• Transactions of the Korean Society of Machine Tool Engineers
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• v.17 no.2
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• pp.1-6
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• 2008

In recent years, developments in the semiconductor and electronic industries have brought a rapid increase in the use of large size silicon wafer. For further improvement of the ultra precision surface and flatness of Si wafer necessary to high density ULSI, it is known that polishing is very important. However, most of these investigation was experiment less than 300mm diameter. Polishing is one of the important methods in manufacturing of Si wafers and in thinning of completed device wafers. This study reports the machining variables that has major influence on the characteristic of wafer polishing. It was adapted to polishing pressure, machining speed, and the slurry mix ratio, the optimum condition is selected by ultra precision wafer polishing using load cell and infrared temperature sensor. The optimum machining condition is selected a result data that use a pressure and table speed data. By using optimum condition, it achieves a ultra precision mirror like surface.

• Proceedings of the Korean Society for Noise and Vibration Engineering Conference
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• 2007.05a
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• pp.373-378
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• 2007

On the homodyne interferometers, high pass filter(HPF) is usually used to remove the electrical noise in the interferent signal. Heterodyne interferometer has modulating frequency is shifted in the frequency region where the electrical noise effect is minimized by HPF effect. However, on the homodyne interferometer, the interferent DC-component of homodyne interferometer is unfortunately eliminated by using a HPF because its shifted frequency does not exist. Moreover, this effect is more serious the vibration amplitude is smaller. So, when unstable interferent signals via HPF are demodulated, a velocity is distorted. In this work, the mathematical explanation for the distortion of the homodyne interferent signal using the HPF is given. New synthetic heterodyne LDV based on the homodyne interferometer by exciting the reference mirror is proposed for the cancellation of the distortion. The optimum excitation condition of the mirror to compensate the distortion is discussed. The numerical simulation using the commercial MATLAB code is provided to show the effect of the proposed synthetic heterodyne LDV. The experimental results are also given and the effect of the proposed LDV is discussed.

• Journal of the Korean Institute of Oriental Medical Informatics
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• v.16 no.2
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• pp.51-88
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• 2010

An empirical formula that has been empirically shown to be effective for a particular condition can be said to add medical materials to an exciting formula or to make a new prescription by Korean medical doctors' empirical clinic. This dissertation aims to study the prescriptions according to A Confidential Document of A Distinguished Medical Family and to contribute to the development of Korean medicine. A Confidential Document of A Distinguished Medical Family is a medicinal recipe that is an heirloom of the Gyeongju Kim family for the eighth generation. And the date and the writer of the book are unknown. The contents of the book consist of 18 parts and are made up of about 300 medical recipes. Of these, 153 formulas and indications of roundworm, cholera, puffy swelling, abdominal distension, phlegm-rheum, woman, child, summerheat, dryness-heat, eye, and blood are found in the book. From among these, 26 formulas are directly quoted out of The Precious Mirror of Oriental Medicine, 93 formulas are adjusted in proportion or combined and 34 formulas are empirical ones. By the parity of reasoning of the above, I think that this book was published after The Precious Mirror of Oriental Medicine.

• Journal of the Institute of Electronics Engineers of Korea SD
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• v.37 no.7
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• pp.43-49
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• 2000

We proposed ADD(Alternate Directional Delay) circuit technique as the DLL(Delay Locked Loop) circuits which technique is established the data valid window(tDV) in DDR(Double Data Rate) Synchronous DRAM. This technique could be decrease area-overhead which it could generated bidirectional clock simultaneously using only one delay chain block. In this paper for high speed memory with relatively small size. This technique decreased area-overhead more 2 times than SMD(Synchronous Mirror Delay) technique. ADD technique has 50ps-140ps jitter and the operation frequency has 166MHz-66MHz range.(at 2.5V, TYP. condition)

• Transactions on Electrical and Electronic Materials
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• v.5 no.2
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• pp.71-75
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• 2004

This paper proposes a new bandgap reference (BGR) circuit which takes advantage of a cascode current mirror biasing to reduce the V$\_$ref/ variation, and sizing technique, which utilizes two related ratio numbers k and N, to reduce the PNP BJT area. The proposed BGR is designed and fabricated on a test chip with a goal to provide a reference voltage to the 10 bit A/D(4-4-4 pipeline architecture) converter of the CMOS Active Pixel Sensor (APS) imager to be used in X-ray imaging. The basic temperature variation effect on V$\_$ref/ of the BGR has a maximum delta of 6 mV over the temperature range of 25$^{\circ}C$ to 70$^{\circ}C$. To verify that the proposed BGR has radiation hardness for the X-ray imaging application, total ionization dose (TID) effect under Co-60 exposure conditions has been evaluated. The measured V$\_$ref/ variation under the radiation condition has a maximum delta of 33 mV over the range of 0 krad to 100 krad. For the given voltage, temperature, and radiation, the BGR has been satisfied well within the requirement of the target 10 bit A/D converter.

• Proceedings of the KIEE Conference
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• 1996.11a
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• pp.254-257
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• 1996

A Rapid Thermal Processing (RTP) system operated below $500^{\circ}C$ has been designed and constructed. It uses an optical pyrometer for measuring wafer temperature, the sensing range of pyrometer is from $2.0{\mu}m$ to $2.4{\mu}m$. To remove the interference effect by IR emitted from lamps an IR filter is adapted which uses water. The best condition for Al alloy using the RTP system is $425^{\circ}C$ for ten seconds. The RTP system uses many lamps for supplying enough power in processing wafer because the absorption wavelength range of IF filter is from $1.3{\mu}m$ to $4.0{\mu}m$. However, reproducibility and uniformity is reduced due to the difference of lamp characteristics. Therefore, for improving the reproducibility and uniformity new RTP system using one lamp is designed. The new RTP system uses a focusing mirror and it focuses the light of lamp. The curverture of the focusing mirror is controlled to supply uniform power in processing wafer. The result of computer simulation shows the possibility of new RTP system using one lamp.

• Current Optics and Photonics
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• v.6 no.4
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• pp.407-412
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• 2022

We report on a diode-laser-pumped mode-locked Yb:KGW laser system, which delivers ultrashort pulses down to 89 fs at a repetition rate of 63 MHz, with an average power of up to 5.6 W. A fiber-coupled diode laser at 981 nm, operated with a compact driver, is used to optically pump the gain crystal via an off-axis parabolic mirror. A semiconductor saturable-absorber mirror is used to initiate the pulsed operation. Laser characteristics such as the pulse duration, spectrum bandwidth, and output power are investigated by varying the intracavity dispersions via changing the number of bounces between negative-dispersive mirrors within the cavity. Short pulses with a duration of 89 fs, a center wavelength of 1,027 nm, and 3.6 W of output power are produced at a group-velocity dispersion (GVD) of -3,300 fs². As the negative GVD increases, the pulse duration lengthens but the output power at the single-pulse condition can be enhanced, reaching 5.6 W at a GVD of -6,600 fs². Because of pulse broadening at high negative GVDs, the highest peak intensity is achievable at a moderate GVD with our system.

• Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
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• 2002.10b
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• pp.291-292
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• 2002

Using a low viscosity synthetic traction oil and a low viscosity mineral oil with nearly equal viscosity grade of ISO VG 32, the effect of kind of oil on the fatigue life of bearing steel rollers was examined. A pair of rollers finished the contact surfaces to a mirror-like condition were driven under rolling with sliding conditions of s = -3.2% and a maximum Hertzian stress in the range of $P_H=2.8GPa{\sim}4.0GPa$ was applied in point contact condition. As a result of experiments, the fatigue life with a mineral oil was longer than that with a traction oil under higher stress conditions above $P_H=3.4GPa$. Based on the numerical calculation results of the thermal EHL which simulates the present experiment, the authors discuss the reason why such a difference in the fatigue life comes out.

• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 2003.10b
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• pp.31-35
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• 2003

Friction in cold forging with mist lubrication is measured with the ring compression test. Small quantity of mist lubricant is sprayed onto the surfaces of cemented tungsten carbide (WC) tools polished to mirror surfaces, and the specimens of pure aluminum are compressed. It is found that spraying small quantity of lubricant $(0.5\;g/m^2)$ is effective to reduce the friction in comparison with the dry condition. The mist particles stick to the tool surface as separated dots, and the behavior of the trapped mist lubricant between the tool and specimen during upsetting is discussed.

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.11 no.1
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• pp.1-6
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• 2012

The polishing of silicon wafers has an important role in semiconductor manufacturing. Generally, getting a flat surface such as a mirror is the purpose of the process. The wafer surface roughness is affected by many variables such as the characteristics of the carrier head unit, operation, speed, the pad and slurry temperature. Optimum process conditions for experimental temperature, pH value, down-force, slurry ratio are investigated, time is used as a fixed factor. This study carried out a series of experiments at varying platen, chuck rpm and oscillation cpm taking particular note of the difference between the rpm and the affect it has on the surface roughness. In this experiment determine the optimum conditions for polishing silicone wafers.