• 한국정밀공학회지
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• 제16권9호
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• pp.179-190
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• 1999

To automate the polishing process, a polishing robot with two axes which is attached to a machining center with three axes has been developed by our previous research. This automatic polishing robot is able to keep the polishing tool normal to the curved surface of die and is able to maintain a constant pneumatic pressure. Therefore, in the case of a curved surface die, the surface roughness to be polished by the system with five axes is improved superior than the surface by a three-axis machining center. However, because the polishing robot was big and heavy, a polishing workspace was limited and then it was difficult to attach the robot to machining center. In this study, the smaller and lighter polishing robot than the previous has been designed to improve defects due to the magnitude and weight of the robot. And the sliding mode control ins applied to polishing robot to improve the tracking performance. To obtain switching parameters of sliding mode control, the signal compression method is used. Code separation program to separate the date for a three-axis machining center and a two-axis polishing robot from a five-axis NC data is improved for users to check conveniently the separated trajectory and to handle many data by using the graphic user interface. To evaluate the polishing performance of the developed robot, the polishing experiment for shadow mask was carried out. The result shows the automatic polishing robot has a good trajectory tracking performance and obtains a good polished workpiece efficiently under recommended polishing conditions.

• 대한금속재료학회지
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• 제49권8호
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• pp.657-663
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• 2011

This study represents the results of the peel strength and surface morphology according to the preprocessing times of polyimide (PI) in a Cu/Ni/PI structure flexible copper clad laminate production process based on the polyimide. Field emission scanning electron microscopy, X-ray diffraction, and X-ray photoelectron spectroscopy were used to analyze the surface morphology, crystal structure, and interface binding structure of sputtered Ni, Cu, and electrodeposited copper foil layers. The surface roughness of Ni, Cu deposition layers and the crystal structure of electrodeposited Cu layers were varied according to the preprocessing times. In the RF plasma times that were varied by 100-600 seconds in a preprocessing process, the preprocessing applied by about 300-400 seconds showed a homogeneous surface morphology in the metal layers and that also represented high peel strength for the polyimide. Considering the effect of peel strength on plastic deformation, preprocessing times can reasonably be at about 400 seconds.

• 반도체디스플레이기술학회지
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• 제9권3호
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• pp.53-58
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• 2010

In this study, we have investigated the effect of the ambient gases on the characteristics of IZO thin films for the OLED (organic light emitting diodes) devices. For this purpose, IZO thin films were deposited by RF magnetron sputtering under various ambient gases (Ar, $Ar+O_2$ and $Ar+H_2$) at $150^{\circ}C$. In order to investigate the influences of the oxygen and hydrogen, the flow rate of oxygen and hydrogen in argon mixing gas has been changed from 0.1sccm to 0.5sccm, respectively. All the samples show amorphous structure regardless of ambient gases. The electrical resistivity of IZO film increased with increasing flow rate of $O_2$ under $Ar+O_2$ while under $Ar+H_2$ atmosphere the electrical resistivity showed minimum value near 0.5sccm of $H_2$. All the films showed the average transmittance over 85% in the visible range. The OLED device was fabricated with different IZO substrates made by configuration of IZO/${\alpha}$-NPD/DPVB/$Alq_3$/LiF/Al to elucidate the performance of IZO substrate. OLED devices with the amorphous-IZO (a-IZO) anode film show better current densityvoltage-luminance characteristics than that of OLED devices with the commercial crystalline-ITO (c-ITO) anode film. It can be explained that very flat surface roughness and high work function of a-IZO anode film lead to more efficient hole injection by reduction of interface barrier height between anode and organic layers. This suggests that a-IZO film is a promising anode materials substituting conventional c-ITO anode in OLED devices.

• 한국자기학회지
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• 제21권6호
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• pp.214-218
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• 2011

본 연구에서는 DC 마그네트론 스퍼터링을 이용해 MgO 단결정 기판 위에 성장된 Ag/CoFeB 박막의 스퍼터링 조건에 따른 박막 미세구조의 변화를 연구하였다. Ag 박막의 결정성 및 표면 거칠기는 인가전력(sputtering power) 및 증착온도의 변화에 따라 증착온도가 증가하는 경우 (200) 방향의 결정성이 향상되는 것을 확인하였으며, 인가전력이 증가되는 경우 표면 거칠기가 감소하는 것을 확인하였다. 또한 고분해능 TEM(transmission electron microscopy) 및 XRR(X-ray reflectivity) 측정을 통해 MgO 기판 위 Ag층의 켜쌓기 성장 및 MgO 기판과 Ag층 사이에 산화층에 해당하는 계면층이 존재하는 것을 알 수 있었으며, 증착온도의 증가에 따른 Ag의 섬상구조 형성 및 intermixing 효과에 의한 Ag/CoFeB 계면층의 변화 및 자기적 특성의 변화를 연구하였다.

• 한국해안·해양공학회논문집
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• 제30권6호
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• pp.298-305
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• 2018

본 연구에서는 해양 항만 콘크리트 구조물의 보수작업을 위한 수중코팅제의 부착 특성을 조사하기 위하여 실험적 연구를 수행하였다. 고려된 실험변수는 코팅제의 종류, 코팅대상 모재의 표면 거칠기, 도포 작업환경(육상 혹은 수중)으로 부착 강도는 Pull-off 방식으로 측정하였다. 코팅제의 부착 강도는 각 수중코팅제의 도포 작업 완료 24시간 후에 ASTM C1583 규정에 따라 측정하였다. 또한, 콘크리트 모재와 코팅제 간의 부착파괴 거동(코팅제, 계면, 콘크리트 모재)을 육안으로 관찰하였으며 측정된 부착 강도 수치에 근거하여 각 실험요인의 비교분석을 수행하였다. 실험결과, 수중에서 도포한 코팅제의 부착 강도가 육상의 경우에 비해 감소하는 경향을 보였으며 수중환경에서는 부착 강도에 미치는 모재 표면 거칠기의 영향이 육상의 경우에 비하여 미비하였다. 마지막으로 수중코팅제의 선정, 사용 시에 유의할 점에 대하여 설명하였다.

• 대한금속재료학회지
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• 제49권10호
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• pp.811-817
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• 2011

In this study, we have investigated the role of a metal oxide hole injection layer (HIL) between an Indium Tin Oxide (ITO) electrode and an organic hole transporting layer (HTL) in organic light emitting diodes (OLEDs). Nickel Oxide films were deposited at different deposition times of 0 to 60 seconds, thus leading to a thickness from 0 to 15 nm on ITO/glass substrates. To study the influence of NiO film thickness on the properties of OLEDs, the relationships between NiO/ITO morphology and surface properties have been studied by UV-visible spectroscopy measurements and AFM microscopy. The dependences of the I-V-L properties on the thickness of the NiO layers were examined. Comparing these with devices without an NiO buffer layer, turn-on voltage and luminance have been obviously improved by using the NiO buffer layer with a thickness smaller than 10 nm in OLEDs. Moreover, the efficiency of the device ITO/NiO (< 5 nm)/NPB/$Alq_3$/ LiF/Al has increased two times at the same operation voltage (8V). Insertion of a thin NiO layer between the ITO and HTL enhances the hole injection, which can increase the device efficiency and decrease the turn-on voltage, while also decreasing the interface roughness.

• 대한금속재료학회지
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• 제49권4호
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• pp.321-328
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• 2011

The 30 nm-thick Ni layers was deposited on a flexible polyimide substrate with an e-beam evaporation. Subsequently, we deposited a Si layer using a catalytic CVD (Cat-CVD) in a hydride amorphous silicon (${\alpha}$-Si:H) process of $T_{s}=180^{\circ}C$ with varying thicknesses of 55, 75, 145, and 220 nm. The sheet resistance, phase, degree of the crystallization, microstructure, composition, and surface roughness were measured by a four-point probe, HRXRD, micro-Raman spectroscopy, FE-SEM, TEM, AES, and SPM. We confirmed that our newly proposed Cat-CVD process simultaneously formed both NiSi and crystallized Si without additional annealing. The NiSi showed low sheet resistance of < $13{\Omega}$□, while carbon (C) diffused from the substrate led the resistance fluctuation with silicon deposition thickness. HRXRD and micro-Raman analysis also supported the existence of NiSi and crystallized (>66%) Si layers. TEM analysis showed uniform NiSi and silicon layers, and the thickness of the NiSi increased as Si deposition time increased. Based on the AES depth profiling, we confirmed that the carbon from the polyimide substrate diffused into the NiSi and Si layers during the Cat-CVD, which caused a pile-up of C at the interface. This carbon diffusion might lessen NiSi formation and increase the resistance of the NiSi.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2000년도 제18회 학술발표회 논문개요집
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• pp.163-163
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• 2000

In this research, we used the ion irradiation technique which has an advantae in improving intentionally the properties of surface and interface in a non-equilibrium, instead of the conventional annealing method which has been known to improve the material properties in the equilibrium stat. Cu/Co multilayered films were prepared on SiN4/SiO2/Si substrates by the electron-beam evaporation for the Co layers and the thermal evaporation for the Cu layers in a high vacuum. The ion irradiation with a 80keV Ar+ was carried out at various ion doses in a high vacuum. Hysteresis loops of the films were investigated by magneto-optical polar Kerr spectroscopy at various experimental conditions. The change of atomic structure of the films before and after the ion irradiation was studied by glancing angle x-ray diffraction, and the intermixing between Co and Cu sublayers was confirmed by Rutherford backscattering spectroscopy. The surface roughness and magneto-resistance were measured by atomic force microscopy and with a four-point probe system, respectively. During the magneto-resistance measurement, we changed temperature and the direction of magnetization. From the results of experiments, we found that the change at the interfaces of the Cu/Co multilayered film induced by ion irradiation cause the change of magnetic properties. According to the change in hysteresis loop, the surface inplane component of magnetic easy axis was isotropic before the ion irradiation, but became anisotropic upon irradiation. It was confirmed that this change influences the axial behavior of magneto-resistance. Especially, the magneto-resistance varied in accordance with an external magnetic field and the direction of current, which means that magneto-resistance also shows the uniaxial behavior.

• 대한치과교정학회지
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• 제27권3호
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• pp.493-502
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• 1997

본 연구에서는 치과용 니켈-크롬합금의 표면에 전처리없이 치과용 브라켓을 Super-bond로 접착한 대조군과 샌드블라스팅 및 tin-plating을 각각 혹은 병용으로 표면처리후 Super-bond로 접착한 실험각군의 인장접착강도, 브라켓 탈락양상 및 주사전자현미경 소견을 비교하여 임상적용 가능성을 알아보고자 하였으며 다음과 같은 결과를 얻었다. 1. 인장장접착강도는 니켈-크롬합금의 표면에 샌드블라스팅 처리후 Super-bond로 브라켓을 접착한 실험 I군이 $14.41{\pm}2.24MPa$로 가장 높았고, tin-plating처리후 Super-bond로 접착한 실험 III군이 $13.59{\pm}1.51MPa$, 샌드블라스팅후 tin-lating처리를 하고 Super-bond로 접착한 실험 II군이 $12.27{\pm}1.45MPa$, 특정한 표면처리 없이 Super-bond로 접착한 대조군이 $10.50{\pm}1.57MPa$로 가장 낮게 나타났으나 실험 I군과 실험 III군간, 실험 III군과 실험 II군간, 실험 II군과 대조군간에는 유의한 차이가 없었다(p>0.05). 2. 브라켓의 주된 탈락양상은 대조군의 경우 $70\%$가 브라켓과 접착제 계면에서 adhesive failure를, $30\%$가 니켈-크롬합금과 접착제 계면에서 adhesive failure를 나타내었고, 실험 각군은 모두 브라켓과 접착제 계면에서 adhesivefailure 를 나타내었다. 3. 주사전자현미경 소견에서 대조군의 경우 일부 레진이 브라켓 기저면에 부착되어 나타났으나 실험 각군에서는 거의 대부분의 레진이 니켈-크롬합금면에 부착되어 관찰되었고, 샌드블라스팅만 시행한 시편면이 가장 균일하고 조밀한 표면 요철상을 나타내었다.

• 한국지반공학회논문집
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• 제27권10호
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• pp.13-23
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• 2011

동토기반 말뚝기초의 지지력은 말뚝구조물 표면과 주변 토사의 접촉면에서 발현되는 동착강도에 의해 산정되며, 이는 동착-강도가 동토지반 기초설계를 위한 가장 주요한 설계정수임을 의미한다. 동착강도는 토사종류, 동결온도, 말뚝표면에 수직방향으로 작용하는 지중응력, 재하속도, 말뚝구조물의 표면 거칠기 등 다양한 인자들에 동시다발적인 영향을 받는 것으로 보고되고 있다. 1960년대부터 동토지반 기초설계를 위한 동착강도 산정방법들이 제안되어 왔으나, 대부분 동결온도와 말뚝구조물 표면특성에 대한 영향은 고려하고 있는 반면 동착강도의 주요 영향인자 중 하나인 지중응력에 의한 영향을 고려하지 않고 있어 소정깊이 이상의 말뚝기초 설계를 위한 동착강도 산정방법으로 활용되기에는 한계가 있는 것으로 판단된다. 본 연구에서는 동결온도뿐 아니라 지중응력이 동착강도에 미치는 영향을 파악하기 위하여 직접전단시험기를 활용한 동결토 전단강도 및 동착강도 측정실험을 각각 수행하였다. 실험결과 전단강도와 동착강도는 모두 동결온도 조건이 낮아질수록, 혹은 수직응력 조건이 커질수록 증가하는 경향을 보였다. 전단강도와 동착강도의 정량적 관계분석을 위해 정의된 전단강도와 동착강도의 비 $r_s$는 초기 동결온도에서는 급격하게 감소하는 경향을 나타냈으나, 동결온도가 낮아질수록 증가하며 수렴구간을 형성해가는 경향을 보였다. 본 연구에서는 최종적인 연구결과로서 동결온도 및 수직응력 조건을 바탕으로 결정된 $r_s$값을 이용하여 동결토의 전단강도로부터 동착강도를 예측할 수 있는 방법을 제안하고 있다.