• Title/Summary/Keyword: liquid-crystal-display (LCD)

Search Result 760, Processing Time 0.037 seconds

Light and bias stability of c-IGO TFTs fabricated by rf magnetron sputtering

  • Jo, Kwang-Min;Lee, Joon-Hyung;Kim, Jeong-Joo;Heo, Young-Woo
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2016.02a
    • /
    • pp.265.2-265.2
    • /
    • 2016
  • Oxide thin film transistors (TFTs) have attracted considerable interest for gate diver and pixel switching devices of the active matrix (AM) liquid crystal display (LCD) and organic light emitting diode (OLED) display because of their high field effect mobility, transparency in visible light region, and low temperature processing below $300^{\circ}C$. Recently, oxide TFTs with polycrystalline In-Ga-O(IGO) channel layer reported by Ebata. et. al. showed a amazing field effect mobility of $39.1cm^2/Vs$. The reason having high field effect mobility of IGO TFTs is because $In_2O_3$ has a bixbyite structure in which linear chains of edge sharing InO6 octahedral are isotropic. In this work, we investigated the characteristics and the effects of oxygen partial pressure significantly changed the IGO thin-films and IGO TFTs transfer characteristics. IGO thin-film were fabricated by rf-magnetron sputtering with different oxygen partial pressure ($O_2/(Ar+O_2)$, $Po_2$)ratios. IGO thin film Varies depending on the oxygen partial pressure of 0.1%, 1%, 3%, 5%, 10% have been some significant changes in the electrical characteristics. Also the IGO TFTs VTH value conspicuously shifted in the positive direction, from -8 to 11V as the $Po_2$ increased from 1% to 10%. At $Po_2$ was 5%, IGO TFTs showed a high drain current on/off ratio of ${\sim}10^8$, a field-effect mobility of $84cm^2/Vs$, a threshold voltage of 1.5V, and a subthreshold slpe(SS) of 0.2V/decade from log(IDS) vs VGS.

  • PDF

Optical Design of a Multilayer LED Array Light Source and Illumination Optics for a Large-Screen LC Projection Display System (대화면 액정 화상 투영기용 다층 배열 엘이디 광원 및 조명광학계 설계)

  • Kim, Hyun Hee;Han, Dong Jin;Kim, Jin Seung
    • Korean Journal of Optics and Photonics
    • /
    • v.26 no.4
    • /
    • pp.226-232
    • /
    • 2015
  • A double-layer LED array together with an illumination optical system is proposed as a possible light source for LC projection display systems for large screens, up to $8m{\times}6m$ (400 inches diagonal). The heat dissipation problem of the LED array is solved by arranging the LEDs in double layers, and thermal analysis shows its effectiveness. The light from the LEDs in the back layer can be transmitted through the front layer without significant loss by arranging the LEDs in non-overlapping positions in the two layers and inserting suitable microlenses between the two layers and holes in the first layer. Together with the double-layer LEDs, an illumination optical system is designed to illuminate liquid crystal panels with good uniformity and appropriate matching with the projection optics.

FTS (Facing Target Sputtering)장비를 이용한 알루미늄 무기산화막 박막에 관한 연구

  • Bang, Seung-Gyu;Lee, Dong-Uk;Bae, Gang;Kim, Hwa-Min;Son, Seon-Yeong;Jeong, Sang-Gwon
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2012.02a
    • /
    • pp.169-169
    • /
    • 2012
  • 현재 디스플레이 시장은 LCD (Liquid Crystal Display), PDP (Plasma Display Panel) 등과 같이 평판 디스플레이가 주류를 이루고 있으며 현재에는 기존의 디스플레이와는 달리 잘 휘어지고 높은 투과성을 가지는 플렉시블 디스플레이에 대한 연구가 활발히 진행 중이다. 하지만 이러한 플렉시블 디스플레이에 사용되는 플라스틱 기판의 경우 용제에 대한 화학적 저항성 및 기계적인 안정성이 취약한 점과 대기중의 수분이나 산소가 플라스틱 기판을 통하여 소자내로 침투하게 되어 금속전극을 산화시키거나 기포 또는 흑점 등과 같은 비 발광 영역이 확산되어 소자의 수명을 단축시키는 치명적인 단점을 가진다. 이에 본 실험에서는 고밀도 플라즈마 형성이 가능하고 저온공정이 가능한 FTS (Facing Target Sputtering) 장비를 이용하여 Polyethylene terephthalate (PET) 기판위에 낮은 수분 투과율 또는 산소 투과율을 갖는 양질의 무기 산화막을 적층하기 위해 저 투습도 및 기계적인 경도 향상을 위한 비 반응성 박막으로 $Al_20_3$층을 Ar분위기에서 증착하였고 그 위에 박막의 stress 감소, 유연성 향상을 위한 반응성 박막으로 Al을 Ar과 $O_2$를 비율별로 증착하여 비교 실험하였다. 이와 같이 제작된 무기산화막들을 Uv- spectrophotometer를 이용하여 광학적 특성을 조사한 결과 가시광 영역에서 모두 80% 이상의 높은 투과율을 나타내었으며, 그 외 XRD (X-ray Diffraction)를 사용하여 결정성을 확인, SEM (Scanning Electron Microscope), AFM (Atomic Force Microscope)을 이용하여 박막의 구조와 표면향상 및 표면조도를 측정한 결과 모든 박막에서 밀집도가 좋으며 거칠기가 작은 것으로 확인되었다. 마지막으로 수분 투과율(WVTR)을 알아보기 위해 Mocon (Permatran W3/31)장비를 이용하여 측정한 결과 $1.0{\sim}3.0{\times}10^{-3}g/m{\cdot}day$의 낮은 수분 투과율을 볼 수 있었다. 이러한 측정 결과로 볼 때 향후 FTS 장비를 이용하여 양질의 플라즈마를 형성하여 알루미늄 무기산화막을 이용한 고밀도 다층막을 형성하면 더욱 낮은 수분투과율을 갖는 가스차단막을 제작할 수 있을 것으로 보여지며 반도체 소자 및 디바이스의 Pachaging으로도 사용가능 할 것이라 사료된다. 본 연구는 한국산업기술진흥원에서 지원하는 2011년도 지역산업기술개발사업의 연구수행으로 인한 결과물임을 밝힙니다.

  • PDF

New BLU Sheet with Linear Arrays of Deformed Bar Prism for Direct Back Light Unit (직하형 Back Light Unit에 사용하는 변형 막대프리즘의 1차원 배열로 구성한 새로운 BLU 필름)

  • Jang, Sun-Young;Jo, Jae-Heung;Baek, Seung-Sun
    • Korean Journal of Optics and Photonics
    • /
    • v.18 no.6
    • /
    • pp.401-409
    • /
    • 2007
  • A new sheet of back light unit(BLU) to reduce the number of sheets and enhance the optical performances of direct back light unit(BLU) in a liquid crystal display is proposed and designed. In order to improve the straightness and spatial uniformity of brightness of the BLU, we design the new sheet with linear arrays of complicated bar prism by using the fusion of cylindrical lens and bar prism. Then, we investigate and analyze various optical performances of a BLU including the new sheet through an illumination optical system design program. From these results, we determine the optimum geometrical structure of the sheet. Under the optimum condition, the luminance efficiency and spatial uniformity of luminance of the BLU are 53.5% and 83.5% respectively. And the vertical and horizontal widths of the angular luminance distribution are $90^{\circ}$ and $112.5^{\circ}$ respectively. Finally we have fabricated a new BLU sheet according to this design shape by using an ordinary resins.

Tolerance Improvement of Metal Pattern Line using Inkjet Printing Technology (잉크젯 프린팅 방식으로 제작된 금속 배선의 선폭 및 오차 개선)

  • Kim, Yong-Sik;Seo, Shang-Hoon;Kim, Tae-Gu;Park, Sung-Jun;Joung, Jae-Woo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2006.06a
    • /
    • pp.105-105
    • /
    • 2006
  • IT 산업 및 반도체 산업이 발전함에 따라 초소형, 고집적화 시스템의 요구에 대응하기 위해서 고해상도 및 고정밀의 패턴 구현에 관한 많은 연구가 진행되고 있다. 이러한 연구는 각종 산업제품의 PCB(Printed Circuit Board) 및 디스플레이 장치인 PDP(Plasma Display Panel), LCD(Liquid Crystal Display) 등에 적용되어 널리 응용되고 있다. 현재 널리 사용되는 인쇄 회로 기판은 마스킹 후 선택적 에칭 방식을 적용하여 금속 배선을 형성하는 방식을 적용하고 있다. 이러한 방식은 설계가 변경될 경우 마스크를 다시 제작해야 하는 번거로움이 있어 설계 변경이 용이하지 않고 더욱 길어진 생산시간의 증가로 인하여 생산성 및 집적도가 떨어지게 된다. 따라서 최근에는 이러한 한계를 극복하기 위한 방안이 여러 가지 측면에서 시도되고 있으며, 그 중에서도 Inkjet Printing 기술에 대한 관심이 증가하고 있다. 본 연구에서는 Inkjet Printing 방식을 적용하여 금속 배선을 형성하고 선폭과 두께의 오차를 줄여 배선의 Tolerance 를 개선할 수 있는 방안을 제안하였다. Inkjet Printing 방식을 이용한 기존의 금속 배선 형성은 고해상도의 DPI(Dot Per Inch)에서 잉크 액적이 뭉치는 Bulge 현상이 발생되어 원하는 형상 및 배선의 폭을 구현하는데 어려움이 있었다. Bulge 현상은 배선의 불균일성을 야기할 뿐만 아니라 근접한 배선의 간섭에도 영향을 미처 금속 배선의 기능을 할 수 없는 단점을 발생시킨다. 따라서 본 연구에서는 이러한 Bulge 현상을 줄이고 배선간의 간섭을 방지하여 원하는 배선을 용이하게 형성할 수 있는 순차적 인쇄 방식을 적용하였다. 본 연구에서는 노즐직경 35um 의 Inkjet Head 와 나노 Ag 입자 잉크를 사용하여 Glass 표면 위에 배선을 형성하고 배선의 폭과 두께를 측정하였다. 또한 순차적 인쇄 방식을 적용하여 700DPI 이상의 고해상도에서 나타날 수 있는 Bulge 현상이 감소하였음을 관찰하였으며 금속 배선의 Tolerance를 10%내외로 유지할 수 있음을 확인하였다.

  • PDF

The progress in NF3 destruction efficiencies of electrically heated scrubbers (전기가열방식 스크러버의 NF3 제거 효율)

  • Moon, Dong Min;Lee, Jin Bok;Lee, Jee-Yon;Kim, Dong Hyun;Lee, Suk Hyun;Lee, Myung Gyu;Kim, Jin Seog
    • Analytical Science and Technology
    • /
    • v.19 no.6
    • /
    • pp.535-543
    • /
    • 2006
  • Being used widely in semiconductor and display manufacturing, $NF_3$ is internationally considered as one of the regulated compounds in emission. Numerous companies have been continuously trying to reduce the emissions of $NF_3$ to comply with the global environmental regulation. This work is made to report the destruction and removal efficiency (DRE) of electrically heated scrubbers and the use rate in process chambers installed in three main LCD manufacturing companies in Korea. As the measurement techniques for $NF_3$ emission, mass flow controlled helium gas was continuously supplied into the equipment by which scrubber efficiency is being measured. The partial pressures of $NF_3$ and helium were accurately measured for each sample using a mass spectrometer, as it is emitted from inlet and outlet of the scrubber system. The results show that the DRE value for electrically heated scrubbers installed before 2004 is less than 52 %, while that for the new scrubbers modified based on measurement by scrubber manufacturer has been sigificentely improved upto more than 95 %. In additon, we have confirmed the efficiency depends on such variables as the inlet gas flow rate, water content, heater temperature, and preventative management period. The use rates of $NF_3$ in process chambers were also affected by the process type. The use rate of radio frequency source chambers, built in the $1^{st}$ and $2^{nd}$ generation process lines, was determined to be less than 75 %. In addition, that of remote plasma source chambers for the $3^{rd}$ generation was measured to be aboove 95 %. Therefore, the combined application of improved scrubber and the RPSC process chamber to the semiconductor and display process can reduce $NF_3$ emmision by 99.95 %. It is optimistic that the mission for the reduction of greenhouse gas emission can be realized in these LCD manufacturing companies in Korea.

Optical Simulation Study on the Performances of Collimating Films for LCD Backlight Applications (액정표시장치 백라이트용 집광필름의 광학특성 분석을 위한 시뮬레이션 기법 연구)

  • Park, Ji-Hee;Lee, Jung-Ho;Jeong, Jin-Ha;Nahm, Kie-Bong;Ko, Jae-Hyeon;Kim, Joong-Hyun
    • Korean Journal of Optics and Photonics
    • /
    • v.18 no.6
    • /
    • pp.432-440
    • /
    • 2007
  • Optical simulation methods such as a ray tracing technique have been widely used to predict the optical performances of collimating films for LCD backlight applications. It is necessary to optimize simulation conditions which have substantial effect on the simulation result in order to predict accurate performances of collimating films. We have set up a very simple backlight model consisting of a reflection film, a virtual flat light-source, and a prism film, which is a representative collimating film for backlight, in order to analyze the simulation conditions which are strongly correlated with the on-axis luminance gain and the viewing-angle characteristics of prism films. It was found that the dependence of the relative change in the on-axis luminance on the structure and material properties of collimating films can be derived from the above-mentioned simple BLU model and from simulation using it. However, the exact reflection property of the reflection film and the distribution of the incident light onto the optical film were found to be very important for revealing exact viewing-angle characteristics of collimating films.

Simulation of Luminance and Uniformity of LGP According to the Laser Scattering Pattern (레이저 가공 산란패턴의 유형에 따른 도광판의 휘도 및 균일도 향상에 관한 전산모사)

  • Park, So-Hee;Lee, Seung-Suk;Ma, Hye-Joon;Choi, Eun-Seo;Shin, Yong-Jin
    • Korean Journal of Optics and Photonics
    • /
    • v.21 no.6
    • /
    • pp.225-229
    • /
    • 2010
  • Laser-induced scatterer patterns in a light guide panel(LGP) have provided partially concentrated light distribution, especially near the light entrance of the LGP. Additional treatments for enhancing performance of the LGP, such as gradually increased processing depth, were also developed, but minor improvement was observed in the fabricated LGP. To solve this problem, we designed a revised scatterer pattern to be inscribed into the LGP using different laser processing depths and different separation distances between patterns. Performance feasibility of the proposed pattern was analyzed with simulation before laser inscription in the LGP. The LGP inscribed with the proposed scatterer patterns contributes improvements in luminance and uniformity of the LGP.

Metallizations and Electrical Characterizations of Low Resistivity Electrodes(Al, Ta, Cr) in the Amorphous Silicon Thin Film Transistor (비정질 실리콘 박막 트랜지스터 소자 특성 향상을 위한 저 저항 금속 박막 전극의 형성 및 전기적 저항 특성 평가)

  • Kim, Hyung-Taek
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 1993.05a
    • /
    • pp.96-99
    • /
    • 1993
  • Electrical properties of the Thin Film Transistor(TFT) electrode metal films were investigated through the Test Elements Group(TEG) experiment. The main purpose of this investigation was to characterize the electrical resistance properties of patterned metal films with respect to the variations of film thickness and TEG metal line width. Aluminum(Al), Tantalum(Ta) and Chromium(Cr) that are currently used as TFT electrode films were selected as the probed metal films. To date, no work in the electrical characterizations of patterned electrodes of a-Si TFT was accomplished. Bulk resistance$(R_b)$, sheet resistance$(R_s)$, and resistivities($\rho$) of TEG patterned metal lines were obtained. Electrical continuity test of metal film lines was also performed in order to investigate the stability of metallization process. Almost uniform-linear variations of the electrical properties with respect to the metal line displacements was also observed.

  • PDF

Development of an Anaesthesia Ventilator by Volume Control Method and a Gas Monitoring System (가스 모니터 및 볼륨 제어 방식의 마취기용 인공 호흡기 개발)

  • Lee, Jong-Su;Seong, Jong-Hun;Kim, Yeong-Gil
    • Journal of the Institute of Electronics Engineers of Korea SC
    • /
    • v.37 no.4
    • /
    • pp.42-48
    • /
    • 2000
  • Generally an operator would take notice at putting a patient under anesthesia. If the operation is executed in mistake, the patient is exposed to danger. The object of this Paper is that a system is developed for an accuracy of system and a convenience of user interface to prevent an operation of several elements of risk by mistake. The part of electrical system particularly is made for convenience of a manipulation using electrical switch and encoder. A real-time monitoring system is developed for an airway pressure and a gas concentration of carbon dioxide of patient using graphic LCD(liquid crystal display). Moreover, this flow control system could be developed control with accuracy by feedback control method. This is implemented using flow control valve and flow sensor. The implemented system gives convenience and precision of a manipulation of variable value using developed technique. This system shows guaranteed stabilization and confidence of anesthesia ventilator by notifying us that patient's state and information in case of being out of alarm range of variable value.

  • PDF