• Title/Summary/Keyword: ion beam methods

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X-ray Absorption Near-edge Studies of Au1-xPtx alloys

  • Y.D. Chung;Lim, K.Y.;Lee, Y.S.;C.N.Whang;Park, B.S.;Y.Jeon
    • Proceedings of the Korean Vacuum Society Conference
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    • 2000.02a
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    • pp.164-164
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    • 2000
  • Since Au-Pt alloys have various atomic structures depending upon composition and annealing temperature, it is very interesting to investigate the electronic structures of alloys. We studied the changes of the electronic structure I the Au-Pt alloys by x-ray absorption near edge spectroscopy (XANES). Two kinds of Au-Pt alloy samples were prepared by arc melting methods and ion-beam-mixing technique. The Pt L2, 3-edge and Au L2, 3-edge X-ray absorption spectra (XPS) were measured with the electron yield mode detector at the 3C1 beam line of the Pohang Light Source (PLS). It was found that there was a substantial decrease in the area of the Pt L2, 3 white lines compared with that of pure Pt. The observed decrease in white line area was attributed to an increase in the number of pure Pt. The observed decrease in white line area was attributed to an increase in the number of 5d-electrons at the Pt site upon alloy formation. However, the Au L2, 3 edge spectra for Au-Pt alloys are all similar to that of pure Au. This implies that the 5d hole count of Au is not changed by alloy formation with Pt.

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Deposition of Copper Film on Polytetrafluoroethylene (PTFE) Modified by 1 keV Ion Irradiation (1 keV $Ar^+$이온빔으로 개질된 polytetrafluoroethylene (PTFE) 위의 구리 박막 증착)

  • Cho, Jun-Sik;Yoon, Ki-hyun;Koh, Seok-Keun
    • Korean Journal of Materials Research
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    • v.10 no.1
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    • pp.77-82
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    • 2000
  • A surface of polytetrafluoroethylene(PTFE) was modified with changing ion doses by 1 keV $Ar^+$ ion irradiation and Cu films having thickness $5000\;{\AA}$ were deposited on the modified PTFE. The SEM study showed that the surface texture of modified PTFE was in the form of cones whose height increased depending on ion doses. Through XPS spectra, it was found that the intensity of F ls peaks decreased with ion doses by preferential sputtering of F atoms and the C-C and / or C-F chains were formed by the crosslinking in the newly unstable chains. Cu films were deposited uniformly along the filaments formed on the modified PTFE. In x-ray diffraction (XRD) spectra of deposited Cu films on modified PTFE, a preferred orientation along (111) and (200) planes was found and the peak intensity of (111) plane increased as surface roughness of modified PTFE increased. The resistivity of Cu films was changed from $2.7{\mu}{\Omega}cm$ of unmodified PTFE to $4.3{\mu}{\Omega}cm$ of modified PTFE at ion dose of $1{\times}10^{16}/\textrm{cm}^2$ and the abrupt increase of resistivity in the modified PTFE at ion dose of $1{\times}10^{17}/\textrm{cm}^2$ was due to being cut off the film which resulted from the increased surface roughness.

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Study on the beam properties of small field sizes (소조사면 전량분포의 특성에 관한 고찰)

  • Cho JeongHee;Lee SangKyu;An SeungKwon;Park Jell
    • The Journal of Korean Society for Radiation Therapy
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    • v.16 no.1
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    • pp.1-9
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    • 2004
  • Purpose : The aim of this study is to investigate the properties of small field size and to measure the penumbra and central axis depth dose varying to the jaw setting and off axis distance for indicate this data to small field sizes radiation therapy. Material and methods : The percentage depth dose, beam profile and central axis output dose was measured by farmer type ion chamber and pinpoint chamber using Primart linac with 6MV energy. Beam quality and penumbra variations according to the central axis shift, from center to every 2cm outside increment, and field size, from $1{\times}1cm$ to $10{\times}10cm$ was investigated and compared with that of the standard geometrical condition's results Results : The differences of measured values between two ion chamber was about $37\%$ at 10cm depth with $1{\times}1cm$ field sizes but as field size increased this differences was diminished gradually. Measured data from various off axis distance with the different asymmetric collimations are not changed significantly but as size decreased the dose variation was increased and at $1{\times}1cm$ field size dose difference among off axis distance was as much as $13\%$, and as shallower the measured depth the central axis dose variations among the OAD was increased, penumbra was not changed noticeably depending on off axis distance but the percentage of penumbra from its initial field sizes was strongly dependant on field sizes and penumbra occupation rates of its own field sizes ranging from $6\%$ at $10{\times}10cm$ to $50\%$ at $1{\times}1cm$ field size. Conclusion : For imrt treatment, there are several numbers of different gentry angles with beams of nonuniform fluences are required and several complex factors involved. Among them the characteristics of beam output varying to the geometrical setting and design of collimators are of important to attaining a good treatment results. As mentioned in results the differences of measured values are changed significantly depends on ion chamber volume, depths and field size. For providing quality radiation treatment, especially at small field size, those factor's should have considering deliberately.

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OBSERVATIONS AND SPECTRAL ANALYSES OF SOLAR FLARES

  • DING M. D.
    • Journal of The Korean Astronomical Society
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    • v.36 no.spc1
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    • pp.49-54
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    • 2003
  • We introduce the two-dimensional spectral observations of solar flares using the Solar Tower Tele-scope of Nanjing University, China. In particular, we introduce three typical events and the methods used to analyze the data. (1) The flare of November 11, 1998, which is a limb flare. We derive the temperature and density within the flaring loop using non-LTE calculations. The results show that the loop top may be hotter and denser than other parts of the loop, which may be a result of magnetic reconnect ion above the loop. (2) The flare of March 10, 2001, which is a white-light flare that shows an emission enhancement at the near infrared continuum. We propose a model of non-thermal electron beam heating plus backwarming to interpret the observations. (3) The flare of September 29, 2002, which shows unusual line asymmetries at one flare kernel. The line asymmetries are caused by an upward moving plasma that is accelerated and heated during the flare development.

Improvement of bolometric properties of vanadium oxide by addition of tungsten (텅스텐 첨가에 의한 적외선 소자용 바나듐 옥사이드의 특성 향상)

  • Han, Yong-Hui;Choi, In-Hun;Kim, Geun-Tae;Shin, Hyeon-Jun;Chi, En;Moon, Seong-Uk
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2003.11a
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    • pp.207-207
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    • 2003
  • Uncooled infrared(IR) detectors that use a microbolometer with a large focal-plane array(FPA) have been developed with surface micromachining technology. There are many materials for microbolometers, such as metals, vanadium oxide, semiconductors and superconductors. Among theses, vanadium oxide is a promising material for uncooled microbolometers due to it high temperature coefficient of resistance(TCR) at room temperature. It is, however, is very difficult to deposit vanadium oxide thin films having a high TCR and low resistance because of the process limits in microbolometer fabrication. In general, vanadium oxides have been applied to microbolometer in mixed phases formed by ion beam deposition methods at low temperature with TCR in the range from -1.5 to -2.0%K.

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STIMULATING NEURAL ELECTRODE-A STUDY ON CHARGE INJECTION PROPERTIES OF IRIDIUM OXIDE FILMS

  • Lee, In-Seop;Ray A. Buchanan;Jim M.Williams
    • Journal of the Korean Vacuum Society
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    • v.4 no.S2
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    • pp.156-162
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    • 1995
  • For a stimulating neural electrode, the charge density should be as large as possible to provide adequate stimulation of the nervous system while allowing for miniaturization of the electrode. Since iridium oxide is able to produce high charge densities while preventing undesirable reactions due to charge storage, it has become a promising material for neural prostheses. Successful production of stable Ir and Ir oxide films on various substrates now limits the use of this material. Ir was deposited on two differently prepared surface of (mirror finish, passivation) surgical Ti-6AI-4V with several methods. Ion beam mixing of sputter deposited Ir films on passivated Ti-6AI-4V produced stable and good adherent Ir films. It was found that the increase in charge density of pure Ir on continuous cyclingis due to the accumulation of the oxide phase ( associated with a large surface area) in which the valence state of iridium changes and the double-layer capacitance increases. This study also showed that the double layer capacitance is equally or even more responsible for the high charge density of anodically formed Ir oxide.

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Comparison of characteristics of MgO films deposited by vacuum arc method with other methods. (진공아크 증착법과 다른 공정에 의해 증착된 MgO 박막 특성 비교)

  • 이은성;김종국;이성훈;이건환
    • Journal of the Korean Vacuum Society
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    • v.12 no.2
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    • pp.112-117
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    • 2003
  • MgO films is widely used in plasma display panel (PDP) technology. In this work, structural and optical properties of the MgO films deposited by e-beam evaporation, reactive magnetron sputtering, which are commercially used, and arc deposition were compared. MgO thin films were deposited on glass substrates by vacuum arc deposition equipment using a magnesium metal target at various oxygen gas flows. In order to investigate the packing density by ellipsometer, to measure reasonable erosion-rates of the MgO protective layers, we introduced an acceleration test method, namely, Ar+ ion beam induced erosion test. Also, XPS and UV test were adopted to examine the effect of the moisture on the optical transmittance of the MgO protective layers, which showed that these of MgO films by arc deposition method sustained more 90% and were insensitive to effect of the moisture. XRD and AFM have been also used to study behaviors of the structure and surface morphology.

Temperature dependence of Heteroeptaxial $Y_2O_3$ films grown on Si by ionized cluster beam deposition

  • Cho, M.-H.;Ko, D.-H.;Whangbo, S.W.;Kim, H.B.;Jeong, K.H.;Whang, C.N.;Choi, S.C.;Cho, S.J.
    • Journal of the Korean Vacuum Society
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    • v.7 no.s1
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    • pp.57-77
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    • 1998
  • Heteroepitaxial $Y_2O_3$ films were grown on a Si(111) substrate by ionized cluster beam deposition(ICBD) in ultra high vacuum, and its qualities such as crystllitnity, film stress, and morphological characteristics were investigated using the various measurement methods. The crystallinity was investigated by x-ray diffraction (XRD) and reflection high energy electron diffraction (RHEED). Interface crystallinity was also examined by Rutherford backscattering spectroscopy(RBS) channeling, transmission electron microscopy(TEM). The stress of the films was measured by RBS channeling and XRD. Surface and interface morphological characteristics were investigated by atomic force microscopy (AFM) and x-ray scattering method. Comparing the interface with the surface characteristics, we can conclude that many defects at the interface region were generated by interface reaction between the yttrium metal and SiO2 layer and by ion beam characteristic such as shallow implantation, so that they influenced the film qualities. The film quality was dominantly depended on the characteristic temperature range. In the temperature range from $500^{\circ}C$ to $600^{\circ}C$, the crystallinity was mainly improved and the surface roughness was drastically decreased. On the other hand, in the temperature range from $600^{\circ}C$ to $700^{\circ}C$, the compressive stress and film density were dominantly increased, and the island size was more decreased. Also the surface morphological shape was transformed from elliptical shape to triangular. The film stress existed dominantly at the interface region due to the defects generation.

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BST Thin Film Multi-Layer Capacitors

  • Choi, Woo Sung;Kang, Min-Gyu;Ju, Byeong-Kwon;Yoon, Seok-Jin;Kang, Chong-Yun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.319-319
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    • 2013
  • Even though the fabrication methods of metal oxide based thin film capacitor have been well established such as RF sputtering, Sol-gel, metal organic chemical vapor deposition (MOCVD), ion beam assisted deposition (IBAD) and pulsed laser deposition (PLD), an applicable capacitor of printed circuit board (PCB) has not realized yet by these methods. Barium Strontium Titanate (BST) and other high-k ceramic oxides are important materials used in integrated passive devices, multi-chip modules (MCM), high-density interconnect, and chip-scale packaging. Thin film multi-layer technology is strongly demanded for having high capacitance (120 nF/$mm^2$). In this study, we suggest novel multi-layer thin film capacitor design and fabrication technology utilized by plasma assisted deposition and photolithography processes. Ba0.6Sr0.4TiO3 (BST) was used for the dielectric material since it has high dielectric constant and low dielectric loss. 5-layered BST and Pt thin films with multi-layer sandwich structures were formed on Pt/Ti/$SiO_2$/Si substrate by RF-magnetron sputtering and DC-sputtering. Pt electrodes and BST layers were patterned to reveal internal electrodes by photolithography. SiO2 passivation layer was deposited by plasma-enhanced chemical vapor deposition (PE-CVD). The passivation layer plays an important role to prevent short connection between the electrodes. It was patterned to create holes for the connection between internal electrodes and external electrodes by reactive-ion etching (RIE). External contact pads were formed by Pt electrodes. The microstructure and dielectric characteristics of the capacitors were investigated by scanning electron microscopy (SEM) and impedance analyzer, respectively. In conclusion, the 0402 sized thin film multi-layer capacitors have been demonstrated, which have capacitance of 10 nF. They are expected to be used for decoupling purpose and have been fabricated with high yield.

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Surface Modification of Polypropylene Membrane by ${\gamma}$ Irradiation Methods and their Solutes Permeation Behaviors

  • Shim, J. K.;Lee, S. H.;Kwon, O. H.;Lee, Y. M.;Nho, Y. C.
    • Proceedings of the Membrane Society of Korea Conference
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    • 1998.04a
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    • pp.99-101
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    • 1998
  • 1. Introduction : The conventional grafting polymerization technique requires chemically reactive groups on the surface as well as on the polymer chains. For this reason, a series of prefunctionalization steps are necessary for covalent grafting. The surface prefunctionalizational technique for grafting can be used to ionization radiation, UV, plasma, ion beam or chemical initiators. Of these techniques, radiation method is one of the useful methods because of uniform and rapid creation of active radical sites without catalytic contamination in grafted samples. If the diffusion of monomer into polymer is large enough to come to the inside of polymer substrate, a homogeneous and uniform grafting reaction can be carried out throughout the whole polymer substrate. Radiation-induced grafting method may attach specific functional moieties to a polymeric substrate, such as preirradiation and simultaneous irradiation. The former is irradiated at backbone polymer in vacuum or nitrogen gas and air, and then subsequent monomer grafting by trapped or peroxy radicals, while the latter is irradiated at backbone polymer in the presence of the monomer. Therefore, radiation-induced polymerization can be used to modification of the chemical and physical properties of the polymeric materials and has attracted considerable interest because it imparts desirable properties such as blood compatibility. membrane quality, ion excahnge, dyeability, protein adsorption, and immobilization of bioactive materials. Synthesizing biocompatible materials by radiation method such as preirradiation or simultaneous irradiation has often used $\gamma$-rays to graft hydrophilic monomers onto hydrophobic polymer substrates. In this work, in attempt to produce surfaces that show low levels of anti-fouling of bovine serum albumin(BSA) solutions, hydroxyethyl methacrylate(HEMA) was grafted polypropylene membrane surfaces by preirradiation technique. The anti-fouling effect of the polypropylene membrane after grafting was examined by permeation BSA solution.

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