• Title/Summary/Keyword: micro array pattern

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Highly Integrated DNA Chip Microarrays by Hydrophobic Interaction

  • Park, Yong-Sung;Kim, Do-Kyin;Kwon, Young-Soo
    • KIEE International Transactions on Electrophysics and Applications
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    • v.11C no.2
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    • pp.23-27
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    • 2001
  • Microarray-based DNA chips provide an architecture for multi-analyte sensing. In this paper, we report a new approach for DNA chip microarray fabrication. Multifunctional DNA chip microarrays were made by immobilizing many kinds if DNAs on transducers (particles). DNA chip microarrays were prepared by randomly distributing a mixture of the particles on a chip pattern containing thousands of micro meter-scale sites. The particles occupied different sites from array to array. Each particle cam be distinguished by a tag that is established on the particle. The particles were arranged on the chip pattern by the random fluidic self-assembly (RFSA) method, using hydrophobic interaction.

Fabrication of Microstructure Array using the Projection Microstereolithography System (전사방식 마이크로광조형을 이용한 배열 형태 미세 구조물 가공)

  • Choi, Jae-Won;Ha, Young-Myoung;Lee, Seok-Hee
    • Journal of the Korean Society for Precision Engineering
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    • v.24 no.8 s.197
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    • pp.138-143
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    • 2007
  • Microstereolithography technology is similar to the conventional stereolithography process and enables to fabricate a complex 3D microstructure. This is divided into scanning and projection type according to aiming at precision and fabrication speed. The scanning MSL fabricates each layer using position control of laser spot on the resin surface, whereas the projection MSL fabricates one layer with one exposure using a mask. In the projection MSL, DMD used to generate dynamic pattern consists of $1024{\times}768$ micromirrors which have $13.68{\mu}m$ per side. The fabrication range and resolution are determined by the field of view of the DMD and the magnification of the projection lens. If using the projection lens with high power, very fine microstructures can be fabricated. In this paper, the projection MSL system adapted to a large surface for array-type fabrication is presented. This system covers the meso range, which is defined as the intermediate range between micro and macro, with a resolution of a few ${\mu}m$. The fabrication of array-type microstructures has been demonstrated to verify the performance of implemented system.

Development of UV imprinting process for micro lens array of image sensor (UV 임프린트를 이용한 이미지 센서용 마이크로 렌즈 어레이 성형 공정 개발)

  • Lim, Ji-Seok;Kim, Seok-Min;Jeong, Gi-Bong;Kim, Hong-Min;Kang, Shin-Il
    • 정보저장시스템학회:학술대회논문집
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    • 2005.10a
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    • pp.17-21
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    • 2005
  • High-density image sensors have microlens array to improve photosensitivity. It is conventionally fabricated by reflow process. The reflow process has some weak points. UV imprinting process can be proposed as an alternative process to integrate microlens array on photodiodes. In this study, the UV imprionting process to integrate microlens array on image sensor was developed using W transparent flexible mold and simulated image sensor substrate. The UV transparent flexible mold was fabricated by replicating master pattern using siliconacrylate photopolymer. The releasing property and shape accuacy of siliconacrylate mold was analysed. After UV imprinting process, replication quality and align accuracy was analysed.

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Development of UV imprinting process for micro lens array of image sensor (UV 임프린트를 이용한 이미지 센서용 마이크로 렌즈 어레이 성형 공정 개발)

  • Lim, Ji-Seok;Kim, Seok-Min;Jeong, Gi-Bong;Kim, Hong-Min;Kang, Shin-Il
    • Transactions of the Society of Information Storage Systems
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    • v.2 no.2
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    • pp.91-95
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    • 2006
  • High-density image sensors rave microlens array to improve photosensitivity. It is conventionally fabricated by reflow process. The reflow process has some weak points. UV imprinting process can be proposed as an alternative process to integrate microlens array on photodiodes. In this study, the UV imprionting process to integrate microlens array on image sensor was developed using UV transparent flexible mold and simulated image sensor substrate. The UV transparent flexible mold was fabricated by replicating master pattern using siliconacrylate photopolymer. The releasing property and shape accuacy of siliconacrylate mold was analysed. After UV imprinting process, replication quality and align accuracy was analysed.

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Micro Patterning Using Active Polymer Pen Array (능동 폴리머 펜 어래이를 이용한 미세 패터닝)

  • Han, Yoonsoo;Hong, Jihwa
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.26 no.12
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    • pp.853-857
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    • 2013
  • We design, develope and test a parallel active polymer pen lithography (PPL) device, which consists of individually addressable elastomeric probe tips. The PPL array chip is fabricated using soft lithography method with polydimethylsiloxane (PDMS) material. Individual probe can be pneumatically actuated via a computer controlled interface. We demonstrate parallel writing with 16 individually addressed pens, with each pen producing a different pattern in the same run. The largest proof-of-concept array fabricated is $4{\times}4$ with a spacing of $250{\mu}m$ in both x and y axes.

A Cylindrical Hybrid Antenna for Shaping Complex Beam Patterns (복합 빔 패턴 형성을 위한 원통형 하이브리드 안테나)

  • Eom, Soon-Young;Jung, Young-Bae;Jeon, Soon-Ick;Kim, Chang-Joo
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.18 no.11
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    • pp.1279-1290
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    • 2007
  • In this paper, a cylindrical hybrid antenna which is spatially fed by an off-set linear feed array is described to form complex beam patterns. The linear feed array consists of twelve micro-strip patch elements and forms a flat-topped beam pattern with a beam-width of $90^{\circ}$ in the horizontal plane. The vertical curve on the cylindrical reflector with the linear feed array is shaped in order to form a cosecant beam pattern within the range of $-5^{\circ}$ to $-25^{\circ}$ in the vertical plane. To form complex beam patterns, the hybrid antenna with cylindrical reflector aperture of $140{\times}50\;cm$ was designed and fabricated to be operated within the IMT 2000 service band, and also electrical performances of the antenna were measured and analyzed.

Micromachining for plastic mold steel using DPSS UV laser and wet etching (DPSS UV Laser와 습식 식각을 이용한 금형강 미세 가공)

  • Min, Kyoung-Ik;Kim, Jae-Gu;Cho, Sung-Hak;Choi, Doo-Sun;Whang, Kyung-Hyun
    • Laser Solutions
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    • v.12 no.3
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    • pp.1-6
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    • 2009
  • This paper describes the method for the fabrication of micro dot array on a plastic mold steel using DPSS (diode pumped solid-states) UV laser and wet etching process. We suggest the process of the ablation of a photoresist (PR) coated on plastic mold steel and wet etching process using solutions of various concentrations of $FeCl_3$, $HNO_3$ in water as etchant. This method makes it possible to fabricate metallic roller mold because the microstructures are directly fabricated on the metal surface. In the range of operating conditions studied, $17\;{\mu}J$ laser pulse energy and 50 ms laser exposure time, an etchant containing 40wt% $FeCl_3$, 5wt% $HNO_3$ and etch time for 45 s gave the $10\;{\mu}m$ of micro dot pattern on plastic mold steel.

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Optimization of Ultrathin Backlight Unit by Using a Tapered Light Guide Film Studied by Optical Simulation

  • Joo, Byung-Yun;Ko, Jae-Hyeon
    • Current Optics and Photonics
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    • v.1 no.2
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    • pp.101-106
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    • 2017
  • Optical structures of a tapered ultra-thin light guide film (LGF) were optimized by optical simulation for increasing coupling efficiency between light sources and the LGF. A serration pattern on the entrance side surface could provide a comparable coupling efficiency to that of the conventional LGF where a linear, asymmetric prism array was formed on the taper surface. Several micro-patterns were applied to the top and/or bottom surface of the LGF for achieving better luminance property, and it was found that an optimized micro-pyramid pattern exhibited the highest average luminance together with satisfactory luminance uniformity.

Fabrication of Silicon Nanotemplate for Polymer Nanolens Array

  • Cho, Si-Hyeong;Kim, Hyuk-Min;Lee, Jung-Hwan;Venkatesh, R. Prasanna;Rizwan, Muhammad;Park, Jin-Goo
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2011.05a
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    • pp.37.1-37.1
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    • 2011
  • Miniaturization of lenses has been widely researched by various scientific and engineering techniques. As a result, micro scaled lens structure could be easily achieved from various fabrication techniques; nevertheless it is still challenging to make nano scaled lenses. This paper reports a novel fabrication method of silicon nanotemplate for nanolens array. The inverse structure of nanolens array was fabricated on silicon substrate by reactive ion etching (RIE) process. This technique has a flexibility to produce different tip shapes using different pattern masks. Once the silicon nano-tip array structure is well-defined using an optimized recipe, it is followed by polymer molding to duplicate nanolens array from the template. Finally, the nanostructures formed on silicon nanotemplate and polymer replica were investigated using FE-SEM and AFM measurements. The nano scaled lens can be manufactured from the same template, also using other replication techniques such as imprinting, injection molding and so on.

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Fabrication and Measurement of a Micro strip-Array Antenna for the Electronic Toll Collection System (ETCS)

  • Yoon, Joong-Han;Lee, Sang-Mok;Lee, Hwa-Choon;Kwak, Kyung-Sup;Chun, Su-Mi;Byun, Woo-Sub;Jung, Myung-Nam;Shin, Dong-Hun
    • Proceedings of the IEEK Conference
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    • 2002.07b
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    • pp.723-726
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    • 2002
  • This paper describes the design, fabrication, and measurement of a sequential-rotation microstrip-array antenna for the Electronic Toll Collection System (ETCS). The ETCS is made possible by using roadside equipment with radiation pattern that can accurately pinpoint the designated communication area, without interference from other lanes. The sequential-rotation microstrip-array antenna was applied to the absorber to reduce the side lobe level (SLL). Results showed that the antenna yields a return loss at a center frequency of -20.675 dB, an axial ratio of 1.15 dB, and a gain of 20.26 dBi.

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