• Journal of the Korean institute of surface engineering
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• v.44 no.6
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• pp.269-276
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• 2011

Phase evolution and tribological behavior of Cr-Mo-N multi compositional films with different interlayer were investigated. The films were deposited by hybrid PVD (Physical Vapor Deposition) system consisted of dc unbalanced magnetron (UBM) sputtering and arc ion plating (AIP) sources. A pure molybdenum (Mo) was used as sputtering target and also a pure Cr was used as AIP target to form the Cr-Mo-N films. Various growth planes were found, no textured surface, in all of the multi composition films. Maximum value of microhardness was measured in Cr-Mo-N film with Mo interlayer as 29 GPa. Composition film was mainly showed the aspect of the adhesive wear than CrN film. The friction coefficient was decreased from 0.6 for pure CrN coating to 0.35 for Cr-Mo-N film with Mo interlayer. This result may come from the formation of metal oxide tribo-layer which is known as solid lubricant during the wear test.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2017.05a
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• pp.116.2-116.2
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• 2017

DLC (Diamond like carbon) 박막을 전극 재료로 활용하기 위해서는 높은 전기 저항과 금속성 기판에 대한 낮은 접착력을 극복해야 한다. 본 연구에서는 PECVD에 의해 합성 된 DLC/Ti 전극의 아크 중간층, 질소 도핑, 증착 및 열처리 온도가 접착 강도와 전기적 및 전기 화학적 특성에 주는 영향을 체계적으로 조사 하였다. 그 결과, arc ion plating (AIP) 법에 의해 증착 된 Ti/TiC 중간층의 도입은 스크래치 테스트와 전기화학적 싸이클 테스트에서 향상된 접착 강도 및 수명을 가져온다는 것을 확인 하였다. 그리고 arc 중간층에서의 arc droplet은 DLC 박막의 표면적을 넓혀 전기 화학적 활성도를 높이는 긍정적인 역할을 하였다. 소량의 질소 도핑은 DLC 막의 비저항을 크게 낮춰주었고, 전기화학적 활성도를 증가시켰다. 증착 온도가 높을수록 DLC 막의 sp2/sp3 비율이 증가하였고, 이에 따라 비저항은 감소하였으며 전기 화학적 활성도는 증가하였다. 반면, 가장 높은 전기화학적 전위창은 $300^{\circ}C$ 에서 얻어졌으며 더 높은 온도에서 감소하였다. 열처리 온도를 높일수록 비저항의 감소 및 전기 화학적 활성도가 증가한 반면, 전기화학적 전위창은 지속적으로 감소하였고, 높은 열처리 온도에서는 DLC 전극의 수명이 줄어드는 것을 확인 하였다.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2017.05a
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• pp.85-85
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• 2017

ISO (International Organization for Standardization) is an independent, non-governmental international organization with a membership of 163 national standards bodies (NSB). The ISO standards are developed and processed within the technical committees (TC) or their subcommittees (SC) dealing with the different subject matters. The first technical committee, ISO/TC1, deals with screw threads and was created back in 1947. While, more recently, TC 309 was created to standardize organizational governance. The ISO technical committee in the field of metallic coatings was created in 1962 with the title ISO/TC107- Metallic and other inorganic coatings. This ISO/TC107 technical committee is dealing with the standardization of the characteristics of protective and decorative metallic coatings applied by electrolysis, fusion, vacuum or chemical means, mechanical deposition and ion plating. similarly, it also covers the standardization of the characteristics of protective and decorative non-metallic coatings (excluding paints and other organic coatings) on metal surface applied by electrolysis, fusion, vacuum or chemical means. Scope is further extended to the Standardization of the preparation of the substrates prior to the deposition of metallic and inorganic coatings. There are a total of 144 existing ISO standards published by this technical committee and has 19 participating countries (P-members) and 24 observing countries (O-members). Korean Agency for Technology and Standards (KATS), being the secretariat of ISO/TC107, is constantly supporting this technical committee for the development of standards and related activities.

• Journal of the Korean Vacuum Society
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• v.12 no.3
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• pp.193-199
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• 2003

Ti-Cu-N and Ti-Ag-N nanocomposite films with various copper and silver contents were synthesized by arc ion plating and magnetron sputtering hybrid system. The structure and mechanical properties of these films were found to be dependant on the copper and silver concentration. The maximum hardness of Ti-Cu-N and Ti-Ag-N films showed approximately 40 ㎬ below 2 at%Me. The role of soft metallic phase in Ti-Me-N nanosturctured films containing one hard and one soft phase is also discussed.

• Journal of the Korean Society for Heat Treatment
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• v.20 no.2
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• pp.78-83
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• 2007

CrN coatings were deposited by cathodic arc ion plating method on the SKD11 steel substrates. Atmosphere temperature of $350^{\circ}C$, arc current of 90 A, nitrogen partial pressure of 1.0-5.3 Pa, and negative bias voltage of 30-135 V were selected. The characteristics of microstructure were investigated with XRD. Hardness, adhesion and friction coefficient measured by microhardness tester, scratch tester, and ball on disk tribometer. Microstructures depended on nitrogen partial pressure and bias voltage. The preferred orientation of the films was changed from (200) to (111) with decreasing pressure and increasing bias voltage. Adhesion properties related with microstructure, but microstructure changes slightly influenced on hardness and friction properties. The critical load.($Lc_1$) and hardness of CrN films deposited at 5.3 Pa, -30 V condition were 55 N(HF1), $2157{\pm}47\;Hk_{0.025}$. The friction coefficient were about 0.5 under dry condition.

• Journal of the Korean institute of surface engineering
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• v.42 no.2
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• pp.73-78
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• 2009

Quinary Ti-Al-Si-C-N films were successfully synthesized on SUS 304 substrates and Si wafers by a hybrid coating system combining an arc ion plating technique and a DC reactive magnetron sputtering technique. In this work, the effect of Si content on the microstructure and mechanical properties of Ti-Al-C-N films were systematically investigated. It was revealed that the microstructure of Ti-Al-Si-C-N coatings changed from a columnar to a nano-composite by the Si addition. Due to the nanocomposite microstructure of Ti-Al-Si-C-N coatings, the microhardness of The Ti-Al-Si-C-N coatings significantly increased up to 56 GPa. In addition the average friction coefficients of Ti-Al-Si-C-N coatings were remarkably decreased with Si addition. Therefore, Ti-Al-Si-C-N coatings can be applicable as next-generation hard-coating materials due to their improved hybrid mechanical properties.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2014.11a
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• pp.213-213
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• 2014

$300^{\circ}C$와 $500^{\circ}C$에서 아크 이온 증착된 도포층의 조성은 각각 Fe : Al : Ti : Si : N = 1.31 : 36.52 : 31.31 : 0.48 : 30.38 [wt.%]와 Fe : Cr : Al : Ti : Si : N = 1.24 : 0.56 : 36.82 : 32.72 : 0.59 : 28.07 [wt.%] 이었다. 0.1N $H_2SO_4$ 수용액과 인공해수 (ASTM D1141-98) 분위기에서 $300^{\circ}C$, $500^{\circ}C$에서 증착된 도포층의 부식전압과 부식속도는 각각 $-0.2787V_{SHE}$, $0.002A/cm^2$, $-2.764V_{SHE}$, $0.002A/cm^2$ 와 $-0.2799V_{SHE}$, $0.002A/cm^2$, $-0.0394V_{SHE}$, $0.002A/cm^2$이었다. 나노 경도값은 각각 23.6, 25.8 GPa 이었다. 이는 각각 2208.2, $2434.2H_V$에 해당되었다.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2014.11a
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• pp.304-304
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• 2014

Quaternary Ti-Al-Si-N films were deposited on WC-Co substrates by a hybrid deposition system of arc ion plating (AIP) method for Ti-Al source and DC magnetron sputtering technique for Si incorporation. The synthesized Ti-Al-Si-N films were revealed to be composites of solid-solution (Ti,Al)N crystallites and amorphous $Si_3N_4$ by instrumental analyses. The Si addition in Ti-Al-N films affected the refinement and uniform distribution of crystallites by percolation phenomenon of amorphous silicon nitride, similarly to Si effect in TiN film. As the Si content increased up to about 9 at.%, the hardness of Ti-Al-N film steeply increased from 30 GPa to about 50 GPa. The highest microhardness value (~50 GPa) was obtained from the Ti-Al-Si-N film having the Si content of 9 at.%, the microstructure of which was characterized by a nanocomposite of $nc-(Ti,Al)N/a-Si_3N_4$.

• Korean Journal of Materials Research
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• v.28 no.7
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• pp.405-410
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• 2018

TiN and CrN thin films are among the most used coatings in machine and tool steels. TiN and CrN are deposited by arc ion plating(AIP) method. The AIP method inhibits the reaction by depositing a hard, protective coating on the material surface. In this study, the characteristics of multi-layer(TiN/CrN/TiN(TCT), CrN/TiN/CrN(CTC)) are investigated. For comparison, TiN with the same thickness as the multilayer is formed as a single layer and analyzed. Thin films formed as multilayers are well stacked. The characteristics of micro hardness and corrosion resistance are better than those of single layer TiN. The TiN/CrN peak is confirmed because both TCT and CTC are formed of the same component(TiN, CrN), and the phase is first grown in the (111) direction, which is the growth direction. However, the adhesion and abrasion resistance of the multilayer films are somewhat lower.

• Journal of the Semiconductor & Display Technology
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• v.13 no.2
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• pp.29-35
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• 2014

In this study general solar cell production process was complemented, with research on improvement of solar cell efficiency through surface structure and thermal annealing process. Firstly, to form the pyramid structure, the saw damage removal (SDR) processed surface was undergone texturing process with reactive ion etching (RIE). Then, for the formation of smooth pyramid structure to facilitate uniform doping and electrode formation, the surface was etched with HND(HF : HNO3 : D.I. water=5 : 100 : 100) solution. Notably, due to uniform doping the leakage current decreased greatly. Also, for the enhancement and maintenance of minority carrier lifetime, antireflection coating thermal annealing was done. To maintain this increased lifetime, front electrode was formed through Au plating process without high temperature firing process. Through these changes in two processes, the leakage current effect could be decreased and furthermore, the conversion efficiency could be increased. Therefore, compared to the general solar cell with a conversion efficiency of 15.89%, production of high efficiency solar cell with a conversion efficiency of 17.24% was made possible.