• 제목/요약/키워드: low-bandgap

검색결과 139건 처리시간 0.027초

양자성, 비양자성 이온성 액체와 새롭게 합성된 낮은 밴드갭을 갖는 고분자와의 상호작용에 의한 전기적,광학적 특성 연구 (Electrical and Optical Properties of Newly Synthesised Low Bandgap Polymer with Protic and Aprotic Ionic Liquids)

  • 김중일;김인태
    • 한국응용과학기술학회지
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    • 제30권3호
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    • pp.461-471
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    • 2013
  • Use of low bandgap polymers is the most suitable way to harvest a broader spectrum of solar radiations for solar cells. But, still there is lack of most efficient low bandgap polymer. In order to solve this problem, we have synthesised a new low bandgap polymer and investigated its interaction with the ILs to enhance its conductivity. ILs may undergo almost unlimited structural variations; these structural variations have attracted extensive attention in polymer studies. In addition to this, UV-Vis spectroscopy, confocal Raman spectroscopy and FT-IR spectroscopy results have revealed that all studied ILs (tributylmethylammonium methyl sulfate [$N_{1444}$][$MeSO_4$] from ammonium family) and 1-methylimidazolium chloride ([MIM]Cl, and 1-butyl-3-methylimidazolium chloride [Bmim]Cl from imidazolium family) has potential to interact with polymer. Further, protic ILs shows enhanced conductivity than aprotic ILs with low bandgap polymer. This study provides the combined effect of low bandgap polymer and ILs that may generate many theoretical and experimental opportunities.

개선된 CTAT 보상을 가지는 저전압 CMOS Bandgap Voltage Reference (Modified Low-Votlage CMOS Bandgap Voltage Reference with CTAT Compensation)

  • 김재붕;조성익
    • 전기학회논문지
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    • 제61권5호
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    • pp.753-756
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    • 2012
  • In this paper, a modified low-votlage CMOS bandgap voltage reference with CTAT compensation is presented. The proposed structure doesn't use PTAT current. The proposed structure is more simple than the existing structure and doesn't use the eighteen BJT. The modified low-votlage CMOS bandgap voltage reference with CTAT compensation has been successfully verified in a standard 0.18um CMOS process. The simulation results have confirmed that, with the minimum supply voltage of 1.25V, the output reference voltage at 549mV has a temperature coefficient of 12$ppm/^{\circ}C$ from $0^{\circ}C$ to $100^{\circ}C$.

A Low Voltage Bandgap Current Reference with Low Dependence on Process, Power Supply, and Temperature

  • Cheon, Jimin
    • 한국정보기술학회 영문논문지
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    • 제8권2호
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    • pp.59-67
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    • 2018
  • The minimum power supply voltage of a typical bandgap current reference (BGCR) is limited by operating temperature and input common mode range (ICMR) of a feedback amplifier. A new BGCR using a bandgap voltage generator (BGVG) is proposed to minimize the effect of temperature, supply voltage, and process variation. The BGVG is designed with proportional to absolute temperature (PTAT) characteristic, and a feedback amplifier is designed with weak-inversion transistors for low voltage operation. It is verified with a $0.18-{\mu}m$ CMOS process with five corners for MOS transistors and three corners for BJTs. The proposed circuit is superior to other reported current references under temperature variation from $-40^{\circ}C$ to $120^{\circ}C$ and power supply variation from 1.2 V to 1.8 V. The total power consumption is $126{\mu}W$ under the conditions that the power supply voltage is 1.2 V, the output current is $10{\mu}A$, and the operating temperature is $20^{\circ}C$.

Accurate Sub-1 V CMOS Bandgap Voltage Reference with PSRR of -118 dB

  • Abbasizadeh, Hamed;Cho, Sung-Hun;Yoo, Sang-Sun;Lee, Kang-Yoon
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제16권4호
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    • pp.528-533
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    • 2016
  • A low voltage high PSRR CMOS Bandgap circuit capable of generating a stable voltage of less than 1 V (0.8 V and 0.5 V) robust to Process, Voltage and Temperature (PVT) variations is proposed. The high PSRR of the circuit is guaranteed by a low-voltage current mode regulator at the central aspect of the bandgap circuitry, which isolates the bandgap voltage from power supply variations and noise. The isolating current mirrors create an internal regulated voltage $V_{reg}$ for the BG core and Op-Amp rather than the VDD. These current mirrors reduce the impact of supply voltage variations. The proposed circuit is implemented in a $0.35{\mu}m$ CMOS technology. The BGR circuit occupies $0.024mm^2$ of the die area and consumes $200{\mu}W$ from a 5 V supply voltage at room temperature. Experimental results demonstrate that the PSRR of the voltage reference achieved -118 dB at frequencies up to 1 kHz and -55 dB at 1 MHz without additional circuits for the curvature compensation. A temperature coefficient of $60 ppm/^{\circ}C$ is obtained in the range of -40 to $120^{\circ}C$.

고효율 적층형 태양전지를 위한 유무기 페로브스카이트 (Organic-Inorganic Perovskite for Highly Efficient Tandem Solar Cells)

  • 박익재;김동회
    • 세라미스트
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    • 제22권2호
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    • pp.146-169
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    • 2019
  • To overcome the theoretical efficiency of single-junction solar cells (> 30 %), tandem solar cells (or multi-junction solar cells) is considered as a strong nominee because of their excellent light utilization. Organic-inorganic halide perovskite has been regarded as a promising candidate material for next-generation tandem solar cell due to not only their excellent optoelectronic properties but also their bandgap-tune-ability and low-temperature process-possibility. As a result, they have been adopted either as a wide-bandgap top cell combined with narrow-bandgap silicon or CuInxGa(1-x)Se2 bottom cells or for all-perovskite tandem solar cells using narrow- and wide-bandgap perovskites. To successfully transition perovskite materials from for single junction to tandem, substantial efforts need to focus on fabricating the high quality wide- and narrow-bandgap perovskite materials and semi-transparent electrode/recombination layer. In this paper, we present an overview of the current research and our outlook regarding perovskite-based tandem solar technology. Several key challenges discussed are: 1) a wide-bandgap perovskite for top-cell in multi-junction tandem solar cells; 2) a narrow-bandgap perovskite for bottom-cell in all-perovskite tandem solar cells, and 3) suitable semi-transparent conducting layer for efficient electrode or recombination layer in tandem solar cells.

양면 중첩기법을 이용하는 새로운 광대역의 소형 포토닉 밴드갭 구조 (A Novel Wideband and Compact Photonic Bandgap Structure using Double-Plane Superposition)

  • 김진양;방현국
    • 한국전자파학회:학술대회논문집
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    • 한국전자파학회 2002년도 종합학술발표회 논문집 Vol.12 No.1
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    • pp.413-422
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    • 2002
  • A novel photonic bandgap(PBG) structure is proposed and measured for wide bandgap and compact circuit applications. The proposed structure realizes the ultra-wideband bandgap(2-octave) characteristics by superposing two different PBG structures into a coupled double-plane configuration. A low pass filter fabricated using 3-period of the PBG cells shows 2-octave 10 ㏈ stopband from 4.3 to 16.2 ㎓ and 0.2 ㏈ insertion loss in the passband. Moreover, we confirmed that 44∼70 % size reduction can be achieved using the proposed PBG structures. We expect this novel double-plane PBG structure is widely used for compact and wideband circuit applications, such as compact high-efficiency power amplifiers using harmonic tuning techniques.

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$0.18{\mu}m$ CMOS 저 잡음 LDO 레귤레이터 (A Low-Noise Low Dropout Regulator in $0.18{\mu}m$ CMOS)

  • 한상원;김종식;원광호;신현철
    • 대한전자공학회논문지SD
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    • 제46권6호
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    • pp.52-57
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    • 2009
  • 본 논문은 CMOS RFIC 단일 칩을 위한 Bandgap Voltage Reference와 이를 포함한 저 잡음 Low Dropout (LDO) Regulator 회로에 관한 것이다. 저 잡음을 위해 Bandgap Voltage Reference에 사용된 BJT 다이오드의 유효면적을 증가시켜야 함을 LDO의 잡음해석을 통해 나타내었다. 이를 위해 다이오드를 직렬 연결하여 실리콘의 실제면적은 최소화 하면서 다이오드의 유효면적을 증가시키는 방법을 적용하였고, 이를 통해 LDO의 출력잡음을 줄일 수 있음을 확인하였다. $0.18{\mu}m$ CMOS 공정으로 제작된 LDO는 입력전압이 2.2 V 에서 5 V 일때 1.8 V의 출력전압에서 최대 90 mA의 전류를 내보낼 수 있다. 측정 결과 Line regulation은 0.04%/V 이고 Load regulation은 0.45%를 얻었으며 출력 잡음 레벨은 100 Hz와 1 kHz offset에서 각각 479 nV/$^\surd{Hz}$와 186 nV/$^\surd{Hz}$의 우수한 성능을 얻었다.

PTAT 밴드갭 온도보상회로를 적용한 가변 이득 저잡음 증폭기 설계 (Design of Variable Gain Low Noise Amplifier Using PTAT Bandgap Reference Circuit)

  • 최혁재;고재형;김군태;이제광;김형석
    • 정보통신설비학회논문지
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    • 제9권4호
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    • pp.141-146
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    • 2010
  • In this paper, bandgap reference PTAT(Proportional to Absolute Temperature) circuit and flexible gain control of LNA(Low Noise Amplifier) which is usable in Zigbee system of 2.4GHz band are designed by TSMC $0.18{\mu}m$ CMOS library. PTAT bandgap reference circuit is proposed to minimize the instability of CMOS circuit which may be unstable in temperature changes. This circuit is designed such that output voltage remains within 1.3V even when the temperature varies from $-40^{\circ}C$ to $-50^{\circ}C$ when applied to the gate bias voltage of LNA. In addition, the LNA is designed to be operated on 2.4GHz which is applicable to Zigbee system and able to select gains by changing output impedance using 4 NMOS operated switches. The simulation result shows that achieved gain is 14.3~17.6dB and NF (Noise Figure) 1.008~1.032dB.

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저전압 밴드갭 기준 전압 발생기 설계 (A Low Voltage Bandgap Reference Voltage Generator Design and Measurement)

  • 심외용;이재형;김종희;김태훈;박무훈;하판봉;김영희
    • 한국정보통신학회:학술대회논문집
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    • 한국해양정보통신학회 2007년도 추계종합학술대회
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    • pp.785-788
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    • 2007
  • 새롭게 제안된 밴드갭 기준전압 발생기는 PVT변동에 둔감하면서 기존의 밴드갭 기준전압 발생기보다 안정적인 동작을 하기 위해 요구되는 최소 전원전압(VDD)의 크기을 낮추었다. 모의실험 결과 전원전압(VDD)이 1.0V의 낮은 전압에서 안정적인 동작을 하는 것을 확인 하였다. 매그나칩 반도체 $0.18{\mu}m$ DDI 공정을 이용하여 Layout 하였고, 사이즈는 $409.36{\mu}m$ ${\times}$ $435.46{\mu}m$ 이다.

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The Change of Energy Band Gap and Transmittance Depending on Ag Thinkness of IGZO, ZnO, AZO OMO

  • 이승민;김홍배;이상렬
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.340.1-340.1
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    • 2014
  • 본 실험에서는 Ag두께 변화에 따른 투과율과 Energy bandgap의 변화를 알아보기 위해 RF Sputter장비와 Evaporator장비를 사용하여 IGZO, ZnO, AZO OMO 구조로 Low-e 코팅된 Glass를 제작하였다. $3cm{\times}3cm$의 Corning1737 유리기판에 RF Sputtering 방식으로 Oxide layer를 증착 하였고 Evaporator장비로는 Metal layer인 Ag막을 증착하였다. Oxide layer 증착 시 RF Sputter장비의 조건은 $3.0{\times}10^{-6}Torr$이하로 하였으며, 증착압력은 $6.0{\times}10^{-3}Torr$, 증착온도는 실온으로 고정하였다. Metal layer 증착 시 Evaporator장비의 조건은 $5.0{\times}10^{-6}Torr$이하, 전압은 0.3 V, Rotate 2 rpm으로 고정하였다. 실험 변수로는 Ag 두께를 5,7,9,11,13 nm로 변화를 주어 실험을 진행하였다. 투과도 측정 장비를 사용하여 각 샘플을 측정한 결과 IGZO의 경우 가시광영역의 평균 투과율이 80% 이상이며 Ag두께가 5nm일 때부터 자외선 영역의 빛을 차단하여 low-e 특성을 나타내었다. 이는 산화물인 IGZO가 결정질인 AZO, ZnO 보다 낮은 표면거칠기를 가지기 때문이다. Ag 두께에 따른 각 물질의 Optical energy bandgap 분석결과 Ag 두께가 증가할수록 IGZO는 4.65~4.5 eV, AZO는 4.6~4.4 eV, ZnO는 4.55~4.45 eV로 Energy bandgap은 감소하였다. AFM장비를 이용하여 각 샘플의 표면 Roughness 측정 결과 Ag 두께가 증가할수록 표면거칠기도 증가하는 경향을 나타내었다.

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