• 전자공학회논문지A
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• 제31A권6호
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• pp.134-142
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• 1994

A kink due to the lasing of the first transverse mode in laser diodes is investigated using rate equations based on the spatial hole burning model. An analytic expression for the kink power is derived and the result agrees well with experimental results. It is also shown that the position of a kink can be identified in the electrical derivative characteristics as well as in light output vs, current characteristics.

• 전자공학회논문지T
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• 제35T권2호
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• pp.6-12
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• 1998

박막의 SOI(Silicon-On-Insulator) 소자는 짧은 채널 효과(short channel effect), subthreshold slope의 개선, 이동도 향상, latch-up 제거 등 많은 이점을 제공한다. 반면에 이 소자는 current kink effect와 같이 정상적인 소자 동작에 있어 주요한 저해 요소인 floating body effect를 나타낸다. 본 논문에서는 이러한 문제를 해결하기 위해 T-형 게이트 구조를 갖는 SOI NMOSFET를 제안하였다. T-형 게이트 구조는 일부분의 게이트 산화막 두께를 다른 부분보다 30nm 만큼 크게 하여 TSUPREM-4로 시뮬레이션 하였으며, 이것을 2D MEDICI mesh를 구성하여 I-V 특성 시뮬레이션을 시행하였다. 부분적으로 게이트 산화층의 두께가 다르기 때문에 게이트 전계도 부분적으로 차이가 발생되어 충격 이온화 전류의 크기도 줄어든다. 충격 이온화 전류가 감소한다는 것은 current kink effect가 감소하는 것을 의미하며, 이것을 MEDICI 시뮬레이션을 통해 얻어진 충격 이온화 전류 곡선, I-V 특성 곡선과 정공 전류의 분포 형태를 이용하여 제안된 구조에서 current kink effect가 감소됨을 보였다.

• 전자공학회논문지
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• 제53권12호
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• pp.15-19
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• 2016

매우 큰 사이즈를 가진 multi-finger RF MOSFET의 $S_{11}$-parameter에서 스미스차트의 저항 circle 라인을 벗어나는 kink 현상의 게이트 바이어스 종속 특성이 관찰되었다. 이러한 바이어스 종속성은 $S_{11}$-parameter의 크기와 위상, 입력저항, 입력 커패시턴스의 주파수 응답곡선을 측정하여 최초로 분석되었다. 그 결과 입력 커패시턴스의 크기와 입력저항의 dominant pole과 zero 주파수에 의해 $V_{gs}$ 종속 kink 현상이 크게 변하는 것을 알 수 있다. $V_{gs}=0V$일 때 매우 적은 $S_{11}$-parameter 위상차와 입력저항의 높은 pole 주파수에 의해 고주파영역에서 kink 현상이 나타난다. 하지만 $V_{gs}$가 높아지면 $S_{11}$-parameter 위상차가 크게 증가하고 pole 주파수가 낮아져 저주파영역에서 kink 현상이 발생하게 된다.

• 한국컴퓨터산업학회논문지
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• 제6권5호
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• pp.783-790
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• 2005

In this paper, we have simulated a Symmetric Dual-gate Single-Si TFT which has three split floating n+ zones. This structure reduces the kink-effect drastically and improves the on-current. Due to the separated floating n+ zones, the transistor channel region is split into four zones with different lengths defined by a floating n+ region, This structure allows an effective reduction of the kink-effect depending on the length of two sub-channels. The on-current of the proposed dual-gate structure is 0.9mA while that of the conventional dual-gate structure is 0.5mA at a 12V drain voltage and a 7V gate voltage. This result shows a 80% enhancement in on-current. Moreover we observed the reduction of electric field in the channel region compared to conventional single-gate TFT and the reduction of the output conductance in the saturation region. In addition, we also confirmed the reduction of hole concentration in the channel region so that the kink-effect reduces effectively.

• 한국전기전자재료학회논문지
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• 제18권5호
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• pp.423-430
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• 2005

In this paper, we have simulated a Symmetric Dual-gate Single-Si TFT which has three split floating $n^{+}$ zones. This structure reduces the kink-effect drastically and improves the on-current. Due to the separated floating $n^{+}$ zones, the transistor channel region is split into four zones with different lengths defined by a floating $n^{+}$ region. This structure allows an effective reduction of the kink-effect depending on the length of two sub-channels. The on-current of the proposed dual-gate structure is 0.9 mA while that of the conventional dual-gate structure is 0.5 mA at a 12 V drain voltage and a 7 V gate voltage. This results show a $80 {\%}$ enhancement in on-current by adding two floating $n^{+}$ zones. Moreover we observed the reduction of electric field In the channel region compared to conventional single-gate TFT and the reduction of the output conductance in the saturation region. In addition we also confirmed the reduction of hole concentration in the channel region so that the kink-effect reduces effectively.

• Transactions on Electrical and Electronic Materials
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• 제7권2호
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• pp.53-57
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• 2006

In this paper, a Symmetric Dual-gate Single-Si TFT, which includes three split floating n+ zones, is simulated. This structure drastically reduces the kink-effect and improves the on-current. This is due to the separated floating n+ zones, the transistor channel region is split into four zones with different lengths defined by a floating n+ region. This structure allows effective reduction in the kink-effect, depending on thy length of the two sub-channels. The on-current of the proposed dual-gate structure is 0.9 mA, while that of the conventional dual-gate structure is 0.5 mA, at both 12 V drain and 7 V gate voltages. This result shows an 80% enhancement in on-current. In addition, the reduction of electric field in the channel region compared to a conventional single-gate TFT and the reduction of the output conductance in the saturation region, is observed. In addition, the reduction in hole concentration, in the channel region, in order for effectively reducing the kink-effect, is also confirmed.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2005년도 추계학술대회 논문집 전기물성,응용부문
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• pp.84-86
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• 2005

본 논문에서는 역 방향 전하공핍(reverse bias depletion)을 적용한 새로운 구조의 다결정 실리콘 박막 트랜지스터(poly-Si TFT)를 제안한다. 제안된 소자는 kink 전류 억제를 목적으로 counter-doped(p+) 영역이 채널 내로 확장되어 유효채널 폭을 감소시키는 구조이다. 감소된 채널 폭에 의하여 포화 영역의 채널 내 저항이 증가하고, 훌 전류를 통하여 kink 효과가 억제된다. 제작된 새로운 poly-Si TFT는 기존의 소자에 비해 효과적으로 kink 전류를 억제할 수 있음을 실험을 통해 검증하였다.

• KCI Concrete Journal
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• 제12권1호
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• pp.57-68
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• 2000

The effect of structure size on the nominal strength of unidirectional fiber-polymer composites, failing by propagation of a kink band with fiber microbuckling, is analyzed experimentally and theoretically. Tests of novel geometrically similar carbon-PEEK specimens, with notches slanted so as to lead to a pure kink band (without shear or splitting cracks), are conducted. The specimens are rectangular strips of widths 15.875, 31.75. and 63.5 mm (0.625, 1.25 and 2.5 in and gage lengths 39.7, 79.375 and 158.75 mm (1.563, 3.125 and 6.25 in.). They reveal the existence of a strong (deterministic. non-statistical) size effect. The doubly logarithmic plot of the nominal strength (load divided by size and thickness) versus the characteristic size agrees with the approximate size effect law proposed for quasibrittle failures in 1983 by Bazant This law represents a gradual transition from a horizontal asymptote, representing the case of no size effect (characteristic of plasticity or strength criteria), to an asymptote of slope -1/2 (characteristic of linear elastic fracture mechanics. LEFM) . The size effect law for notched specimens permits easy identification of the fracture energy of the kink bandand the length of the fracture process zone at the front of the band solely from the measurements of maximum loads. Optimum fits of the test results by the size effect law are obtained, and the size effect law parameters are then used to identify the material fracture characteristics, Particularly the fracture energy and the effective length of the fracture process zone. The results suggest that composite size effect must be considered in strengthening existing concrete structural members such as bridge columns and beams using a composite retrofitting technique.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1997년도 하계학술대회 논문집 C
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• pp.1286-1288
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• 1997

In this study, partially-depleted SOI MOSFET with multi-gate was fabricated on p-type SIMOX(Seperation by Implanted Oxygen). As increase the number of its gate, increase the breakdown voltage. But kink effect was not affected by the number of its gate. However, it is known that the asymmetric gate structure reduce kink effect. So if asymmetric multi-gate applied to partially-depleted SOI MOSFET, it is expected that the breakdown voltage of SOI MOSET with asymmetric multi-gate is higher than that of SOI MOSFET with single gate and that kink effect is reduced by SOI MOSFET with asymmetric multi-gate.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2005년도 제36회 하계학술대회 논문집 C
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• pp.2031-2033
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• 2005

poly-Si TFT의 kink 전류를 억제하는 L-shaped dual-gate TFT 구조를 제안하고 이를 제작하였다. 제안된 소자는 채널의 그레인 방향을 일정하게 성장시키는 SLS나 CW laser 결정화 방법을 사용한다. L자 모양의 게이트 구조를 사용하여 서고 다른 전계효과 이동도를 갖는 두 개의 sub-TFT를 구현할 수 있으며, 이러한 sub-TFT간의 특성차이가 kink 전류를 억제시킨다. 직접 제작한 L-shaped dual-gate 구조의 소자가 poly-Si TFT의 kink 전류를 억제하고, 전류포화 영역에서 전류량을 고정시킴으로써 신뢰성이 향상됨을 확인하였다.