• 제목/요약/키워드: memory margin

Search Result 82, Processing Time 0.023 seconds

The impact of substrate bias on the Z-RAM characteristics in n-channel junctionless MuGFETs (기판 전압이 n-채널 무접합 MuGFET 의 Z-RAM 특성에 미치는 영향)

  • Lee, Seung-Min;Park, Jong-Tae
    • Journal of the Korea Institute of Information and Communication Engineering
    • /
    • v.18 no.7
    • /
    • pp.1657-1662
    • /
    • 2014
  • In this paper, the impact of substrate bias($V_{BS}$) on the zero capacitor RAM(Z-RAM) in n-channel junctionless multiple gate MOSFET(MuGFET) has been analyzed experimentally. Junctionless transistors with fin width of 50nm and 1 fin exhibits a memory window of 0.34V and a sensing margin of $1.8{\times}10^4$ at $V_{DS}=3.5V$ and $V_{BS}=0V$. As the positive $V_{BS}$ is applied, the memory window and sensing margin were improved due to an increase of impact ionization. When $V_{BS}$ is increased from 0V to 10V, not only the memory window is increased from 0.34V to 0.96V but also sensing margin is increased slightly. The sensitivity of memory window with different $V_{BS}$ in junctionless transistor was larger than that of inversion-mode transistor. A retention time of junctionless transistor is better than that of inversion-mode transistor due to low Gate Induced Drain Leakage(GIDL) current. To evaluate the device reliability of Z-RAM, the shifts in the Set/Reset voltages and current were measured.

Small Molecular Organic Nonvolatile Memory Cells Fabricated with in Situ O2 Plasma Oxidation

  • Seo, Sung-Ho;Nam, Woo-Sik;Park, Jea-Gun
    • JSTS:Journal of Semiconductor Technology and Science
    • /
    • v.8 no.1
    • /
    • pp.40-45
    • /
    • 2008
  • We developed small molecular organic nonvolatile $4F^2$ memory cells using metal layer evaporation followed by $O_2$ plasma oxidation. Our memory cells sandwich an upper ${\alpha}$-NPD layer, Al nanocrystals surrounded by $Al_2O_3$, and a bottom ${\alpha}$-NPD layer between top and bottom electrodes. Their nonvolatile memory characteristics are excellent: the $V_{th},\;V_p$ (program), $V_e$ (erase), memory margin ($I_{on}/I_{off}$), data retention time, and erase and program endurance were 2.6 V, 5.3 V, 8.5 V, ${\approx}1.5{\times}10^2,\;1{\times}10^5s$, and $1{\times}10^3$ cycles, respectively. They also demonstrated symmetrical current versus voltage characteristics and a reversible erase and program process, indicating potential for terabit-level nonvolatile memory.

A Low Vth SRAM Reducing Mismatch of Cell-Stability with an Elevated Cell Biasing Scheme

  • Yamauchi, Hiroyuki
    • JSTS:Journal of Semiconductor Technology and Science
    • /
    • v.10 no.2
    • /
    • pp.118-129
    • /
    • 2010
  • A lower-threshold-voltage (LVth) SRAM cell with an elevated cell biasing scheme, which enables to reduce the random threshold-voltage (Vth) variation and to alleviate the stability-degradation caused by word-line (WL) and cell power line (VDDM) disturbed accesses in row and column directions, has been proposed. The random Vth variation (${\sigma}Vth$) is suppressed by the proposed LVth cell. As a result, the LVth cell reduces the variation of static noise margin (SNM) for the data retention, which enables to maintain a higher SNM over a larger memory size, compared with a conventionally being used higher Vth (HVth) cell. An elevated cell biasing scheme cancels the substantial trade-off relationship between SNM and the write margin (WRTM) in an SRAM cell. Obtained simulation results with a 45-nm CMOS technology model demonstrate that the proposed techniques allow sufficient stability margins to be maintained up to $6{\sigma}$ level with a 0.5-V data retention voltage and a 0.7-V logic bias voltage.

A study on characteristics of crystallization according to changes of top structure with phase change memory cell of $Ge_2Sb_2Te_5$ ($Ge_2Sb_2Te_5$ 상변화 소자의 상부구조 변화에 따른 결정화 특성 연구)

  • Lee, Jae-Min;Shin, Kyung;Choi, Hyuck;Chung, Hong-Bay
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2005.11a
    • /
    • pp.80-81
    • /
    • 2005
  • Chalcogenide phase change memory has high performance to be next generation memory, because it is a nonvolatile memory processing high programming speed, low programming voltage, high sensing margin, low consumption and long cycle duration. We have developed a sample of PRAM with thermal protected layer. We have investigated the phase transition behaviors in function of process factor including thermal protect layer. As a result, we have observed that set voltage and duration of protect layer are more improved than no protect layer.

  • PDF

Advances in Package-on-Package Technology for Logic + Memory Integration

  • Scanlan Christopher
    • Proceedings of the International Microelectronics And Packaging Society Conference
    • /
    • 2005.09a
    • /
    • pp.111-129
    • /
    • 2005
  • Pop provides OEMs and EMS with a platform to cost effectively expand options for logic + memory 3D integration - Expands device options by simplifying business logistics of stacking - Integration controlled at the system level to best match stacked combinations with system requirements - Eliminates margin stacking and expands technology reuse - Helps manage the huge cost impacts associated with increasing demand for multi media processing and memory. PoP is well timed to enable and leverage: - Mass customization of systems for different use (form, fit and function) requirements o Bband and apps processor + memory stack platforms - Logic transition to flip chip enables PoP size reduction o Area and height reduction. Industry standardization is progressing. Amkor provides full turn-key support for base package, memory package and full system integration.

  • PDF

Low-Cost CRC Scheme by Using DBI(Data Bus Inversion) for High Speed Semiconductor Memory (고속반도체 메모리를 위한 DBI(Data Bus Inversion)를 이용한 저비용 CRC(Cyclic Redundancy Check)방식)

  • Lee, Joong-Ho
    • Journal of IKEEE
    • /
    • v.19 no.3
    • /
    • pp.288-294
    • /
    • 2015
  • CRC function has been built into the high-speed semiconductor memory device in order to increase the reliability of data for high-speed operation. Also, DBI function is adopted to improve of data transmission speed. Conventional CRC(ATM-8 HEC code) method has a significant amounts of area-overhead(~XOR 700 gates), and processing time(6 stage XOR) is large. Therefore it leads to a considerable burden on the timing margin at the time of reading and writing of the low power memory devices for CRC calculations. In this paper, we propose a CRC method for low cost and high speed memory, which was improved 92% for area-overhead. For low-cost implementation of the CRC scheme by the DBI function it was supplemented by data bit error detection rate. And analyzing the error detection rate were compared with conventional CRC method.

Memory Optimization Method with Energy / Area Constraints (소모전력/면적 제약조건에서 메모리 최적화 방법)

  • Lee, Sung-Chul;Shin, Hyun-Chul
    • Proceedings of the IEEK Conference
    • /
    • 2008.06a
    • /
    • pp.451-452
    • /
    • 2008
  • In this paper we describe a multi-module, multi-port memory design procedure that satisfies area and/or energy constraints. Our procedure uses ILP models to determine (a) the memory configuration with minimum area, given the energy bound, (b) the memory configuration with minimum energy, given the area bound. If we have a margin in time constraint, we break up conflict edges and expend the search space of ILP. This method effectively reduces area and power of the designed results.

  • PDF

Design of an eFuse OTP Memory of 8 Bits for PMICs and its Measurement (PMIC용 8비트 eFuse OTP Memory 설계 및 측정)

  • Park, Young-Bae;Choi, In-Hwa;Lee, Dong-Hoon;Jin, Liyan;Jang, Ji-Hye;Ha, Pan-Bong;Kim, Young-Hee
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
    • /
    • 2012.05a
    • /
    • pp.722-725
    • /
    • 2012
  • In this paper, we design an 8-bit eSuse OTP (one-time programmable) memory based on a $0.35{\mu}m$ BCD process using differential paired eFuse cells which can sense BL data without a reference voltage and also have smaller sensing resistances of programmed eFuse links. The channel widths of a program transistor of the differential eFuse OTP cell are splitted into $45{\mu}m$ and $120{\mu}m$. Also, we implement a sensing margin test circuit with variable pull-up loads in consideration of variations of the programmed eFuse resistances. It is confirmed by measurement results that the designed 8-bit eFuse OTP memory IP gives a better yield when the channel width is $120{\mu}m$.

  • PDF

Experimental investigation of Scalability of DDR DRAM packages

  • Crisp, R.
    • Journal of the Microelectronics and Packaging Society
    • /
    • v.17 no.4
    • /
    • pp.73-76
    • /
    • 2010
  • A two-facet approach was used to investigate the parametric performance of functional high-speed DDR3 (Double Data Rate) DRAM (Dynamic Random Access Memory) die placed in different types of BGA (Ball Grid Array) packages: wire-bonded BGA (FBGA, Fine Ball Grid Array), flip-chip (FCBGA) and lead-bonded $microBGA^{(R)}$. In the first section, packaged live DDR3 die were tested using automatic test equipment using high-resolution shmoo plots. It was found that the best timing and voltage margin was obtained using the lead-bonded microBGA, followed by the wire-bonded FBGA with the FCBGA exhibiting the worst performance of the three types tested. In particular the flip-chip packaged devices exhibited reduced operating voltage margin. In the second part of this work a test system was designed and constructed to mimic the electrical environment of the data bus in a PC's CPU-Memory subsystem that used a single DIMM (Dual In Line Memory Module) socket in point-to-point and point-to-two-point configurations. The emulation system was used to examine signal integrity for system-level operation at speeds in excess of 6 Gb/pin/sec in order to assess the frequency extensibility of the signal-carrying path of the microBGA considered for future high-speed DRAM packaging. The analyzed signal path was driven from either end of the data bus by a GaAs laser driver capable of operation beyond 10 GHz. Eye diagrams were measured using a high speed sampling oscilloscope with a pulse generator providing a pseudo-random bit sequence stimulus for the laser drivers. The memory controller was emulated using a circuit implemented on a BGA interposer employing the laser driver while the active DRAM was modeled using the same type of laser driver mounted to the DIMM module. A custom silicon loading die was designed and fabricated and placed into the microBGA packages that were attached to an instrumented DIMM module. It was found that 6.6 Gb/sec/pin operation appears feasible in both point to point and point to two point configurations when the input capacitance is limited to 2pF.

Design of an eFuse OTP Memory of 8bits Based on a Generic Process ($0.18{\mu}m$ Generic 공정 기반의 8비트 eFuse OTP Memory 설계)

  • Jang, Ji-Hye;Kim, Kwang-Il;Jeon, Hwang-Gon;Ha, Pan-Bong;Kim, Young-Hee
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
    • /
    • 2011.05a
    • /
    • pp.687-691
    • /
    • 2011
  • In this paper, we design an 8-bit eSuse OTP (one-time programmable) memory in consideration of EM (electro-migration) and eFuse resistance variation based on a $0.18{\mu}m$ generic process, which is used for an analog trimming application. First, we use an external program voltage to increase the program power applied an eFuse. Secondly, we apply a scheme of precharging BL to VSS prior to RWL (read word line) activation and optimize read NMOS transistors to reduce the read current flowing through a non-programmed cell. Thirdly, we design a sensing margin test circuit with a variable pull-up load out of consideration for the eFuse resistance variation of a programmed eFuse. Finally, we increase program yield of eFuse OTP memory by splitting the length of an eFuse link.

  • PDF