized by a four-point probe was within 30% deviation. The morphology and crystal quality of the single-wall carbon nanotube film were also characterized by field emission scanning electron microscopy and Raman spectroscopy.

Bandgap Alteration of Transparent Zinc Oxide Thin Film with Mg Dopant

  • Salina, M.;Ahmad, R.;Suriani, A.B.;Rusop, M.
    • Transactions on Electrical and Electronic Materials
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    • v.13 no.2
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    • pp.64-68
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    • 2012
  • We have successfully demonstrated a bandgap alteration of transparent zinc oxide (ZnO) thin film with Mg dopant by using sol-gel spin coating technique. By increasing the dopant from 0 to 30 atomic percent (at.%), a decrement value in the cutoff is observed, where the absorption edge shifts continuously to the shorter wavelength side, towards 300 nm. This resulted in a significant bandgap increment from 3.28 to 3.57 eV. However, the transmittance of the thin film at 350-800 nm gradually downgraded, from 93 to 80 % which is most probably due to the grain size that becomes bigger, and it also affected the electrical properties. The decrement from 45 to 0.05 mA at +10 V was observed in the I-V characteristics, concluding the significant relationship; where higher optical bandgap materials will exhibit lower conductivity. These findings may be useful in optoelectronics devices.

Effect of Film Thickness on Structural, Electrical, and Optical Properties of Sol-Gel Deposited Layer-by-layer ZnO Nanoparticles

  • Shariffudin, S.S.;Salina, M.;Herman, S.H.;Rusop, M.
    • Transactions on Electrical and Electronic Materials
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    • v.13 no.2
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    • pp.102-105
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    • 2012
  • The structural, electrical, and optical properties of layer-by-layer ZnO nanoparticles deposited using sol-gel spin coating technique were studied and now presented. Thicknesses of the thin films were varied by increasing the number of deposited layers. As part of our characterization process, XRD and FE-SEM were used to characterize the structural properties, current-voltage measurements for the electrical properties, and UV-Vis spectra and photoluminescence spectra for the optical properties of the ZnO thin films. ZnO thin films with thicknesses ranging from 14.2 nm to 62.7 nm were used in this work. Film with thickness of 42.7 nm gave the lowest resistivity among all, $1.39{\times}10^{-2}{\Omega}{\cdot}cm$. Photoluminescence spectra showed two peaks which were in the UV emission centered at 380 nm, and visible emission centered at 590 nm. Optical transmittance spectra of the samples indicated that all films were transparent (>88%) in the visible-NIR range. The optical band gap energy was estimated to be 3.21~3.26 eV, with band gap increased with the thin film thickness.

Effect of Ga-doping on the properties of ZnO films grown on glass substrate at room temperature by radio frequency magnetron sputtering (RF 마그네트론 스퍼터링 방법으로 상온에서 유리기판 위에 성장시킨 ZnO의 성질에 미치는 Ga 도핑 효과)

  • Kim, G.C.;Lee, J.S.;Lee, S.K.;Kim, D.H.;Lee, S.H.;Moon, J.H.;Jeon, M.H.
    • Journal of the Korean Vacuum Society
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    • v.17 no.1
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    • pp.40-45
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    • 2008
  • We present the effect of Ga-doping on the electrical, structural and optical properties of ZnO layers with a thickness of ${\sim}500nm$ deposited on glass substrates. Polycrystalline ZnO and Ga-doped ZnO (GZO) layers were deposited by radio frequency (rf) magnetron sputtering at room temperature. Based on the X-ray diffraction (XRD) and transmission electron microscopy (TEM) data, the crystalline quality of Ga-doped ZnO film was improved and GZO film has a preferred orientation along with the (002) crystal direction. The transmittance of the GZO film was enhanced by 10% in the visible region from that of the ZnO film. From photoluminescence (PL) data, the ratio of intensity of near band edge (NBE) emission to deep level (DL) emission was as high as 2.65:1 and 1.27:1 in the GZO and ZnO films, respectively. The res istivities of GZO and ZnO films were measured to be 1.27 and 1.61 $\Omega{\cdot}cm$, respectively. The carrier concentrations of ZnO and GZO film were approximately 1018 and 1020 $cm^2$/Vs, respectively. Based on our experimental results, the Ga-doping improves the electrical, structural and optical properties of ZnO film with potential application.

Electrical Characterization of Nano SOI Wafer by Pseudo MOSFET (Pseudo MOSFET을 이용한 Nano SOI 웨이퍼의 전기적 특성분석)

  • Bae, Young-Ho;Kim, Byoung-Gil;Kwon, Kyung-Wook
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.18 no.12
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    • pp.1075-1079
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    • 2005
  • The Pseudo MOSFET measurements technique has been used for the electrical characterization of the nano SOI wafer. Silicon islands for the Pseudo MOSFET measurements were fabricated by selective etching of surface silicon film with dry or wet etching to examine the effects of the etching process on the device properties. The characteristics of the Pseudo MOSFET were not changed greatly in the case of thick SOI film which was 205 nm. However the characteristics of the device were dependent on etching process in the case of less than 100 nm thick SOI film. The sub 100 nm SOI was obtained by thinning the silicon film of standard thick SOI wafer. The thickness of SOI film was varied from 88 nm to 44 nm by chemical etching. The etching process effects on the properties of pseudo MOSFET characteristics, such as mobility, turn-on voltage, and drain current transient. The etching Process dependency is greater in the thinner SOI wafer.

Effect of Alanine on Cu/TaN Selectivity in Cu-CMP (Cu-CMP에서 Alanine이 Cu와 TaN의 선택비에 미치는 영향)

  • Park Jin-Hyung;Kim Min-Seok;Paik Ungyu;Park Jea-Gun
    • Korean Journal of Materials Research
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    • v.15 no.6
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    • pp.426-430
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    • 2005
  • Chemical mechanical polishing (CMP) is an essential process in the production of integrated circuits containing copper interconnects. The effect of alanine in reactive slurries representative of those that might be used in copper CMP was studied with the aim of improving selectivity between copper(Cu) film and tantalum-nitride(TaN) film. We investigated the pH effect of nano-colloidal silica slurry containing alanine through the chemical mechanical polishing test for the 8(inch) blanket wafers as deposited Cu and TaN film, respectively. The copper and tantalum-nitride removal rate decreased with the increase of pH and reaches the neutral at pH 7, then, with the further increase of pH to alkaline, the removal rate rise to increase soddenly. It was found that alkaline slurry has a higher removal rate than acidic and neutral slurries for copper film, but the removal rate of tantalum-nitride does not change much. These tests indicated that alanine may improve the CMP process by controlling the selectivity between Cu and TaN film.

Development of Highly Conductive Poly(3,4-ethylenedioxythiophene) Thin Film using High Quality 3-Aminopropyltriethoxysilane Self-Assembled Monolayer (고품질 3-Aminopropyltriethoxysilane 자기조립단분자막을 이용한 고전도도 Poly(3,4-ethylenedioxythiophene) 전극박막의 개발)

  • Choi, Sangil;Kim, Wondae;Kim, Sungsoo
    • Journal of Integrative Natural Science
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    • v.4 no.4
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    • pp.294-297
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    • 2011
  • Quality of PEDOT electrode thin film vapor phase-polymerized on 3-aminopropyltriethoxysilane (APS) self-assembled monolayer (SAM) is very crucial for making an ohmic contact between electrode and semiconductor layer of an organic transistor. In order to improve the quality of PEDOT film, the quality of APS-SAM laying underneath the film must be in the best condition. In this study, in order to improve the quality of APS-SAM, the monolayer was self-assembled on $SiO_2$ surface by a dip-coating method under strictly controlled relative humidity (< 18%RH). The quality of APS-SAM and PEDOT thin film were investigated with a contact angle analyzer, AFM, FE-SEM, and four-point probe. The investigation showed that a PEDOT film grown on the humidity-controlled SAM is very smooth and compact (sheet resistivity = 20.2 Ohm/sq) while a film grown under the uncontrolled condition is nearly amorphous and contains quite many pores (sheet resistivity = 200 Ohm/sq). Therefore, this study clearly proves that a highly improved quality of APSSAM can offer a highly conductive PEDOT electrode thin film on it.