• Title/Summary/Keyword: junction structure

Search Result 485, Processing Time 0.025 seconds

EVALUATION OF FAR-INFRARED BIB-TYPE GE DETECTORS FABRICATED WITH THE SURFACE-ACTIVATED WAFER BONDING TECHNOLOGY

  • Hanaoka, Misaki;Kaneda, Hidehiro;Oyabu, Shinki;Hattori, Yasuki;Tanaka, Kotomi;Ukai, Sota;Shichi, Kazuyuki;Wada, Takehiko;Suzuki, Toyoaki;Watanabe, Kentaroh;Nagase, Koichi;Baba, Shunsuke;Kochi, Chihiro
    • Publications of The Korean Astronomical Society
    • /
    • v.32 no.1
    • /
    • pp.351-353
    • /
    • 2017
  • To realize large-format compact array detectors covering a wide far-infrared wavelength range up to 200 µm, we have been developing Blocked-Impurity-Band (BIB) type Ge detectors with the room-temperature surface-activated wafer bonding technology provided by Mitsubishi Heavy Industries. We fabricated various types of $p^+-i$ junction devices which possessed a BIB-type structure, and evaluated their spectral response curves using a Fourier transform spectrometer. From the Hall effect measurement, we also obtained the physical characteristics of the $p^+$ layers which constituted the $p^+-i$ junction devices. The overall result of our measurement shows that the $p^+-i$ junction devices have a promising applicability as a new far-infrared detector to cover a wavelength range of $100-200{\mu}m$.

Reduction of Light Reflectance from InAlP by the Texture Formation Using Ultra-Thin Pt Layer (Pt 금속 박막을 이용한 InAlP층의 텍스쳐 구조 형성 및 반사율 측정)

  • Shin, Hyun Wook;Shin, Jae Cheol;Kim, Hyo Jin;Kim, Sung;Choe, Jeong-Woo
    • Journal of the Korean Vacuum Society
    • /
    • v.22 no.3
    • /
    • pp.150-155
    • /
    • 2013
  • Textured surface has been fabricated to reduce the light reflectance from the solar cells. The textured surface is very suitable for the multi-junction III-V solar cells because it can decrease the light reflectance over a large wavelength range. In this study, we have generated a textured structure on InAlP which is used for the window layer of the multi-junction III-V solar cells. Ultra-thin Pt layer (0.7 nm) has been used for wet etching mask. An array of nanosized pyramid shape formed on InAlP surface dramatically reduces the light reflectance up to 13.7% over a large wavelength range (i.e., $0.3{\sim}1.5{\mu}m$).

Cold Cathode using Avalanche Phenomenon at the Inversion Layer (반전층에서의 애벌런치 현상을 이용한 냉음극)

  • Lee, Jung-Yong
    • Journal of the Korean Vacuum Society
    • /
    • v.16 no.6
    • /
    • pp.414-423
    • /
    • 2007
  • Field Emission Display(FED) has significant advantages over existing display technologies, particularly in the area of small and high quality display. In order to test the feasibility of fabricating the System-on-Chip(SOC) with FED, we conducted the experiment to use the p-n junction as an electron beam source for the flat panel display. A novel structure was constructed to form p-n junctions by generating inversion layer with the electric field from the cantilever style gate. When we applied more than 220V at the cantilever style gate which has a height of $1{\mu}m$, avalanche breakdown onset was successfully achieved. The characteristics was compared with the electron emission from the ultra shallow junction in the avalanche region. The experiment result and the future direction were discussed.

Local Current Distribution in a Ferromagnetic Tunnel Junction Fabricated Using Microwave Excited Plasma Method (마이크로파 여기 프라즈마법으로 제조한 강자성 터널링 접합의 국소전도특성)

  • Yoon, Tae-Sick;Kim, Cheol-Gi;Kim, Chong-Oh;Masakiyo Tsunoda;Migaku Takahashi;Ying Li
    • Journal of the Korean Magnetics Society
    • /
    • v.13 no.2
    • /
    • pp.47-52
    • /
    • 2003
  • Ferromagnetic tunnel junctions were fabricated by dc magnetron sputtering and plasma oxidation process. The local transport properties of the ferromagnetic tunnel junctions were studied using contact-mode Atomic Force Microscopy (AFM) and the local current-voltage analysis. Tunnel junctions with the structure of sub./Ta/Cu/Ta/NiFe/Cu/Mn$\_$75/Ir$\_$25//Co$\_$70/Fe$\_$30//Al-oxide were prepared on thermally oxidized Si wafers. Al-oxide layers were formed with microwave excited plasma using radial line slot antenna (RLSA) for 5 and 7 sec. Kr gas was used as the inert gas mixed with $O_2$ gas for the plasma oxidization. No correlation between topography and current image was observed while they were measured simultaneously. The local current distribution was well identified with the distribution of local barrier height. Assuming the gaussian distribution of the local barrier height, the ferromagnetic tunnel junction with longer oxidation time was well fitted with the experimental results. As contrast, in the case of the shorter time oxidation junction, the current mainly flow through the low barrier height area for its insufficient oxygen. Such leakage current might result in the decrease of tunnel magnetoresistance (TMR) ratio.

Design of Broadband Spiral Antenna for Non-Linear Junction Detector (비선형 소자 탐지용 광대역 스파이럴 안테나의 설계)

  • Kim, Tae-Geun;Min, Kyeong-Sik;Lee, Kwang-Kun
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
    • /
    • v.22 no.1
    • /
    • pp.81-88
    • /
    • 2011
  • This paper presents a design of spiral antenna with broad bandwidth for non-linear junction detector(NLJD). An elliptical patch as radiating element located on center position of radiating surface, as well as the spiral elements on radiating surface was designed for broad bandwidth of spiral antenna. An antenna ground structure generating the multi resonance by spiral slit inserted on ground surface was also proposed. In order to realize high directivity and high gain of the proposed antenna, the cavity wall made of Fr4-epoxy and the metal cap were considered in design. As a result, the calculated gain of antenna with metal cap was improved about 3 dB with comparison of antenna without metal cap and the measured main beam directivity toward -z axis direction agreed well with calculation result. The measured axial ratio satisfied the circular polarization within -z axis ${\pm}45^{\circ}$ at design frequency bands and showed reasonable agreement with prediction.

CHAINED COMPUTATIONS USING AN UNSTEADY 3D APPROACH FOR THE DETERMINATION OF THERMAL FATIGUE IN A T-JUNCTION OF A PWR NUCLEAR PLANT

  • Pasutto, Thomas;PENiguel, Christophe;Sakiz, Marc
    • Nuclear Engineering and Technology
    • /
    • v.38 no.2
    • /
    • pp.147-154
    • /
    • 2006
  • Thermal fatigue of the coolant circuits of PWR plants is a major issue for nuclear safety. The problem is especially accute in mixing zones, like T-junctions, where large differences in water temperature between the two inlets and high levels of turbulence can lead to large temperature fluctuations at the wall. Until recently, studies on the matter had been tackled at EDF using steady methods: the fluid flow was solved with a CFD code using an averaged turbulence model, which led to the knowledge of the mean temperature and temperature variance at each point of the wall. But, being based on averaged quantities, this method could not reproduce the unsteady and 3D effects of the problem, like phase lag in temperature oscillations between two points, which can generate important stresses. Benefiting from advances in computer power and turbulence modelling, a new methodology is now applied, that allows to take these effects into account. The CFD tool Code_Saturne, developped at EDF, is used to solve the fluid flow using an unsteady L.E.S. approach. It is coupled with the thermal code Syrthes, which propagates the temperature fluctuations into the wall thickness. The instantaneous temperature field inside the wall can then be extracted and used for structure mechanics computations (mainly with EDF thermomechanics tool Code_Aster). The purpose of this paper is to present the application of this methodology to the simulation of a straight T-junction mock-up, similar to the Residual Heat Remover (RHR) junction found in N4 type PWR nuclear plants, and designed to study thermal striping and cracks propagation. The results are generally in good agreement with the measurements; yet, in certain areas of the flow, progress is still needed in L.E.S. modelling and in the treatment of instantaneous heat transfer at the wall.

Simulation Studies on the Super-junction MOSFET fabricated using SiGe epitaxial process (SiGe 에피 공정기술을 이용하여 제작된 초 접합 금속-산화막 반도체 전계 효과 트랜지스터의 시뮬레이션 연구)

  • Lee, Hoon-Ki;Park, Yang-Kyu;Shim, Kyu-Hwan;Choi, Chel-Jong
    • Journal of the Semiconductor & Display Technology
    • /
    • v.13 no.3
    • /
    • pp.45-50
    • /
    • 2014
  • In this paper, we propose a super-junction MOSFET (SJ MOSFET) fabricated through a simple pillar forming process by varying the Si epilayer thickness and doping concentration of pillars using SILVACO TCAD simulation. The design of the SJ MOSFET structure is presented, and the doping concentration of pillar, breakdown voltage ($V_{BR}$) and drain current are analyzed. The device performance of conventional Si planar metal-oxide semiconductor field-effect transistor(MOSFET), Si SJ MOSFET, and SiGe SJ MOSFET was investigated. The p- and n-pillars in Si SJ MOSFET suppressed the punch-through effect caused by drain bias. This lead to the higher $V_{BR}$ and reduced on resistance of Si SJ MOSFET. An increase in the thickness of Si epilayer and decrease in the former is most effective than the latter. The implementation of SiGe epilayer to SJ MOSFET resulted in the improvement of $V_{BR}$ as well as drain current in saturation region, when compared to Si SJ MOSFET. Such a superior device performance of SiGe SJ MOSFET could be associated with smaller bandgap of SiGe which facilitated the drift of carriers through lower built-in potential barrier.

Switching Characteristics of Magnetic Tunnel Junction with Amorphous CoFeSiB Free Layer (비정질 CoFeSiB 자유층을 갖는 자기터널접합의 스위칭 특성)

  • Hwang, J.Y.;Rhee, J.R.
    • Journal of the Korean Magnetics Society
    • /
    • v.16 no.6
    • /
    • pp.276-278
    • /
    • 2006
  • The switching characteristics of magnetic tunnel junctions (MTJs) comprising amorphous ferromagnetic CoFeSiB free layer have been investigated. CoFeSiB was used for the free layer to enhance the switching characteristics. The typical junction structure was $Si/SiO_{2}/Ta$ 45/Ru 9.5/IrMn 10/CoFe $7/AlO_{x}/CoFeSiB\;(t)/Ru\;60\;(in\;nm)$. CoFeSiB has low saturation magnetization ($M_{s}$) of $560\;emu/cm^{3}$ and high anisotropy constant ($K_{u}$) of $2800\;erg/cm^{3}$. These properties caused low coercivity ($H_{c}$) and high sensitivity in MTJs, and it also confirmed in submicrometer-sized elements by micromagnetic simulation based on the Landau-Lisfschitz-Gilbert equation. By increasing CoFeSiB free layer thickness, the switching characteristics became worse due to increase of the demagnetization field.

Time-Variant Characteristics of Organic Thin Film Solar Cell Devices on Plastic Substrates (플라스틱 기판에 제작된 유기박막태양전지의 출력특성 경시변화)

  • No, Im-Jun;Lee, Sunwoo;Shin, Paik-Kyun
    • Journal of the Korean Vacuum Society
    • /
    • v.22 no.4
    • /
    • pp.211-217
    • /
    • 2013
  • Two types of organic thin film solar cell devices with bulk hetero-junction (BHJ) structure were fabricated on plastic substrates using conjugated polymers of $PCDTBT:PC_{71}BM$ and $PTB7:PC_{71}BM$ blended as active channel layer. Time-variant characteristics of the organic thin film solar cell devices were investigated: short circuit current density ($J_{SC}$); open circuit voltage ($V_{OC}$); ; fill factor (FF); power conversion efficiency (PCE, ŋ). All the performance parameters were degraded by progress of the measurement time, while $V_{OC}$ showed the most drastic decrease with time. Possible factors to cause the time-variant alteration of performance parameters were discussed to be clarified.

Analysis of Stepped T-Junction using Improved Three Plane Mode Matching Method and Its Application (개선된 Three Plane Mode Matching Method를 이용한 계단형 T-접합의 해석과 응용)

  • 손영일;김상태;황충선;백락준;신철재
    • The Journal of Korean Institute of Communications and Information Sciences
    • /
    • v.24 no.6B
    • /
    • pp.1123-1133
    • /
    • 1999
  • In this paper, we applied mode matching and generalized scattering matrix methods to three plane mode matching method for analyzing T-junctions. We calculated all scattering matrix elements by only three times and considered several incident modes. By proposed analysis method, we could analyze various waveguide discontinuity structures more conveniently and accurately. Using the stepped T-junction, we would be able to reduce the reflection coefficient at an input port and use it over wider band. Simulated and HFSS data of T-junctions are compared, showing good agreement for scattering matrix elements. Considering step numbers, height, length and position, we extracted for optimum dimensions and equivalent circuit parameters.

  • PDF