• 제목/요약/키워드: multi-layer dielectric

검색결과 131건 처리시간 0.031초

HSS STI-CMP 공정의 최적화에 관한 연구 (Study on the Optimization of HSS STI-CMP Process)

  • 정소영;서용진;박성우;김철복;김상용;이우선
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 춘계학술대회 논문집 센서 박막재료 반도체 세라믹
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    • pp.149-153
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    • 2003
  • Chemical mechanical polishing (CMP) technology for global planarization of multi-level inter-connection structure has been widely studied for the next generation devices. CMP process has been paid attention to planarized pre-metal dielectric (PMD), inter-layer dielectric (ILD) interconnections. Expecially, shallow trench isolation (STI) used to CMP process on essential. Recently, the direct STI-CMP process without the conventional complex reverse moat etch process has established by using slurry additive with the high selectivity between $SiO_2$ and $Si_3N_4$ films for the purpose of process simplification and n-situ end point detection(EPD). However, STI-CMP process has various defects such as nitride residue, tom oxide and damage of silicon active region. To solve these problems, in this paper, we studied the planarization characteristics using a high selectivity slurry(HSS). As our experimental results, it was possible to achieve a global planarization and STI-CMP process could be dramatically simplified. Also we estimated the reliability through the repeated tests with the optimized process conditions in order to identify the reproducibility of HSS STI-CMP process.

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SBN 박막의 결정화 및 전기적 특성에 관한 씨앗층 두께의 영향 (Effect of Seed-layer thickness on the Crystallization and Electric Properties of SBN Thin Films.)

  • 장재훈;이동근;이희영;조상희
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 추계학술대회 논문집 Vol.16
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    • pp.271-274
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    • 2003
  • [ $Sr_xBa_{1-x}Nb_2O_6$ ] (SBN, $0.25{\leq}x{\leq}0.75$) ceramic is a ferroelectric material with tetragonal tungsten bronze (TTB) type structure, which has a high pyroelectric coefficient and a nonlinear electro-optic coefficient value. In spite of its advantages, SBN has not been investigated well compared to other ferroelectric materials with perovskite structure. In this study, SBN thin film was manufactured by ion beam sputtering technique using the prepared SBN target in $Ar/O_2$ atmosphere. SBN30 thin films of different thickness were pre-deposited as a seed layer on $Pt(100)/TiO_2/SiO_2/Si$ substrate followed by SBN60 deposition up to $4500\;{\AA}$ in thickness. As-deposited SBN60/SBN30 layer was heat-treated at different temperatures of 650, 700, 750, and $800\;^{\circ}C$ in air, respectively, The crystallinity and orientation behavior as well as electric properties of SBN60/SBN30 multi-layer were examined. The deposited layer was uniform and the orientation was shown primarily along (001) plane from XRD pattern. There was difference in the crystal structure with heat-treatment temperature, and the electric properties depended on the heating temperature and the seed-layer thickness. In electric properties of Pt/SBN60/SBN30/Pt thin film capacitor prepared, the remnant polarization (2Pr) value was $15\;{\mu}C/cm^2$, the coercive field (Ec) 65 kV/cm, and the dielectric constant 1492, respectively.

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GSM/CDMA 대역용 LTCC Diplexer설계 및 제작 (Design and Fabrication of a LTCC Diplexer for GSM/CDMA Applications)

  • 김태완;이영철
    • 한국정보통신학회논문지
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    • 제13권7호
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    • pp.1267-1271
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    • 2009
  • 본 논문에서는 LTCC 다층회로 기술을 이용하여 GSM과 CDMA 대역을 분리 하는 diplexer를 설계 및 제작하여 그 특성을 측정하였다. Diplexer의 집적도를 높이가 위해 3차원 적층형 인덕터와 커패시터를 이용하여 유전율 7이고, 총 6층의 LTCC 기판에 설계되었다. 저역통과 필터에 인덕터와 고역통과 필터에 커패시터를 각각 병렬로 결합하여 두 대역의 주파수 대역의 선택성을 높였다. LTCC표준 공정으로 제작되어진 다이플렉서의 크기는CPW pad를 포함하여 3,450 ${\times}$4,000 ${\times}$694 ${\mu}$m3이다. GSM 대역에서 -1.35 dB 이하의 삽입 손실과 -5.66 dB 이상의 반사 손실, 그리고 CDMA 대역에서는 -1.54 dB 이하의 삽입 손실과 -9.30 dB 이상의 반사 손실의 특성을 나타내었다.

SBN60 박막의 결정화 및 전기적 특성에 관한 씨앗층의 영향 (Effect of Seed-layer on the Crystallization and Electric Properties of SBN60 Thin Films)

  • 장재훈;이동근;이희영;조상희
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.2
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    • pp.723-727
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    • 2003
  • [ $Sr_xBa_{1-x}Nb_2O_6$ ] (SBN, $0.25{\leq}x{\leq}0.75$) ceramic is a ferroelectric material with tetragonal tungsten bronze (TTB) type structure, which has a high pyroelectric coefficient and a nonlinear electro-optic coefficient value. In spite of its advantages, SBN has not been investigated well compared to other ferroelectric materials with perovskite structure. In this study, SBN thin film was manufactured by ion beam sputtering technique using the prepared SBN target in $Ar/O_2$ atmosphere. SBN30 thin film of $1000{\AA}$ was pre-deposited as a seed layer on $Pt(100)/TiO_2/SiO_2/Si$ substrate followed by SBN60 deposition up to $3000{\AA}$ in thickness. As-deposited SBN60/SBN30 layer was heat-treated at different temperatures of 650, 700, 750, and $800^{\circ}C$ in air, respectively The crystallinity and orientation behavior as well as electric properties of SBN60/SBN30 multi-layer were examined. The deposited layer was uniform and the orientation was shown primarily along (001) plane from XRD pattern. There was no difference in the crystal structure with heat-treatment temperature, but the electric properties depended on the heating temperature and was the best at $750^{\circ}C$. In electric properties of Pt/SBN60/SBN30/Pt thin film capacitor prepared, the remnant polarization (2Pr) value was $15{\mu}C/cm^2$, the coercive field (Ec) 75 kV/cm, and the dielectric constant 1075, respectively.

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Flexibility Improvement of InGaZnO Thin Film Transistors Using Organic/inorganic Hybrid Gate Dielectrics

  • Hwang, B.U.;Kim, D.I.;Jeon, H.S.;Lee, H.J.;Lee, N.E.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.341-341
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    • 2012
  • Recently, oxide semi-conductor materials have been investigated as promising candidates replacing a-Si:H and poly-Si semiconductor because they have some advantages of a room-temperature process, low-cost, high performance and various applications in flexible and transparent electronics. Particularly, amorphous indium-gallium-zinc-oxide (a-IGZO) is an interesting semiconductor material for use in flexible thin film transistor (TFT) fabrication due to the high carrier mobility and low deposition temperatures. In this work, we demonstrated improvement of flexibility in IGZO TFTs, which were fabricated on polyimide (PI) substrate. At first, a thin poly-4vinyl phenol (PVP) layer was spin coated on PI substrate for making a smooth surface up to 0.3 nm, which was required to form high quality active layer. Then, Ni gate electrode of 100 nm was deposited on the bare PVP layer by e-beam evaporator using a shadow mask. The PVP and $Al_2O_3$ layers with different thicknesses were used for organic/inorganic multi gate dielectric, which were formed by spin coater and atomic layer deposition (ALD), respectively, at $200^{\circ}C$. 70 nm IGZO semiconductor layer and 70 nm Al source/drain electrodes were respectively deposited by RF magnetron sputter and thermal evaporator using shadow masks. Then, IGZO layer was annealed on a hotplate at $200^{\circ}C$ for 1 hour. Standard electrical characteristics of transistors were measured by a semiconductor parameter analyzer at room temperature in the dark and performance of devices then was also evaluated under static and dynamic mechanical deformation. The IGZO TFTs incorporating hybrid gate dielectrics showed a high flexibility compared to the device with single structural gate dielectrics. The effects of mechanical deformation on the TFT characteristics will be discussed in detail.

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SBN60 박막의 결정화 및 전기적 특성에 관한 씨앗층의 영향 (Effect of Seed-layer on the Crystallization and Electric Properties of SBN60 Thin Films)

  • 장재훈;이동근;이희영;조상희
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 제5회 영호남 학술대회 논문집
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    • pp.85-88
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    • 2003
  • $Sr_xBa_{1-x}Nb_2O_6$(SBN, $025{\leq}x{\leq}0.75$) ceramic is a ferroelectric material with tetragonal tungsten bronze (TTB) type structure, which has a high pyroelectric coefficient and a nonlinear electro-optic coefficient value. In spite of its advantages, SBN has not been investigated well compared to other ferroelectric materials with perovskite structure. In this study, SBN thin film was manufactured by ion beam sputtering technique using the prepared SBN target in Ar/$O_2$ atmosphere. SBN30 thin film of 500 ${\AA}$ was pre-deposited as a seed layer on Pt(l00)/$TiO_2$/$SiO_2$/Si substrate followed by SBN60 deposition up to 4500 ${\AA}$ in thickness. SBN60/SBN30 layer was deposited at different Oxygen amount of 0, 8.1, 17, and 31.8 sccm, respectively. The crystallinity and orientation behavior as well as electric properties of SBN60/SBN30 multi-layer were examined. The deposited layer was uniform and the orientation was shown primarily along (001) plane from XRD pattern. The crystal structure and the electric properties depended on the Oxygen amount, heating temperature and was the best at O2 = 8.1 seem, $750^{\circ}C$. In electric properties of Pt/SBN60/SBN30/Pt thin film capacitor prepared, the remnant polarization (2Pr) value was 13 ${\mu}C/cm^2$, the coercive field (Ec) 75 kV/cm, and the dielectric constant 1492, respectively.

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SiO2의 첨가를 통한 Polyfluorene계 Polymer-OLED의 발광 동작 개선 가능성 (Improved On-off Property of SiO2 Embedded Polyfluorene Polymer-OLED)

  • 전병주;김효준;김종수;정용석
    • 반도체디스플레이기술학회지
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    • 제16권1호
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    • pp.40-44
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    • 2017
  • The effect of weak dielectric silicone dioxide($SiO_2$) embedded in polyfluorene(PFO) emitting layer of polymer-based multi structure OLED was investigated. Indium tin oxide(ITO)/poly(3,4-ethylenedioxythiophene)-poly(styrenesulfonate) (PEDOT:PSS)/poly(9,9-di-n-octylfluorenyl-2,7-diyl)(PFO)/2,2,2"-(1,3,5-benzinetriyl)-tris(1-phenyl-1-H-benzimidazole) (TPBi)/aluminum(Al) structure OLED was fabricated by spin-coating method. Applied electric field causes some effect on $SiO_2$ in PFO layer. Thus, interaction between polymers and affected $SiO_2$ might generate electrical and luminance properties change. Experimental results, show the reduced threshold voltage of 6 V(from 23 V to 17 V). The maximum current density was rather increased from $71A/m^2$ to $610A/m^2$ and maximum brightness was also increased from $7.19cd/m^2$ to $41.03cd/m^2$, 9 and 6 times each. Additionally we obtained colour broadening result due to the increasing of blue-green band emission. Consequently we observed that electrical and luminance properties are enhanced by adding $SiO_2$ and identified the possibility of controlling the emission colour of OLED device according to colour broadening.

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주기적인 원형 2D-격자의 회절에 대한 모드 전송선로 이론 (Modal Transmission-Line Theory for Optical Diffraction of Periodic Circular 2D-Grating)

  • 호광춘
    • 한국인터넷방송통신학회논문지
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    • 제19권1호
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    • pp.247-252
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    • 2019
  • 다층 주기 구조에 의한 광 신호의 회절 특성은 기본 격자구조와 연계된 Fourier 확장을 사용하여 2D 공간에서 공식화 된다. 그때 각 층에서의 필드들은 특성 모드에 의하여 표현되며, 완전한 해는 적절한 경계 값 문제에 의존하는 모드 전송선로이론(MTLT)을 사용하여 정확하게 얻을 수 있다. 이러한 해석법은 일반적으로 다층 구조에 평행 또는 수직 방향에 따라 광학 특성을 갖는 임의의 형태의 유전체 성분을 포함하는 모든 주기적 격자들을 처리할 수 있다. 본 논문은 간단한 주기적인 원형 2D-구조에 대하여 과거에 보고된 데이터와 비교하여 현 해석법을 설명하였다. 또한 제시한 해석법은 가능한 표준 형태와 높은 유전율을 가지는 복수의 주기적인 영역을 포함하는 매우 복잡한 구조들에 대하여 쉽게 적용할 수 있다.

임베디드 커패시터로의 응용을 위해 상온에서 RF 스퍼터링법에 의한 증착된 bismuth magnesium niobate 다층 박막의 특성평가 (The characteristics of bismuth magnesium niobate multi layers deposited by sputtering at room temperature for appling to embedded capacitor)

  • 안준구;조현진;유택희;박경우;웬지긍;허성기;성낙진;윤순길
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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    • pp.62-62
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    • 2008
  • As micro-system move toward higher speed and miniaturization, requirements for embedding the passive components into printed circuit boards (PCBs) grow consistently. They should be fabricated in smaller size with maintaining and even improving the overall performance. Miniaturization potential steps from the replacement of surface-mount components and the subsequent reduction of the required wiring-board real estate. Among the embedded passive components, capacitors are most widely studied because they are the major components in terms of size and number. Embedding of passive components such as capacitors into polymer-based PCB is becoming an important strategy for electronics miniaturization, device reliability, and manufacturing cost reduction Now days, the dielectric films deposited directly on the polymer substrate are also studied widely. The processing temperature below $200^{\circ}C$ is required for polymer substrates. For a low temperature deposition, bismuth-based pyrochlore materials are known as promising candidate for capacitor $B_2Mg_{2/3}Nb_{4/3}O_7$ ($B_2MN$) multi layers were deposited on Pt/$TiO_2/SiO_2$/Si substrates by radio frequency magnetron sputtering system at room temperature. The physical and structural properties of them are investigated by SEM, AFM, TEM, XPS. The dielectric properties of MIM structured capacitors were evaluated by impedance analyzer (Agilent HP4194A). The leakage current characteristics of MIM structured capacitor were measured by semiconductor parameter analysis (Agilent HP4145B). 200 nm-thick $B_2MN$ muti layer were deposited at room temperature had capacitance density about $1{\mu}F/cm^2$ at 100kHz, dissipation factor of < 1% and dielectric constant of > 100 at 100kHz.

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Outgas 분석을 통한 MLCC Bar 변형률 측정 (Experimental Study on the Deformation of MLCC Compressed Bar by Quantitative Analysis for Outgas)

  • 김민주;김종윤;정기호;박창식
    • 한국전기전자재료학회논문지
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    • 제23권6호
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    • pp.458-463
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    • 2010
  • MLCC (multi-layer ceramic capacitor) is usually fabricated by lamination of predetermined number of single layers. Often, the state of MLCC before sintering is called the green state, whose strength comes from the adhesion between the dielectric material and the polymer binder. Therefore the lamination of a single layer before sintering can be easily deformed by environment due to the relatively lower strength. After the compression process, which helps single sheets cohereto with adjacent sheets, the MLCC green bar is preheated to resolve the probable internal stress. Unfortunately, unexpected deformation after preheating resulted in problems during cutting of the MLCC green bar. In this study, one of 2 primary hypotheses which were proposed to resolve the unexpected deformation after preheating was examined by quantitative experiment with GC/MS (gas chromatograpy/mass spectrometer). The proportion of deformation caused by DOP evaporation, which was primarily evaporated componet during preheating, to the total deformation of the MLCC green bar was found to be 53%.