• 한국자기학회지
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• 제10권3호
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• pp.123-132
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• 2000

고주파 마그네트론 스퍼터를 이용하여 cerium 치환 YIG(Ce:YIG, cerium substitued yttrium iron garnet) 박막을 제조시 기판유형, 기판온도, 스퍼터전력, 스퍼터가스 등의 증착변수와 증착후 열처리 조건이 박막의 결정성, 화학조성, 미세구조 그리고 자기적 특성에 미치는 영향에 대하여 고찰하였다. 750 $^{\circ}C$ 이상의 온도에서 수행한 증착후 열처리에 의하여 비정질 박막이 결정화 되었으며, 특히 GGG(gadolinium gallium garnet) 기판 위에 제조된 박막은 강한 우선배향성을 나타냈다. 박막의 조성은 스퍼터가스 내의 산소분율에 민감하게 변하였으며, 산소 분율이 10%인 스퍼터 가스(Ar+ $O_2$)를 사용하여 제조된 박막은 C $e_{0.23}$ $Y_{1.30}$F $e_{3.50}$ $O_{12}$의 조성을 나타내었다. 증착후 열처리 온도가 900 $^{\circ}C$로부터 1100 $^{\circ}C$로 증가함에 따라, GGG 기판 위 박막의 표면 거칠기는 약 3 nm로부터 40 nm까지 증가하였으며, 보자력과 강자성 공명 선폭은 각각 0.48 kA/m로부터 0.37 kA/m로 각각 감소하였다.다.하였다.다.

• 해양환경안전학회지
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• 제22권2호
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• pp.253-258
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• 2016

선박 및 해양구조물에서의 생물학적 오손을 방지하기 위하여 나노크기의 $MnO_x-WO_3-TiO_2$ 분말을 졸겔법으로 합성하여 특성을 제어하였고, 입자의 결정과 미세구조 등 분체특성 평가를 실시하였다. 자기마모형 방오도료의 안료에 적용하기 위하여 수지에 첨가된 $TiO_2$계 나노분말 안료의 함량에 따른 표면특성 및 방오성능을 확인하였다. $TiO_2$계 안료의 분체특성으로 비표면적은 약 $90m^2/g$, 입자크기는 약 100 ~ 150 nm을 보였다. 텅스텐 산화물은 망간산화물과 티타늄산화물과 상관관계를 통해, 삼원계 분체가 분체특성 및 표면특성이 우수하였다. 망간산화물의 첨가는 독특한 산화환원 특성으로 인하여 방오성능을 증가시키고, 텅스텐 산화물은 안료의 분체특성을 향상시킴으로, 안료와 수지의 비율을 조절하여 분산성, 표면특성 및 방오성능을 제어하였다. 그 결과로, 분산성 및 표면특성에 있어서 1, 5 wt. % 안료가 첨가된 것이 일부 우수하였으나, 5개월 동안의 해상침지시험에서는 2 wt. % 함유된 시편이 높은 방오성능을 보여 해양구조물의 방오안료 적용가능성을 확인하였다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 1999년도 제17회 학술발표회 논문개요집
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• pp.216-216
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• 1999

The usage of a stationary plasma thruster (SPT) ion source, invented previously for space application in Russia, in experiments with surface modifications and film deposition systems is reported here. Plasma in the SPT is formed and accelerated in electric discharge taking place in the crossed axial electric and radial magnetic fields. Brief description of the construction of specific model of SPT used in the experiments is presented. With gas flow rate 39ml/min, ion current distributions at several distances from the source are obtained. These was equal to 1~3 mA/$\textrm{cm}^2$ within an ion beam ejection angle of $\pm$20$^{\circ}$with discharge voltage 160V for Ar as a working gas. Such an extremely high ion current density allows us to obtain the Ti metal films with deposition rate of $\AA$/sec by sputtering of Ti target. It is shown a possibility of using of reactive gases in SPT (O2 and N2) along with high purity inert gases used for cathode to prevent the latter contamination. It is shown the SPT can be operated at the discharge and accelerating boltages up to 600V. The results of presented experiments show high promises of the SPT in sputtering and surface modification systems for deposition of oxide thin films on Si or polymer substrates for semiconductor devices, optical coatings and metal corrosion barrier layers. Also, we have been tried to establish in application of the modeling expertise gained in electric and ionic propulsion to permit numerical simulation of additional processing systems. In this mechanism, it will be compared with conventional DC sputtering for film microstructure, chemical composition and crystallographic considerations.

• 한국재료학회지
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• 제29권10호
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• pp.609-616
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• 2019

Oxide coatings are formed on die-cast AZ91D Mg alloy through an environmentally friendly plasma electrolytic oxidation(PEO) process using an electrolytic solution of $NaAlO_2$, KOH, and KF. The effects of PEO condition with different duty cycles (10 %, 20 %, and 40 %) and frequencies(500 Hz, 1,000 Hz, and 2,000 Hz) on the crystal phase, composition, microstructure, and micro-hardness properties of the oxide coatings are investigated. The oxide coatings on die-cast AZ91D Mg alloy mainly consist of MgO and $MgAl_2O_4$ phases. The proportion of each crystalline phase depends on various electrical parameters, such as duty cycle and frequency. The surfaces of oxide coatings exhibit as craters of pancake-shaped oxide melting and solidification particles. The pore size and surface roughness of the oxide coating increase considerably with increase in the number of duty cycles, while the densification and thickness of oxide coatings increase progressively. Differences in the growth mechanism may be attributed to differences in oxide growth during PEO treatment that occur because the applied operating voltage is insufficient to reach breakdown voltage at higher frequencies. PEO treatment also results in the oxide coating having strong adhesion properties on the Mg alloy. The micro-hardness at the cross-section of oxide coatings is much higher not only compared to that on the surface but also compared to that of the conventional anodizing oxide coatings. The oxide coatings are found to improve the micro-hardness with the increase in the number of duty cycles, which suggests that various electrical parameters, such as duty cycle and frequency, are among the key factors controlling the structural and physical properties of the oxide coating.

• Electronic Materials Letters
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• 제14권6호
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• pp.700-711
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• 2018

CdS synthesized by the chemical bath method at $70^{\circ}C$, has been used as an electron transport layer in the planar structure of the perovskite solar cells. A two-step spin process produced a mixed halide perovskite of $CH_3NH_3PbI_{3-x}Cl_x$ and a mixture of $PbCl_2$ and $PbI_2$ was deposited on CdS, followed by a sub-sequential reaction with MAI ($CH_3NH_3I$). The added $PbCl_2$ to $PbI_2$ in the first spin-step affected the structure, orientation, and shape of lead halides, which varied depending on the content of Cl. A small amount of Cl enhanced the surface morphology and the preferred orientation of $PbI_2$, which led to large and uniform grains of perovskite thin films. In contrast, the high content of Cl produces a new phase PbICl in addition to $PbI_2$, which leads to the small and highly uniform grains of perovskites. An improved surface coverage of perovskite films with the large and uniform grains maximized the performance of perovskite solar cells at 0.1 molar ratio of $PbCl_2$ to $PbI_2$. The depth profiling of elements in both lead halide films and mixed halide perovskite films were measured by Rutherford backscattering spectroscopy, revealing the distribution of chlorine along with the thickness, and providing the basis for the mechanism for enhanced preferred orientation of lead halide and the microstructure of perovskites.

• Current Photovoltaic Research
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• 제3권4호
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• pp.130-134
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• 2015

The high efficiency cell research processes through the KF post deposition treatment (PDT) of the $Cu(In,Ga)Se_2(CIGS)$ thin film has been very actively progress. In this study, it CIGS thin film deposition process when KF PDT 300 to the processing temperature, 350, $400^{\circ}C$ changed to soda-lime glass (SLG) efficiency of the CIGS thin film characteristics, and solar cell according to Na presence of diffusion from the substrate the effects were analyzed. As a result, the lower the temperature of KF PDT and serves to interrupt the flow of current K-CIGS layer is not removed from the reaction surface, FF and photocurrent is decreased significantly. Blocking of the Na diffusion from the glass substrate is significantly increased while the optical voltage, photocurrent and FF is a low temperature (300, $350^{\circ}C$) in the greatly reduced, and in $400^{\circ}C$ tend to reduce fine. It is the presence of Na in CIGS thin film by electron-induced degradation of the microstructure of CIGS thin film is expected to have a significant impact on increasing the hole recombination rate a reaction layer is formed of the K elements in the CIGS thin film surface.

• 대한금속재료학회지
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• 제50권9호
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• pp.659-667
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• 2012

Alloy 617 is a Ni-base superalloy and a candidate material for the intermediate heat exchanger (IHX) of a very high temperature gas reactor (VHTR) which is one of the next generation nuclear reactors under development. The high operating temperature of VHTR enables various applications such as mass production of hydrogen with high energy efficiency. Alloy 617 has good creep resistance and phase stability at high temperatures in an air environment. However, it was reported that the mechanical properties decreased at a high temperature in an impure helium environment. In this study, high-temperature corrosion tests were carried out at $850^{\circ}C-950^{\circ}C$ in a helium environment containing the impurity gases $H_2$, CO, and $CH_4$, in order to examine the corrosion behavior of Alloy 617. Until 250 h, Alloy 617 specimens showed a parabolic oxidation behavior at all temperatures. The activation energy for oxidation in helium environment was 154 kJ/mol. The SEM and EDS results elucidated a Cr-rich surface oxide layer, Al-rich internal oxides and depletion of grain boundary carbides. The thickness and depths of degraded layers also showed a parabolic relationship with time. A normal grain growth was observed in the Cr-rich surface oxide layer. When corrosion tests were conducted in a pure helium environment, the oxidation was suppressed drastically. It was elucidated that minor impurity gases in the helium would have detrimental effects on the high-temperature corrosion behavior of Alloy 617 for the VHTR application.

• 한국재료학회지
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• 제22권8호
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• pp.409-415
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• 2012

$TiO_2$ thin films for high energy density capacitors were prepared by r.f. magnetron sputtering at room temperature. Flexible PET (Polyethylene terephtalate) substrate was used to maintain the structure of the commercial film capacitors. The effects of deposition pressure on the crystallization and electrical properties of $TiO_2$ films were investigated. The crystal structure of $TiO_2$ films deposited on PET substrate at room temperature was unrelated to deposition pressure and showed an amorphous structure unlike that of films on Si substrate. The grain size and surface roughness of films decreased with increasing deposition pressure due to the difference of mean free path. X-ray photoelectron spectroscopy (XPS) analysis revealed the formation of chemically stable $TiO_2$ films. The dielectric constant of $TiO_2$ films was significantly changed with deposition pressure. $TiO_2$ films deposited at low pressure showed high dissipation factor due to the surface microstructure. The dielectric constant and dissipation factor of films deposited at 70 mTorr were found to be 100~120 and 0.83 at 1 kHz, respectively. The temperature dependence of the capacitance of $TiO_2$ films showed the properties of class I ceramic capacitors. $TiO_2$ films deposited at 10~30 mTorr showed dielectric breakdown at applied voltage of 7 V. However, the films of 500~300 nm thickness deposited at 50 and 70 mTorr showed a leakage current of ${\sim}10^{-8}{\sim}10^{-9}$ A at 100 V.

• 대한치과보철학회지
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• 제49권2호
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• pp.120-127
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• 2011

연구 목적: 본 연구의 목적은 색소체인 크롬염화물을 지르코니아에 첨가함으로써 지르코니아의 색상 및 물리적 성질, 그리고 미세구조가 어떻게 변화하는지 알아보고자 한다. 연구 재료 및 방법: 크롬염화물의 함량이 지르코니아 분말에 각각 0.06, 0.12, 0.25 wt%가 되도록 측량하고 알코올에 녹여 액상상태의 크롬염화물을 준비하였다. 지르코니아 분말과 각각의 액상상태의 크롬염화물을 혼합하고 혼합된 분말을 이용하여 디스크형태의 지르코니아 시편을 제작하였다. 제작된 시편은 $1450^{\circ}C$에서 완전소결 후 색상 및 물리적 성질, 그리고 미세구조를 관찰하였다. 색상은 분광측색장치를 이용하여 국제조명위원회 (CIE) ISO 기준인 D65 광원, SCE 방식으로 측정하여 $L^*$, $C^*$, $a^*$, $b^*$ 값으로 분석하였다. 밀도는 아르키메데스 법으로 측정하였고, 주사전자현미경과 X선 회절 분석기를 이용하여 시편의 미세구조 및 결정상을 관찰하였다. 파괴인성은 압흔 형성법(Vickers indentation법)을 이용하여 시편에 압흔 형성 후, 광학현미경으로 압흔의 크기를 측정하고 이를 이용하여 파괴인성을 구하였다. 결과는 일원배치분산분석 (one-way ANOVA)으로 통계처리 하였고, Tukey test로 사후 검정하였다. 결과: 1. 크롬염화물을 첨가하여 지르코니아의 색상을 조절할 수 있음을 확인하였으며, 크롬염화물 첨가 함량이 증가함에 따라 지르코니아 색상은 백색계통의 갈색에서 짙은 색의 갈색으로 변하였다. 2. 크롬염화물의 첨가는 시편의 밀도를 점점 감소시켰으며, 크롬염화물이 첨가되지 않은 시편과 비교 시, 크롬염화물의 첨가량이 증가할수록 통계학적으로 유의한 차이를 보였다 (P<.05). 3. 크롬염화물이 첨가된 시편은 첨가되지 않는 시편에 비해 결정립 크기가 증가하였다. 4. X-선 회절 분석결과, 크롬염화물의 첨가 여부와 첨가 함량에 상관없이 지르코니아 결정상의 차이점은 관찰되지 않았다. 5. 지르코니아에 크롬염화물을 첨가 시 크롬염화물의 첨가 함량에 따라 파괴인성값은 감소하였고, 특히 0.25 wt%의 크롬염화물을 첨가 시 가장 낮은 파괴인성 값을 보였다 (P<.05). 결론: 이상의 결과로 크롬염화물을 액체상태로 첨가하여 지르코니아의 색상을 조절할 수 있음을 확인하였으며, 제작한 유색 지르코니아의 색상은 자연치아 색상과 다소 차이가 있지만, 본 소재는 임상에서 사용되는 완전도재관 코어 (Core) 재료로써 사용할 수 있을 것으로 생각한다.

• 한국재료학회지
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• 제17권5호
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• pp.256-262
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• 2007

Effects of interlayer and the combination of different coating methods on the mechanical and corrosion behaviors of TiN and CrN coated on 420 stainless steel have been studied. STS 420 specimen were tempered at $300^{\circ}C$ for 1 hr in vacuum furnace. The TiN and CrN thin film with 2 ${\mu}m$ thickness were coated by arc ion plating and DC magnetron sputtering following the formation of interlayer for pure titanium and chromium with 0.2 ${\mu}m$ thickness. The microstructure and surface analysis of the specimen were conducted by using SEM, XRD and roughness tester. Mechanical properties such as hardness and adhesion also were examined. XRD patterns of TiN thin films showed that preferred TiN (111) orientation was observed. The peaks of CrN (111) and $Cr_2N$ (300) were only observed in CrN thin films deposited by arc ion plating. Both TiN and CrN deposited by arc ion plating had the higher adhesion and hardness compared to those formed by magnetron sputtering. The specimen of TiN and CrN on which interlayer deposited by magnetron sputtering and thin film deposited by arc ion plating had the highest adhesion with 22.2 N and 19.2 N. respectively. TiN and CrN samples shown the most noble corrosion potentials when the interlayers were deposited by using magnetron sputtering and the metal nitrides were deposited by using arc ion plating. The most noble corrosion potentials of TiN and CrN were found to be approximately -170 and -70 mV， respectively.