• Journal of the Korean institute of surface engineering
• /
• v.38 no.2
• /
• pp.73-78
• /
• 2005

A real-time monitoring of ICP(inductively coupled plasma) assisted magnetron sputtering of MgO was carried out using a QMS(quadrupole mass spectrometer), an OES(optical emission spectrometer), and a digital oscilloscope with a high voltage probe and a current monitor. At the time of ICP ignition, the most distinct impurity was OH emission (308.9 nm) which was dissociated from water molecules. For reactive deposition oxygen was added to Ar and the OH emission intensity was reduced abruptly When the discharge voltage was regulated by a PID controller from 240V(metallic mode) to 120V(oxide mode), the emission intensity from Mg (285.2 nm) changed proportionally to the discharge voltage, but the intensity of Ar I(811.6 nm) was constant. At 100V of discharge voltage, Mg sputtering was almost stopped. Emissions from Ar I(420.1 nm) and Mg I were dropped down to 1/10, but Ar I(811.6 nm) didn't change. And the emission from atomic oxygen (O I, 777.3 nm) was increased to 10 times. These results are compatible with those from QMS study.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.21 no.8
• /
• pp.727-732
• /
• 2008

In this work, the etch characteristics of $VO_2$ thin films were investigated using inductively coupled plasma (ICP) of $Cl_2/Ar$ gas mixtures. To analyze the plasma characteristics, a quadrupole mass spectrometer (QMS), an optical emission spectroscopy (OES), and a Langmuir probe measuring system were used. The surface reaction of the $VO_2$ thin films was investigated using X-ray photoelectron spectroscopy (XPS). It was found that an increase in Ar fraction in the $Cl_2/Ar$ plasma at fixed gas pressure, input power, and bias power resulted in increasing $VO_2$ etch rate which reached a maximum value of 87.6 nm/min at 70-75 % Ar. It was confirmed that the etch rate of the $VO_2$ films was mainly controlled by the ion flux. On the basis of measuring results, we will discuss possible etching mechanism of $VO_2$ film in the $Cl_2/Ar$ plasma.

• Corrosion Science and Technology
• /
• v.12 no.5
• /
• pp.215-219
• /
• 2013

Aluminum alloy(3003) can be dissolved during hydration process with hot tap water. In order to increase the stability of aluminum alloy, it was pretreated with anodization and phosphoric acid before hydration process. The effect of pretreatment on the surface property changes was analyzed with X-ray Photoelectron Spectroscopy (XPS) and Inductively Coupled Plasma-Optical Emission Spectrometer (ICP-OES) and their results supported that the increase of hydroxyl group (-OH) on the surface formed during anodization and phosphorous acid treatment prevented the dissolution of aluminum alloy during hydration process at high temperature.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2001.11a
• /
• pp.209-212
• /
• 2001

Polyimide(PI) films have been considered as the interlayer dielectric materials due to low dielectric constant, low water absorption, high gap-fill and planarization capability. The PI film was etched with using inductively coupled plasma (ICP). The etching characteristics such as etch rate and selectivity were evaluated to gas mixing ratio. High etch rate was 8300$\AA$/min and vertical profile was approximately acquired 90$^{\circ}$ at CF$_4$/(CF$_4$+O$_2$) of 0.2. The selectivies of polyimide to PR and SiO$_2$ were 1.2, 5.9, respectively. The etching profiles of PI films with an aluminum pattern were measured by a scanning electron microscope (SEM). The chemical states on the PI film surface were investigated by x-ray photoelectron spectroscopy (XPS). Radical densities of oxygen and fluorine in different gas mixing ratio of 07CF4 were investigated by optical emission spectrometer (OES).

• The Korean Journal of Food And Nutrition
• /
• v.29 no.6
• /
• pp.1015-1022
• /
• 2016

The purpose of this study was to investigate ash and mineral contents of agricultural products that are widely and specifically grown in Korea, including 23 fruits, 11 cereals and specialty crops, and 11 leaves and vegetables. Pre-treatment of mineral was performed by microwave method. Mineral contents were analyzed by Inductively Coupled Plasma-Optical Emission Spectrometer (ICP-OES) and Inductively Coupled Plasma Spectrophotometry Mass (ICP-MS). Ash contents ranged from 0.20 to 0.69 g/100 g in fruits, 1.62 to 3.80 g/100 g in cereals, and 0.28 to 2.93 g/100 g in leaves and vegetables. Among the 45 samples, the highest contents of ash were found in quinoa (average 3.80 g/100 g), the highest contents of calcium (Ca) were found in Hansan ramie leaves (average 894.79 mg/100 g), the highest contents of phosphorus (P) were found in yellow amaranth(average 661.88 mg/100 g), the highest contents of potassium (K) were found in quinoa (average 1,455.38 mg/100 g), the highest contents of magnesium (Mg) were found in red amaranth (average 434.02 mg/100 g), the highest contents of molybdenum (Mo) were found in moringa (average $482.50{\mu}g/100g$), and the highest contents of selenium (Se) were found in apple mango(average $23.67{\mu}g/100g$).

• Proceedings of the Korean Vacuum Society Conference
• /
• 2012.08a
• /
• pp.243-243
• /
• 2012

화석연료를 대체할 새로운 청정 에너지원의 요구가 높아지고 있는 현 시점에서 고효율, 무공해, 무소음 등의 장점으로 인해 친환경적 에너지원으로 연료전지의 수요가 증가하고 있다. 연료전지 분리판으로 고밀도 흑연을 종래에 가공하여 제작하였는데, 가공이 어렵고, 비용이 크게 들며, 대량생산이 어렵다는 등의 문제로 스테인리스강을 위주로 한 금속 분리판 개발이 이루어지고 있다. 본 연구에서는, 낮은 가격, 고속 증착, 우수한 가공성, 높은 기계적 강도 및 전기전도도, 화학적 안정성 및 내식성을 충족시키기 위하여 스테인리스 강박(0.1 mm이하)에 보호막으로 CrN을 선택하였다. 저가격화를 위하여 새로운 증착원인 스퍼터-승화형 소스의 가능성을 유도 결합 플라즈마에 Cr 봉을 직류 바이어스 함으로써 시도하였다. 10 mTorr의 Ar 유도 결합 플라즈마를 2.4 MHz, 400 W로 유지하면서 직류 바이어스 전력을 120 W (615 V, 0.19 A) 인가하였을 때 10분 동안의 증발양이 0.35 gr으로 측정이 되어 그 가능성을 확인할 수 있었다. 또한 OES(Optical emission spectrometer)를 이용하여 RPS로 방전시킨 고밀도 ICP를 측정한 결과 842.4 nm, 811.4 nm, 772.3 nm 등의 파장에서 높은 intensity를 갖는 peak을 찾을 수 있었고, 이 peak 들은 Ar 중성의 peak임을 확인할 수 있었다. ICP+DC bias로 Cr rod를 가열하는 공정에서의 plasma를 OES로 측정한 결과 Ar 중성의 peak은 감소하고, 520.5 nm, 425.5 nm, 357.7 nm 등의 파장에서 높은 intensity를 갖는 peak을 찾을 수 있었으며, 이 peak들은 Cr 중성의 peak임을 확인할 수 있었다. OES 측정 data를 토대로 공정 중의 rod type Cr target의 교체 주기를 예측할 수 있고 공정 중 실시간 감시가 가능할 것으로 기대된다.

• Laser Solutions
• /
• v.17 no.4
• /
• pp.7-13
• /
• 2014

In this work, the application of laser induced breakdown spectroscopy (LIBS) for the composition analysis of thin $Cu(In,Ga)Se_2$ (CIGS) solar cell films ($1-2{\mu}m$ thickness) is reported. For the ablation of CIGS films, femtosecond (fs) laser (wavelength = 343nm, pulse width = 500fs) and nanosecond (ns) laser (wavelength = 266nm, pulse width = 5ns) were used under atmospheric environment. The emission spectra were detected with an intensified charge coupled device (ICCD) spectrometer and multichannel CCD spectrometer for fs-LIBS and ns-LIBS, respectively. The calibration curves for fs-LIBS and ns-LIBS intensity ratios of Ga/Cu, In/Cu, and Ga/In were generated with respect to the concentration ratios measured by inductively coupled plasma optical emission spectrometry (ICP-OES).

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2001.11b
• /
• pp.209-212
• /
• 2001

Polyimide(PI) films have been considered as the interlayer dielectric materials due to low dielectric constant, low water absorption, high gap-fill and planarization capability. The PI mm Was etched with using inductively coupled plasma (ICP). The etching characteristics such as etch rate and selectivity were evaluated to gas mixing ratio. High etch rate was $8300{\AA}/min$ and vertical profile was approximately acquired $90^{\circ}$ at $CF_{4}/(CF_{4}+O_{2})$ of 0.2. The selectivies of polyimide to PR and $SiO_{2}$ were 1.2, 5.9, respectively. The etching profiles of PI films with an aluminum pattern were measured by a scanning electron microscope (SEM). The chemical states on the PI film surface were investigated by x-ray photoelectron spectroscopy (XPS). Radical densities of oxygen and fluorine in different gas mixing ratio of $O_{2}/CF_{4}$ were investigated by optical emission spectrometer (OES).

• Clean Technology
• /
• v.25 no.1
• /
• pp.14-18
• /
• 2019

In general after the etching process, waste etching solution contains metals. (ex. Nickel (Ni), Chromium (Cr), Zinc (Zn), etc.) In this work, we proposed a recycling process for waste etching solution and refining from waste liquid contained nickel to make nickel metal nano powder. At first, the neutralization agent was experimentally selected through the hydrolysis of impurities such as iron by adjusting the pH. We selected sodium hydroxide solution as a neutralizing agent, and removed impurities such as iron by pH = 4. And then, metal ions (ex. Manganese (Mn) and Zinc (Zn), etc.) remain as impurities were refined by D2EHPA (Di-(2-ethylhexyl) phosphoric acid). The nickel powders were synthesized by liquid phase reduction method with hydrazine ($N_2H_4$) and sodium hydroxide (NaOH). The resulting nickel chloride solution and nickel metal powder has high purity ( > 99%). The purity of nickel chloride solution and nickel nano powders were measured by EDTA (ethylenediaminetetraacetic) titration method with ICP-OES (inductively coupled plasma optical emission spectrometer). FE-SEM (field emission scanning electron microscopy) was used to investigate the morphology, particle size and crystal structure of the nickel metal nano powder. The structural properties of the nickel nano powder were characterized by XRD (X-ray diffraction) and TEM (transmission electron microscopy).

• Journal of Korean Society of Occupational and Environmental Hygiene
• /
• v.26 no.1
• /
• pp.48-57
• /
• 2016

Objectives: This study was conducted to evaluate the accuracy and precision of airborne metal analysis using polyvinyl chloride(PVC) membrane filter by pretreatment methods. Methods: A total of 75 spiked PVC samples for Cr, Fe and Mn ranged from 6 ug/sample to 40 ug/sample were used to evaluate recovery rates for three pretreatment methods: acid extraction, hot plate ashing and microwave digestion. For Mn, an additional 75 spiked mixed cellulose ester(MCE) membrane filters were analysed to compare the recovery rates of PVC samples. All samples were analysed with an inductively coupled plasma optical emission spectrometer(ICP-OES) and manganese samples were additionally analyzed by atomic absorption spectrometer(AAS). Results: The overall mean recovery rates of PVC samples for Cr, Fe and Mn were 90% or higher regardless of pretreatment methods, but there were statistically significant differences in recovery rates for Cr(p<0.05) and Mn(p<0.01) samples by pretreatment methods. The biases and the coefficient variations of PVC samples for three metals pretreated with three kinds of pretreatment methods ranged from 1.7% to 4.7% and from 1.6% to 6.5%, respectively. The manganese PVC samples pretreated by microwave digestion and analyzed with ICP-OES had the lowest bias at 1.9% and also showed lower bias than the bias for MCE samples, 2.7%. Conclusions: In order to accurately analyze the metals sampled with PVC membrane filters, microwave digestion and ICP-OES can be recommended.