• 한국진공학회지
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• 제9권1호
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• pp.7-15
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• 2000

An ECR-PECVD system with the characteristics of high ionization rat다 ability of plasma processing in a wide pressure range and deposition at low temperature was manufactured and characterized for the deposition of thin films. The system consists of a vacuum chamber, sample stage, vacuum gauge, vacuum pump, gas injection part, vacuum sealing valve, ECR source and a control part. The control of system is carried out by the microprocessor and the ROM program. We have investigated the vacuum characteristics of ECR-PECVD system, and also have diagnosed the characteristics of ECR microwave plasma by using the Langmuir probe. From the data of system and plasma characterization, we could confirmed the stability of pressure in the vacuum chamber according to the variation of gas flow rate and the effect of ion bombardment by the negative DC self bias voltage. The plasma density was increased with the increase of gas flow rate and ECR power. On the other hand, it was decreased with the increase of horizontal radius and distance between ECR source and probe. The calculated plasma densities were in the range of 49.7\times10^{11}\sim3.7\times10^{12}\textrm{cm}^{-3}$. It is also expected that we can estimate the thickness uniformity of film fabricated by the ECR-PECVD system from the distribution of the plasma density.

• 한국진공학회지
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• 제12권2호
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• pp.93-104
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• 2003

저진공펌프의 내구성평가와 관련하여 펌프의 성능이나 상태의 저하에 관한 기술적 근거를 확보함으로써 펌프의 운전상태를 진단할 수 있는 기초기술을 확보할 수 있으며, 이는 진공펌프의 기계적 결함 및 성능평가 장치의 동적 응답과 신뢰도 구축에 중점을 두고 신호 분석을 통하여 실험적으로 기계적인 동적 특성을 확인하는 과정을 통하여 수행할 수 있다. 저진공펌프의 압축일에 소요되는 전력을 이론적으로 규명하고 펌프의 압축일을 계산하였으며, 소비전력에 대한 진공펌프의 에너지 효율을 예측하여 펌프 노화에 따르는 소비전력의 증가 원인을 규명하는 자료로 활용할 수 있다. 또한 저진공펌프의 가동 중에 측정한 진동, 압력신호, 배기속도 및 소비전력을 측정하고 분석하여 펌프 운전상태를 감시하는데 매우 유용한 인자가 무엇인지 확인하였으며 추후 연구의 방향과 내구성평가의 기초기술을 확보하였다.

• Applied Science and Convergence Technology
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• 제24권4호
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• pp.84-89
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• 2015

The base pressure and outgassing rate of a mild steel chamber were measured and compared to those of a stainless steel chamber. A combined sputter-ion and non-evaporable getter pump with a nominal pumping speed of 490 l/s generated the base pressure of $2.7{\times}10^{-11}$ mbar in the mild steel chamber and $1.2{\times}10^{-10}$ mbar in the stainless steel chamber. The rate-of-rise measurements show that the mild steel has an extremely low outgassing rate of $2.6{\times}10^{-13}$ mbar $ls^{-1}cm^{-2}$, which is about one-order of magnitude smaller than the outgassing rate of the stainless steels. Vacuum annealing of the mild steel at $850^{\circ}C$ reduced the outgassing rate further to $8.8{\times}10^{-14}$ mbar $ls^{-1}cm^{-2}$, which was comparable to the outgassing rate of a heat treated stainless steel for extreme-high vacuum use.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2006년도 춘계학술대회 논문집
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• pp.155-156
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• 2006

UV-NIL is a promising technology for the fabrication of sub-100 nm features. Due to non-uniformity of the residual layer thickness (RLT) and a strong possibility of defects, many UV-NIL processes have been developed and some are commercially available at present, most are based on the 'step-and-repeat' nanoimprint technique, which employs a small-area stamp, much smaller than the substrate. This is mainly because, when a large-area stamp is used, it is difficult to obtain acceptable uniform residual layer thickness and/or to avoid defects such as air entrapment. As an attempt to enable UV_NIL with a large-area stamp for high throughput, we propose a new UV-NIL tool that is able to imprint 4 inch wafer in a low vacuum environment at a single step.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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• pp.147-147
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• 2012

Cutoff probe has been used for measuring a plasma density using the cutoff peak which is located at the plasma frequency in the low pressure plasma. However, research on analysis of low frequency region of transmission microwave frequency (TMF) spectrum does not performed even though important plasma parameters are located in the low frequency region, i.e., ion plasma frequency and collision frequency. In this research, we analyzed the low frequency region of the TMF spectrum. Experimental results reveal the effect of plasma parameters on the low frequency region on the TMF spectrum. Based on the response of TMF spectrum from changing of plasma parameters, deduction of the plasma parameters was tried. This comprehensive analysis of TMF spectrum expands applicable area of cutoff probe.

• 대한기계학회논문집B
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• 제30권8호
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• pp.772-779
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• 2006

Window is a critical component in the design of energy-efficient buildings. To minimize the heat loss, insulation performance of the glazing has to be improved. Manufacturing of vacuum glazing has been motivated by the possibility of making windows of very good thermal insulation properties for such applications. It is made by maintaining vacuum in the gap between two glass panes. Pillars are placed between them to withstand the atmospheric pressure. Edge covers are applied to reduce conduction through the edge. Accurate measurements have been made of the radiative heat transfer, the pillar conduction and the gas conduction using a guarded hot plate apparatus. Vacuum glazing is found to have low thermal conductance roughly below $1W/m^2K$. Among the heat transfer modes of residual gas conduction, conduction through support pillar and the radiative heat transfer between the glass panes, the last one is the most dominant to the overall thermal conductance. Vacuum glazing using very low emittance AI-coated glass has an overall thermal conductance of about $0.7W/m^2K$.

• 한국산업정보학회:학술대회논문집
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• 한국산업정보학회 2009년도 춘계학술대회 미래 IT융합기술 및 전략
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• pp.184-189
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• 2009

자동차 부품의 측정 시스템은 현재 고가의 장비가 대부분이다. 본 논문에서는 저가의 장비를 구현하려고 하였다. 자동차의 부품은 여러가지가 있으나, 이 중에서 현재 공장에서 공기흐름 제어에 어려움을 겪고 있는 CCP(Canister Controlled Purge Solenoid)을 대상으로 하였다. 공기의 사용량에 따라 진공압력을 일정하게 유지하는데 소요하는 시간이 과거에는 최소한 3-4분 정도 요구하지만 본 개발의 목표는 보다 더 짧은 시간이내(수초)에 컴퓨터를 이용하여 설정진공을 유지하고자 한다. 즉 일정공기압 하에서 자동차 부품 CCP를 검사하는 제어시스템을 개발하고자 하였다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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• pp.155.1-155.1
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• 2013

The goals of this study are to elucidate the plasma effects on DNA molecules to apply some plasma based applications and also to find out the mechanisms of plasma-induced DNA damage in biomolecule. Nonthermal atmospheric pressure plasma has much potential for medical, agricultural and food applications for the future. The atmospheric pressure plasma jet (APPJ) contains radicals, charged particles, low energy electrons, excited molecules and UV light. It has been started doing experiments using APPJ at the early 21th. And some recent results showed that APPJ has a possibility to apply to new fields like mentioned above. But it is kind of at the very early stages of plasma based application. It is definitely necessary much of theoretical and experimental studies to further understanding to use nonthermal atmospheric pressure plasma in biomedical, agriculture and food parts. Here we introduce a new experimental system to study plasma effects on biomolecules. And we will show some recent results of LEE-induced DNA damage using electron irradiation apparatus under ultra-high vacuum.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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• pp.181.2-181.2
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• 2015

Sputtering is one of the most popular physical deposition methods due to their versatility and reproducibility. Synthesis of Cr thin films by DC magnetron sputtering using glancing angle deposition (GLAD) has been reported. Chromium thin films have been prepared at two different working pressure($2.0{\times}10-2$, 30, $3.3{\times}10-3torr$) on Si-wafer substrate using magnetron sputtering with glancing angle deposition (GLAD) technique. The thickness of Cr thin films on the substrate was adjusted about 1 mm. The electrical property was measured by four-point probe method. For the measurement of density in the films, an X-ray reflectivity (XRR) was carried out. The sheet resistance and column angle increased with the increase of glancing angle. However, nanohardness and density of Cr thin films decreased as the glancing angle increased. The measured density for the Cr thin films decreased from 6.1 to 3.8 g/cc as the glancing angle increased from $0^{\circ}$ to $90^{\circ}$ degree. The low density of Cr thin films is resulted from the isolated columnar structure of samples. The evolution of the isolated columnar structure was enhanced at the conditions of low sputter pressure and high glancing angle. This GLAD technique can be potentially applied to the synthesis of thin films requiring porous and uniform coating such as thin film catalysts or gas sensors.

• 한국태양에너지학회 논문집
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• 제34권2호
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• pp.44-52
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• 2014

The main purpose of this paper is to develop the new BIPV module equipped with vacuum glass. Beacuse BIPV module has a function of architectural materials, thermal and PV performance should be simultaneously evaluated. To improve the thermal performance of BIPV module, this study developed BIPV module equipped with a vacuum glass. Those BIPV module was tested with a variety of encapsulants. The results are as follows. When a vacuum glass is laminated with EVA or PVB, it was broken. The reason seems to be bending by unbalance of heat expansion with center and edge of vacuum glass. In case of lamination with resin, there is no breakage and no bending of vacuum glass. Because production was conducted in low pressure & low temperature conditions. And it was also found that vacuum glass does not interfere with the UV curing process.