• 제목/요약/키워드: layer 2

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MONOnS 각 layer층의 두께에 따른 특성

  • Baek, Gyeong-Hyeon;Jeong, Seong-Uk;Jang, Gyeong-Su;Park, Hyeong-Sik;Yu, Gyeong-Yeol;Lee, Won-Baek;Lee, Jun-Sin
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.253-253
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    • 2010
  • 유리 기판 상에 시스템 온 패널과 같은 차세대 디스플레이 구현과 평판형 디스플레이의 문제점 해결을 위하여 비휘발성 메모리 소자 등의 전자 소자 집적화와 빠른 구동 속도를 가진 박막트랜지스터가 요구된다. 본 논문에서는 비휘발성 메모리 소자에서 MONOnS 각 layer층의 두께 따른 특성에 대한 연구를 진행하였다. 실험은 ONO 구조를 12.5nm/35nm/2.7nm, 12.5nm/20nm/2.3nm, 8.5nm/10nm/2.3nm, 6.5nm/10nm/1.9nm 의 두께로 증착하였다. ${\Delta}VFB$, Retention time, capacitance을 측정하여 oxide/Nitride/Oxynitride 층의 두께 변화를 통해 최적화된 tunneling layer와 charge storage layer, 그리고 blocking layer의 두께를 알 수 있다.

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Fabrication of (PDDA/SiO2) Thin Film by an Applying Voltage Layer-By-Layer Self Assembly Method (전압인가 LBL법을 이용한 (PDDA/SiO2) 박막 제조)

  • Park, Jong-Guk;Kyung, Kyu-Hong;Lee, Mi-Jai;Hwang, Jonghee;Lim, Tae-Young;Kim, Jin-Ho
    • Korean Journal of Materials Research
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    • v.24 no.12
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    • pp.715-719
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    • 2014
  • (PDDA/$SiO_2$) thin films that consisted of positively charged poly (diallyldimethylammonium chloride) (PDDA) and negatively charged $SiO_2$ nanoparticles were fabricated on a glass substrate by an applying voltage layer-by-layer (LBL) self-assembly method. In this study, the microstructure and optical properties of the (PDDA/$SiO_2$) thin films coated on glass substrate were measured as a function of the applied voltage on the Pt electrodes. When 1.0 V was applied to a Pt electrode in a PDDA and $SiO_2$ solution, the thickness of the $(PDDA/SiO_2)_{10}$ thin film increased from 79 nm to 166 nm. The surface roughness also increased from 15.21 nm to 33.25 nm because the adsorption volume of the oppositely charged PDDA and $SiO_2$ solution increased. Especially, when the voltage was applied to the Pt electrode in the $SiO_2$ solution, the thickness increase of the (PDDA/$SiO_2$) thin film was larger than that obtained when using the PDDA solution. The refractive index of the fabricated (PDDA/$SiO_2$) thin film was ca. n = 1.31~1.32. The transmittance of the glass substrate coated by (PDDA/$SiO_2$)6 thin film with a thickness of 106 nm increased from ca. 91.37 to 95.74% in the visible range.

Anti-Reflective Coating with Hydrophilic/Abraion-Resistant Properties using TiO2/SiOxCy Double-Layer Thin Film (TiO2/SiOxCy 이중 박막을 이용한 투명 친수성/내마모성 반사방지 코팅)

  • Lee, Sung-jun;Lee, Min-kyo;Park, Young-chun
    • Journal of Surface Science and Engineering
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    • v.50 no.5
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    • pp.345-351
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    • 2017
  • A double-layered anti-reflective coating with hydrophilic/abrasion-resistant properties was studied using anatase titanium dioxide($TiO_2$) and silicon oxycarbide($SiO_xC_y$) thin film. $TiO_2$ and $SiO_xC_y$ thin films were sequentially deposited on a glass substrate by DC sputtering and PECVD, respectively. The optical properties were measured by UV-Vis-NIR spectrophotometer. The abrasion-resistance and the hydrophilicity were observed by a taber abrasion tester and a contact angle analyzer, respectively. The $TiO_2/SiO_xC_y$ double-layer thin film had an average transmittance of 91.3%, which was improved by 10% in the visible light region (400 to 800 nm) than that of the $TiO_2$ single-layer thin film. The contact angle of $TiO_2/SiO_xC_y$ film was $6.9^{\circ}$ right after UV exposure. After 9 days from the exposure, the contact angle was $10.2^{\circ}$, which was $33^{\circ}$ lower than that of the $TiO_2$ single-layer film. By the abrasion test, $SiO_xC_y$ film showed a superior abrasion-resistance to the $TiO_2$ film. Consequently, the $TiO_2/SiO_xC_y$ double-layer film has achieved superior anti-reflection, hydrophilicity, and abrasion resistance over the $TiO_2$ or $SiO_xC_y$ single-layer film.

Analysis of Fuel Moisture Contents Change after Precipitation in the Pine tree stand during Forest Fire Period in the East sea region (영동지역 소나무림에서 강우 후 임내 연료습도 변화분석)

  • Lee, Si-Young;Lee, Myung-Woog;Kwon, Chun-Geun;Yeom, Chan-Ho
    • 한국방재학회:학술대회논문집
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    • 2008.02a
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    • pp.149-152
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    • 2008
  • This study is the result between the variation of fuel moisture and the risk of forest fire through measuring the change of moisture containing ratio on-site and its average analysis for fallen leaves layer, humus layer, and soil layer in the forest. The measurement was performed on six days from the day after a rainfall. The fuel moisture on-site was measured on the day when the accumulated rainfall was above 5.0mm, and the measurements was 2 times in spring and 1 time in fall. From the pine forest which were distributed around Samcheok and Donghae in Kangwondo, three regions were selected by loose, medium, and dense forest density, and the fuel moisture was measured on fallen leaves layer, humus layer, and soil layer in the forest. for six days from the day after a rainfall. The study showed that the moisture containing ratio converged on 3 - 4 days in spring and fall for fallen leaves layer, and the convergence was made more than six days in spring and fall for the humus layer. In the other case of soil layer, the variation of moisture containing ratio after rainfall was not distinguishable regardless of season.

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Response of the Midlatitude F2 Layer to Some Strong Geomagnetic Storms during Solar Minimum as Observed at Four Sites of the Globe

  • Kim, Vitaly P.;Hegai, Valery V.
    • Journal of Astronomy and Space Sciences
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    • v.32 no.4
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    • pp.297-304
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    • 2015
  • In this study, we documented the midlatitude F2-layer response to five strong geomagnetic storms with minimum Dst < -150 nT that occurred in solar minimum years using hourly values of the F2-layer critical frequency (foF2) from four ionosondes located in different hemispheres. The results were very limited, but they illustrated some peculiarities in the behavior of the F2-layer storm. During equinox, the characteristic ionospheric disturbance patterns over the Japanese station Wakkanai in the Northern Hemisphere and the Australian station Mundaring in the Southern Hemisphere were consistent with the well-known scenario by $Pr{\ddot{o}}lss$ (1993); however, during a December solstice magnetic storm, both stations did not observe any noticeable positive ionospheric disturbances. Over the "near-pole" European ionosonde, clear positive ionospheric storms were not observed during the events, but the "far-from-pole" Southern Hemisphere station Port Stanley showed prominent enhancements in F2-layer peak electron density in all magnetic storms except one. No event produced noticeable nighttime enhancements in foF2 over all four ionosondes.

Gas sensing property of polypyrrole and SnO2 composite (폴리피롤과 산화주석 복합재료를 이용한 센서의 가스 검지 특성)

  • Kim, Do-Yeon;Yu, Joon-Boo;Son, Sung-Ok;Huh, Jeung-Soo
    • Journal of Sensor Science and Technology
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    • v.15 no.3
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    • pp.211-215
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    • 2006
  • Conducting polymer (Polypyrrole) and Tin oxide ($SnO_{2}$) composite films have been fabricated with layer-by-layer technique. $SnO_{2}$ layer was screen-printed on $Al_{2}O_{3}$ substrate and then was dip-coated with polypyrrole (Ppy). The microstructures of composite films were evaluated by a field emission scanning electron microscope (FE-SEM) and FTIR spectral analysis. The change in sensitivity to various VOCs was observed. The target VOCs were methanol, ethanol, benzene and toluene. The sensitivities of the $Ppy/SnO_{2}$ sensor to benzene and toluene were very low at 1000 ppm (2.1 %, 1.5 %), while the sensitivities to methanol and ethanol was high (9 %, 11 %). It indicates that the sensors have selectivity to alcoholic gases such as methanol and ethanol.

Adhesion Property of Cu on Low-k : Ti Glue Layer, Boron Dopant, N2plasma effects (Ti glue layer, Boron dopant, N2plasma 처리들이 Cu와 low-k 접착력에 미치는 효과)

  • Lee, Seob;Lee, Jae-gab
    • Korean Journal of Materials Research
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    • v.13 no.5
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    • pp.338-342
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    • 2003
  • Adhesion between Cu and low-k films has been investigated. Low-k films deposited using a mixture of hexamethyldisilane(HMDS) and Para-xylene had a dielectric constant as low as 2.7, showing the thermally stable properties up to $400^{\circ}C$. In this study, Ti glue layer, boron dopant, and $N_2$plasma treatment were used to improve adhesion property of between Cu and low-k films. Ti glue layer slightly improved adhesion property. After $N_2$plasma treatment, the adhesion property was significantly improved due to the increased roughness and the formation of new binding states between Ti and plasma-treated PPpX : HMDS. However, $300^{\circ}C$ annealing of $N_2$plasma treated sample caused the diffusion of Cu into the PPpX : HMDS, degrading the low-k properties. In the case of Cu(B)/Ti/PPpX : HMDS, the adhesion was remarkably increased. This enhanced adhesion was attributed to formation of Ti-boride at the Cu-Ti interface. It is because the formed Ti-boride prevented the diffusion of Cu into the PPpX : HMDS and the Cu-Ti reaction at the Ti interface.

Additive Fabrication of Patterned Multi-Layered Thin Films of Ta2O5 and CdS on ITO Using Microcontact Printing Technique

  • Lee, Jong-Hyeon;Woo, Soo-Yeun;Kwon, Young-Uk;Jung, Duk-Young
    • Bulletin of the Korean Chemical Society
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    • v.24 no.2
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    • pp.183-188
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    • 2003
  • The micro-patterning of multi-layered thin films containing CdS and $Ta_2O_5$ layers on ITO substrate with various structures was successfully obtained by combining three different techniques: chemical solution depositions, sol-gel, and microcontact printing (μCP) methods using octadecyltrichlorosilane (OTS) as the organic thin layer template. $Ta_2O_5$ layer was prepared by sol-gel casting and CdS one obtained by chemical solution deposition, respectively. Parallel and cross patterns of multi-layers with $Ta_2O_5$ and CdS films were fabricated additively by successive removal of OTS layer pre-formed. This study presents the designed architectures consisting of the two types of feature having horizontal dimensions of 170 ㎛ and 340 ㎛ with constant thickness ca. 150 nm of each deposited materials. The thin film lay-out of the cross-patterning is composed of four regions with chemically different layer compositions, which are confirmed by Auger electron microanalysis.

Effect of HfO2 Thin Film for Blocking Layer of Dye-Sensitized Solar Cell

  • Jo, Dae-Hui;Lee, Gyeong-Ju;Song, Sang-U;Kim, Hwan-Seon;Cheon, Eun-Yeong;Jang, Ji-Hun;Mun, Byeong-Mu
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.360.1-360.1
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    • 2014
  • DSSC (Dye-Sensitized Solar Cell)의 TCO (Transparent Conductive Oxide)와 전해질 사이의 전자 재결합(Back reaction)은 DSSC의 효율을 떨어뜨리는 요소 중 하나이다. 이와 같은 문제점을 해결하기 위하여 Blocking layer로서 $TiO_2$ 가 많이 사용되어지고 있다. 본 실험에서는 $HfO_2$ 를 Blocking layer로 사용하여 전자 재결합으로 인한 효율 저하를 막기 위한 연구를 진행하였다. 기존 $TiO_2$ 대비 $HfO_2$는 큰 에너지 밴드갭을 가지고 있어, TCO와 전해질 사이에 전자 재결합을 줄여주는 역할을 하기 때문에 DSSC의 효율 향상을 확인할 수 있다. 효율 측정은 1sun (100 mW/cm, AM1.5)조건에서 solar simulator를 이용하여 측정 했으며, 전자 재결합 감소는 Dark Current, EIS (Electrochemical Impedance spectroscopy)의 측정을 통하여 확인하였다. $HfO_2$를 이용한 blocking layer를 염료 감응 태양전지에 적용하면, 전자 재결합에 의한 손실을 줄여 성능적 측면에서 개선 가능할 것으로 생각된다.

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