• Title/Summary/Keyword: low-temperature fabrication

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Design fabrication and characteristics of 3C-SiC micro heaters for high temperature, high powers (고온, 고전압용 SiC 마이크로 히터 설계, 제작 및 특성)

  • Jeong, Jae-Min;Chung, Gwiy-Sang
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.11a
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    • pp.113-113
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    • 2009
  • This paper describes the characteristics of a poly 3C-SiC micro heater which was fabricated on $AlN(0.1{\mu}m)/3C-SiC(1.0{\mu}m)$ suspended membranes by surface micro- machining technology. The 3C-SiC and AlN thin films which have wide energy bandgap and very low lattice mismatch were used sensors for high temperature and voltage environments. The 3C-SiC thin film was used as micro heaters and temperature sensor materials simultaneously. The implemented 3C-SiC RTD (resistance of temperature detector) and the power consumption of micro heaters were measured and calculated. The TCR (thermal coefficient of the resistance) of 3C-SiC RTD is about -5200 $ppm/^{\circ}C$ within a temperature range from $25^{\circ}C$ to $50^{\circ}C$ and -1040 $ppm/^{\circ}C$ at $500^{\circ}C$. The micro heater generates the heat about $500^{\circ}C$ at 10.3 mW. Moreover, durability of 3C-SiC micro heaters in high voltages is better than pt micro heaters. A thermal distribution measured and simulated by IR thermovision and COMSOL is uniform on the membrane surface.

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Luminescent Properties of OLEO Devices with Various Substrate Temperatures (기판 온도에 따른 OLED 소자의 발광 특성)

  • Kim, Jung-Taek;Paek, Kyeong-Kap;Ju, Sung-Hoo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.22 no.11
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    • pp.956-960
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    • 2009
  • The characteristics of organic films can be affected by the temperature of evaporation source because the temperature of evaporation source has an effect on substrate temperature during OLED fabrication process using the thermal evaporation. To investigate the characteristics of OLED devices fabricated by using thermally damaged organic films, I-V-L and half life-time in OLED devices fabricated with various substrate temperatures were measured. During emission layer(EML) evaporation, OLED devices with a structure of ITO(100 nm)/ELM200(50 nm)/NPB(30 nm)/$Alq_3$(55 nm)/LiF(0.7 nm)/Al(100 nm) were fabricated at various substrate temperatures(room temperature, $30^{\circ}C$, $40^{\circ}C$, and $50^{\circ}C$). The characteristics of current density and luminance versus applied voltage in OLED devices fabricated shows that many electrical currents flowed and high brightness appeared at low voltage, but that the lifetime of OLED devices dropped suddenly. This phenomenon explained that the crystallization of $Alq_3$ thin film appeared owing to the substrate heating during evaporation.

Fabrication and Characterizations of ITO Film as a Transparent Conducting Electrode for PDP Application (PDP 투명전극의 응용을 위한 ITO 박막의 제작평가)

  • Park, Kang-Il;Lim, Dong-Gun;Kwak, Dong-Joo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.07b
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    • pp.788-791
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    • 2002
  • Tin doped indium oxide(ITO) films are highly conductive and transparent in the visible region whose property leads to the applications in solar cell, liquid crystal display, thermal heater, and other sensors. This paper investigated ITO films as a transparent conducting films for application of PDP. ITO films were grown on glass substrate by RF magnetron sputtering method. To achieve high transmittance and low resistivity, we examined the various film deposition such as substrate temperature, gas pressure, annealing temperature, and deposition time. We recommend the substrate temperature of $500^{\circ}C$ and post annealing of $200^{\circ}C$ in $O_2$ atmosphere for good conductivity and transmittance. From XRD examination, ITO films showed a preferred(222) orientation. As substrate temperature increased from RT to $500^{\circ}C$, the intensity of the (222) peak increased. The highest peak intensity was observed at a substrate temperature of $500^{\circ}C$. with the optimum growth conditions, ITO films showed resistivity of $1.04{\times}10^{-4}{\Omega}-cm$ and transmittance of 81.2% for a film 300nm thick in the wavelength range of the visible spectrum.

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Development of a Convective Sequential Production System for Aspheric Lens (전도방식 순차제조 비구면 렌즈 제조시스템 개발)

  • Kuk, Kum-Hoan;Kim, Gab-Soon;Jung, Dong-Yean
    • Journal of the Korean Society for Precision Engineering
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    • v.28 no.2
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    • pp.202-210
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    • 2011
  • The fabrication method of aspheric lens is changed from machining to press molding so as to improve the productivity. In the case of the press molding method, the temperature control of the molding die is most important, because the temperature of each molding die determines the quality of lens. But any practical method for direct measuring of the lens temperature and the die internal temperature is yet unknown. Besides, in the case of the press molding system in which the heating and pressing and cooing of a die is done at separate work stations, the lens productivity of the system for small lens is yet too low. The paper shows an improved structure of convective sequential system, the lens productivity of which is three times as many as the conventional convective system. To know the die internal temperature, numerical results are given using ANSYS. A new convective sequential system is developed and tested. Finally, the Taguchi method is applied in order to optimize the setting conditions of individual work station of the system.

$V_2O_5/V/V_2O_5$ based uncooled infrared detector by MEMS technology ($V_2O_5/V/V_2O_5$ 다층박막 및 MEMS기술을 이용한 비냉각형 적외선 감지 소자의 제작)

  • Han, Yong-Hee;Hur, Jae-Sung;Park, In-Hoon;Kim, Kun-Tae;Chi-Anh;Shin, Hyun-Joon;Sung Moon
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2003.03a
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    • pp.131-131
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    • 2003
  • Surface micromachined uncooled IR detector with the optimized VOx bolometric layer was fabricated based on sandwich structure of the V$_2$O$_{5}$V/V$_2$O$_{5}$. In order to improve the detectivity of the IR detector, we optimized a few factors in the viewpoint of bolometric material. Vanadium oxide thin film is a promising material for uncooled microbolometers due to its high temperature coefficient of resistance at room temperature. It is, however, very difficult to deposit vanadium oxide thin films having high temperature coefficient of resistance and low resistance because of process limits in microbolometer fabrication. In order to increase the responsivity and decrease noise, we increase TCR of bolometric material and decrease room temperature resistance based on the sandwich structure of the V$_2$O$_{5}$V/V$_2$O$_{5}$ by conventional sputter. By oxygen diffusion through low temperature annealing of V$_2$O$_{5}$V/V$_2$O$_{5}$ in oxygen ambient, various mixed phase vanadium oxide was formed and we obtained TCR in range of-1.2 ~-2.6%/$^{\circ}C$ at room temperature resistance of 5~100k$\Omega$.mega$.

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Effects of Metal Mg on Replacement Reaction of Molten Al for Fabrication of $Al_2$O$_3$//Al Composites (Al$_2$O$_3$/Al 복합체 제조시 용융 알루미늄의 치환반응에 미치는 금속 마그네슘의 영향)

  • 정두화;배원태
    • Journal of the Korean Ceramic Society
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    • v.35 no.1
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    • pp.23-32
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    • 1998
  • Al2O3/Al composites were produced by immersing the sintered silica preform in molten aluminum which contained magnesium as impurity. Three distinct regions existed in the penetration behavior of molten me-tal with changing the reaction temperature. These regions are denoted as low temperature regime(75$0^{\circ}C$-85$0^{\circ}C$) intermediate regime(90$0^{\circ}C$-95$0^{\circ}C$) and high temperature regime(100$0^{\circ}C$$\leq$) In the low temperature regime the penetration speed of molten aluminum increased with increasing reaction temperature whereas it decreased in the intermediate regime due to the phase transition of alumina formed by displacement reac-tion. In the high temperature regime the penetration speed of molten aluminum was the highest at 100$0^{\circ}C$ which was 3.6 mm/hr But above 105$0^{\circ}C$ molten aluminum did not penetrate into the silica preform because of the formation of a dense spinel layer at the preform surface by magnesium in molten Al.

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Fabrication and Characteristics of Indium Tin Oxide Films on CR39 Substrate for OTFT

  • Kwon, Sung-Yeol
    • Transactions on Electrical and Electronic Materials
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    • v.7 no.5
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    • pp.267-270
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    • 2006
  • The Indium tin oxide (ITO) films were deposited on CR39 substrate using DC magnetron sputtering. ITO thin films deposited at room temperature because CR39 substrates its glass-transition temperature of is $130^{\circ}C$. ITO thin films used bottom and top electrode and for organic thin film transparent transistor.(OTFT) ITO thin film electrodes electrical properties and optical transparency properties in the visible wavelength range (300 - 800 nm) strongly dependent on volume of oxygen percent. For the optimum resistivity and transparency of ITO thin film electrode achieved with a 75 W plasma power, 10 % volume of oxygen and a 27 nm/min deposition rate. Above 85 % transparency in the visible wavelength range (300 - 800 nm) measured without post annealing process and $9.83{times}10{-4}{\Omega}cm$ a low resistivity was measured thickness of 300 nm.

Fabrication of the LDD Structure poly-Si TFT with Excimer Laser Recrystallization Process (Excimer laser로 재결정화한 LDD구조의 poly-Si TFT 제작)

  • 정준호;박용해
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.32A no.2
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    • pp.324-331
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    • 1995
  • The leakage current characteristics of the low temperature processed LDD structure poly-Si TFT is analyzed. The excimer laser technology was applied to the recrystallization process of poly-Si film and the maximum processing temperature was retained under 600.deg.C. From the fabricated LDD space 0.3.mu.m to 3$\mu$m, the best on/off current ration could be obtained with the 1.3$\mu$m LDD space. And the threshold voltage did not increase more than 4V over 0.8$\mu$m LDD space. The characteristics of leakage current was compared to non-LDD structure TFT to analyze the mechanism of leakage current. Consequently, it could be concluded that the leakage current is strongly affected by the trap states as well as high electric field between gate and drain.

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Study on the Fabrication of Embedded Capacitor Films for PWB substrate (PWB 기판용 Embedded Capacitor필름 제작에 관한 연구)

  • 이주연;조성동;백경욱
    • Proceedings of the International Microelectronics And Packaging Society Conference
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    • 2001.11a
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    • pp.21-27
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    • 2001
  • Epoxy/BaTiO$_3$composite film type capacitors with excellent stability at room temperature, uniform thickness, and electrical properties over a large area were successfully fabricated. We fabricated composite capacitor films with good film formation capability and easy process ability, from ACF-resin as a matrix and two kinds of BaTiO$_3$powders as fillers to increase the dielectric constant of the composite film. The crystal structure of the powders and its effects on dielectric constant of the films were investigated by X-ray diffraction. DSC and dielectric properties tests were conducted to decide the right curing temperature and the optimum amount of the curing agent. As a result, the capacitors of $7{\mu}{\textrm}{m}$ thick film with 10nF/cm2 and low leakage current were successfully demonstrated.

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Fabrication of Porous Mullite Ceramics and Its Properties (다공성 Mullite 세라믹스 제조 및 그 특성)

  • 김병훈;나용한
    • Journal of the Korean Ceramic Society
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    • v.31 no.3
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    • pp.275-281
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    • 1994
  • Mullite ceramics have recently been utilized as ceramic gas filters for high-temperature treatment of solid wastes due to their low thermal expansion coefficient and high refractoriness under load. In this experiment, mechanical, thermal and microstructural properties of porous mullite ceramics, which were used as carriers and high-temperature gas filters in food industry, were investigated as a function of starting raw materials. Porous mullite ceramics showed different microstructures depending on their starting materials. The specimen M2 had excellent resistance to thermal spalling and high mechanical strength. The average pore size varied from 0.3 ${\mu}{\textrm}{m}$ to 16.6 ${\mu}{\textrm}{m}$, and porous mullite ceramics fabricated by thermal decomposition of Al(OH)3 had very large pores and broad distribution of pore size.

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