• ETRI Journal
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• 제37권6호
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• pp.1135-1142
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• 2015

Multilayered ZnO-$SnO_2$ heterostructure thin films consisting of ZnO and $SnO_2$ layers are produced by alternating the pulsed laser ablation of ZnO and $SnO_2$ targets, and their structural and field-effect electronic transport properties are investigated as a function of the thickness of the ZnO and $SnO_2$ layers. The performance parameters of amorphous multilayered ZnO-$SnO_2$ heterostructure thin-film transistors (TFTs) are highly dependent on the thickness of the ZnO and $SnO_2$ layers. A highest electron mobility of $43cm^2/V{\cdot}s$, a low subthreshold swing of a 0.22 V/dec, a threshold voltage of 1 V, and a high drain current on-to-off ratio of $10^{10}$ are obtained for the amorphous multilayered ZnO(1.5nm)-$SnO_2$(1.5 nm) heterostructure TFTs, which is adequate for the operation of next-generation microelectronic devices. These results are presumed to be due to the unique electronic structure of amorphous multilayered ZnO-$SnO_2$ heterostructure film consisting of ZnO, $SnO_2$, and ZnO-$SnO_2$ interface layers.

• 한국전기전자재료학회논문지
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• 제23권9호
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• pp.681-684
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• 2010

The $TiO_2$/ZnS/Ag/ZnS/$TiO_2$ multilayered structure for the transparent electrodes in plasma display panel was designed by essential macleod program (EMP) and the multilayered film was deposited on a glass substrate by direct-current (DC)/radio-frequency (RF) magnetron sputtering system. During film deposition process, the Ag layer in $TiO_2$/Ag/$TiO_2$ structure became oxidized and the filter characteristic was degraded easily. In this study, ZnS layer was adopted as a diffusion blocking layer between $TiO_2$ and Ag to prevent the oxidation of Ag layer efficiently in $TiO_2$/ZnS/Ag/ZnS/$TiO_2$ structure. Based on the AES depth profiling analysis, the Ag layer was effectively protected by the ZnS layer as compared with the $TiO_2$/Ag/$TiO_2$ multilayered films without ZnS as an antioxidant layer. The 3 times stacked $TiO_2$/ZnS/Ag/ZnS/$TiO_2$ films have low sheet resistance of $1.22{\Omega}/{\square}$ and luminous transmittance was as high as 62% in the visible ranges.

• 한국응용과학기술학회지
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• 제39권1호
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• pp.34-41
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• 2022

일상적인 화학제품들의 사용량이 증가함에 따라 사용되었던 염료 폐기물 처리 또한 중요한 환경적인 문제로 대두되었다. 이러한 염료폐기물은 광촉매를 이용하여 분해시킬 수 있는데, 졸-겔 기술을 활용하면 매우 비용 효율적으로 광촉매를 합성할 수 있다. 졸-겔 기술은 나노스케일의 막 형성에도 상당히 유용하며 간단하게 다층구조를 형성할 수도 있다. 본 연구에서는 다양한 염료 분해에 효과가 있는 산화아연(ZnO) 이용하여 다중 회전도포 방법으로 다층구조(3층, 5층)를 가진 ZnO 막을 형성하였다. 성능비교를 위해 단일 회전도포 방법에 의한 단층구조를 가진 ZnO 막을 대조군으로 준비하였다. X선 회절분석기 및 에너지 분산 X선 분광계를 이용하여 ZnO의 구조 및 원소분석을 수행하였고, 주사전자현미경을 통해 나노선같은 표면형상을 관찰할 수 있었다. 추가적으로 UV-Vis 분광광도계를 활용하여 자외선의 흡수도를 측정하였다. 5층구조를 가진 ZnO 막이 단층 구조를 가진 ZnO 막에 비해 모의 메틸렌 블루를 49% 더 많이 분해하였다. 결론적으로, 다층구조를 가진 ZnO 는 메틸렌블루 염료를 더욱 효과적으로 분해하는 광촉매로써 유용하다는 알 수 있었다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2003년도 제5회 영호남 학술대회 논문집
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• pp.126-129
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• 2003

The electrical properties of a ZnO-based multilayered chip varistor (abbreviated as MLV) were studied as functions of firing condition and the degree of lamination. The fundamental varistor characteristics such as nonlinear coefficient and breakdown voltage were independent of the degree of lamination. As the number of the laminated ceramic sheets increased, however, not only the energy handling capability but also the capacitance and the leakage current which are relevant to delayed response to the voltage surge and the pre-breakdown energy loss, respectively, increased. With the increase of firing temperature between $950^{\circ}C$ and $1150^{\circ}C$, both the capacitance and the leakage current of the MLV increased due mainly to the grain growth of ZnO and the volatilization of $BiO_2O_3$. High performance MLVs with clear electrode pattern were obtained at the firing temperature range of $l000{\sim}1050^{\circ}C$ in this experiment.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제51권9호
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• pp.417-422
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• 2002

ZnO thin films were deposited on various substrates, such as Si-(111), SiO$_2$(5000 $\AA$ by thermal CVD)/Si-(100), and SiO$_2$(2000 $\AA$ by RF sputtering)/Si-(100). The (002)-orientation, surface morphology and roughness, and electrical resistivity of deposited films were measured and compared in terms of substrate. Surface acoustic wave(SAW) filters with a multilayered configuration of IDT/ZnO/SiO$_2$/Si were also fabricated and the IDT was obtained using a lift-off method. From the frequency-response characteristics of fabricated devices, the insertion loss and side-lobe rejection were estimated. The experimental results showed that the (002)-oriented growth nature of ZnO films, which played a crucial role of determining the characteristic of SAW device, was strong1y dependent upon the SiO$_2$buffer.

• Transactions on Electrical and Electronic Materials
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• 제13권4호
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• pp.208-211
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• 2012

In the present study, a ZnO thin film, as a buffer layer of ITO (indium tin oxide) film was deposited on glass substrates by RF magnetron sputtering at low temperature of $150^{\circ}C$. In order to estimate the optical characteristics and compare with the experimental results in Glass/ZnO(100 nm)/ITO(35 nm) multilayered film, the simulation program, EMP (Essential Macleod Program) was adopted. The sheet resistance and optical transmittance of the films were measured using the four-point probe method and spectrophotometer, respectively. From X-ray diffraction patterns, all the films deposited at $150^{\circ}C$ demonstrated only the amorphous phase. Optical transmittance was the highest at a ZnO thickness of 100 nm. The ITO(35 nm)/ZnO(100 nm) film exhibits an optical transmittance of >92% at 550 nm. The multilayered film showed an electrical sheet resistance of 407 ${\Omega}/sq.$, which is significantly better than that of a single-layer ITO film without a ZnO buffer layer (815 ${\Omega}/sq.$).

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2000년도 제1회 학술대회 논문집
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• pp.37-38
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• 2000

The ZnS:Tb thin-film electroluminescent devices were grown by atomic layer deposition with utilizing single-layer aluminum oxide and/or multilayered tantalum aluminum oxide, $Ta_xAl_yO$, as upper and lower insulating layers. These devices were investigated in terms of the luminescent and electrical characteristics. From this analysis, the devices using the $Ta_xAl_yO$ instead of $Al_2O_3$ were observed to have a lower threshold voltage for emission due to the higher relative dielectric constant of $Ta_xAl_yO$ insulators than that of the $Al_2O_3$ device. And there was a large amount of dynamic space charge generation in the phosphor of the device with the $Ta_xAl_yO$ insulators seemingly due to electron multiplication such as trap ionization.

• 한국세라믹학회지
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• 제39권3호
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• pp.286-293
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• 2002

소성온도에 따른 ZnO계 적층형 세라믹 칩 바리스터(약칭 MLV)의 미세구조와 전기적 특성의 변화를 조사하였다. 소성온도 1100$^{\circ}$C에서 Ag/Pd(7:3) 내부전극층의 두께가 불균일하게 변화하면서 부분적인 공극이 발생하기 시작하고, 1150$^{\circ}$C에서는 상당한 전극 패턴의 소멸과 박리가 관찰되었다. 950$^{\circ}$C로 소성한 MLV의 경우 누설전류의 열화가 특히 컸는데 이는 미반응의 pyrochlore상이 잔류하여 액상과 천이원소의 균일한 분포가 일어나지 않았기 때문이라 사료된다. 1100$^{\circ}$C 이상의 온도로 소성한 경우에는 바리스터 특성 및 그 재현성의 저하가 관찰되었는데, 이는 내부전극의 소멸, 전극물질과 소체의 반응, 그리고 $Bi_2O_3$의 휘발에 기인한 것으로 보인다. 한편, 950∼1100$^{\circ}$C의 전 소성온도 범위에 걸쳐 온도가 증가할수록 정전용량과 누설전류는 증가하고 항복전압과 피크전류는 감소하였으나, 비선형계수와 클램핑 비는 각각 ∼30 및 1.4로 거의 일정한 값을 유지하였다. 특히 1000∼1050$^{\circ}$C 소성체의 경우 칩 바리스터에 적합한 바리스터 특성이 재현성 있게 나타났다. 결과적으로 Ag/Pd(7:3) 합금은 1050$^{\circ}$C의 동시 소성 온도이하에서는 $Bi_2O_3$를 함유한 대부분의 ZnO계 MLV의 내부전극으로 충분히 사용가능한 것으로 판단된다.

• 한국자기학회지
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• 제7권1호
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• pp.19-24
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• 1997

적층형 chip inductor 소재인 NiCuZn ferrite의 제조 공정 조건 및 조성을 선정하였다. NiCuZn ferrite의 NiO 함량이 증가할 수록 저온 소결에 필요한 Fe$_{2}$O$_{3}$ 결핍량은 점차 증가하였고, NiO 함량과 Co$_{3}$O$_{4}$ 첨가량을 변화하여 투자율을 12 ~ 562 범위에서 제어할 수 있었다. NiCuZn ferrite의 투자율이 562에서 60으로 변화함에 따라서 Q$_{max}$ 주파수는 3 MHz에서 50 MHz 범위로 제어할 수 있었다. 이때 Q$_{max}$ 주파수(Y)와 투자율(X)은 log Y = 4.2-1.4 log X의 상관관계를 나타내었다.

• Progress in Superconductivity
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• 제13권2호
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• pp.90-96
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• 2011

We investigated the properties of artificial pinning centers of YBCO multilayer films in which $Y_2O_3$ and ZnO nanoparticles are uniformly introduced by using the pulsed laser deposition (PLD) technique. $Y_2O_3$ and ZnO nanoparticles were deposited on top of YBCO buffer layer and the density of nanoparticles was controlled by varying the number of nanoparticle layers. YBCO superconducting layers with total thickness of 250 nm were deposited on top of $Y_2O_3$ and ZnO nanoparticles. Based on analyses of the surface morphology, the transition temperature $T_c$, and the critical current density $J_c$, we discussed the difference between the two kinds of nanoparticles as flux pinning centers.